Patents Assigned to Shipley
  • Coating compositions for use with an overcoated photoresist
    Patent number: 6852421
    Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.
    Type: Grant
    Filed: September 26, 2002
    Date of Patent: February 8, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Gerald B. Wayton, Peter Trefonas, III, Suzanne Coley, Tomoki Kurihara
  • Photoresist compositions particularly suitable for short wavelength imaging
    Patent number: 6852466
    Abstract: The present invention provides novel photoresist compositions that comprise a resin binder, a photoacid generator compound and an added amine component. In a first aspect, the added amine preferably is 1) non-aromatic 2) has from about 9 to about 16 carbon atoms, 3) contains no primary or secondary amine groups, and/or 4) contains no multiple tertiary amine groups where two tertiary groups are separated by a linkage of optionally substituted ethylene. In a related aspect, the added amine is a non-aromatic amine that comprises either 1) a tertiary nitrogen alicyclic ring member, and preferably is at junction position between a bicyclic or other multi-ring ring system; or 2) a tertiary nitrogen that is not a ring member, and is substituted by at least two tertiary or quaternary carbon radicals.
    Type: Grant
    Filed: December 23, 1998
    Date of Patent: February 8, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Peter Trefonas, III, Gary N. Taylor
  • Optical switch assembly and method for making
    Patent number: 6853764
    Abstract: An assembly and a method for accurately aligning optical fibers in an optical switch are described. An optical switch assembly is described having a pair of optical arrays mounted on a mounting apparatus. The mounting apparatus may include a base structure with either integral rails or affixed fibers. Alternatively, the mounting apparatus may include a base structure with grooves and a plurality of spheres in the grooves. An alternative arrangement includes a base structure with some grooves extending transverse to other grooves and mounting structures in each groove. One of the optical arrays is rendered immobile while the other array is freely movable on the mounting apparatus. Switching is provided by moving the movable fiber array relative to the fixed fiber array.
    Type: Grant
    Filed: May 11, 2001
    Date of Patent: February 8, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Noel Heiks, David W. Sherrer
  • Nickel electroplating solution
    Patent number: 6852211
    Abstract: Nickel plating baths that efficiently deposit layers of nickel on only the parts to be plated without corroding electronic parts that are ceramic composites or ceramic parts containing transition metal oxides are provided. Such nickel plating baths contain at least two chelating agents selected from amino polycarboxylic acids, polycarboxylic acids, and polyphosphonic acids, and have a pH in the range of 5 to 7, and a ratio of nickel ions to chloride ions of greater than 1.
    Type: Grant
    Filed: December 27, 2002
    Date of Patent: February 8, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Makoto Kondo, Haruki Enomoto, Motoya Shimazu
  • Stable composition
    Patent number: 6852367
    Abstract: Disclosed are stable organo polysilica resin composition containing a B-staged organo polysilica resin and an organic acid, methods of stabilizing such B-staged organo polysilica resin compositions and methods of manufacturing electronic devices using such stable compositions.
    Type: Grant
    Filed: July 12, 2002
    Date of Patent: February 8, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Yujian You, Robert H. Gore, Michael K. Gallagher
  • Photoimageable composition
    Publication number: 20050026077
    Abstract: Disclosed are photoimageable compositions containing silsesquioxane binder polymers and photoactive compounds, methods of forming relief images using such compositions and methods of manufacturing electronic devices using such compositions. Such compositions are useful as photoresists and in the manufacture of optoelectronic devices.
    Type: Application
    Filed: August 23, 2004
    Publication date: February 3, 2005
    Applicant: Shipley Company, L.L.C.
    Inventors: Dana Gronbeck, George Barclay, Leo Linehan, Kao Xiong, Subbareddy Kanagasabapathy
  • Photoacid generators and photoresists comprising same
    Patent number: 6849374
    Abstract: This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that generate an ?,?-difluoroalkyl sulfonic acid upon exposure to activating radiation. Positive- and negative-acting chemically amplified resists that contain such PAGs are particularly preferred. The invention also includes methods for synthesis of such PAGs and ?,?-difluoroalkyl sulfonic acids.
    Type: Grant
    Filed: November 3, 2001
    Date of Patent: February 1, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: James F. Cameron, Thomas M. Zydowsky
  • Methods and devices for coupling optoelectronic packages
    Patent number: 6848839
    Abstract: Optoelectronic packages comprise both an optical array and base chip. The array and base chip are aligned and coupled using a combination of V-grooves, wick stops, and alignment spheres (e.g., presion ball bearings). The array and base chip are passively aligned by disposeing an optical fiber having an angled endface onto V-grooves in both the array and base chip. The base chip typically comprises an optical surface device, such as a vertical cavity, surface emitting laser or photodetector.
    Type: Grant
    Filed: April 6, 2001
    Date of Patent: February 1, 2005
    Assignee: Shipley Company, L.L.C.
    Inventor: Dan A. Steinberg
  • Copolymers and photoresist compositions comprising same
    Patent number: 6849381
    Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention suitably contain 1) photoacid labile groups that preferably contain an alicyclic moiety; 2) a polymerized electron-deficient monomer; 3) a polymerized cyclic olefin moiety. Particularly preferred polymers of the invention are tetrapolymers or pentapolymers, preferably with differing polymerized norbornene units.
    Type: Grant
    Filed: April 7, 2003
    Date of Patent: February 1, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Stefan J. Caporale, Wang Yueh, Zhibiao Mao, Joseph Mattia
  • Polymers and photoresist compositions comprising same
    Patent number: 6849376
    Abstract: The invention includes polymers that contain a polymers of the invention contain one or more 1) carbonate units and/or 2) a lactone provided by a monomer having a ring oxygen adjacent to the monomer vinyl group. The invention also provides photoresists that contain such polymers, particularly for imaging at short wavelengths such as sub-200 nm.
    Type: Grant
    Filed: February 25, 2002
    Date of Patent: February 1, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Stefan J. Caporale
  • Reverse pulse plating composition and method
    Publication number: 20050016858
    Abstract: A composition and method for electroplating a metal on a substrate. The composition has a chloride to brightener concentration ratio of from 20:1 to 125:1. The method of electroplating, which employs the composition, employs pulse patterns that improve physical properties of metal surfaces.
    Type: Application
    Filed: December 19, 2003
    Publication date: January 27, 2005
    Applicant: Shipley Company, L.L.C.
    Inventors: Leon Barstad, Thomas Buckley, Raymond Cruz, Trevor Goodrich, Gary Hamm, Mark Kapeckas, Katie Price, Erik Reddington, Wade Sonnenberg
  • Thick film photoresists and methods for use thereof
    Publication number: 20050019705
    Abstract: New methods and compositions are provided that enable application and processing of photoresist as thick coating layers, e.g. at dried layer (post soft-bake) thicknesses of in excess of 2 microns. Resists can be imaged at short wavelengths in accordance with the invention, including 248 nm.
    Type: Application
    Filed: August 23, 2004
    Publication date: January 27, 2005
    Applicant: Shipley Company, L.L.C.
    Inventors: James Thackeray, James Mori, Gary Teng
  • Resistive materials
    Patent number: 6846370
    Abstract: Electrically resistive material including platinum and from about 5 and about 70 molar percent or iridium, ruthenium or mixtures thereof, calculated based on platinum as 100%, are disclosed.
    Type: Grant
    Filed: July 3, 2002
    Date of Patent: January 25, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Craig S. Allen, John Schemenaur, David D. Senk, Marc Langlois, Xiaodong Hu, Jan Tzyy-Jiuan Hwang, Jud Ready, Trifon Tomov
  • Optical interconnect having alignment depression
    Patent number: 6847764
    Abstract: An optical interconnect includes a waveguide holder having a first side and a second side. The first side has a first depression and the second side has a second depression. The waveguide holder has an opening in which a plurality of waveguides are disposed.
    Type: Grant
    Filed: April 16, 2001
    Date of Patent: January 25, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Dan A. Steinberg, David W. Sherrer
  • Polymers and photoresist compositions for short wavelength imaging
    Patent number: 6844270
    Abstract: The present invention includes polyacetal polymers and photoresist compositions that include the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-300 nm, particularly 157 nm.
    Type: Grant
    Filed: November 26, 2001
    Date of Patent: January 18, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Anthony Zampini, Sungseo Cho
  • Optical waveguide switch
    Patent number: 6842552
    Abstract: The present invention provides an optical switch. The switch includes a substrate and a first waveguide holding member. The switch also includes a second waveguide holding member disposed over the substrate and movable relative to the first waveguide holding member to provide a switching function. A movement guiding member is provided for guiding the movement of the second waveguide holding member. A registration element is disposed at the movement guiding member for positioning the second waveguide holding member at a selected location relative to the first waveguide holding member. The selected location is one that provides alignment between a selected waveguide of the first waveguide holding member and a selected waveguide of the second waveguide holding member.
    Type: Grant
    Filed: January 31, 2003
    Date of Patent: January 11, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Dan A. Steinberg, John J. Fisher, David W. Sherrer, Mindaugas F. Dautartas, William T. Stacy
  • Photoimageable waveguide composition and waveguide formed therefrom
    Patent number: 6842577
    Abstract: Provided are photodefinable compositions suitable for use in forming an optical waveguide. The compositions include a silsesquioxane polymer having polymerized units of the formula (R1SiO1.5) and (R2SiO1.5), wherein R1 and R2 are different and are substituted or unsubstituted organic side chain groups and are free of hydroxy groups, and two or more functional end groups, and a photoactive component. The solubility of the silsesquioxane polymer is altered upon exposure to actinic radiation such that the composition is developable in an aqueous developer solution. Also provided are methods of forming an optical waveguide with the inventive compositions, optical waveguides, and electronic devices including one or more optical waveguide.
    Type: Grant
    Filed: December 2, 2002
    Date of Patent: January 11, 2005
    Assignee: Shipley Company L.L.C.
    Inventors: James G. Shelnut, Matthew L. Moynihan, Omari Patterson
  • Polymers, processes for polymer synthesis and photoresist compositions
    Patent number: 6841331
    Abstract: The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties.
    Type: Grant
    Filed: February 26, 2002
    Date of Patent: January 11, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Stefan J. Caporale, Robert J. Kavanagh, Nick Pugliano
  • Optical assembly for coupling with integrated optical devices and method for making
    Patent number: 6839474
    Abstract: An optical assembly which allows for passive alignment of the various elements is described. A substrate with a cut out portion and an upper surface is utilized as a mount for an optical array and an imaging assembly. The optical array, which preferably includes a plurality of optical fibers is positioned on V-grooves located on the upper surface. The imaging assembly, which preferably includes a plurality of lenses, such as GRIN lenses, is lowered at least partially into the cut-out portion. The optical fibers are optically coupled with said lenses. A waveguide, having a plurality of waveguide cores within a cladding, may further be optically coupled with the lenses, or alternatively, directly to the optical fibers. An integrated optic chip may also be affixed to the substrate or mounted on the substrate.
    Type: Grant
    Filed: November 15, 2001
    Date of Patent: January 4, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Dan A. Steinberg, David W. Sherrer, Mindaugas F. Dautartas, Arden Jeantilus
  • Multilayer photoresist system
    Publication number: 20040265754
    Abstract: Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing photoresist that is imaged at short exposure wavelengths.
    Type: Application
    Filed: November 20, 2003
    Publication date: December 30, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: George G. Barclay, James F. Cameron