Abstract: Electrolytic copper plating methods are provided, wherein copper is electrolytically deposited on a substrate, and the electrolytic copper plating solution supplied to the electrolytic copper plating is subjected to dummy electrolysis using an insoluble anode. The method described above can maintain and restore the electrolytic copper plating solution so as to maintain satisfactory appearance of plated copper, fineness of deposited copper film, and via-filling.
Abstract: Resistive materials have resistivities that are axis dependent are provided. Such resistive materials having a resistivity in a first direction and a very different resistivity in an orthogonal direction. These resistive materials are particularly suitable for use as resistors embedded in printed wiring boards.
Type:
Application
Filed:
October 17, 2003
Publication date:
December 23, 2004
Applicant:
Shipley Company, L.L.C.
Inventors:
Craig S. Allen, Andrew T. Hunt, Wen-Yi Lin, David D. Senk, John Schemenaur
Abstract: The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties.
Type:
Application
Filed:
April 5, 2004
Publication date:
December 23, 2004
Applicant:
Shipley Company, L.L.C.
Inventors:
George G. Barclay, Stefan J. Caporale, Robert J. Kavanagh, Nick Pugliano
Abstract: A method to determine and monitor concentrations of inert metal plating components in metal plating baths. An inert indictor is included in the bath composition and the concentration of the inert indictor is monitored during plating. The change in the concentration of the inert indicator is used to determine the change in the concentration of inert bath components.
Abstract: This invention provides a process for electroless copper plating without using formaldehyde and an electroless copper plating solution which is used in the process. To this end, there is disclosed a process for electroless copper plating, which treatment comprises depositing a palladium or palladium-tin catalyst on a resin substrate, and then treating said resin substrate having the catalyst deposited thereon with a formaldehyde-free electroless copper plating solution that contains copper ions and a reducing agent, wherein the need for an accelerating treatment of a catalyst after said catalyst depositing treatment is obviated. The productivity of a copper-resin composite material is dramatically enhanced by the process of the present invention, because a copper thin layer can be formed on the resin substrate in a short time, even if an accelerating treatment for a catalyst is not performed in a separate process.
Type:
Application
Filed:
October 29, 2003
Publication date:
December 16, 2004
Applicant:
Shipley Company, L.L.C.
Inventors:
Masaru Seita, Hideki Tsuchida, Masaaki Imanari, Yoshihiro Sugita, Andre Egli, William Brasch
Abstract: Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing photoresist. Preferred underlayer compositions comprise one or more resins or other components that impart etch-resistant and antireflective properties, such as one or more resins that contain phenyl or other etch-resistant groups and anthracene or other moieties that are effective anti-reflective chromophores for photoresist exposure radiation.
Type:
Application
Filed:
November 20, 2003
Publication date:
December 16, 2004
Applicant:
Shipley Company, L.L.C.
Inventors:
James F. Cameron, Dana A. Gronbeck, George G. Barclay
Abstract: An optical fiber switch having two coupled fiber arrays which move in a transverse direction to provide switching action. Each array has a front face and the front faces are nearly in contact. Optical fiber ends are located at the front faces. The front faces of the fiber arrays have transverse grooves in which rolling spheres are disposed. The fiber arrays move by rolling on the spheres. The spheres provide for smooth transverse motion and a fixed distance between optical fiber arrays. The spheres and front face grooves also provide for alignment between the optical fibers.
Type:
Grant
Filed:
December 1, 2000
Date of Patent:
December 14, 2004
Assignee:
Shipley Company, L.L.C.
Inventors:
Dan A Steinberg, David W Sherrer, Mindaugas F Dautartas
Abstract: Compounds that function to provide level or uniform metal deposits are provided. These compounds are particularly useful in providing level copper deposits. Copper plating baths and methods of copper plating using these compounds are also provided. These baths and methods are useful for providing a planarized layer of copper on a substrate having small apertures. The compositions and methods provide complete fill of small apertures with reduced void formation.
Type:
Application
Filed:
June 4, 2003
Publication date:
December 9, 2004
Applicant:
Shipley Company, L.L.C.
Inventors:
Deyan Wang, Chunyi Wu, Robert D. Mikkola
Abstract: An optical device package includes a substrate, optical semiconductor component, optical fiber, frame and lid. The substrate has a longitudinal notch for mounting the optical fiber and a lateral groove with a proximally facing stop surface. The frame includes at least one downwardly extending projection configured and dimensioned so as to engage a lateral end portion of the lateral groove. The frame is self-aligning and seats itself by being dropped into place.
Type:
Grant
Filed:
November 21, 2001
Date of Patent:
December 7, 2004
Assignee:
Shipley Company, L.L.C.
Inventors:
Dan A. Steinberg, Mindaugas F. Dautartas
Abstract: Compositions and methods of the invention provide for a controlled flow of resist into device contact (via) holes during a post-exposure, post-development hard-bake step. Resists of the invention are positive-acting and contain one or more components that are preferably substantially stable (i.e. no substantial crosslinking) during: 1) soft-bake, pre-exposure thermal treatment to remove solvent carrier of the applied resist, and 2) post-exposure, pre-development thermal treatment to promote or enhance the acid-promoted reaction in exposed regions (typically a de-blocking reaction). However, resists of the invention will crosslink during a post-development more stringent thermal treatment (thermal flow hard-bake step).
Abstract: Disclosed are methods for determining the quantity of leveler in an electroplating bath in the presence of other organic additives, such as accelerators, brighteners and suppressors. Such methods are fast, work over a broad concentration range of components and can be performed in real-time.
Type:
Grant
Filed:
November 2, 2001
Date of Patent:
December 7, 2004
Assignee:
Shipley Company, L.L.C.
Inventors:
Wade Sonnenberg, Mark J. Kapeckas, David L. Jacques, Raymond Cruz, Leon R. Barstad, Elie H. Najjar, Eugene N. Step, Robert A. Binstead
Abstract: An optical switch includes a first wavedguide holding member and a second waveguide holding member disposed on a substrate. The first waveguide holding member moves relative to the second waveguide holding member. A movement guiding member guides the motion of the first waveguide holding member and the substrate.
Advantageously, the first waveguide holding member moves transversely relative to the second waveguide holding member. The traverse motion enables selective coupling between a waveguide in the first waveguide holding member and a waveguide in the second holding member. Through this transverse motion of the second waveguide holding member, an optical switching action may be implemented.
Abstract: Disclosed are electroless nickel plating composition including nickel, a reducing agent, a complexing agent, and an accelerator, wherein the accelerator is a mesoionic compound in an amount sufficient to accelerate the rate of deposition the composition.
Abstract: Disclosed are methods for depositing a copper seed layer on a substrate having a conductive layer. Such methods are particularly suitable for depositing a copper seed layer on a substrate having small apertures, and preferably very small apertures.
Type:
Grant
Filed:
October 17, 2001
Date of Patent:
November 30, 2004
Assignee:
Shipley Company, L.L.C.
Inventors:
James G. Shelnut, David Merricks, Oleh B. Dutkewych, Charles R. Shipley
Abstract: Electrically resistive material including platinum and from about 5 and about 70 molar percent of iridium, ruthenium or mixtures thereof, calculated based on platinum as 100%, are disclosed.
Type:
Application
Filed:
June 21, 2004
Publication date:
November 25, 2004
Applicant:
Shipley Company, L.L.C.
Inventors:
Craig S. Allen, John Schemenaur, David D. Senk, Marc Langlois, Xiaodong Hu, Jan Tzyy-Jiuan Hwang, Jud Ready, Trifon Tomov
Abstract: Electrolyte compositions for the deposition of tin and tin-alloys on a substrate are disclosed, along with methods of electroplating tin and tin-alloys using such compositions. These electrolyte compositions are useful for high speed tin plating.
Abstract: Dielectric structures particularly suitable for use in capacitors and having a textured surface are provided, together with methods of forming these structures. Such dielectric structures show increased adhesion of subsequently applied conductive layers.
Type:
Grant
Filed:
October 10, 2002
Date of Patent:
November 16, 2004
Assignee:
Shipley Company, L.L.C.
Inventors:
Craig S. Allen, Maria Anna Rzeznik, David L. Jacques
Abstract: A molded mount of non-crystalline polymer material is configured to have a channel for retaining a silicon chip having a plurality of juxtaposed V-groove formed in a top surface between right and left side portions, thereof, a recessed area being provided in the channel behind the chip for accommodating fiber buffer coating, and a notch being formed in a top portion of the mount between the channel and one side portion thereof, for retaining strengthening fibers of an optical fiber cable, with the V-groove being configured to receive individual optical fibers therein respectively. Two such molded mounts with silicon chips are securely sandwiched together with V-groove of the chips opposing one another to retain optical fibers therebetween.
Type:
Grant
Filed:
October 24, 2001
Date of Patent:
November 16, 2004
Assignee:
Shipley Company, L.L.C.
Inventors:
Dan A. Steinberg, David W. Sherrer, Mindaugas F. Daurtartas, Robert G. Schinazi
Abstract: A functionalized copolymer containing a main chain derived from polymerizable monomers and pendent functional groups terminated with one or more &agr; or &bgr; ethylenically or acetylenically unsaturated groups. The functionalized copolymers are self cross-linking and are suitable for use as binders.
Type:
Application
Filed:
December 11, 2003
Publication date:
November 11, 2004
Applicant:
Shipley Company, L.L.C.
Inventors:
Edgardo Anzures, Robert K. Barr, Yueping Fu
Abstract: A photosensitive resin composition and a method for the formation of a resin pattern using the photosensitive resin composition are provided. The photosensitive resin composition contains, as a catalyst precursor, a catalytic metal element with a metal-deposition catalytic activity suitable for electroless metal plating. The method for the formation of a resin pattern uses a photosensitive resin composition, which contains, as a catalyst precursor, a catalytic metal element with a metal-deposition catalytic activity suitable for electroless metal plating. By using the method of this invention, it is possible to form a conductive film selectively on a resin pattern formed through exposure and development of the photosensitive resin composition of this invention.