Abstract: The thermal analyzer comprises temperature deviation approximation formula holder which holds an approximate formula of a temperature deviation between sample and furnace and an elevating or lowering rate of the temperature of furnace during measuring the temperature deviation, programmed temperature corrector which corrects a programmed temperature in proportion to the elevating or lowering rate of the temperature. So that, since the temperature deviation is corrected in proportion to the elevating or lowering rate of the temperature program, the temperature deviation between sample and furnace is controlled to diminish when heating or cooling the sample using the temperature program which elevates or lowers the temperature of the sample or the furnace.

Abstract: There is provided a sample operation apparatus in which, by a static electricity force acting between a probe and a sample, an accurate position is gripped without the sample being moved, and the sample can be operated by the probe for an observation, a grip, a release, or the like.

Abstract: A focused ion beam apparatus includes a plasma generator having a plasma torch therein, which lets plasma flow out while being kept inside, a differential exhaust chamber that is connected to the plasma torch via the torch orifice to cause adiabatic expansion of the plasma flowing out of the plasma torch to form a supersonic flow of the plasma, a drawing orifice provided at the differential exhaust chamber at a position facing the torch orifice to draw ions from the supersonic flow of the plasma, a drawing electrode that electrostatically accelerates ions having passed through the drawing orifice to further draw ions, and an ion optical system that focuses the ions drawn from the drawing electrode and causing the ions to enter the sample by optically manipulating the ions.

Abstract: A first working process performs a deposition working or an etching working to a workpiece by face-irradiating a focused ion beam to the workpiece, and a second working process then performs a deposition working or an etching working to the workpiece by edge-irradiating a focused ion beam to an edge of the workpiece. During the first working process, the deposition working or the etching working is performed to add the missing portion or remove the excess portion to a point slightly short of the edge boundary of the workpiece, i.e., to a point that is less than the irradiation width of the focused ion beam. The remaining missing portion or the remaining excess portion is eliminated in the second working process by edge-irradiating the focused ion beam to the edge of the workpiece.

Abstract: A thermal analysis equipment includes a thermal analysis data preservation function that preserves, as thermal analysis data, signals from a temperature sensor and a physical quantity sensor that detect a temperature and a change in physical quantity, respectively, of a sample. An electromagnetic-wave data acquisition control function controls acquisition of electromagnetic wave data in accordance with setting of a trigger to acquire the electromagnetic wave data. An electromagnetic-wave data preservation function preserves the electromagnetic wave data. An electromagnetic-wave data correlation function correlates the preserved electromagnetic wave data to a position on the thermal analysis data when the trigger is set.

Abstract: A thermal analysis apparatus possesses a temperature sensor measuring a temperature of a heating furnace inside, a temperature program setter which can set a temperature program and outputs a temperature program signal, a temperature control section adjusting a supply electric power to a heater in compliance with a difference between the temperature program signal and a detection signal of the temperature sensor, a processor section calculating an air flow rate corresponding to a program temperature, and a mass flow controller which adjusts an air flow rate supplied to the heating furnace inside in compliance with a signal of the air flow rate calculated by the processor section. In the processor section, operation expressions calculating the air flow rate are set so as to differ respectively in a higher temperature side and a lower temperature side than a predetermined boundary temperature.

Abstract: Objects to be achieved by the invention are to provide a nanobio device in which cultured cells are organized at a high-level in a state near in vivo, and to provide a method of using the nanobio device of imitative anatomy structure. The nanobio device of imitative anatomy structure of the invention is obtained by manufacturing a substrate with a bio-compatible substance and arranging a plurality of types of cells thereon in a desired array. A method of manufacturing a nanobio device in the invention includes a step of manufacturing a substrate for a nanobio device by a micromachine processing technique and a step of arranging a plurality of cultured cells on the substrate in a desired array with laser optical tweezers.

Abstract: There is provided a method of arranging, as a composite charged-particle beam system, a gas ion beam apparatus, an FIB and an SEM in order to efficiently prepare a TEM sample. The composite charged-particle beam system includes an FIB lens-barrel 1, an SEM lens-barrel 2, a gas ion beam lens-barrel 3, and a rotary sample stage 9 having an eucentric tilt mechanism and a rotating shaft 10 orthogonal to an eucentric tilt axis 8. In the composite charged-particle beam system, an arrangement is made such that a focused ion beam 4, an electron beam 5 and a gas ion beam 6 intersect at a single point, an axis of the FIB lens-barrel 1 and an axis of the SEM lens barrel 2 are orthogonal to the eucentric tilt axis 8, respectively, and the axis of the FIB lens-barrel 1, an axis of the gas ion beam lens-barrel 3 and the eucentric tilt axis 8 are in one plane.

Abstract: In a method of making a lamina specimen, first and second ion beams are simultaneously used to sputter etch first and second side walls of a lamina region at the same time under first and second ion beam conditions. A scanning ion microscope observation of the lamina region is made using the second ion beam while sputter etching of the first and second side walls is continued using the first ion beam until the thickness of the lamina has a predetermined value.

Abstract: To be able to achieve further small-sized formation and light-weighted formation and to promote a sensitivity by further efficiently detecting a fluorescent X-ray or the like in an X-ray tube and an X-ray analyzing apparatus, there are provided a vacuum cabinet 2 inside of which is brought into a vacuum state and which includes a window portion 1 formed by an X-ray transmitting film through which an X-ray can be transmitted, an electron beam source 3 installed at inside of the vacuum cabinet 2 for emitting an electron beam e, a target T generating a primary X-ray X1 by being irradiated with the electron beam e and installed at inside of the vacuum cabinet 2 to be able to emit the primary X-ray X1 to an outside sample S by way of the window portion 1, and an X-ray detecting element 4 arranged at inside of the vacuum cabinet 2 to be able to detect a fluorescent X-ray and a scattered X-ray X2 emitted from the sample S and incident from the window portion 1 for outputting a signal including energy information of

Abstract: To enable the reduction in working efforts by hand by performing control a drying operation by appropriately selecting dry conditions depending on the connection mode of the cooling device, and removal of moisture and the like without fail. The thermal analysis system uses a heater and a cooling device to raise and decrease the temperature inside the purge box. In the drying method for the thermal analysis system, the drying operation is performed by: previously setting dry conditions depending on the connection mode of the cooling device; starting control of an opening time dry process upon activation of the thermal analysis system; supplying a predetermined amount of dry gas into the purge box in accordance with the dry conditions corresponding to the selected connection mode of the cooling device with the cooling device kept off; and making the temperature control module control the temperature of the dry gas.

Abstract: Provided are an X-ray tube and an X-ray analysis apparatus, which can be further reduced in size as well as in weight and more efficiently detect a fluorescent X-ray and the like to increase sensitivity.

Abstract: There is provided a fluorescent X-ray analysis apparatus in which a detection lower limit is improved, and it is possible to quantify a trace aimed element having been contained not only in a sample whose main component is a heavy element but also in a sample whose main component is a light element. The fluorescent X-ray analysis apparatus possesses a sample base supporting the sample, an X-ray source irradiating a primary X-ray with a predetermined irradiation position being made a center, and a detector disposed toward the irradiation position and detecting a fluorescent X-ray generated from the sample.

Abstract: A vacuumed enclosure has a window formed of an X-ray transmissive material. The vacuumed enclosure encloses an electron beam source for generating an electron beam and a target which, irradiated by the electron beam, generates a primary X-ray. The target is smaller in the outer dimension than the window and located on the center of the window such that it irradiates, through the window, the primary X-ray onto a sample located outside. The vacuumed enclosure further encloses an X-ray detector located such that it can detect a fluorescent X-ray and a scattered X-ray coming from the sample through the window. The X-ray detector generates a signal representative of energy information of the fluorescent X-ray and the scattered X-ray. The vacuumed enclosure further encloses a thermally and electrically conductive metal extending through the target across the widow.

Abstract: Provided are an X-ray analysis apparatus and an X-ray analysis method, in which a measurer can judge an area incapable of being analyzed in a sample with a concave-convex portion.

Abstract: A displacement detection mechanism for a scanning probe microscope capable of performing measurement quickly with high precision even if an objective lens or an illumination system is arranged above or below a sample or a cantilever, and a scanning probe microscope comprising it.

Abstract: A vibration-type cantilever holder holds a cantilever opposed to a sample. The holder supports a main body part of the cantilever at only its base end so that a probe at the free end of the cantilever can contact the sample. The holder has a cantilever-attaching stand on which the main body part is placed and fastened such that the cantilever is tilted at a predetermined angle with respect to the sample. A first vibration source is fastened to the cantilever-attaching stand and vibrates with a phase and an amplitude depending on a predetermined waveform signal, and the first vibration source is fastened at a first location to a holder main body. A second vibration source is fastened at a second location, which is spaced from the first location, to the holder main body and generates vibrations to offset vibrations traveling from the first vibration source to the cantilever-attaching stand and holder main body.

Abstract: To provide a superconducting X-ray detector capable of carrying out a measurement by a high energy resolution by restraining a reduction in a sensitivity by a self magnetic field.

Abstract: To be able to measure a value with regard to a dissipation, or a value in proportion to a dissipation energy without making a premise by being brought into a steady state. Exciting means 12 for carrying out an excitation by following a resonance frequency of a cantilever 2, a displacement detector 10 for detecting a displacement of a stylus at a tip of the cantilever 2, an amplitude detector 20 for successively providing an amplitude from a signal from the displacement detector 10, a difference value detector 21 for providing a time difference value of the amplitude, a divider 22 for providing a value of a quotient between the time difference values, a logarithmic converter 23 for providing a logarithmic value of the value of the quotient, and a second divider 24 for providing a value with regard to a dissipation by calculating a value constituted by dividing the logarithmic value by a difference time period are provided.

Abstract: There is provided a differential scanning calorimeter in which a base line stability and a responsiveness are improved. There is made a constitution in which the stability is ensured by making a neck-like part in a heat passage from a heat reservoir 1 to a sensor plate 4 and, at the same time, a two-dimension heat flow passage to a sample holder 5a is ensured.