Abstract: A memory cell system is provided including forming a first insulator layer over a semiconductor substrate, forming a charge trap layer over the first insulator layer, forming a second insulator layer over the charge trap layer, forming a top blocking intermediate layer over the second insulator layer, and forming a contact layer over the top blocking intermediate layer.

Abstract: A memory system is provided. The system includes an operating system kernel that regulates read and write access to one or more FLASH memory devices that are employed for random access memory applications. A buffer component operates in conjunction with the kernel to regulate read and write access to the one or more FLASH devices.

Abstract: An embodiment of the present invention is directed to a memory cell. The memory cell includes a first trench formed in a semiconductor substrate and a second trench formed in said semiconductor substrate adjacent to said first trench. The first trench and the second trench each define a first side wall and a second sidewall respectively. The memory cell further includes a first storage element formed on the first sidewall of the first trench and a second storage element formed on the second sidewall of the second trench.

Abstract: A method for real-time data-pattern analysis. The method includes receiving and queuing at least one data-pattern analysis request by a data-pattern analysis unit controller. At least one data stream portion is also received and stored by the data-pattern analysis unit controller, each data stream portion corresponding to a received data-pattern analysis request. Next, a received data-pattern analysis request is selected by the data-pattern analysis unit controller along with a corresponding data stream portion. A data-pattern analysis is performed based on the selected data-pattern analysis request and the corresponding data stream portion, wherein the data-pattern analysis is performed by one of a plurality of data-pattern analysis units.

Abstract: A semiconductor manufacturing equipment includes a first chamber that has a first connection hole, a second chamber that has a second connection hole connected to the first connection hole of the first chamber, an O-ring that is provided between the first chamber and the second chamber so as to surround the first connection hole and the second connection hole, and a cover portion that covers a space between the first chamber and the second chamber.

Abstract: A method for forming a memory device is provided. A nitride layer is formed over a substrate. The nitride layer and the substrate are etched to form a trench. The memory device is pre-cleaned to prepare a surface of the memory device for oxide formation thereon, where cleaning the memory device removes portions of the barrier oxide layer on opposite sides of the trench. The nitride layer is trimmed on opposite sides of the trench. A liner oxide layer is formed in the trench.

Abstract: An imaging device suitable for detecting certain imaging particles and recording the detection of imaging particles, and as such can include certain recording devices such as a charge storage structure.

Abstract: In an electronic device, a diode and a resistive memory device are connected in series. The diode may take a variety of forms, including oxide or silicon layers, and one of the layers of the diode may make up a layer of the resistive memory device which is in series with that diode.

Abstract: A memory cell system including providing a substrate, forming a charge-storing stack having silicon-rich nitride on the substrate, and forming a gate on the charge-storing stack.

Abstract: A memory device includes a memory array, an output buffer, an initial latency register, and an output signal. Often times a host device that interfaces with the memory device is clocked at high rate such that data extraction rates of the memory device are not adequate to support a gapless data transfer. The output signal is operable to stall a transmission between the memory device and the host device when data extraction rates from the memory array are not adequate to support output rates of the output buffer.

Abstract: A memory buffering system is disclosed that arbitrates bus ownership through an arbitration scheme for memory elements in chain architecture. A unified host memory controller arbitrates bus ownership for transfer to a unified memory buffer and other buffers within the chain architecture. The system is used within a communication system with a bus in chain architectures and parallel architectures.

Abstract: A non-volatile memory device comprising a memory cell array including memory cells distributed among a plurality of sectors; a controller operable to program, read, and erase memory cells in said memory array, said controller further operable to generate and store EPLI values for programming a number of EPLI bits in one of said plurality of sectors with said stored EPLI values; and a comparator to compare said stored EPLI values with EPLI values programmed in said EPLI bits.

Abstract: Based on a continuous erase start signal outputted, in response to an inputted continuous erase command, from a continuous erase control circuit, a shift circuit outputs a control signal for giving instructions to execute respective data erase operation to a plurality of non-volatile memory circuits sequentially, and when the data erase operation in all of the non-volatile memory circuits has been completed, the shift circuit outputs a continuous erase completion signal. Thereby, the data erase operation in all of the non-volatile memory circuits built in one chip can be continuously executed by one continuous erase command as is also the case where a single non-volatile memory circuit is built in.

Abstract: An exhaust gas manifold having thermoelectric devices in the exhaust manifold of a stirling engine is disclosed.

Abstract: The semiconductor device according to the present invention has a planar semiconductor chip having projecting connection terminals provided on one surface thereof. A shelf is provided where a peripheral edge of a surface of the semiconductor chip opposite one surface thereof onto which connection terminals are provided is removed. This makes it possible to secure a larger volume of the fillet portion of the underfill, thereby helping improve the function of preventing the rising up of the excess underfill by providing a shelf in the semiconductor chip.

Abstract: A system comprising a processor and a memory, wherein said memory comprises instructions that when executed by said processor implement a method. The method includes loading a first portion of a set of redundancy data into a register of the processor for each redundant sector of a plurality of redundant sectors. A second portion of a set of redundancy data is also loaded into the volatile memory for each redundant sector of the plurality of redundant sectors. Loading the second portions of the sets of redundancy data comprises loading a third portion of redundancy data comprising a plurality of second portions of redundancy data for the plurality of redundant sectors.

Abstract: The present invention provides a semiconductor device that has a shorter distance between the bit lines and easily achieves higher storage capacity and density. The semiconductor device includes: first bit lines formed on a substrate; an insulating layer that is provided between the first bit lines and in a groove in the substrate, and has a higher upper face than the first bit lines; channel layers that are provided on both side faces of the insulating layer, and are coupled to the respective first bit lines; and charge storage layers that are provided on the opposite side faces of the channel layers from the side faces on which the insulating layers are formed.

Abstract: The present invention provides a semiconductor memory and a control method therefor, the semiconductor device including a first current-voltage conversion circuit connected to a core cell provided in a nonvolatile memory cell array, a second current-voltage conversion circuit connected to a reference cell through a reference cell data line, a sense amplifier sensing an output from the first current-voltage conversion circuit and an output from the second current-voltage conversion circuit, a compare circuit comparing a voltage level at the reference cell data line with a predefined voltage level, and a charging circuit charging the reference cell data line, if the voltage level at the reference cell data line is lower than the predefined voltage level during pre-charging the reference cell data line. According to the present invention, the pre-charging period of the reference cell data line can be shortened, and the data read time can be shortened.

Abstract: An approach to use silicided bit line contacts that do not short to the underlying substrate in memory devices. The approach provides for silicide formation in the bit line contact area, using a process that benefits from being self-aligned to the oxide-nitride-oxide (ONO) nitride edges. A farther benefit of the approach is that the bit line contact implant and rapid temperature anneal process can be eliminated. This approach is applicable to embedded flash, integrating high density devices and advanced logic processes.

Abstract: Embodiments described herein generally relate to methods of manufacturing n-type lightly doped drains and p-type lightly doped drains. In one method, a photoresist mask is used to etch a transistor, and the mask is left in place (i.e., reused) to protect other devices and poly while a high energy implantation is performed in alignment with the photoresist mask, such that the implantation is adjacent to the etched transistor. One example of a high energy implantation is forming lightly doped source and drain regions. This technique of reusing a photoresist mask can be employed for creating lightly doped source and drain regions of one conductivity followed by using the technique a second time to create lightly doped source and drain regions of the complementary conductivity type. This may prevent use of at least one hard mask during manufacturing.