Publication number: 20160168675
Abstract: The present disclosure is drawn to amorphous thin metal films and associated methods. Generally, an amorphous thin metal film can comprise a combination of four metals or metalloids including: 5 at % to 85 at % of a metalloid selected from the group of carbon, silicon, and boron; 5 at % to 85 at % of a first metal; 5 at % to 85 at % of a second metal; and 5 at % to 85 at % of a third metal wherein each metal is independently selected from the group of titanium, vanadium, chromium, cobalt, nickel, zirconium, niobium, molybdenum, rhodium, palladium, hafnium, tantalum, tungsten, iridium, and platinum, wherein the first metal, the second metal, and the third metal are different metals. Typically, the four elements account for at least 70 at % of the amorphous thin metal film.
Type:
Application
Filed:
July 12, 2013
Publication date:
June 16, 2016
Applicants:
Hewlett-Packard Development Company, L.P., Oregon State University
Inventors:
James Elmer ABBOTT, JR., Arun K. AGARWAL, Roberto A. PUGLIESE, Greg Scott LONG, Stephen HORVATH, Douglas A. KESZLER, John WAGER, Kristopher OLSEN, John MCGLONE