Patents Assigned to STMicroelectronics (Crolles 2)
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Patent number: 10074649Abstract: An integrated electronic detector operates to detecting a variation in potential on an input terminal. The detector includes a MOS transistor having a drain forming an output. Variation in drain current is representative of the variation in potential. A bipolar transistor has a base forming the input terminal and a collector electrically connected to the gate of the MOS transistor. The detector has a first configuration in which the bipolar transistor is conducting and the MOS transistor is turned off. The detector has a second configuration in which the bipolar transistor is turned off and the MOS transistor is in a sub-threshold operation. Transition of the detector from the first configuration to the second configuration occurs in response to the variation in potential.Type: GrantFiled: August 30, 2016Date of Patent: September 11, 2018Assignee: STMicroelectronics (Crolles 2) SASInventors: Stephane Monfray, Gaspard Hiblot
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Patent number: 10075694Abstract: A semiconductor chip includes a plurality of superposed semiconductor levels. The semiconductor levels include a plurality of elementary circuits coupled to a common input node. Sensing circuits are coupled to elementary elements of different levels. The outputs of the sensing circuits are used to generate a number, which serves as an identification number of the semiconductor chip.Type: GrantFiled: August 18, 2017Date of Patent: September 11, 2018Assignee: STMICROELECTRONICS (CROLLES 2) SASInventors: Alexandre Ayres, Bertrand Borot
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Patent number: 10075102Abstract: A system for converting thermal energy into electrical power includes a temperature-sensitive element held in a frame by its two ends between a heat source and a cold source producing a thermal gradient. A piezoelectric element is positioned between the frame and at least one end of the temperature-sensitive element. The temperature-sensitive element is configured to deform cyclically between two states under the action of the thermal gradient. With each cyclic deformation, a stress is applied to the piezoelectric element via the one end.Type: GrantFiled: April 26, 2016Date of Patent: September 11, 2018Assignee: STMicroelectronics (Crolles 2) SASInventors: Arthur Arnaud, Jihane Boughaleb, Stephane Monfray, Thomas Skotnicki
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Patent number: 10073219Abstract: An integrated circuit includes an active device for confinement of a light flux that is formed in a semiconducting substrate. A confinement rib is separated from two doped zones by two trenches. Each doped zone includes a contacting zone on an upper face. Each trench widens from a bottom wall towards the upper face of the corresponding doped zone. The widening trenches present a sidewall having a tiered profile between the trench and the doped zone. An opposite sidewall presents a straight profile.Type: GrantFiled: February 24, 2016Date of Patent: September 11, 2018Assignee: STMicroelectronics (Crolles 2) SASInventor: Charles Baudot
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Publication number: 20180254414Abstract: The present invention relates to a memory device comprising a first electrode (27), a second electrode (28) and an active portion that can change conductive state, positioned between a first face of the first electrode (27) and a first face of the second electrode (28). The first electrode (27) comprises an upper portion forming the first face of the first electrode (27). At least one out of the upper portion and the active portion that can change conductive state comprises a porous layer (15).Type: ApplicationFiled: January 23, 2018Publication date: September 6, 2018Applicants: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES, STMICROELECTRONICS (CROLLES 2) SASInventors: Sophie BERNASCONI, Christelle Charpin-Nicolle, Aomar Halimaoui
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Publication number: 20180247874Abstract: An integrated circuit includes a semiconductor substrate with an electrically isolated semiconductor well. An upper trench isolation extends from a front face of the semiconductor well to a depth located a distance from the bottom of the well. Two additional isolating zones are electrically insulated from the semiconductor well and extending inside the semiconductor well in a first direction and vertically from the front face to the bottom of the semiconductor well. At least one hemmed resistive region is bounded by the two additional isolating zones, the upper trench isolation and the bottom of the semiconductor well. Electrical contacts are electrically coupled to the hemmed resistive region.Type: ApplicationFiled: October 3, 2017Publication date: August 30, 2018Applicants: STMicroelectronics (Crolles 2) SAS, STMicroelectronics (Rousset) SASInventors: Benoît Froment, Stephan Niel, Arnaud Regnier, Abderrezak Marzaki
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Publication number: 20180239088Abstract: A photonic integrated circuit includes an optical coupling device situated between two successive interconnection metal levels. The optical coupling device includes a first optical portion that receives an optical signal having a transverse electric component in a fundamental mode and a transverse magnetic component. A second optical portion converts the transverse magnetic component of the optical signal into a converted transverse electric component in a higher order mode. A third optical portion separates the transverse electric component from the converted transverse electric component and switches the higher order mode to the fundamental mode. A fourth optical portion transmits the transverse electric component to one waveguide and transmits the converted transverse electric component to another waveguide.Type: ApplicationFiled: August 31, 2017Publication date: August 23, 2018Applicant: STMicroelectronics (Crolles 2) SASInventors: Sylvain Guerber, Charles Baudot, Florian Domengie
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Publication number: 20180233511Abstract: An integrated circuit includes a high-voltage MOS (HV) transistor and a capacitor supported by a semiconductor substrate. A gate stack of the HV transistor includes a first insulating layer over the semiconductor layer and a gate electrode formed from a first polysilicon. The capacitor includes a first electrode made of the first polysilicon and a second electrode made of a second polysilicon and at least partly resting over the first electrode. A first polysilicon layer deposited over the semiconductor substrate is patterned to form the first polysilicon of the gate electrode and first electrode, respectively. A second polysilicon layer deposited over the semiconductor substrate is patterned to form the second polysilicon of the second electrode. Silicon oxide spacers laterally border the second electrode and the gate stack of the HV transistor. Silicon nitride spacers border the silicon oxide spacers.Type: ApplicationFiled: April 17, 2018Publication date: August 16, 2018Applicant: STMicroelectronics (Crolles 2) SASInventors: Fausto PIAZZA, Sebastien LAGRASTA, Raul Andres BIANCHI, Simon JEANNOT
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Patent number: 10048317Abstract: A chain of flip-flops is tested by passing a reference signal through the chain. The reference signal is generated from a test pattern that is cyclically fed back at the cadence of a clock signal. The reference signal propagates through the chain of flip-flops at the cadence of the clock signal to output a test signal. A comparison is carried out at the cadence of the clock signal of the test signal and the reference signal, where the reference signal is delayed by a delay time taking into account the number of flip-flops in the chain and the length of the test pattern. An output signal is produced, at the cadence of the clock signal, as a result of the comparison.Type: GrantFiled: August 23, 2016Date of Patent: August 14, 2018Assignee: STMicroelectronics (Crolles 2) SASInventors: Sylvain Clerc, Gilles Gasiot
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Patent number: 10050037Abstract: The disclosure concerns an integrated circuit comprising: a plurality of circuit domains, each circuit domain comprising: a plurality of transistor devices positioned over p-type and n-type wells, the transistor devices defining one or more data paths of the circuit domain; a monitoring circuit adapted to detect when the slack time of at least one of the data paths in the circuit domain falls below a threshold level and to generate an output signal on an output line based on said detection; and a biasing circuit adapted to modify a biasing voltage of the n-type and/or p-type well of the circuit domain.Type: GrantFiled: May 31, 2017Date of Patent: August 14, 2018Assignees: STMICROELECTRONICS SA, STMICROELECTRONICS (CROLLES 2) SASInventors: Florian Cacho, Vincent Huard
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Patent number: 10043837Abstract: An image sensor includes a control circuit and pixels. Each pixel includes: a photosensitive area, a substantially rectangular storage area adjacent to the photosensitive area, and a read area. First and second insulated vertical electrodes electrically connected to each other are positioned opposite each other and delimit the storage area. The first electrode extends between the storage area and the photosensitive area. The second electrode includes a bent extension opposite a first end of the first electrode, with the storage area emerging onto the photosensitive area on the side of the first end. The control circuit operates to apply a first voltage to the first and second electrodes to perform a charge transfer, and a second voltage to block charge transfer.Type: GrantFiled: April 17, 2017Date of Patent: August 7, 2018Assignee: STMicroelectronics (Crolles 2) SASInventors: Francois Roy, Philippe Are
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Patent number: 10042115Abstract: An electro-optic device may include a substrate layer, and a first photonic layer over the substrate layer and having a first photonic device. The electro-optic device may include a second photonic layer over the first photonic layer and having a second photonic device. The electro-optic device may include a dielectric layer over the second photonic layer, and a first electrically conductive via extending through the dielectric layer and the second photonic layer to couple to the first photonic device, and a second electrically conductive via extending through the dielectric layer and coupling to the second photonic device. The electro-optic device may include a third electrically conductive via extending through the substrate layer, the second photonic layer, and the first photonic layer to couple to the substrate layer.Type: GrantFiled: April 19, 2016Date of Patent: August 7, 2018Assignee: STMICROELECTRONICS (CROLLES 2) SASInventors: Frédéric Boeuf, Charles Baudot
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Publication number: 20180211915Abstract: A connecting bar electrically connects separate circuit zones of an integrated circuit. The connecting bar is formed by a main portion that is a conductive strip extending above separate circuit zones to be interconnected. The conductive strip is separated from the integrated circuit by a dielectric except at the circuit zones to be interconnected. The connecting bar further includes secondary portions that are conductive pads passing through the dielectric in a vertical direction from the circuit zone to the conductive strip.Type: ApplicationFiled: September 11, 2017Publication date: July 26, 2018Applicants: STMicroelectronics (Rousset) SAS, STMicroelectronics (Crolles 2) SASInventors: Philippe Boivin, Delia Ristoiu
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Patent number: 10026821Abstract: An all-around gate field-effect transistor includes two drain-source areas supported by a semiconductor substrate. At least one channel region, surrounded with a gate insulated by a gate insulator, extends between the two drain-source areas. The at least one channel region is located above an insulating layer resting on the substrate and positioned between the two drain-source areas. This insulating layer has a thickness-to-permittivity ratio at least 2 times greater than that of the gate insulator. An extension of the insulating layer is positioned to insulate at least one of the channel regions from the semiconductor substrate.Type: GrantFiled: March 23, 2017Date of Patent: July 17, 2018Assignee: STMicroelectronics (Crolles 2) SASInventor: Loic Gaben
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Publication number: 20180197781Abstract: A PNP transistor is manufactured in parallel with the manufacture of NPN, NMOS, and PMOS transistors. A first semiconductor layer is deposited on a P-type doped semiconductor substrate and divided into first, second, and third regions, with the third region forming the base. An insulating well is deeply implanted into the substrate. First and second third wells, respectively of N-type and P-type are formed to extend between the second region and third region and the insulating well. A third well of P-type is formed below the third region to provide the collector. Insulating layers are deposited over the third region and patterned to form an opening. Epitaxial growth of a second P-type doped semiconductor layer is performed in the opening to provide the emitter.Type: ApplicationFiled: March 5, 2018Publication date: July 12, 2018Applicant: STMicroelectronics (Crolles 2) SASInventors: Pascal Chevalier, Gregory Avenier
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Patent number: 10020758Abstract: A first closed enclosure defines a cavity having an inner dimension smaller than 5 mm. At least one second resiliently deformable closed enclosure is connected in fluid communication with the first enclosure. A fluid at more than 90% in the liquid state fills the first and second enclosures. A first portion of the first enclosure is in contact with a hot source of a temperature higher than the evaporation temperature of the fluid. A second portion of the first enclosure located between the first portion and the resiliently deformable closed enclosure is in contact with a cold source at a temperature lower than the condensation temperature of the fluid. An electromechanical transducer is coupled to a deformable membrane of the resiliently deformable closed enclosure.Type: GrantFiled: February 12, 2016Date of Patent: July 10, 2018Assignees: STMicroelectronics (Crolles 2) SAS, SOCPRA Sciences et Génie S.E.C.Inventors: Gholamreza Mirshekari, Etienne Leveille, Luc Guy Frechette, Stephane Monfray, Thomas Skotnicki
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Patent number: 10012792Abstract: An integrated electronic device includes a substrate having an opening extending therethrough. The substrate includes an interconnection network, and connections coupled to the interconnection network. The connections are to be fixed on a printed circuit board. An integrated photonic module is electrically connected to the substrate, with a portion of the integrated photonic module in front of or overlapping the opening of the substrate. An integrated electronic module is electrically connected to the photonic module, and extends at least partly into the opening of the substrate. The electronic module and the substrate may be electrically connected onto the same face of the photonic module.Type: GrantFiled: July 22, 2016Date of Patent: July 3, 2018Assignee: STMICROELECTRONICS (CROLLES 2) SASInventors: Jean-Francois Carpentier, Patrick Lemaitre, Mickael Fourel
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Patent number: 10014337Abstract: A spectral filter is manufactured using a process wherein a first rectangular bar is formed within a first layer made of a first material, said first rectangular bar being made of a second material having a different optical index. The process further includes, in a second layer over the first layer, a second rectangular bar made of the second material. The second rectangular bar is positioned in contact with the first rectangular bar. The second layer is also made of the first material.Type: GrantFiled: September 29, 2016Date of Patent: July 3, 2018Assignees: STMicroelectronics SA, STMicroelectronics (Crolles 2) SASInventors: Romain Girard Desprolet, Michel Marty, Salim Boutami, Sandrine Lhostis
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Patent number: 10014308Abstract: Active areas of memory cells and active areas of transistors are delimited in an upper portion of a wafer. Floating gates are formed on active areas of the memory cells. A silicon oxide-nitride-oxide tri-layer is then deposited over the wafer and a protection layer is deposited over the silicon oxide-nitride-oxide tri-layer. Portions of the protection layer and tri-layer located over the active areas of transistors are removed. Dielectric layers are formed over the wafer and selectively removed from covering the non-removed portions of the protection layer and tri-layer. A memory cell gate is then formed over the non-removed portions of the protection layer and tri-layer and a transistor gate is then formed over the non-removed portions of the dielectric layers.Type: GrantFiled: August 4, 2016Date of Patent: July 3, 2018Assignee: STMicroelectronics (Crolles 2) SASInventors: Stephane Zoll, Philippe Garnier
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Patent number: 10014660Abstract: The invention relates to a III-V heterostructure laser device (1) arranged in and/or on silicon, comprising: a III-V heterostructure gain medium (3); and an optical rib waveguide (11), arranged facing the gain medium (3) and comprising a slab waveguide (15) equipped with a longitudinal rib (17), the optical rib waveguide (11) being arranged in the silicon. The optical rib waveguide (11) is oriented so that at least one Bragg grating (19, 19a, 19b) is arranged on that side (21) of the slab waveguide (15) which is proximal relative to the gain medium (3) and in that the rib (17) is placed on that side (23) of the slab waveguide (15) that is distal relative to the gain medium (3).Type: GrantFiled: August 17, 2015Date of Patent: July 3, 2018Assignees: Commisariat A L'Energie Atomique et aux Energies Alternatives, STMICROELECTRONICS SA, STMICROELECTRONICS (CROLLES 2) SASInventors: Thomas Ferrotti, Badhise Ben Bakir, Alain Chantre, Sebastien Cremer, Helene Duprez