Abstract: A capacitive element includes a trench extending vertically into a well from a first side. The trench is filled with a conductive central section clad with an insulating cladding. The capacitive element further includes a first conductive layer covering a first insulating layer that is located on the first side and a second conductive layer covering a second insulating layer that is located on the first conductive layer. The conductive central section and the first conductive layer are electrically connected to form a first electrode of the capacitive element. The second conductive layer and the well are electrically connected to form a second electrode of the capacitive element. The insulating cladding, the first insulating layer and the second insulating layer form a dielectric region of the capacitive element.

Abstract: A capacitive element includes a trench extending vertically into a well from a first side. The trench is filled with a conductive central section clad with an insulating cladding. The capacitive element further includes a first conductive layer covering a first insulating layer that is located on the first side and a second conductive layer covering a second insulating layer that is located on the first conductive layer. The conductive central section and the first conductive layer are electrically connected to form a first electrode of the capacitive element. The second conductive layer and the well are electrically connected to form a second electrode of the capacitive element. The insulating cladding, the first insulating layer and the second insulating layer form a dielectric region of the capacitive element.

Abstract: An integrated circuit includes at least one antifuse element. The antifuse element is formed from a semiconductor substrate, a trench extending down from a first face of the semiconductor substrate into the semiconductor substrate, a first conductive layer housed in the trench and extending down from the first face of the semiconductor substrate into the semiconductor substrate, a dielectric layer on the first face of the semiconductor substrate, and a second conductive layer on the dielectric layer. A program transistor selectively electrically couples the second conductive layer to a program voltage in response to a program signal. A program/read transistor selectively electrically couples the first conductive layer to a ground voltage in response to the program signal and in response to a read signal. A read transistor selectively electrically couples the second conductive layer to a read amplifier in response to the read signal.

Abstract: An integrated circuit is protected against at attack. An electrically conductive body at floating potential is situated in the integrated circuit. The electrically conductive body has an initial amount of electric charge prior to the attack and functions to collect electric charge as a result of the attack. A detection circuit operates to detect an amount of electric charge collected on the electrically conductive body and determine whether the collected amount is different from the initial amount. If the detected amount of charge is different from the initial amount, a control circuit trigger the taking of a protective action.

Abstract: A semiconductor substrate has a back face and a front face and includes a semiconductor well that is electrically isolated from the semiconductor substrate. A device is configured to detect a thinning of the semiconductor substrate from the back face. The device includes at least one trench that extends within the semiconductor well between two peripheral locations from the front face down to a location situated at a distance from a bottom of the semiconductor well. The trench is electrically isolated from the semiconductor well. A detection circuit is configured to measure a physical quantity representative of well electrical resistance between two contact areas respectively situated on either side of the at least one first trench.

Abstract: The thinning of a semiconductor substrate of an integrated circuit from a back face is detected using the measurement of a physical quantity representative of the resistance between the ends of two electrically-conducting contacts situated at an interface between an insulating region and an underlying substrate region. The two electrically-conducting contacts extend through the insulating region to reach the underlying substrate region.

Abstract: A device can be used for detecting faults. A shift register is suitable for shifting, in tempo with a clock, a binary signal alternating between two logic levels, in successive cells of the shift register. A first logic circuit is suitable for comparing values contained in at least one pair of cells of the register.

Abstract: A capacitive element is fabricated by forming a sacrificial trench isolation and directionally etching through the sacrificial trench isolation and into an underlying semiconductor substrate to form an electrode trench. The electrode trench is then clad with an insulating material and filled with a conductive material. The conductive fill provided one capacitor electrode and the semiconductor substrate forms another capacitor electrode, with the insulating material cladding forming the capacitor dielectric layer.

Abstract: An integrated circuit includes a substrate, an interconnection part, and an isolating region located between the substrate and the interconnection part. A decoy structure is located within the isolating region and includes a silicided sector which is electrically isolated from the substrate.

Abstract: An electronic chip disclosed herein includes a plurality of IP core circuits, with a shared strip that is at least partially conductive and is linked to a node for applying a fixed potential. A plurality of tracks electrically links the plurality of IP core circuits to the shared strip. Each individual track of the plurality of tracks solely links a single one of said IP core circuits to the shared strip.

Abstract: A MOS transistor is produced on and in an active zone and included a source region and a drain region. The active zone has a width measured transversely to a source-drain direction. A conductive gate region of the MOS transistor includes a central zone and, at a foot of the central zone, at least one stair that extends beyond the central zone along at least an entirety of the width of the active zone.

Abstract: A standard integrated cell includes a semiconductor region with a functional domain for logic circuits including a transistor and an adjacent continuity domain that extends out to an edge of the standard integrated cell. The edge is configured to be adjacent to another continuity domain of another standard integrated cell. The standard integrated cell further includes a capacitive element. This capacitive element may be housed in the continuity domain, for example at or near the edge. Alternatively, the capacitive element may be housed at a location which extends around a substrate region of the transistor.

Abstract: An integrated circuit includes a semiconductor substrate and a multitude of electrically conductive pads situated between component zones of the semiconductor substrate and a first metallization level of the integrated circuit, respectively. The multitude of electrically conductive pads are encapsulated in an insulating region and include: first pads, in electrical contact with corresponding first component zones, and at least one second pad, not in electrical contact with a corresponding second component zone.

Abstract: A method of real-time scene detection performed by a wireless communication device includes, performing a first scene detection measurement to determine that the wireless communication device is located in a first scene. The first scene detection measurement is performed at first instant in time. The first scene is a type of environment. The method further includes associating the first scene with a corresponding reference scene of a predetermined set of reference scenes, determining a reference duration associated with the corresponding reference scene, and performing a second scene detection measurement immediately following expiration of the reference duration measured from the first instant in time.

Abstract: A signal generation circuit generates first and second non-overlapping digital signals from an input pulse signal. A first digital circuit includes: a first logical OR gate receiving the second digital signal and the input pulse signal to generate a third digital signal; and a second logical OR gate receiving the input pulse signal and a delayed version of the third digital signal to generate the first digital signal. A second digital circuit includes: a first logical AND gate receiving the first digital signal and the input pulse signal to generate a fourth digital signal; and a second logical AND gate receiving the input pulse signal and the fourth digital signal to generate the second digital signal.

Abstract: An electronic device includes a switched-mode power supply having a first operating phase during which the output node of the switched-mode power supply is coupled by an on switch to a source of a first reference voltage. The first operating phase is followed by a second operation phase during which the output node of the switched-mode power supply is in a high impedance state. While in the second operating phase, a capacitor connected to the output node of the switched-mode power supply at least partially discharges into a load.

Abstract: A first power supply rail is provided as a power supply tree configured with couplings to distribute a supply voltage to active elements of the circuit. A second power supply rail is provided as an electrostatic discharge channel and is not configured with distribution tree couplings to active elements of the circuit. A first electrostatic discharge circuit is directly electrically connected between one end of the second power supply rail and a ground rail. A second electrostatic discharge circuit is directly electrically connected between an interconnect node and the ground rail. The interconnect node electrically interconnects another end of the second power supply rail to the first power supply rail at the second electrostatic discharge circuit.

Abstract: A semiconductor substrate has a front face and a back face. A first contact and a second contact, spaced apart from each other, are located on the front face. An electrically conductive wafer is located on the back face. A detection circuit is configured to detect a thinning of the substrate from the back face. The detection circuit including a measurement circuit that takes a measurement of a resistive value of the substrate between said at least one first contact, said at least one second contact and said electrically conductive wafer. Thinning is detected in response to the measured resistive value.

Abstract: An integrated device for physically unclonable functions is based on a set of MOS transistors exhibiting a random distribution of threshold voltages which are obtained by lateral implantations of dopants exhibiting non-predictable characteristics, resulting from implantations through a polysilicon layer. A certain number of these transistors form a group of gauge transistors which makes it possible to define a mean gate source voltage making it possible to bias the gates of certain others of these transistors (which are used to define the various bits of the unique code generated by the function). All these transistors consequently exhibit a random distribution of drain-source currents and a comparison of each drain-source current of a transistor associated with a bit of the digital code with a reference current corresponding to the average of this distribution makes it possible to define the logical value 0 or 1 of this bit.

Abstract: A system includes a near-field communication device configured to transmit a radio frequency control signal in a near-field regime and an interface. The interface includes a near-field communication circuit configured to receive the RF control signal. The interface further includes a pulse width modulation signal generation circuit configured to generate a pulse width modulation signal according to the radio frequency control signal. The system further includes an electrically-controllable equipment configured to be controlled by the pulse width modulation signal.