Abstract: A cationically polymerizable curable composition comprising a compound having a vinyloxy group bonded to an aromatic group which is easily cured upon light exposure and/or heating, a cured product of the curable composition, and a method of producing a cured product using the curable composition. In a cationically polymerizable curable composition that includes a compound having a vinyloxy group bonded to an aromatic group, a sulfonium salt having a specific structure is used as a curing agent. A cured product is produced by shaping the curable composition into a predetermined shape, and subjecting the shaped curable composition to light exposure and/or heating.

Abstract: The present invention provides: a surface treatment liquid which is capable of performing good hydrophilization or hydrophobization of the surface of an object to be treated even if the surface treatment liquid does not contain a coating film-forming resin; and a surface treatment method which uses this surface treatment liquid, A surface treatment liquid, comprising a resin (A) and a solvent (C), and wherein a resin having a functional group I that is a nitrogen-containing heterocyclic group and a functional group II that is a functional group other than the functional group I and having one or more groups selected from among hydrophilic groups and hydrophobic groups, and comprising a constituent unit (a1) having the functional group I, and one or more constituent units selected from the group consisting of a constituent unit (a2) having a cationic group in a side chain, and a constituent unit (a3) having an anionic group in a side chain, is used as the resin (A).

Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid and a fluorine additive component (F) which exhibits decomposability to an alkali developing solution, the fluorine additive component (F) including a fluorine resin component (F1) having a structural unit (f1) containing a base dissociable group and a structural unit (f2) containing a group represented by general formula (f2-r-1) shown below in which each Rf21 independently represents a hydrogen atom, an alkyl group, an alkoxy group, a hydroxy group, a hydroxyalkyl group or a cyano group; n? represents an integer of 0 to 2; and * represents a valence bond.

Abstract: A resist composition which includes a polymer compound including a structural unit which is derived from an acrylic ester in which the hydrogen atom bonded to an ?-position carbon atom may be substituted with a substituent and which has a lactone-containing cyclic group containing other electron withdrawing groups such as a cyano group at a side chain terminal, and a compound whose a conjugate acid has an acid dissociation constant (pKa) of less than 3.

Abstract: A coating agent capable of favorably reducing the roughness of a resist pattern, and a method for forming a resist pattern in which roughness is reduced. The method includes coating the resist pattern with the coating agent. The coating agent is a composition including a resin, an amine compound, and a solvent, the amine compound having an aliphatic hydrocarbon group having 8 to 20 carbon atoms and having 1 or more unsaturated double bond and a group having a specific amount of ethylene oxide and/or propylene oxide added thereto.

Abstract: A method of recovering a defect portion of a resist pattern formed on a substrate including applying a shrinking agent composition so as to cover the resist pattern having the defect portion; forming a developing solution-insoluble region on the surface of the resist pattern; and developing the covered resist pattern, the shrinking agent composition including a polymeric compound (X) which is a homopolymer or a random copolymer.

Abstract: A filtration filter used for filtering a liquid chemical for lithography, provided with a polyimide resin porous membrane; a filtration method including allowing a liquid chemical for lithography to pass through the filtration filter; and a production method of a purified liquid chemical product for lithography, including filtering a liquid chemical for lithography by the filtration method.

Abstract: A coloring agent dispersion which contains a satisfactorily dispersed pigment, and results in a photosensitive resin composition capable of forming a cured film when mixed in the photosensitive resin composition; a photosensitive resin composition containing the coloring agent dispersion; a cured product of the composition; an organic EL element provided with the cured product; a method for forming a pattern using the composition; and a method for producing a photosensitive resin composition using the dispersion. In a coloring agent dispersion including a coloring agent which contains a pigment and a dispersant, a dispersant containing a silsesquioxane compound of a specific structure is used.

Abstract: A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, R1 and R2 are each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Va01 is a divalent hydrocarbon group which may have an ether bond, na01 is an integer of 0 to 2, Ra10 is a tertiary alkyl ester-type acid dissociable group, Va02 is a divalent linking group containing a heteroatom, or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, Ra20 is an acid dissociable group, and na022 is an integer of 1 to 3.

Abstract: A surface treatment liquid capable of making a surface of a treatment target hydrophilic or hydrophobic without including a resin having a coating film formation property, and a surface treatment method using the surface treatment liquid. The surface treatment liquid includes a resin, a solvent and a strong acid having a pKa of 1 or less. The resin includes a functional group I that is at least one of a hydroxyl group, a cyano group, and a carboxyl group, and a functional group II that is a hydrophilic group or a hydrophobic group other than the functional group I.

Abstract: A resist composition including a polymeric compound having 0 to 20 mol % of a structural unit containing a polar group-containing aliphatic hydrocarbon group, and an acid generator compound represented by general formula (b1-1) in which R101 represents a hydrocarbon group having at least 1 hydroxy group as a substituent; Y101 represents a single bond or a divalent linking group containing an oxygen atom; V101 represents a single bond, an alkylene group or a fluorinated alkylene group; R102 represents a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms; M?m+ represents an organic cation having a valency of m.

Abstract: A high-frequency antenna element that is easily downsized even when an electromagnetic wave absorber is used, and is capable of protecting a receiving antenna unit by covering the receiving antenna unit, and provides a high-frequency antenna module including the high-frequency antenna element. The high-frequency antenna element includes a substrate, a dielectric layer, a receiving antenna unit, and a coating layer, in which the dielectric layer is laminated on the substrate, the receiving antenna unit is mounted on the dielectric layer, the coating layer covers a surface of the dielectric layer in a portion in which the receiving antenna unit is not mounted while the coating layer is in contact with entire side surfaces of the receiving antenna unit, and the coating layer covers at least a part of an upper surface of the receiving antenna unit.

Abstract: A composition capable of stably providing a high-quality siliceous film even under relatively low-temperature heating conditions, and a method of using the composition for forming a siliceous film. The composition includes a polysilazane and an imidazole group-containing compound represented by Formula (B).

Abstract: A cleaning liquid which includes 3-alkoxy-3-methyl-1-butanol represented by the following general formula (1); at least one of diethylene glycol monomethyl ether and triethylene glycol monomethyl ether; and quaternary ammonium hydroxide: in which R1 represents an alkyl group having 1 to 5 carbon atoms.

Abstract: A pattern forming method includes forming a first organic film by coating an etching target film with a composition including a polymer including a cross-linkable component, infiltrating an inorganic substance into the first organic film, cross-linking the polymer, forming a second organic film on the first organic film, forming a second organic film pattern by patterning the second organic film, forming a first organic film pattern having a pitch reduced to one-half of a pitch of the second organic film pattern by patterning the first organic film by a self-aligned patterning method that uses the second organic film pattern as a core pattern, forming an etching target film pattern having a pitch reduced to one-half of a pitch of the first organic film pattern by patterning the etching target film by a self-aligned patterning method that uses the first organic film pattern as a core pattern.

Abstract: A method of forming a photosensitive resin layer including laminating a photosensitive resin layer including a chemically amplified positive-type photosensitive resin composition which includes an acid generator which generates an acid upon light exposure and generates an acid by heating on a metal surface having catalytic activity, a resin whose solubility in alkali increases under the action of an acid, and an organic solvent, on an catalytic activity-containing metal surface of a substrate; and heating the photosensitive resin layer, so that the solubility in alkali of the photosensitive resin layer increases as the layer becomes closer to an interface with the substrate.

Abstract: A photosensitive resin composition for cell culture substrates that enables the low-cost manufacture of a cell culture substrate, that can easily form patterns of various shapes when providing a pattern on the surface of a cell culture substrate, has low cytotoxicity, and that can form a cell culture substrate; a cell culture substrate that is formed using the photosensitive resin composition; and a cell culture substrate manufacturing method that uses the photosensitive resin composition. The photosensitive resin composition includes a photopolymerizable monomer and a photopolymerization initiator. The photopolymerizable monomer contains a defined amount of a polyfunctional monomer that is at least trifunctional, and the content of the photopolymerization initiator is within a prescribed range.

Abstract: A novel imidazole compound that yields a surface treatment liquid that is very effective at suppressing migration and oxidation of a wiring surface; a metal surface treatment liquid that contains the imidazole compound; a metal surface treatment method that uses the metal surface treatment liquid; and a laminate production method that uses the surface treatment liquid. A metal is surface-treated using the surface treatment liquid which includes a saturated fatty acid or a saturated fatty acid ester of a specific structure, in which a prescribed position is substituted by an aromatic group of a prescribed structure and an imidazolyl group that may have a substituent group.

Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component which exhibits changed solubility in a developing solution under action of acid and an acid diffusion control agent, the base component including a structural unit represented by general formula (a0-1) shown below in which R represents H, C1-C5 alkyl group or C1-C5 halogenated alkyl group; Ya represents C; Xa represents a group which forms a divalent cyclic hydrocarbon group with Ya; Ra01 to Ra03 represents H, C1-C10 monovalent saturated chain hydrocarbon group or C3-C20 monovalent saturated cyclic hydrocarbon group; the acid diffusion control agent containing an acid which exhibits an acid dissociation constant of 1.5 or more.

Abstract: A transparent body production method that includes subjecting the compound represented by formula (1) to heating at a temperature equal to or greater than the melting point of said compound. In formula (1), each of W1 and W2 is the group represented by formula (2) in which the ring Z is an aromatic hydrocarbon ring, X is a single bond or —S—, R1 is a single bond or an alkylene group having 1-4 carbon atoms, R2 is a specific substituent, and m is an integer of 0 or higher, the group represented by formula (4) is —OH— or a (meth)acryloyloxy group, each of the rings Y1 and Y2 is an aromatic hydrocarbon ring, R is a single bond or a specific divalent group, each of R3a and R3b is —CN, a halogen group, or a monovalent hydrocarbon group, and each of n1 and n2 is an integer of 0-4.