Patents Assigned to Tokyo Ohka Kogyo Co., Ltd.
  • Patent number: 10180625
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a compound (D1) represented by general formula (d1), wherein Z? represents an anion having an aromatic ring containing a hydroxybenzoic acid skeleton, provided that at least one hydrogen atom of the aromatic ring has been substituted with a halogen atom; m represents an integer of 1 or more; and Mm+ represents an organic cation having a valency of m.
    Type: Grant
    Filed: June 27, 2017
    Date of Patent: January 15, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takashi Nagamine, Kotaro Endo, Hideto Nito
  • Patent number: 10177357
    Abstract: Provided is a method for producing a porous polyimide film with which it is possible to suppress the occurrence of curling in the polyimide-fine particle composite film obtained by firing the unfired composite film. The method for producing a porous polyimide film of the present invention includes, in the following order: forming an unfired composite film using a varnish that contains a resin including polyamide acid and/or polyimide, fine particles, and a solvent; immersing the unfired composite film in a solvent including water; firing the unfired composite film to obtain a polyimide-fine particle composite film; and removing the fine particles from the polyimide-fine particle composite film.
    Type: Grant
    Filed: September 7, 2015
    Date of Patent: January 8, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Mitsuharu Tobari, Yoshitsugu Kawamura, Kaoru Ishikawa, Tsukasa Sugawara
  • Publication number: 20190002744
    Abstract: A permanent adhesive composition for image sensors which provides an adhesive layer having excellent heat resistance and thermal shock resistance, and a bonding method and laminate using the permanent adhesive composition. The permanent adhesive composition for image sensors contains a thermosetting or photocurable resin containing a specific bifunctional (meth)acrylic acid ester-derived structural unit, a polymerizable monomer, and an antioxidant, and used to bond together a substrate and a support for the substrate. The bonding method includes bonding together a substrate and a support for the substrate using the permanent adhesive composition. The laminate is provided with a substrate, a support for the substrate, and an adhesive layer for bonding the substrate and the support together, and the adhesive layer is formed of the permanent adhesive composition.
    Type: Application
    Filed: December 21, 2016
    Publication date: January 3, 2019
    Applicants: TOKYO OHKA KOGYO CO., LTD., NIPPON STEELE & SUMIKIN CHEMICAL CO., LTD.
    Inventors: Tokunori YAMADAYA, Hiroaki TAKEUCHI, Masatoshi MAEDA, Kentaro HAYASHI, Masayoshi ISOZAKI
  • Patent number: 10168617
    Abstract: A composition for forming an interlayer insulating film including a polymerizable monomer, an imide compound represented by general formula (z-1), a reaction promoter which promotes the polymerization of the polymerizable monomer and the imide compound, and a polymerization initiator, an interlayer insulating film containing a polymerized product thereof, a method for forming an interlayer insulating film pattern, and a device including the interlayer insulating film on a support. In the formula (z-1), R1 and R2 represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. Rz00 represents a divalent organic group containing an aliphatic hydrocarbon group and/or an aromatic hydrocarbon group, Rz01 and Rz02 represent an alkyl group or an alkoxy group, and n1 and n2 are 0 or 1.
    Type: Grant
    Filed: March 24, 2017
    Date of Patent: January 1, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventor: Kazuhide Uno
  • Patent number: 10156787
    Abstract: A composition for forming an interlayer insulating film including a polymerizable monomer, an alkali-soluble elastomer containing a polymerizable group, an imide compound represented by general formula (z-1), and a polymerization initiator, an interlayer insulating film containing a polymerized product thereof, a method for forming an interlayer insulating film pattern, and a device including the interlayer insulating film on a support. In the formula (z-1), R1 and R2 represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, Rz00 represents a divalent organic group containing an aliphatic hydrocarbon group and/or an aromatic hydrocarbon group, Rz01 and Rz02 represent an alkyl group or an alkoxy group, and n1 and n2 are 0 or 1.
    Type: Grant
    Filed: March 23, 2017
    Date of Patent: December 18, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventor: Kazuhide Uno
  • Patent number: 10155185
    Abstract: A polyimide-based resin film cleaning liquid includes at least one solvent selected from the group consisting of a hydroxy aliphatic carboxylic acid ester, an aliphatic carboxylic acid ester, a chain or cyclic ketone, an alkylene glycol monoalkyl ether, an alkylene glycol monoalkyl ether acetate, and an aprotic polar solvent other than these solvents.
    Type: Grant
    Filed: May 3, 2017
    Date of Patent: December 18, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventor: Isao Hirano
  • Patent number: 10137665
    Abstract: After bringing a water-containing peeling liquid in contact with a thin flat film formed on a substrate, a support film including a cover film having one main surface thereof is laminated onto the flat film, such that the support film is in contact with the flat film, a cover film-attached laminate composed of a support film and a cover film is then separated from the substrate, and the laminate including the flat film and the support film is separated from the cover film-attached film.
    Type: Grant
    Filed: December 29, 2016
    Date of Patent: November 27, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takuya Noguchi, Takahiro Senzaki, Toshiyuki Ogata
  • Patent number: 10141547
    Abstract: A nonaqueous secondary battery which can be made thinner without deterioration of battery performance, and a method for manufacturing the battery. The nonaqueous secondary battery includes a positive electrode and a negative electrode which are substantially arranged in the same plane so that respective end surfaces face each other at a distance; a substrate by which the positive electrode and the negative electrode are affixed and supported; a cover member having gas barrier properties, which defines an airtight chamber together with the substrate, in the chamber in which the positive electrode and the negative electrode are contained; and an electrolyte which is contained in the airtight chamber so as to be positioned at least between the facing end surfaces of the positive electrode and the negative electrode, and which relates to the battery reaction between the positive electrode and the negative electrode.
    Type: Grant
    Filed: June 19, 2014
    Date of Patent: November 27, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takahiro Asai, Kaoru Ishikawa, Mitsuo Hagihara
  • Patent number: 10119103
    Abstract: A cleaning liquid including hydrofluoric acid, a tetrazole compound, and water. The tetrazole compound may be represented by the following Formula (B1) in which R1 is a hydrogen atom or an organic group and R2 is a hydrogen atom, a hydroxyl group, a mercapto group, an amino group, or an organic group.
    Type: Grant
    Filed: February 22, 2017
    Date of Patent: November 6, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Tatsuo Goto, Kenji Seki
  • Publication number: 20180311622
    Abstract: To provide: a purification method which uses a polyimide and/or polyamide imide porous membrane that exhibits excellent removal performance for impurities such as metals, and wherein a liquid that is a silylating agent liquid, a film forming material or a diffusing agent composition is an object to be purified; a purification method for purifying a silicon compound-containing liquid that contains a silicon compound which is capable of producing a silanol group by hydrolysis; a method for producing a silylating agent liquid, a film forming material or a diffusing agent composition, which uses the purification method; a filter medium which is composed of the above-described porous membrane; and a filter device which comprises the above-described porous membrane.
    Type: Application
    Filed: October 28, 2016
    Publication date: November 1, 2018
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yoshihiro SAWADA, Tsukasa SUGAWARA
  • Patent number: 10112377
    Abstract: A supporting member separation method of separating a laminate formed by laminating a substrate, an adhesive layer, a release layer which is changed in quality by absorbing light, and a support plate in this order, the method including an irradiation step in which irradiation of laser light which is pulse-oscillated with a pulse having a pulse width of 20 ns or greater is performed to the release layer.
    Type: Grant
    Filed: January 17, 2013
    Date of Patent: October 30, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yasushi Fujii, Shinji Takase
  • Publication number: 20180299778
    Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including at least one acid generator (B1) represented by general formula (b1) shown below, at least one acid generator (B2) represented by general formula (b2) shown below, and at least one acid generator (B3) represented by general formula (b3) shown below (wherein IV to R3 each independently represents a cyclic group which may have a substituent, a chain alkyl group, or a chain alkenyl group; Y1 represents a single bond or a divalent linking group containing an oxygen atom; M1+ to M3+ represents a monovalent organic cation; n represents an integer of 1 to 4; m represents an integer of 0 to 4; provided that, when m is 0, the carbon atom adjacent to the sulfur atom within R2 has no fluorine atom bonded thereto).
    Type: Application
    Filed: October 13, 2016
    Publication date: October 18, 2018
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Tsuyoshi NAKAMURA, Kazuishi TANNO, JunYeob LEE
  • Patent number: 10100221
    Abstract: A method of forming a structure containing a phase-separated structure, the method including applying a block copolymer composition including an organic solvent component (S) and a block copolymer in which a block of polystyrene or a polystyrene derivative is bonded to at least one kind of block to a substrate to form a layer containing the block copolymer; and phase-separating the layer containing the block. The value of an interaction distance RaPS(MPa1/2) between the Hansen solubility parameter of the organic solvent component (S) and the Hansen solubility parameter of polystyrene or the polystyrene derivative satisfying the following formula (1). 4.
    Type: Grant
    Filed: May 9, 2016
    Date of Patent: October 16, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Hitoshi Yamano, Tasuku Matsumiya, Tsuyoshi Kurosawa, Taku Hirayama, Ken Miyagi, Katsumi Ohmori
  • Patent number: 10101658
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid generator (B) which generates acid upon exposure, the base component (A) including a resin component having a structural unit (a0) represented by general formula (a0-1) shown below, and the acid generator component (B) containing a compound having a cation moiety having an electron withdrawing group (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Ya represents a carbon atom; Xa represents an atomic group required to form an alicyclic hydrocarbon group with Ya; and Ra01 represents an aromatic hydrocarbon group optionally having a substituent).
    Type: Grant
    Filed: January 14, 2016
    Date of Patent: October 16, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Taku Hirayama, Daisuke Kawana, Shogo Matsumaru, Kenta Suzuki, Takashi Kamizono, Masahito Yahagi, Tatsuya Fujii
  • Patent number: 10101660
    Abstract: In a method of forming patterns, an object layer is formed on a substrate. Guide patterns are formed on the object layer. A brush layer is formed using a brush polymer on surfaces of the guide patterns. The brush polymer includes at least one of a first brush polymer and a second brush polymer. The first brush polymer includes a hydrophobic repeating unit and a hydrophilic terminal group having at least two hydroxyl groups. The second brush polymer includes a hydrophobic repeating unit and a hydrophilic random repeating unit having a hydroxyl group. A self-aligned layer is formed using a block copolymer on the brush layer to form blocks aligned around the guide patterns. At least a portion of the blocks is transferred to the object layer.
    Type: Grant
    Filed: November 8, 2016
    Date of Patent: October 16, 2018
    Assignees: Samsung Electronics Co., Ltd., Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Jeong-Ju Park, Seung-Chul Kwon, Eun-Sung Kim, Kyeong-Mi Lee, Shi-Yong Yi, Tsuyosh Kurosawa, Katsumi Ohmori, Tasuku Matsumiya
  • Patent number: 10100134
    Abstract: A method for manufacturing a polymer compound which has a constituent unit (a10) which includes a hydroxy group and a constituent unit (a1) which includes an acid decomposable group of which a polarity increases due to an effect of an acid, the method including copolymerizing a monomer for deriving a constituent unit (a0) which includes a group which protects a phenolic hydroxyl group or a hydroxy group of a carboxy group with an organic silicon compound and a monomer for deriving the constituent unit (a1) and obtaining a prepolymer which has the constituent unit (a0) and the constituent unit (a1), and selectively deprotecting the constituent unit (a0) by reacting a compound which has a fluoride anion with the prepolymer and obtaining a polymer compound which has the constituent unit (a10) and the constituent unit (a1).
    Type: Grant
    Filed: December 5, 2016
    Date of Patent: October 16, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Masatoshi Arai, Yoshitaka Komuro, Akiya Kawaue
  • Patent number: 10096809
    Abstract: A method for manufacturing, a secondary battery separator including a porous resin film in which pores have three-dimensionally ordered structure and are in mutual communication via through-holes. The method includes: uniformly dispersing spherical microparticles having narrow particle size distribution in a dispersion medium to prepare a microparticles-dispersed slurry; drying slurry to obtain a spherical microparticles-dispersed film; heat-treating the film to form a microparticles-resin film in which the microparticles are regularly arrayed in three-dimensions in a resin matrix; and contacting the microparticles-resin film with an organic acid, water, an alkaline solution or an inorganic acid other than hydrofluoric acid to dissolve and remove the microparticles, or heating the microparticles-resin film to remove the microparticles, to form pores which are in mutual communication and regularly arrayed in the resin matrix.
    Type: Grant
    Filed: June 4, 2014
    Date of Patent: October 9, 2018
    Assignees: TOKYO METROPOLITAN UNIVERSITY, 3DOM INC., TOKYO OHKA KOGYO CO., LTD.
    Inventors: Kiyoshi Kanamura, Hirokazu Munakata, Kazuhiro Imazawa, Hiroyoshi Sago
  • Patent number: 10093815
    Abstract: A surface treatment agent capable of effectively preventing pattern collapse of an inorganic pattern or a resin pattern provided on a substrate, and a surface treatment method using such a surface treatment agent. The surface treatment agent includes a silylation agent and a nitrogen-containing heterocyclic compound which does not include a silicon atom.
    Type: Grant
    Filed: September 19, 2016
    Date of Patent: October 9, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Daijiro Mori, Akira Kumazawa
  • Patent number: 10094024
    Abstract: A method for forming a release layer which lies between a substrate and a supporting member and has a property that changes when the release layer absorbs light coming through the supporting member, by carrying out plasma CVD with a high-frequency power that is set so as to be higher than a power at which a mode jump occurs.
    Type: Grant
    Filed: May 31, 2012
    Date of Patent: October 9, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yasushi Fujii, Tatsuhiro Mitake, Atsushi Matsushita
  • Patent number: 10081172
    Abstract: A method of preparing a laminate, in which the laminate has a substrate and a support plate, and is provided with a release layer capable of being altered by irradiation with infrared ray, the method including forming the release layer on only a periphery of one of the substrate and the support plate; and laminating the substrate and the support plate through the release layer and a first adhesive layer.
    Type: Grant
    Filed: April 25, 2016
    Date of Patent: September 25, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Shingo Ishida, Takahiro Yoshioka