Patents Assigned to Toshiba Silicone Co., Ltd.
  • Patent number: 4996511
    Abstract: A pressure-sensitive resistance element comprising a first contact electrode formed on a first electrically insulating base plate, a second contact electrode formed on a second electrically insulating base plate disposed facing the first contact electrode, a first and/or a second pressure-sensitive electrically conductive layer formed on the whole surface of at least one of the first and second contact electrode regions, and a first and/or second pressure-sensitive electrically conduct pattern formed on at least one of the pressure-sensitive electrically conductive layer and the contact electrode having no pressure-sensitive electrically conductive layer thereon.
    Type: Grant
    Filed: May 4, 1989
    Date of Patent: February 26, 1991
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Kazuhiro Ohkawa, Taro Yamazaki
  • Patent number: 4996257
    Abstract: A polyorganosilsesquioxane fine powder which is surface-treated with an organosilicon comound containing a quaternary ammonium group, represented by the formula (I) or (II): ##STR1## wherein R.sup.1 represents an alkyl group, a substituted or unsubstituted aralkyl group, or a group represented by (C.sub.n H.sub.2n O).sub.m Z wherein Z represents a hydrogen atom or an alkyl group, symbol n is an integer of 2 to 4, and symbol m is an integer of 1 to 20; R.sup.2 and R.sup.3 each independently represents a hydrogen atom, an alkyl group or a hydroxyalkyl group; Q.sup.1 and Q.sup.2 each independently represents an alkylene group; R.sup.4 represents an alkyl group or a phenyl group; R.sup.5 represents an alkyl group having 1 to 4 carbon atoms; X.sup.- represents an anion; and symbol a is an integer of 0 to 3.
    Type: Grant
    Filed: April 18, 1989
    Date of Patent: February 26, 1991
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Kenji Saito, Hiroshi Kimura
  • Patent number: 4990641
    Abstract: A new organosilicon compound is defined by the formula (1): ##STR1## in which R.sup.1 is a hydrogen atom or a methyl gorup, X.sup.1 and X.sup.2 each independently are --CH.sub.2 CH.dbd.CH.sub.2 or --(CH.sub.2).sub.2 SiR.sup.2.sub.n Y.sub.3-n, provided at least one of them --(CH.sub.2).sub.3 SiR.sup.2.sub.n Y.sub.3-n, R.sup.2 is a substituted or non-substituted monovalent hydrocarbon group, Y is an alkoxy group or a halogen atom, and n is zero, 1 or 2.
    Type: Grant
    Filed: July 7, 1989
    Date of Patent: February 5, 1991
    Assignee: Toshiba Silicone Co., Ltd.
    Inventor: Keiji Kabeta
  • Patent number: 4985286
    Abstract: An abrasion-concealing agent for glass containers, which comprises (A) a polyorganosiloxane and (B) a volatile polydimethylsiloxane, a glass container in which abrasions on the surface thereof have been concealed by the abrasion-concealing agent, and a method for concealing abrasions on a glass container by using the abrasion-concealing agent. The abrasion-concealing agent has excellent abrasion-concealing properites, film strength, water resistance, safety, workability and resistance to an aqueous alkaline solution washing, and does not cause any damage to labels on glass containers in the coating process.
    Type: Grant
    Filed: April 27, 1990
    Date of Patent: January 15, 1991
    Assignees: Toshiba Silicone Co. Ltd., Asahi Breweries, Ltd.
    Inventors: Akitsugu Kurita, Yoshiaki Takezawa, Nobuhiro Saitoh, Takehisa Shimada, Hideaki Takemoto
  • Patent number: 4980396
    Abstract: A primar composition comprising(A) 100 parts by weight of an organo-polysiloxane represented by the formula (1) ##EQU1## wherein R.sup.1 represents a substituted or unsubstituted monovalent hydrocarbon group, and a is a number of from 1.98 to 2.01, provided that 25 to 50 mol % of the hydrocarbon group is a perfluoroalkyl group and 0.01 to 10 mol % of the hydrocarbon group is a vinyl group, said organo-polysiloxane having a viscosity as measured at 25.degree. C. of 1,000,000 centistokes or more;(B) 5 to 100 parts by weight of a silica type filler;(C) 0.5 to 50 parts by weight of isocyanurate-type organosilicon compound represented by the formula (2) ##STR1## wherein R.sup.2 represents an alkyl group, a fluoroalkyl group or an alkoxyalkyl group, each having 1 to 5 carbon atoms in the alkyl moiety, and n is an integer of 1 to 5; and(D) a desired amount of an organic solvent.
    Type: Grant
    Filed: June 1, 1989
    Date of Patent: December 25, 1990
    Assignee: Toshiba Silicone Co., Ltd.
    Inventor: Hirofumi Yoshida
  • Patent number: 4975472
    Abstract: A curable organopolysiloxane composition having condensation-curing properties and ultraviolet-curing properties, comprising (A) a diorganopolysiloxane having a viscosity of 50 to 200,000 cSt, both ends of each molecule thereof being blocked with a silanol group, (B) a silane compound, (C) an (alkyl)acrylic acid derivative, (D) a catalyst for condensation and (E) a sensitizer.
    Type: Grant
    Filed: May 5, 1989
    Date of Patent: December 4, 1990
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Tsuneo Motegi, Yasuji Matsumoto
  • Patent number: 4968727
    Abstract: A primer composition which is particularly effective to strongly bond fluorosilicone rubbers to metal, plastics, fibers, and the like, comprising(A) 100 parts by weight of a polyorganosiloxane represented by formula (I): ##EQU1## wherein R.sup.1 represents a substituted or unsubstituted monovalent hydrocarbon group, 10 to 50 mol % of the hydrocarbon groups of R.sup.1 being perfluoroalkyl and 0.01 to 1.0 mol % of the hydrocarbon groups of R.sup.1 being vinyl, and a is a number of from 1.98 to 2.01, and which has a viscosity as measured at 25.degree. C. of 1,000,000 cSt or more;(B) 5 to 100 parts by weight of a silica filler;(C) 0.5 to 50 parts by weight of a compound represented by formula (II): ##STR1## wherein X represents an organosilicon-containing group or a hydrocarbon-containing group, R represents methyl or hydrogen, and n is an integer of 1 or larger; and(D) an organic solvent.
    Type: Grant
    Filed: January 8, 1990
    Date of Patent: November 6, 1990
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Junichiro Watanabe, Makoto Sawada
  • Patent number: 4957989
    Abstract: A vehicle for slow dissolving a coating material, comprising a triorganosilyl (meth) acrylate copolymer consisting essentially of repeating units represented by the formula ##STR1## The vehicle contains no harmful substances and is nontoxic, and therefore can be advantageously used as a vehicle for safe and effective coatings or treating agents.
    Type: Grant
    Filed: January 26, 1990
    Date of Patent: September 18, 1990
    Assignee: Toshiba Silicone Co., Ltd.
    Inventor: Nobuhiro Saitoh
  • Patent number: 4950707
    Abstract: A polyether having molecular weight from 1,000 to 50,000, end-blocked with hydrolyzable silyl groups and represented by the general formula (P): ##STR1## where R.sup.1, R.sup.2, R.sup.6 and R.sup.7 individually represent a divalent hydrocarbon group, R.sup.4 represents a monovalent hydrocarbon group, R.sup.8 represents an alkyl group with 1 to 6 carbon atoms, X represents an aromatic or heterocyclic ring, a represents a number from 1 to 3, m represents a number from 10 to 500, n represents a number of 1 or greater is produced and utilized in room temperature curing compositions containing inorganic filler and curing catalyst. There is also disclosed a method for producing the above polyether by reacting polyoxyalkylene end-blocked with epoxy groups, dimercapto compound and organo silicon compound.
    Type: Grant
    Filed: April 20, 1989
    Date of Patent: August 21, 1990
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Chiyuki Shimizu, Tamio Yoshida
  • Patent number: 4935455
    Abstract: An ultraviolet-curable silicone resin composition for use in coating optical fibers, which comprises(A) 100 parts by weight of a vinyl group-containing flowable organopolysiloxane represented by the average composition formula, ##STR1## wherein R.sup.1 represents a substituted or unsubstituted monovalent hydrocarbon group excluding a vinyl group, and a and b are numbers defined by the formulae 0.01.ltoreq.a.ltoreq.1, 0.8.ltoreq.b<3 and 1.8.ltoreq.a+b.ltoreq.2.2, and having a viscosity as measured at 25.degree. C. of from 50 to 10,000 cP;(B) 30 to 300 parts by weight of a vinyl group-containing organopolysiloxane resin comprising units represented by R.sup.2.sub.3 SiO.sub.0.5, units represented by (CH.sub.2 .dbd.CH).sub.c R.sup.3.sub.2-c SiO wherein R.sup.2 and R.sup.3 each independently represents a substituted or unsubstituted monovalent hydrocarbon group excluding a vinyl group, and c is 0, 1 or 2, and units represented by SiO.sub.2,the molar ratio of the sum of the R.sup.2.sub.3 SiO.sub.0.
    Type: Grant
    Filed: May 10, 1989
    Date of Patent: June 19, 1990
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Sam Huy, Yasuji Matsumoto
  • Patent number: 4933415
    Abstract: There are provided polyethers end-blocked with hydrolyzable silyl groups which have molecular weight from 500 to 50,000 and are represented by the formula: ##STR1## where R.sup.1, R.sup.2, R.sup.3 and R.sup.4 individually represent a divalent hydrocarbon group, R.sup.5 represents a monovalent hydrocarbon group, R.sup.6 represents an alkyl group with 1 to 6 carbon atoms, A represents a substituted or non-substituted divalent aromatic group, a represents a number of 1 to 3, m represents a number of 10 to 500 and n represents a number of 1 or greater. The polyether is produced by reacting an epoxy end-blocked polyoxyalkylene, a mono-epoxy substituted hydrolyzable silane, and an aromatic diamine.
    Type: Grant
    Filed: August 26, 1988
    Date of Patent: June 12, 1990
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Chiyuki Shimizu, Tamio Yoshida
  • Patent number: 4929804
    Abstract: A push button switch which may be used, for example, as a zooming switch in a video camera, having a uniform electrical resistance/applied pressure characteristic and which can be manufactured easily and at a low cost. The switch includes a conductive layer and a pressure-sensitive resistance element disposed between electrode patterns provided on a printed circuit board and an insulated push button. The conductive layer is coated with a pressure-sensitive conductive paste and the pressure-sensitive resistance element is fixed to the insulated push button at a opposed surface to the electrode patterns separated by a predetermined distance.
    Type: Grant
    Filed: December 1, 1988
    Date of Patent: May 29, 1990
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Nobuyuki Kawai, Mitsuhiro Nakamura
  • Patent number: 4927951
    Abstract: An organosilicon compound which contains a highly reactive (meth)acrylamide and a siloxane group with a molecule has the following formula: ##STR1## where R.sup.1 is a methyl group or hydrogen atom, R.sup.2 is a substituted or unsubstituted monovalent hydrocarbon group, Q is a divalent hydrocarbon group having 1-8 carbon atoms, A is a hydrogen atom, substituted or unsubstituted hydrocarbon carbon group or --QSiR.sup.n.sup.2 [OSi(CH.sub.3).sub.3 ].sub.3-n, and n is an integer from 0-2.
    Type: Grant
    Filed: October 20, 1989
    Date of Patent: May 22, 1990
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Keiji Kabeta, Kiyoaki Syuto
  • Patent number: 4921926
    Abstract: A curable polyorganosiloxane composition is disclosed, comprising: (A) 100 parts by weight of polyorganosiloxane having at least two hydroxyl groups or hydrolyzable groups bonded to a silicon atom in the molecule thereof and having a viscosity at 25.degree. C. of 10 to 1,000,000 cSt, (B) 0 to 2,000 parts by weight of polyorganosiloxane having at least two alkenyl groups bonded to a silicon atom in the molecule thereof and having a viscosity at 25.degree. C. of 10 to 1,000,000 cSt, (C) 0.5 to 20 parts by weight of an organosilicon compound having more than 2 (on the average) hydrolyzable groups bonded to a silicon atom in the molecule thereof, (D) 0 to 10 parts by weight of a catalyst for a condensation reaction, and (E) 0.1 to 5 parts by weight of an organic peroxide, wherein at least 0.01 mol % of all organic groups bonded to a silicon atom as contained in (A) to (C) is an alkenyl group. The composition has both condensation reaction curability and ultraviolet ray curability.
    Type: Grant
    Filed: November 16, 1988
    Date of Patent: May 1, 1990
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Tsuneo Motegi, Yasuji Matsumoto, Kiyoshi Takeda, Shuji Chiba
  • Patent number: 4921976
    Abstract: A silicon compound represented by formula (I): ##STR1## wherein either one of R.sup.1 and R.sup.2 represents a vinyl group with the other representing a hydrogen atom; either one of R.sup.3 and R.sup.4 represents a vinyl group with the other representing a hydrogen atom; and R.sup.5, R.sup.6, and R.sup.7, which may be the same or different, each represents a substituted or unsubstituted monovalent hydrocarbon group, an alkoxy group or a halogen atom. The compound exhibits improved compatibility with polymerizable monomers or organic polymers and is useful as a crosslinking agent or modifier.
    Type: Grant
    Filed: November 16, 1988
    Date of Patent: May 1, 1990
    Assignee: Toshiba Silicone Co., Ltd.
    Inventor: Keiji Kabeta
  • Patent number: 4908395
    Abstract: A photocurable adhesive composition for glass is disclosed, comprising (A) 100 parts by weight of a polyorganosiloxane having an average compositional formula: ##STR1## wherein R.sup.1 represents a substituted or unsubstituted monovalent hydrocarbon group except for a vinyl group; 0<a.ltoreq.1; 0<b.ltoreq.2; and 1<a+b<3, (B) from 0.1 to 10 parts by weight of an aromatic ketone photo reaction initiator, and (c) from 0.1 to 5 parts by weight of a trialkenyl isocyanurate or a derivative thereof. The composition, when applied between glass plates or between a glass plate and other materials, can be cured with a small curing shrinkage by short-term irradiation of light transmitted by the glass plate. The cured composition exhibits satisfactory adhesion and excellent resistance to moisture and heat.
    Type: Grant
    Filed: April 25, 1988
    Date of Patent: March 13, 1990
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Atsushi Kurita, Masayuki Hatanaka, Sam Huy
  • Patent number: 4895914
    Abstract: A polymethylsilsesquioxane powder according to the present invention is characterized by being surface treated with an organic silicon compound represented by the following general formula:(R.sub.3 Si)aZwherein R represents a non-substituted monovalent hydrocarbon group, a represents a numeral of 1 or 2, and Z represents a hydrogen atom, a halogen atom, a hydroxyl group, --OR', --NR'X, --ONR'.sub.2 or --OOCR' when a is 1, while --O--, --N(X) or --S-- when a is 2, wherein R' represents an alkyl group having 1 to 4 carbon atoms, and X a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
    Type: Grant
    Filed: November 8, 1988
    Date of Patent: January 23, 1990
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Kenji Saitoh, Hiroshi Kimura
  • Patent number: 4882396
    Abstract: A siloxane-amide block copolymer having an alkenyl group or a photopolymerizable organic group at both terminals thereof which is represented by formula (I): ##STR1## wherein R.sup.1 represents a reaction residual group of an epoxy compound containing an alkenyl group or a photopolymerizable organic group and/or a substitution reaction product between said reaction residual group and an organosilyl group and the other symbols are as defined in the specification. The copolymer is produced by reacting a polycondensate of a diaminosiloxane and a dicarboxylic acid dihalide with a compound containing an alkenyl group or a photopolymerizable organic group at one terminal thereof and an epoxy group at the other terminal thereof. The siloxane-amide block copolymer exhibits excellent processability and reactive curability by application of heat, light or radiation.
    Type: Grant
    Filed: August 5, 1988
    Date of Patent: November 21, 1989
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Hisayuki Nagaoka, Michio Zenbayashi
  • Patent number: 4877855
    Abstract: A siloxane-amide block copolymer represented by formula (I): ##STR1## wherein the symbols are as defined in the specification, is disclosed. The polymer of formula (I) is produced by reacting a polycondensate of a diaminosiloxane and a dicarboxylic acid dihalide with an epoxysilane to induce ring-opening addition reaction between the terminal amino groups of the polymer and the epoxy group of the epoxysilane. The siloxane-amide block copolymer exhibits excellent processability and reactive curability due to the hydrolyzable silyl groups at the both terminals.
    Type: Grant
    Filed: August 5, 1988
    Date of Patent: October 31, 1989
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Hisayuki Nagaoka, Michio Zenbayashi, Chiyuki Shimizu
  • Patent number: 4876363
    Abstract: Epoxy group-containing organic silicon compounds represented by general formula (I): ##STR1## wherein R, which may be the same or different, each represents a monovalent hydrocarbon group free from an aliphatic unsaturated bond; a represents 1 or 2; and n represents an integer of 2 to 6. The epoxy-containing organic silicon compounds contain no hydrolyzable group therein and are suited for use in coupling of organic compounds and modification or crosslinking of polymers.
    Type: Grant
    Filed: August 30, 1988
    Date of Patent: October 24, 1989
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Yuichi Funahashi, Junichiro Watanabe, Kiyoshi Takeda, Makaoto Matsumoto