Abstract: A method and apparatus for masking a workpiece with a layer of ink from an inkjet head is disclosed. The masking prevents exposure of select regions of a photosensitive workpiece. The apparatus includes a workpiece pre-aligner for movably supporting and aligning the workpiece. The inkjet head is arranged to be in operable communication with the photosensitive layer of the workpiece when positioned on the pre-aligner and is adapted for providing a select mask of opaque ink on a photosensitive layer. Where the photosensitive layer is a negative tone photoresist, upon exposure the portion of the photosensitive layer that is not exposed because of the presence of the mask is removed upon developing. In this manner, select regions of the workpiece can be kept clear of photoresist or otherwise patterned with indicia such as alphanumeric symbols or barcodes.

Abstract: A 1X projection optical system for deep ultra-violet (DUV) photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a relatively large field at high numerical apertures at DUV wavelengths. The optical system includes a lens group having first and second prisms and four lenses having a positive-negative-positive negative arrangement as arranged in order from the prisms toward the mirror. A projection photolithography system that employs the projection optical system of the invention is also disclosed.

Abstract: Methods and systems for performing laser thermal processing (LTP) of semiconductor devices are disclosed. The method includes forming a dielectric cap atop a temperature-sensitive element, and then forming an absorber layer atop the dielectric layer. A switch layer may optionally be formed atop the absorber layer. The dielectric cap thermally isolates the temperature-sensitive element from the absorber layer. This allows less-temperature-sensitive regions such as unactivated source and drain regions to be heated sufficiently to activate these regions during LTP via melting and recrystallization of the regions, while simultaneously preventing melting of the temperature-sensitive element, such as a poly-gate.

Abstract: A macroencapsulation container having in combination an inner container member with an inner lid member and an inner body member, and an outer container member with an outer lid member and an outer body member, the inner container member being composed of a thermoplastic polymer material that can be thermo-welded or thermo-bonded to itself by melting. The outer container is composed of a metal. At least one electric resistance wire is embedded in or mounted onto the inner lid member along the area of contact with the inner body member, such that the inner lid member may be thermo-bonded to the inner body member to create an integral, one-piece inner container member encapsulating any material or containers disposed within.

Abstract: Architecture and method to transfer data in generation, display or printing high edge placement accuracy images from multiple exposure of plurality of predefined patterns with lower edge placement accuracy. A pattern is laid out on a grid finer or different from grid size of image transducer pixel size, overlaid by transducer grid and converted to n patterns compatible with transducer grid. When combined by partial exposures weighting patterns unevenly, the n patterns generate an image with line edge positions a fraction (1/(2n−1)) of transducer grid size. For most picture display and step-and-repeat lithography applications, pattern stored in first memory is displayed or partially exposed once, and remaining patterns are displayed or partially exposed 2m−1 times m being copy number of the pattern. Superimposing 2n−1 exposures in human eye to scene integration time, picture with improved line placement accuracy is perceived.

Abstract: A method of this invention includes annealing at least one region of a substrate with a short pulse of particles. The particles can be electrons, protons, alpha particles, other atomic or molecular ions or neutral atoms and molecules. The substrate can be composed of a semiconductor material, for example. The particles can include dopant atoms such as p-type dopant atoms such as boron (B), aluminum (Al), gallium (Ga), or indium (In), and n-type dopant atomic species including arsenic (As), phosphorus (P), or antimony (Sb). The particles can also include silicon (Si) or germanium (Ge) atoms or ionized gas atoms including those of hydrogen (He), oxygen (O), nitrogen (N), neon (Ne), argon (Ar), or krypton (Kr). The particles can be used to anneal dopant atoms previously implanted into the substrate.

Abstract: An optical system for projection photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a large field over both a narrow and a broad spectral range. The optical system includes a positive lens group having a positive subgroup of elements that includes at least a plano-convex element and a negative subgroup that includes at least a negative meniscus element. The lens subgroups are separated by a small air space. The positive and negative subgroups constitute a main lens group arranged adjacent to but spaced apart from a concave mirror along the mirror axis. The system also includes a variable aperture stop so that the system has a variable NA. A projection photolithography system that employs the optical system is also disclosed.

Abstract: An adjustable curb guard filter apparatus for filtering liquid flowing into a curbside drain and method for deploying the same. In accordance with one embodiment, the adjustable curb guard filter apparatus includes a filter sheet disposed between an upper and a lower of a pair of support bar members. The curb guard filter apparatus is deployed onto the curbside drain such that the ends of each of the support bar members exert an outwardly directed pressure against the inner lateral surfaces of the curbside drain enabling the filter sheet to form a substantially complete seal thereon. In a preferred embodiment, the lower end of the filter sheet is wrapped in a scroll-like manner around the lower support bar member such that when installed onto the curbside drain, the wrapped lower support bar member simultaneously provides dam and liquid filtration functionality along the bottom edge of the curbside drain.

Abstract: Apparatus and methods for reducing optical distortion in an optical system by thermal means are disclosed. The apparatus includes a heating/cooling system spaced apart from and in thermal communication with an internally reflecting surface of a refractive element in the optical system. The heating/cooling system is adapted to create a select temperature distribution in the refractive optical element near the internally reflecting surface to alter the refractive index and/or the surface profile in a manner that reduces residual distortion.

Abstract: Apparatus and methods for thermally processing a substrate with scanned laser radiation are disclosed. The apparatus includes a continuous radiation source and an optical system that forms an image on a substrate. The image is scanned relative to the substrate surface so that each point in the process region receives a pulse of radiation sufficient to thermally process the region.

Abstract: A method of forming a doped polycrystalline silicon gate in a Metal Oxide Semiconductor (MOS) device. The method includes forming first an insulation layer on a top surface of a crystalline silicon substrate. Next, an amorphous silicon layer is formed on top of and in contact with the insulation layer and then a dopant is introduced in a top surface layer of the amorphous silicon layer. The top surface of the amorphous silicon layer is irradiated with a laser beam and the heat of the radiation causes the top surface layer to melt and initiates explosive recrystallization (XRC) of the amorphous silicon layer. The XRC process transforms the amorphous silicon layer into a polycrystalline silicon gate and distributes the dopant homogeneously throughout the polycrystalline gate.

Abstract: A magnetic levitation (maglev) stage apparatus and method is disclosed. The maglev stage includes a movable platen having an upper surface capable of supporting a workpiece. A set of magnet arrays is arranged on the bottom surface of the platen, and first and second side magnet arrays are arranged on opposite sides of the platen. A support frame at least partially surrounds the platen on the first and second sides and the bottom surface. A plurality of motor coils is arranged on the support frame so as to be in operable communication with the set of magnet arrays and the side magnet arrays. The magnet arrays and motor coils are operable to magnetically levitate the platen within the support frame and move the platen in up to six degrees of freedom (DOF), with all forces directed through the center-of-gravity of the platen along the DOF axes. Movable counterweights may also be employed to facilitate the smooth movement of the platen.

Abstract: A method and apparatus (10) for determining a best focus position of an object (30) relative to a reference position (e.g., axis A) of a dark-field optical imaging system (20), with an effective focusing range up to 10 times of the depth of field of the system. The method includes the steps of first forming a dark-field image of the object at different focus positions (zm). Each dark-field image has a corresponding image intensity distribution with an average intensity and a variance of intensity. The next step is forming a set of contrast values by calculating a contrast value (Cm) for each dark-field image based on the variance and the average intensity. The last step is determining the best focus position by fitting a Lorentzian function to the set of contrast values plotted as a function of the different focus positions and identifying the focus position associated with the maximum contract value (Cmax).

Abstract: A lithography system and method for cost-effective device manufacture that can employ a continuous lithography mode of operation is disclosed, wherein exposure fields are formed with single pulses of radiation. The system includes a pulsed radiation source (14), an illumination system (24), a mask (M), a projection lens (40) and a workpiece stage (50) that supports a workpiece (W) having an image-bearing surface (WS). A radiation source controller (16) and a workpiece stage position system (60), which includes a metrology device (62), are used to coordinate and control the exposure of the mask with radiation pulses so that adjacent radiation pulses form adjacent exposure fields (EF). Where pulse-to-pulse uniformity from the radiation source is lacking, a pulse stabilization system (18) may be optionally used to attain the desired pulse-to-pulse uniformity in exposure dose.

Abstract: Apparatus and methods for thermally processing a substrate with scanned laser radiation are disclosed. The apparatus includes a continuous radiation source and an optical system that forms an image on a substrate. The image is scanned relative to the substrate surface so that each point in the process region receives a pulse of radiation sufficient to thermally process the region.

Abstract: Systems and methods for reducing colinearity effects in the formation of microdevices are disclosed. A mask with at least one column of microdevice cells is illuminated with pulses of radiation such that only a single column is illuminated. Images of the column are used to form adjacent columnar exposure fields on a workpiece. The columnar exposure fields so formed each have a width much less than that of the full exposure field capable of being formed by the projection lens. One method of the invention includes forming each columnar exposure field with a single pulse of radiation while the workpiece moves continuously relative to a projection lens and mask. Another method includes forming each columnar exposure field with a burst of radiation pulses or a long continuous pulse while stepping the workpiece beneath a projection lens between bursts. By forming columnar exposure fields that contain a single row of devices, a substantial number of error sources that contribute to co-linearity error are eliminated.

Abstract: An image stabilization apparatus and method for stabilizing the imaging of a high-performance optical system prone to imaging instabilities from thermal effects. Thermal instabilities within the lens, such as convection, can result in image placement errors in a high-performance optical system. The apparatus includes a heating element arranged on the upper surface of the optical system to provide heat to one or more gas-filled spaces in the optical system. An insulating blanket covers a portion of the optical system to uniformize the heating of the optical system and increase efficiency of the apparatus. The gas in the spaces is heated so that the warmer gases reside near the upper portion of the optical system, while the cooler gases reside near the lower portion of the optical system. This creates a stable thermal environment within the lens system, thereby stabilizing the imaging. Optionally gas can be flowed over the lower surface to keep heat from heating the lower portion of the optical system.

Abstract: A radiation shield device (100) and method, the apparatus comprising either an absorbing shield (130), a scattering shield (200) or an absorbing and scattering shield (300) arranged in a processing tool (50) that irradiates a workpiece (70) with high-irradiance radiation (80) from a light source (78). The processing tool has a tool portion (66) having an irradiance damage threshold (IDT). The radiation shield device is designed to intercept a portion of the high-irradiance radiation that would otherwise be incident the tool portion, and to ensure that radiation exiting the particular shield comprising the radiation shield device and incident the tool portion has an irradiance below the tool portion irradiance damage threshold. The method includes using the radiation shield device in processing a workpiece using a processing tool.

Abstract: A method of, and apparatus for, mechanically masking a workpiece to form exposure exclusion regions is disclosed. The apparatus includes a mask that is arranged atop the photosensitive surface of the workpiece. The mask is opaque to the wavelength of radiation that activates the photosensitive workpiece surface. The mask is placed onto the workpiece prior to lithographic exposure of the workpiece so that the photosensitive material (e.g., negative acting photoresist) can be removed from select regions of the workpiece to provide, for example, electrical contact directly to the workpiece upper surface.

Abstract: A method of, and apparatus for, defining disk tracks in magnetic recording media. The track-writing apparatus (20) is capable of forming tracks (340) with a track width (TW) and track spaces (350) with a space width (SW) on a magnetic media disk (70) having an upper surface (70S), wherein the disk comprises a magnetic medium with a thermal diffusion length (X). The apparatus comprises, in order along an optical axis (A1), a laser light source (30) capable of providing a pulsed laser light beam (B1), a light pipe (32), and illumination shaping optical system (40) that provides substantially uniform illumination over an exposure region (ER), and a phase plate (60) having a phase grating (210) with a grating period (p), arranged proximate and substantially parallel to the upper surface of the disk so as to form an periodic irradiance distribution (380) at the surface of the disk when the phase plate is illuminated with the exposure region.