Abstract: A media player is provided that includes a processor configured to execute a media player program, a non-volatile memory electrically coupled with the processor, the non-volatile memory being vertically configured, an input/output module electrically coupled with the processor and the non-volatile memory and configured to communicate with an input/output device, and an analog/digital module electrically coupled with the processor and the non-volatile memory, the analog/digital module configured to output a media signal. The input/output module may be in electrical communication with the input/output device (e.g., electrically coupled) and/or signal communication with the input/output device (e.g., wireless and/or optical communication).

Abstract: Performing data operations using non-volatile third dimension memory is described, including a storage system having a non-volatile third dimension memory array configured to store data, the data including an address indicating a file location on a disk drive, and a controller configured to process an access request associated with the disk drive, the access request being routed to the non-volatile third dimension memory array to perform a data operation, wherein data from the data operation is used to create a map of the disk drive. In some examples, an address in the non-volatile third dimension memory array provides an alias for another address in a disk drive.

Abstract: A structure for a memory device including a plurality of substantially planar thin-film layers or a plurality of conformal thin-film layers is disclosed. The thin-film layers form a memory element that is electrically in series with first and second cladded conductors and operative to store data as a plurality of conductivity profiles. A select voltage applied across the first and second cladded conductors is operative to perform data operations on the memory device. The memory device may optionally include anon-ohmic device electrically in series with the memory element and the first and second cladded conductors. Fabrication of the memory device does not require the plurality of thin-film layers be etched in order to form the memory element. The memory element can include a CMO layer having a selectively crystallized polycrystalline portion and an amorphous portion. The cladded conductors can include a core material made from copper.

Abstract: Circuitry and methods for restoring data in memory are disclosed. The memory may include at least one layer of a non-volatile two-terminal cross-point array that includes a plurality of two-terminal memory elements that store data as a plurality of conductivity profiles and retain stored data in the absence of power. Over a period of time, logic values indicative of the stored data may drift such that if the logic values are not restored, the stored data may become corrupted. At least a portion of each memory may have data rewritten or restored by circuitry electrically coupled with the memory. Other circuitry may be used to determine a schedule for performing restore operations to the memory and the restore operations may be triggered by an internal or an external signal or event. The circuitry may be positioned in a logic layer and the memory may be fabricated over the logic layer.

Abstract: A non-volatile register is disclosed. The non-volatile register includes a memory element. The memory element comprises a first end and a second end. The non-volatile register includes a register logic connected with the first and second ends of the memory element. The register logic is positioned below the memory element. The memory element may be a two-terminal memory element configured to store data as a plurality of conductivity profiles that can be non-destructively determined by applying a read voltage across the two terminals. New data can be written to the two-terminal memory element by applying a write voltage of a predetermined magnitude and/or polarity across the two terminals. The two-terminal memory element retains stored data in the absence of power. A reference element including a structure that is identical or substantially identical to the two-terminal memory element may be used to generate a reference signal for comparisons during read operations.

Abstract: Circuits and methods to compensate for defective memory in BEOL third dimensional memory technology are described. An integrated circuit is configured to perform columnar replacement of defective BEOL multi-layered memory. For example, the integrated circuit can include a primary BEOL memory array having a plurality of BEOL memory cells being configured to change resistivity, a secondary BEOL memory array having another plurality of BEOL memory cells being configured to change resistivity, and a FEOL restoration module associated with the primary BEOL memory array and the secondary BEOL memory array, the FEOL restoration module being configured to locate a BEOL memory cell within the secondary BEOL memory array to replace a defective BEOL memory cell within the primary BEOL memory array. The FEOL portion can be fabricated on a substrate and the BEOL portion can be fabricated above and in contact with the FEOL portion to form the integrated circuit.

Abstract: A FIFO with data storage implemented with non-volatile third dimension memory cells is disclosed. The non-volatile third dimension memory cells can be fabricated BEOL on top of a substrate that includes FEOL fabricated active circuitry configured for data operations on the BEOL memory cells. Other components of the FIFO that require non-volatile data storage can also be implemented as registers or the like using the BEOL non-volatile third dimension memory cells so that power to the FIFO can be cycled and data is retained. The BEOL non-volatile third dimension memory cells can be configured in a single layer of memory or in multiple layers of memory. An IC that includes the FIFO can also include one or more other memory types that are emulated using the BEOL non-volatile third dimension memory cells and associated FEOL circuitry configured for data operations on those memory cells.

Abstract: Circuitry and a method for indicating a multiple-type memory is disclosed. The multiple-type memory includes memory blocks in communication with control logic blocks. The memory blocks and the control logic blocks are configured to emulate a plurality of memory types. The memory blocks can be configured into a plurality of vertically stacked memory planes. The vertically stacked memory planes may be used to increase data storage density and/or the number of memory types that can be emulated by the multiple-type memory. Each memory plane can emulate one or more memory types. The control logic blocks can be formed in a substrate (e.g., a silicon substrate including CMOS circuitry) and the memory blocks or the plurality of memory planes can be positioned over the substrate and in communication with the control logic blocks. The multiple-type memory may be non-volatile so that stored data is retained in the absence of power.

Abstract: A low read current architecture for memory. Bit lines of a cross point memory array are allowed to be charged by a selected word line until a minimum voltage differential between a memory state and a reference level is assured.

Abstract: Circuits and methods that use third dimension memory as a different memory technology are described. The third dimension memory can be used for application specific data storage and/or to emulate conventional memory types such as DRAM, FLASH, SRAM, and ROM or new memory types as they become available. A processor-memory system implements a memory operable as different memory technologies. The processor-memory system includes a logic subsystem and a memory subsystem, which includes third dimension memory cells. The logic subsystem implements memory technology-specific signals to interact with the third dimension memory cells as memory cells of a different memory technology. As such, the memory subsystem can emulate different memory technologies. The logic subsystem can be fabricated FEOL on a substrate and the memory subsystem can be fabricated BEOL directly on top of the substrate. An interlayer interconnect structure can electrically couple the logic subsystem with the memory subsystem.

Abstract: A margin restore fuse element is described, including a latch configured to store data, a first memory element coupled to the latch and configured to store a first resistive value, a second memory element coupled to the latch and configured to store a second resistive value, a restore circuit coupled to the latch, the first memory element, and the second memory element, the restore circuit being configured to perform a restore data operation to substantially restore the first and second memory elements to the first and second resistive values, respectively. The latch, restore circuit, and other circuitry can be formed FEOL on a substrate (e.g., a semiconductor wafer) as part of a microelectronics fabrication process and the fuse element and memory elements can be formed BEOL over the substrate as part of another microelectronics fabrication process. The fuse and memory elements can be included in a two-terminal non-volatile memory cell.

Abstract: Non-volatile dual port memory with third dimension memory is described, including a non-volatile third dimensional memory array comprising a memory element, the memory element is configured to change from a first resistive state to a second resistive state in response to a voltage, a transceiver gate configured to gate the voltage to the memory element, the voltage being configured to change the memory element from the first resistive state to the second resistive state, the transceiver gate is configured to receive another voltage from a bit line and a bit bar line, the bit line and the bit bar line being coupled to the memory element and configured to provide the another voltage, and a plurality of word lines coupled to the memory element, the plurality of word lines are configured to provide substantially simultaneous access to the non-volatile third dimensional memory array using two or more ports.

Abstract: A data storage system for refreshing in place data stored in a non-volatile re-writeable memory is disclosed. Data from a location memory can be read into a temporary storage location; the data at the memory location can be erased; the read data error corrected if necessary; and then the read data can be programmed and rewritten back to the same memory location it was read from. One or more layers of the non-volatile re-writeable memory can be fabricated BEOL as two-terminal cross-point memory arrays that are fabricated over a substrate including active circuitry fabricated FEOL. A portion of the active circuitry can be electrically coupled with the one or more layers of two-terminal cross-point memory arrays to perform data operations on the arrays, such as refresh in place operations or a read operation that triggers a refresh in place operation. The arrays can include a plurality of two-terminal memory cells.

Abstract: Conductive oxide electrodes are described, including a bi-layer barrier structure electrically coupled with an adhesion layer, and an electrode layer, wherein the bi-layer barrier structure includes a first barrier layer electrically coupled with the adhesion layer, and a second barrier layer electrically coupled with the first barrier layer and to the electrode layer. The conductive oxide electrodes and their associated layers can be fabricated BEOL above a substrate that includes active circuitry fabricated FEOL and electrically coupled with the conductive oxide electrodes through an interconnect structure that can also be fabricated FEOL. The conductive oxide electrodes can be used to electrically couple a plurality of non-volatile re-writeable memory cells with conductive array lines in a two-terminal cross-point memory array fabricated BEOL over the substrate and its active circuitry, the active circuitry configured to perform data operations on the memory array.

Abstract: Memory cell formation using ion implant isolated conductive metal oxide is disclosed, including forming a bottom electrode below unetched conductive metal oxide layer(s), forming the unetched conductive metal oxide layer(s) including depositing at least one layer of a conductive metal oxide (CMO) material (e.g., PrCaMnOX, LaSrCoOX, LaNiOX, etc.) over the bottom electrode. At least one portion of the layer of CMO is configured to act as a memory element without etching, and performing ion implantation on portions of the layer(s) of CMO to create insulating metal oxide (IMO) regions in the layer(s) of CMO. The IMO regions are positioned adjacent to electrically conductive CMO regions in the unetched layer(s) of CMO and the electrically conductive CMO regions are disposed above and in contact with the bottom electrode and form memory elements operative to store non-volatile data as a plurality of conductivity profiles (e.g., resistive states indicative of stored data).

Abstract: A memory cell including conductive oxide electrodes is disclosed. The memory cell includes a memory element operative to store data as a plurality of resistive states. The memory element includes a layer of a conductive metal oxide (CMO) (e.g., a perovskite) in contact with an electrode that may comprise one or more layers of material. At least one of those layers of material can be a conductive oxide (e.g., a perovskite such as LaSrCoO3-LSCoO or LaNiO3-LNO) that is in contact with the CMO. The conductive oxide layer can be selected as a seed layer operative to provide a good lattice match with and/or a lower crystallization temperature for the CMO. The conductive oxide layer may also be in contact with a metal layer (e.g., Pt). The memory cell additionally exhibits non-linear IV characteristics, which can be favorable in certain arrays, such as non-volatile two-terminal cross-point memory arrays.

Abstract: Multi-structured memory is described, including a first memory configured to emulate a first memory type, a second memory configured to emulate a second memory type, the first and second memories disposed in one or more third dimensional memory arrays, and an interface configured to access the first memory or the second memory for data operations. The one or more third dimensional memory arrays are formed on the same component and can be fabricated BEOL on top of a substrate (e.g., a silicon wafer or other semiconductor substrates) including active circuitry (e.g., CMOS devices) fabricated FEOL and operative to perform data operations on the memory arrays and to communicate with external systems configured to access the memory arrays. The third dimensional memory(s) can include two-terminal non-volatile re-writeable cross-point memory arrays including two-terminal non-volatile re-writeable memory cells having their respective terminals electrically coupled with a pair of conductive array lines.

Abstract: Device fabrication is disclosed, including forming a first part of a device at a first fabrication facility as part of a front-end-of-the-line (FEOL) process, the first part of the device comprising a base wafer formed by FEOL processing, and subsequently performing one or more back-end-of-the-line (BEOL) processes at a second fabrication facility to form an IC, the one or more BEOL processes comprising finishing the forming of the device (e.g., an IC including memory) by depositing one or more memory layers on the base wafer. FEOL processing can be used to form active circuitry die (e.g., CMOS circuitry on a Si wafer) and BEOL processing can be used to form on top of each active circuitry die, one or more layers of cross-point memory arrays formed by thin film processing technologies that may or may not be compatible with or identical to some or all of the FEOL processes.

Abstract: An optimized data storage system including non-volatile re-writeable memory having both block program and erase and full or partial page write is disclosed. A memory controller of the system can use block data operations for large data transfers, and page data operations for small data transfers. Page data operations in the non-volatile re-writeable memory do not require block rewrites. One or more layers of the non-volatile re-writeable memory can be fabricated BEOL as two-terminal cross-point memory arrays that are fabricated over a substrate including active circuitry fabricated FEOL. Some or all of the active circuitry can be electrically coupled with the one or more layers of two-terminal cross-point memory arrays to perform data operations on the arrays, such as the block program and block erase and/or full or partial page writes. The arrays can include a plurality of two-terminal memory cells.

Abstract: An integrated circuit includes a substrate including active circuitry fabricated on the substrate and a cross-point memory array formed above the substrate. The cross-point memory array can include conductive array lines arranged in different directions, and re-writable memory cells. Further, the integrated circuit can also include a memory access circuit configured to perform data operations on the cross-point memory array. The integrated circuit can include a cross-point memory array interface layer positioned between the substrate and the cross-point array and including conductive paths configured to electrically couple portions of the memory access circuit with a subset of the conductive array lines. At least one layer of cross-point memory arrays can be formed over the substrate. The memory cells can be two-terminal memory cells that store data as a plurality of conductivity profiles (e.g., resistive states) that can be non-destructively determined by applying a read voltage across the terminals.