Abstract: A semiconductor structure comprising a matrix having a first cubic Group-III nitride with a first band gap, and a second cubic Group-III nitride having a second band gap and forming a region embedded within the matrix. The second cubic Group-III nitride comprises an alloying material which reduces the second band gap relative to the first band gap, a quantum wire is defined by a portion within the region embedded within the matrix, the portion forming a one-dimensional charge-carrier confinement channel, wherein the quantum wire is operable to exhibit emission luminescence which is optically polarised.

Abstract: This invention relates to devices integrally comprising fibres that have emissivities, particularly of infrared radiation, that can be controllably varied. The active emissive surface comprises graphene layers with intercalated ions.

Abstract: Methods for treating coronavirus disease 2019 (COVID-19), the disease caused by severe acute respiratory syndrome coronavirus 2 (SARS-CoV-2) infections, are described. The methods can be used to reduce the severity of outcomes related to COVID-19, such as hospitalization and ventilation. For example, the methods can involve treatment of a subject with a therapeutic agent that degrades hyaluronan and/or an agent that neutralizes a hyaluronan receptor, e.g., CD44, such as an anti-CD44 antibody.

Abstract: The present invention relates generally to polypeptides or nucleic acids for use in the treatment, management, retardation of progression or normalisation of development of an iduronate-2-sulfatase (IDS) deficiency and/or Mucopolysaccharidosis type II (MPS II) in an individual, wherein the polypeptides comprise iduronate-2-sulfatase (IDS) tethered to a tandem repeat of Apolipoprotein E (ApoEII) or the nucleic acids comprise an iduronate-2-sulfatase (IDS) gene sequence tethered to a tandem repeat of the Apolipoprotein E (ApoEII) gene sequence. The invention also relates to haematopoietic stem and progenitor cells (HSPCs) transduced by such nucleic acids for use in therapies.

Abstract: The present invention relates to a resist composition, especially for use in the production of electronic components via electron beam lithography. In addition to the usual base polymeric component (resist polymer), a secondary electron generator is included in resist compositions of the invention in order to promote secondary electron generation. This unique combination of components increases the exposure sensitivity of resists in a controlled fashion which facilitates the effective production of high-resolution patterned substrates (and consequential electronic components), but at much higher write speeds.

Abstract: A method and system is provided for increasing lipids, biomass, and metabolite yields of a microalgae culture of cells and other organisms with conserved metabolic pathways compared to an untreated culture or organism when maintained under normal conditions. The method includes irradiating with electromagnetic ionizing radiation to induce rapid and reproducible hormetic metabolic activation in the organism cells. In an embodiment, the irradiation can be applied in a exponential or stationary phase of microalgae growth. The hormetic effect involves up-regulation of expression of lipid metabolism genes encoding enzymes that are involved in the biosynthesis of lipids with accumulation of energy reserves in the form of lipids and/or accumulation of other metabolites.

Abstract: The present invention relates generally to polypeptides or nucleic acids for use in the treatment, management, retardation of progression or normalisation of development of an iduronate-2-sulfatase (IDS) deficiency and/or Mucopolysaccharidosis type II (MPS II) in an individual, wherein the polypeptides comprise iduronate-2-sulfatase (IDS) tethered to a tandem repeat of Apolipoprotein E (ApoEII) or the nucleic acids comprise an iduronate-2-sulfatase (IDS) gene sequence tethered to a tandem repeat of the Apolipoprotein E (ApoEII) gene sequence. The invention also relates to haematopoietic stem and progenitor cells (HSPCs) transduced by such nucleic acids for use in therapies.

Abstract: Embodiments of the present invention provide a computer-implemented method of determining a parameter indicative of dark adaptation of an eye, comprising receiving threshold data from a dark adaptometer indicative of a perception threshold of the eye, fitting first and second models to the threshold data, wherein the first model is associated with a first dark adaptation mechanism and the second model is associated with the first dark adaption mechanism and a second dark adaptation mechanism, determining a confidence associated with the fitting of each of the first and second models to the received threshold data, iteratively repeating the steps of receiving the threshold data and fitting the first and second models in dependence on the determined confidence, and outputting an indication of one or more parameters indicative of dark adaptation of an eye associated with one or both of the first and second models.

Abstract: The present invention relates to certain 4-(substituted aniline)-2-(substituted piperidin-1-yl)pyrimidine-5-carboxamide compounds which may be useful in the treatment or prevention of a disease or medical condition mediated through signaling of CaMK1 isoforms. For example, such compounds and salts thereof may be useful in the treatment or prevention of a number of different cancers, metabolic diseases including type-2 diabetes, and/or immune-mediated disorders.

Abstract: The present invention relates to a resist composition, especially for use in the production of electronic components via electron beam lithography. In addition to the usual base polymeric component (resist polymer), a secondary electron generator is included in resist compositions of the invention in order to promote secondary electron generation. This unique combination of components increases the exposure sensitivity of resists in a controlled fashion which facilitates the effective production of high-resolution patterned substrates (and consequential electronic components), but at much higher write speeds.

Abstract: The present invention relates to compositions and adeno associated viral vectors comprising an optimised HGSNAT nucleic acid sequence of SEQ ID No. 1 or a derivative sequence having at least 77% homology thereof. Uses of such compositions and vectors are also contemplated along with kits of parts for their administration.

Abstract: Embodiments of the present invention provide an apparatus for determining spectral information of a three-dimensional object, comprising a cavity (110) for location in relation to the object, an imaging light source (120) located in relation to the cavity, wherein the imaging source is controllable to selectively emit light in a plurality of wavelength ranges, structured light source (130) for emitting structured illumination toward the object, wherein the structured light source comprises a plurality of illumination devices arranged around the cavity, one or more imaging devices (140) for generating image data relating to at least a portion of the object, a control unit, wherein the control unit (1100) is arranged to control the structured light source to emit the structured illumination and to control the imaging light source to emit light in a selected one or more of the plurality of wavelength ranges, a data storage unit (1120) arranged to store image data corresponding to the structured illumination and

Abstract: The present invention relates to resist compostions, in particular to photoresists that can be used in photolithography, especially in the fabrication of integrated circuits and derivative products. The resist compositions of the invention include an anti-scattering component which has a significant amount of empty space, and thus fewer scattering centers, such that radiation-scattering events are more limited during exposure. Such anti-scattering effects can lead to improved resolutions by reducing the usual proximity effects associated with lithographic techniques, allowing the production of smaller, higher resolution microchips. Furthermore, certain embodiments involve anti-scattering components which are directly linked to the resist components, which can improve the overall lithographic chemistry to provide benefits both in terms of resolution and resist sensitivity.

Abstract: The present invention relates to novel nanocomposite materials, methods of making nanocomposites and uses of nanocomposite materials. In particular, the invention relates to composite materials which contain two-dimensional materials (e.g. graphene) in multi-layer form i.e. in a form which has a number of atomic layers. The properties of a composite material containing two-dimensional material is in multi-layer from are shown to be superior to those which contain the two-dimensional material in monolayer form.

Abstract: The present invention relates to a method of altering the relative proportions of protons, deuterons and tritons in a sample using a membrane. The membrane comprises a 2D material and an ionomer. The invention also relates to a method of making said membranes.

Abstract: The present invention relates to an improved method of providing photoreceptor function to a cell, for example for use in the treatment of retinal degeneration. The present invention also relates to compositions and kits, in particular for use in such methods.

Abstract: The present invention relates to resist compostions, in particular to photoresists that can be used in photolithography, especially in the fabrication of integrated circuits and derivative products. The resist compositions of the invention include an anti-scattering component which has a significant amount of empty space, and thus fewer scattering centers, such that radiation-scattering events are more limited during exposure. Such anti-scattering effects can lead to improved resolutions by reducing the usual proximity effects associated with lithographic techniques, allowing the production of smaller, higher resolution microchips. Furthermore, certain embodiments involve anti-scattering components which are directly linked to the resist components, which can improve the overall lithographic chemistry to provide benefits both in terms of resolution and resist sensitivity.

Abstract: Embodiments of the invention provide a method of processing colour image data comprising receiving image data corresponding to a first and a second region of an image having colour information represented in a first colour space; converting the colour information of the image data from the first colour space to a second colour space, the mapping being arranged to substantially maintain a perceived colour of the colour information and to select a meta-brightness of the first and second regions; and out putting the image data having colour information in the second colour space.

Abstract: There is disclosed a device and method for fabricating such a device. The device includes cavities formed in a transparent substrate. A laminated membrane is mounted to the substrate and spans the cavities. The laminated membrane includes a layer of a flexible material, typically a polymer, and a layer of a two-dimensional material that is typically graphene.

Abstract: The present invention relates to an electron beam (eBeam) resist composition, particularly an (eBeam) resist composition for use in the fabrication of integrated circuits. Such resist compositions include an anti-scattering compound which minimises scattering and secondary electron generation, thus affording extremely high resolution lithography. Such high resolution lithography may be used directly upon silicon-based substrates to produce integrated circuits, or may alternatively be used to produce a lithographic mask (e.g. photomask) to facilitate high-resolution lithography.