Patents Assigned to Veeco Instruments, Inc.
  • WAFER CARRIER WITH HUB
    Publication number: 20110114022
    Abstract: A wafer carrier for a rotating disc CVD reactor includes a unitary plate of a ceramic such as silicon carbide defining wafer-holding features such as pockets on its upstream surface and also includes a hub removably mounted to the plate in a central region of the plate. The hub provides a secure connection to the spindle of the reactor without imposing concentrated stresses on the ceramic plate. The hub can be removed during cleaning of the plate. The wafer carrier also preferably includes a gas flow facilitating element on the upstream surface of the plate in the central region of the plate. The gas flow facilitating element helps redirect the flow of incident gases along the upstream surface and away from a flow discontinuity in the central region.
    Type: Application
    Filed: December 1, 2008
    Publication date: May 19, 2011
    Applicant: VEECO INSTRUMENTS INC.
    Inventors: Vadim Boguslavskiy, Alexander I. Gurary, Keng Moy, Eric A. Armour
  • GAS TREATMENT SYSTEMS
    Publication number: 20110091648
    Abstract: An MOCVD reactor such as a rotating disc reactor (10) is equipped with a gas injector head having diffusers (129) disposed between adjacent gas inlets. The diffusers taper in the downstream direction. The injector head desirably has inlets (117) for a first gas such as a metal alkyl disposed in radial rows which terminate radially inward from the reactor wall to minimize deposition of the reactants on the reactor wall. The injector head desirably also has inlets (125) for a second gas such as ammonia arranged in a field between the rows of first gas inlets, and additionally has a center inlet (135) for the second gas coaxial with the axis of rotation.
    Type: Application
    Filed: November 22, 2010
    Publication date: April 21, 2011
    Applicant: VEECO INSTRUMENTS INC.
    Inventors: Bojan Mitrovic, Alex Gurary, Eric A. Armour
  • METHOD AND APPARATUS FOR SURFACE PROCESSING OF A SUBSTRATE
    Publication number: 20110089022
    Abstract: Method and apparatus for processing a substrate with a beam of energetic particles. The beam is directed from a source through a rectangular aperture in a shield positioned between the source and substrate to a treatment zone in a plane of substrate movement. Features on the substrate are aligned parallel to a major dimension of the rectangular aperture and the substrate is moved orthogonally to the aperture's major dimension. The beam impinges the substrate through the aperture during movement. The substrate may be periodically rotated by approximately 180° to reorient the features relative to the major dimension of the rectangular aperture. The resulting treatment profile is symmetrical about the sides of the features oriented toward the major dimension of the rectangular aperture.
    Type: Application
    Filed: December 23, 2010
    Publication date: April 21, 2011
    Applicant: VEECO INSTRUMENTS INC.
    Inventors: Boris Druz, Viktor Kanarov, Hariharakeshave S. Hegde, Alan V. Hayes, Emmanuel Lakios
  • GAS TREATMENT SYSTEMS
    Publication number: 20110088623
    Abstract: An MOCVD reactor such as a rotating disc reactor (10) is equipped with a gas injector head having diffusers (129) disposed between adjacent gas inlets. The diffusers taper in the downstream direction. The injector head desirably has inlets (117) for a first gas such as a metal alkyl disposed in radial rows which terminate radially inward from the reactor wall to minimize deposition of the reactants on the reactor wall. The injector head desirably also has inlets (125) for a second gas such as ammonia arranged in a field between the rows of first gas inlets, and additionally has a center inlet (135) for the second gas coaxial with the axis of rotation.
    Type: Application
    Filed: November 22, 2010
    Publication date: April 21, 2011
    Applicant: VEECO INSTRUMENTS INC.
    Inventors: Bojan Mitrovic, Alex Gurary, Eric A. Armour
  • Real-time scanner-nonlinearity error correction for HDVSI
    Patent number: 7898672
    Abstract: An error correction for scanner position is implemented by adjusting the filter parameters of the quadrature demodulation module of an HDVSI algorithm using a reference signal from an independent position measurement device (PMD). The step size generated by the PMD at each scanner step is substituted for the nominal scanner step in the quadrature demodulation algorithm calculating phase and in the coherent envelope algorithm calculating peak. This substitution eliminates all errors produced by scanner nonlinearities. Furthermore, over the large number of steps carried out during a normal scanning range, random scanner-position errors (such as produced by vibration and other system noise) are automatically corrected by integration over their normal distribution around the noise-free position value. Therefore, a complete correction of scanner-position error may be achieved using the reference signal.
    Type: Grant
    Filed: April 15, 2008
    Date of Patent: March 1, 2011
    Assignee: Veeco Instruments, Inc.
    Inventor: Dong Chen
  • Erodible Spacer Dicing Blade Gang Assembly
    Publication number: 20110041308
    Abstract: A ganged saw blade assembly for dicing of wafers includes a plurality of circular saw blades positioned along a common central axis and erodible pitch spacers positioned along the common central axis between adjacent saw blades. The pitch spacers are eroded to a desired diameter relative to the common central axis to maintain a desired saw exposure, e.g. by sawing into an abrasive material with the saw blade assembly. The saw blade assembly thus permits use of the saw blades over longer periods notwithstanding erosion of the blades.
    Type: Application
    Filed: August 24, 2009
    Publication date: February 24, 2011
    Applicant: VEECO INSTRUMENTS, INC.
    Inventors: Kent A. Swanson, William J. Abeyta, Serapion Doaf
  • Apparatus and method of amplifying low voltage signals
    Patent number: 7886583
    Abstract: A low voltage signal amplifying apparatus includes a probe device, an actuator providing relative motion between the probe device and the sample, and a transducer that generates a voltage signal indicative of a property of at least one of the probe device, the sample, and the actuator. A differential voltage to current converter receives a differential voltage signal from the transducer and generates a differential current signal to provide a balanced, differential, low impedance current mode amplified signal that can be readily carried over a signal transmission device.
    Type: Grant
    Filed: July 11, 2006
    Date of Patent: February 15, 2011
    Assignee: Veeco Instruments Inc.
    Inventors: Carl Masser, Henry Mittel
  • Method and apparatus for surface processing of a substrate
    Patent number: 7879201
    Abstract: Method and apparatus for processing a substrate with a beam of energetic particles. The beam is directed from a source through a rectangular aperture in a shield positioned between the source and substrate to a treatment zone in a plane of substrate movement. Features on the substrate are aligned parallel to a major dimension of the rectangular aperture and the substrate is moved orthogonally to the aperture's major dimension. The beam impinges the substrate through the aperture during movement. The substrate may be periodically rotated by approximately 180° to reorient the features relative to the major dimension of the rectangular aperture. The resulting treatment profile is symmetrical about the sides of the features oriented toward the major dimension of the rectangular aperture.
    Type: Grant
    Filed: August 11, 2004
    Date of Patent: February 1, 2011
    Assignee: Veeco Instruments Inc.
    Inventors: Boris Druz, Viktor Kanarov, Hariharakeshave S. Hegde, Alan V. Hayes, Emmanuel Lakios
  • Minimal force air bearing for lapping tool
    Patent number: 7871306
    Abstract: A lapping tool for lapping a wafer section in a well controlled manner, has a head with an actuator for bending the row tool, and a force multiplier coupled between the actuator and row tool to multiply the force generated by the actuator for application of greater bending force to the row tool than can be generated by the actuator. Furthermore, at least two actuators, which are controlled together, simultaneously apply force to one force multiplier, so as to further increase bending force. The increase in available force permits the use of a row tool of a ceramic or other material that is substantially stiffer than stainless steel, such as a row tool having a coefficient of thermal expansion that is substantially similar to that of the rowbar itself. The tool further includes structures for tilting or otherwise orienting the wafer section relative to the lapping plate.
    Type: Grant
    Filed: May 6, 2007
    Date of Patent: January 18, 2011
    Assignee: Veeco Instruments Inc.
    Inventor: Tracy Lytle
  • In-phase/in-quadrature demodulator for spectral information of interference signal
    Patent number: 7864327
    Abstract: Sinusoidal in-phase and in-quadrature signals at a given spatial frequency are combined with the irradiance signals generating a correlogram of interest and integrated over the length of the correlogram data-acquisition scan. The integration outputs are then used to calculate the amplitude and the phase of the correlogram signal at the selected spatial frequency, thereby producing targeted spectral information. The signal generator used to generate the in-phase and in-quadrature sinusoidal signals may be scanned advantageously through any desired range of spatial frequencies, thereby producing corresponding amplitude and phase spectral information for the correlogram. Because the procedure produces spectral information independently of the number of data frames acquired during the interferometric scan, it is materially more rapid than conventional FFT analysis.
    Type: Grant
    Filed: January 9, 2009
    Date of Patent: January 4, 2011
    Assignee: Veeco Instruments, Inc.
    Inventor: Dong Chen
  • Adaptive controller for ion source
    Patent number: 7853364
    Abstract: An ion source, often used for materials processing applications in a vacuum processing chamber, is provided with an adaptive control system. The adaptive control system has a microprocessor and memory that regulate the inputs of power and gas flow into the ion source. The adaptive control system monitors and stores the dynamic input impedance properties and status of input devices to the ion source. The adaptive control system may additionally control magnetic fields within the ion source. The adaptive control system provides a multivariable control for driving any combination of input power, gas flow, magnetic field, or electrostatic ion beam extraction or acceleration field into the ion source.
    Type: Grant
    Filed: November 29, 2007
    Date of Patent: December 14, 2010
    Assignee: Veeco Instruments, Inc.
    Inventors: James D. Deakins, Dennis J. Hansen, Leonard J. Mahoney, Tolga Erguder, David M. Burtner
  • Method and Apparatus for Characterizing a Probe Tip
    Publication number: 20100313312
    Abstract: A method and apparatus are provided of characterizing a re-entrant SPM probe tip (30) through a single scan of a characterizer, thus dramatically increasing throughput, accuracy, and repeatability when compared to prior known tip characterization techniques. The characterizer also preferably is one whose dimensions can be known with a high level of certainty in order to maximize characterization accuracy. These dimensions are also preferably very stable or, if unstable, change catastrophically rather than in a manner that is difficult or impossible to detect. A carbon nanotube (CNT), preferably a single walled carbon nanotube (SWCNT), has been found to be well-suited for this purpose. Multi-walled carbon nanotubes (MWCNTs) (130) and other structures may also suffice for this purpose. Also provided are a method and apparatus for monitoring the integrity of a CNT.
    Type: Application
    Filed: February 20, 2007
    Publication date: December 9, 2010
    Applicant: VEECO INSTRUMENTS INC.
    Inventors: Gregory Dahlen, Hao-chih Liu
  • MULTI-GAS DISTRIBUTION INJECTOR FOR CHEMICAL VAPOR DEPOSITION REACTORS
    Publication number: 20100300359
    Abstract: A gas distribution injector for chemical vapor deposition reactors has precursor gas inlets disposed at spaced-apart locations on an inner surface facing downstream toward a substrate carrier, and has carrier openings disposed between the precursor gas inlets. One or more precursor gases are introduced through the precursor gas inlets, and a carrier gas substantially nonreactive with the precursor gases is introduced through the carrier gas openings. The carrier gas minimizes deposit formation on the injector. The carrier gas openings may be provided by a porous plate defining the surface or via carrier inlets interspersed between precursor inlets. The gas inlets may removable or coaxial.
    Type: Application
    Filed: August 16, 2010
    Publication date: December 2, 2010
    Applicant: VEECO INSTRUMENTS INC.
    Inventors: Eric A. Armour, Alex Gurary, Lev Kadinski, Robert Doppelhammer, Gary Tompa, Mikhail Kats
  • Web Substrate Deposition System
    Publication number: 20100291308
    Abstract: A deposition system includes a drum for supporting a web substrate during deposition that defines a plurality of apertures in an outer surface for passing cooling gas. A gas manifold includes an input that is coupled to an output of a gas source and at least one output that is coupled to the plurality of apertures in the outer surface of the drum. The gas manifold provides gas to the plurality of apertures that flows between the outer surface of the drum and the web substrate, thereby increasing heat transfer from the web substrate to the drum. At least one deposition source is positioned so that material deposits on the web substrate.
    Type: Application
    Filed: May 14, 2009
    Publication date: November 18, 2010
    Applicant: VEECO INSTRUMENTS INC.
    Inventors: Piero Sferlazzo, Martin Klein
  • Linear Deposition Source
    Publication number: 20100282167
    Abstract: A deposition source includes a crucible for containing deposition material and a body comprising a conductance channel. An input of the conductance channel is coupled to an output of the crucible. A heater heats the crucible so that the crucible evaporates the deposition material into the conductance channel. A heat shield comprising a plurality of heat resistant material layers is positioned around at least one of the heater and the body. A plurality of nozzles is coupled to an output of the conductance channel so that evaporated deposition material is transported from the crucible through the conductance channel to the plurality of nozzles where the evaporated deposition material is ejected from the plurality of nozzles to form a deposition flux.
    Type: Application
    Filed: June 17, 2010
    Publication date: November 11, 2010
    Applicant: VEECO INSTRUMENTS INC.
    Inventors: Chad Conroy, Scott Wayne Priddy, Jacob A. Dahlstrom, Rich Bresnahan, David William Gotthold, John Patrin
  • Linear Deposition Source
    Publication number: 20100285218
    Abstract: A deposition source includes at least one crucible for containing deposition material. A body includes a conductance channel with an input coupled to an output of the crucible. A heater increases a temperature of the crucible so that the crucible evaporates the deposition material into the conductance channel. A plurality of nozzles is coupled to an output of the conductance channel so that evaporated deposition material is transported from the crucible through the conductance channel to the plurality of nozzles where the evaporated deposition material is ejected from the plurality of nozzles to form a deposition flux. At least one of the plurality of nozzles includes a tube that is positioned proximate to the conductance channel so that the tube restricts an amount of deposition material supplied to the nozzle including the tube.
    Type: Application
    Filed: June 17, 2010
    Publication date: November 11, 2010
    Applicant: VEECO INSTRUMENTS INC.
    Inventors: Chad Conroy, Scott Wayne Priddy, Jacob A. Dahlstrom, Rich Bresnahan, David William Gotthold, John Patrin
  • Probe device for a metrology instrument and method of fabricating the same
    Patent number: 7823216
    Abstract: A method of producing a probe device for a metrology instrument such as an AFM includes providing a substrate having front and back surfaces and then forming an array of tip height structures on the first surface of the substrate, the structures having varying depths corresponding to selectable tip heights. The back surface of the substrate is etched until a thickness of the substrate substantially corresponds to a selected tip height, preferably by monitoring this etch visually and/or monitoring the etch rate. The tips are patterned from the front side of the wafer relative to fixed ends of the cantilevers, and then etched using an anisotropic etch. As a result, probe devices having sharp tips and short cantilevers exhibit fundamental resonant frequencies greater than 700 kHz or more.
    Type: Grant
    Filed: August 2, 2007
    Date of Patent: October 26, 2010
    Assignee: Veeco Instruments Inc.
    Inventors: Wenjun Fan, Steven F. Nagle
  • Interferometric measurement of DLC layer on magnetic head
    Patent number: 7808652
    Abstract: An explicit relationship is developed between the ratio of average interferometric modulation produced by diamond-like carbon (DLC)-coated magnetic-head surfaces and the thickness of the DLC layer. Accordingly, the thickness of the DLC layer is calculated in various manners from modulation data acquired for the system using object surfaces of known optical parameters.
    Type: Grant
    Filed: January 18, 2008
    Date of Patent: October 5, 2010
    Assignee: Veeco Instruments, Inc.
    Inventors: Florin Munteanu, Dong Chen, Erik Novak, G. Lawrence Best
  • GRID TRANSPARENCY AND GRID HOLE PATTERN CONTROL FOR ION BEAM UNIFORMITY
    Publication number: 20100219358
    Abstract: A design process for varying hole locations or sizes or both in an ion beam grid includes identifying a control grid to be modified; obtaining a change factor for the grid pattern; and using the change factor to generate a new grid pattern. The change factor is one or both of a hole location change factor or a hole diameter change factor. Also included is an ion beam grid having the characteristic of hole locations or sizes or both defined by a change factor modification of control grid hole locations or sizes or both.
    Type: Application
    Filed: May 10, 2010
    Publication date: September 2, 2010
    Applicant: Veeco Instruments, Inc.
    Inventors: Ikuya Kameyama, Daniel E. Siegfried
  • Method and apparatus of scanning a sample using a scanning probe microscope
    Patent number: 7770439
    Abstract: A method and apparatus of scanning a sample with a scanning probe microscope including scanning a surface of the sample according to at least one scan parameter to obtain data corresponding to the surface, and substantially automatically identifying a transition in the surface. Based on the identified transition, the sample is re-scanned. Preferably, the resultant data is amended with data obtained by re-scanning the transition.
    Type: Grant
    Filed: October 17, 2006
    Date of Patent: August 10, 2010
    Assignee: Veeco Instruments Inc.
    Inventor: Paul L. Mininni