Abstract: The present method and system features an active compliant pin chuck to hold a substrate, having opposed first and second surfaces, and compensates for non-planarity in one of the surfaces of the substrate. To that end, the support system includes a chuck having a plurality of piezo pins and reference pins, with the piezo pins being coupled to piezo actuators to undergo relative movement with respect to said reference pins. These and other embodiments are discussed more fully below.

Abstract: For example, to control an effect due to entrance and leakage of liquid for exposure and allow a preferable exposure processing, a support surface is provided which supports an object. The support surface is liquid repellant, and a collection device is provided which collects liquid from the support surface.

Abstract: A moving element to be propelled across a stator includes a coil unit, including coils, for generating a force to propel the moving unit, and a cooling unit for cooling the coil unit. A thermal conductive member, arranged between the cooling unit and the coil unit, transmits heat away from the coil unit. In addition, a housing unit houses the coil unit, the cooling unit and the thermal conductive member.

Abstract: A method and apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation. The method can include directing the radiation along a radiation path in a first direction toward a reticle, passing the radiation from the reticle and to the microlithographic substrate along the radiation path in a second direction, and moving the reticle relative to the radiation path along a reticle path generally normal to the first direction. The microlithographic substrate can move relative to the radiation path along a substrate path having a first component generally parallel to the second direction, and a second component generally perpendicular to the second direction. The microlithographic substrate can move generally parallel to and generally perpendicular to the second direction in a periodic manner while the reticle moves along the reticle path to change a relative position of a focal plane of the radiation.

Abstract: A cooling apparatus for use with an optical element having a concave part includes a cooling mechanism, located in the concave part of the optical element, for cooling the optical element through radiation in a non-contact manner.

Abstract: An illumination optical system for Koehler-illuminating a target surface with light from a light source includes a light integrator for forming a secondary light source, the light integrator including plural elements formed directly onto a substrate; a condenser for condensing the light from the light integrator; and a shield for shielding the light that goes straight in interfaces among the plural elements from an effective illumination area on the illuminated surface.

Abstract: Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.

Abstract: A magnification correction device 1 includes magnification correction optics 2, a pressure adjustment device 3 and a controller 4. The magnification correction optics 2 is formed in a shape of a box with a glass plate 20 and a bottom plate 11 positioned parallel to the glass plate 20 and a frame 10. The inside of the box is an air room 24 connected to a pressure adjustment device 3 via a connecting pipe 12 so that the pressure of the inside can be changed. The cylinder 30 is driven by a motor 35 via a linear movement unit 36 such as a ball screw and the motor 35 is controlled by a controller 4. The moving distance of cylinder 30, which is equal to the moving distance of the piston, is decided by the number of the revolutions of the motor 35, and the capacity of the closed circuit of the pressure adjustment device 3 is also decided.

Abstract: A coating and developing system is capable of preventing the contamination of a substrate with particles while the same coats a surface of a substrate with a resist film and develops the resist film after the substrate has been processed by immersion exposure. The coating and developing system includes: a processing block including coating units for forming a resist film on a surface of a substrate and developing units for processing the resist film formed on the substrate with a developer, and an interface block connected to the processing block and an exposure system for carrying out an immersion exposure process. The interface block includes: substrate cleaning units for cleaning the substrate processed by the immersion exposure process, a first carrying mechanism and a second carrying mechanism. The first carrying mechanism carries a substrate processed by immersion exposure to the substrate cleaning unit. The second carrying mechanism carries the substrate cleaned by the substrate cleaning unit.

Abstract: An apparatus for adjusting image formation includes a first stage, a second stage, an optical element, a counterweight, and an actuator. The first stage is operable to project an original image. A final image corresponding to the original image is formed on the second stage. The optical element is movable with at least one degree of freedom operable to shift a position of the final image. The counterweight is movable with the at least one degree of freedom. The actuator is operable to actuate the optical element and the counterweight in opposite directions.

Abstract: A reticle thermal detector for measuring a thermal condition and distortion of a reticle prior to photolithography is disclosed. The reticle thermal detector includes a mechanism for determining a degree of distortion of the reticle. An alarm is connected to the mechanism for activation by the mechanism when the reticle is distorted. The invention further includes a novel method of enhancing the quality of circuit pattern images formed on a wafer during photolithography.

Abstract: The heat developing apparatus heats and conveys a film with a heat developing photosensitive material coated on one side of a supporting substrate and makes a latent image formed on the film visible, which includes a first zone composed of stationary guides 51b and 52b having a heater and opposing rollers 51a and 52a for pressing the film against the stationary guides and a second zone 53 composed of a stationary guide 53b having a heater and another guide 53a forming a predetermined guide gap with the stationary guide, wherein the guide gap of the second zone is 3 mm or less.

Abstract: An apparatus for exposing a wafer with light. The apparatus includes a chamber for enclosing at least a portion of a path of the light, a circulation system having a fan unit, an inactive gas supplying path from the fan unit to the chamber, and an inactive gas return unit from the chamber to the fan unit, in which the circulation system is arranged to circulate an inactive gas through the chamber, and a control unit for controlling the fan unit. The control unit changes a revolution speed of the fan unit so that the gas pressure inside the chamber is held within a tolerance. A pressure loss at the return path is smaller than a positive pressure being set with respect to a gas pressure inside the chamber.

Abstract: An integrated lithographic fabrication cluster system, as presented herein, comprises an exposure apparatus to expose a pattern onto a substrate with an associated exposure controller to control the exposure apparatus and a track apparatus interconnecting a plurality of processing modules with an associated track controller to control the track apparatus. The cluster system also comprises a wafer handling apparatus coupled to the exposure apparatus and track apparatus that is configured to transfer substrates between the processing modules utilized by the exposure apparatus and track apparatus and a wafer handling controller to control the wafer handling apparatus. The cluster system further comprises a cluster controller that communicates control information to at least one of the exposure controller, the track controller, and the wafer handling controller to manage operations of the exposure apparatus, the track apparatus, and the wafer handling apparatus during the lithographic fabrication process.

Abstract: A surveillance system is provided including a platform having a plurality and variety of cameras or sensors mounted thereto, and a base enclosure adapted to accommodate a power supply, a variety of electronics and other equipment for controlling and providing power to the surveillance equipment. The base is constructed to be tamper resistant and immovable by manual means. A substantially hollow support pole includes a lower portion detachably mounted to the base, and an upper portion mounted to the platform. Wires and cables for connecting the surveillance equipment with the electronics and power supply are run through the support pole. Power to the system may be supplied through existing power sources, for example a 120V power source.

Abstract: A pattern writing apparatus comprises a DMD for spatially modulating light from a light source and directing modulated light beams to a plurality of irradiation regions, respectively, which are arranged on a substrate two-dimensionally. A pattern is written by controlling the DMD while scanning the plurality of irradiation regions. The plurality of irradiation regions form a plurality of irradiation blocks arranged in a column direction, in each of which irradiation regions are arranged in a row direction. In DMD, writing signal is sequentially inputted to mirror blocks to be used out of a plurality of mirror blocks corresponding to the plurality of irradiation blocks, respectively. When writing a pattern, an operation part determines the number of mirror blocks to be used where scan speed can be maximized, in consideration of required time for input of the writing signal to the DMD and light amount applied on the substrate.

Abstract: A method and system are used to control a characteristic of a beam. The system comprises an illumination system, at least one optical element, a fluid source, and a pressure and/or fluid concentration controller. The illumination system produces a beam of radiation. The at least one optical element has at least one fluid path therethrough through which the beam passes and is capable of changing a characteristic of one or more portions of the beam. The fluid source supplies fluid to the at least one fluid path. The pressure and/or fluid concentration controller controls pressure and/or fluid concentration of the fluid to change the characteristic of the beam, which is positioned between the fluid source and the optical element.

Abstract: An apparatus for exposing a wafer to light. The apparatus includes a light source unit having a light source for emitting light, a first cooling unit for cooling the light source unit, in which the first cooling unit has a gas flowpassage for a gas passing through the light source unit, a second cooling unit for cooling the gas, in which the second cooling unit has a first fluid flowpassage for a first fluid which is to be heat-exchanged with the gas in the gas flowpassage at a position downstream of the light source unit with respect to the flow of the gas, and a first temperature adjusting unit for adjusting the temperature of the first fluid. The first temperature adjusting unit has a second fluid flowpassage for a second fluid which is to be heat-exchanged with the first fluid in the first fluid flowpassage at a position upstream of the cooling unit with respect to the flow of the first fluid.

Abstract: A stage device for positioning an object. The stage device includes a slider for holding the object, a driving section for driving the slider with respect to a base, wherein the slider is supported in a suspended state on the base by a static-pressure bearing and a pressurizing magnet, and a countering section for holding the driving section and canceling a reaction force that acts upon the driving section. The countering section is supported in a suspended state on the base by a static-pressure bearing and a pressurizing magnet. Also, the relation Fm=Fa+Fg is satisfied, wherein Fm represents the attraction force of the magnet, Fg the weight of the stage, and Fa the pressure produced by the static-pressure bearing.

Abstract: The present invention relates to a lithographic apparatus and a method of using the apparatus in the manufacture of a device such as an integrated circuit (IC). In particular, the present invention relates to a lithographic apparatus wherein iso-dense bias in a printed pattern on a substrate is capable of being controlled by using radiation with a spectral distribution comprising two or more spectral peaks.