Abstract: An illumination optical system that is used for an exposure apparatus that includes a mirror and exposes an object, illuminates a surface to be illuminated using light from a light source, and includes a filter member arranged at a position that substantially has a Fourier transform relationship with the surface to be illuminated, the filter member including a transmittance distribution preset to correct a non-uniformity of a transmittance distribution of the illumination optical system caused by the mirror.

Abstract: Exposure equipment adapted for use in the manufacture of semiconductor devices and a related control are disclosed. A wafer stage in the exposure equipment comprises an image sensor adapted to detect patterned light from the reticle. Image data corresponding to the detected patterned light is compared to reference image data to verify a state of overlay mismatch of reticle pattern accuracy prior to wafer exposure.

Abstract: A lithographic apparatus and method include an illumination system that supplies a beam of radiation, an array of individually controllable elements that pattern the beam, and a projection system that directs the patterned beam a substrate supported on a substrate table. The projection system defines a pupil. Either the pupil or the array of individually controllable elements is imaged onto a target portion of the substrate. The projection system includes an array of lenses with each lens in the array arranged to direct a respective part of the patterned beam onto a respective part of the target portion of the substrate. In one example, each of the individually controllable elements is selectively controllable to direct a respective part of the beam away from the pupil such that the proportion of the beam passing through the pupil is adjusted.

Abstract: A lithographic projection apparatus including an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, the patterning device configured to impart the beam with a pattern in its cross section, a substrate table configured to hold a substrate, a projection system configured to project the patterned radiation onto a target portion of the substrate, a plurality of level sensors for sensing a level of a substrate carried on the substrate table at a plurality of different positions, and a system for determining the position of the substrate table.

Abstract: Disclosed is an exposure apparatus having a specific structure that includes a cold trap plate for attracting contaminant substances which might cause a decrease of reflectance of a mirror when adhered thereto, and a radiation shield member for preventing excessive cooling of the mirror or the like by the cold trap plate.

Abstract: An optical imaging system is disclosed for selective thermal transfer of a material from a donor film to a substrate. The imaging system includes a light source assembly that is configured to emit a patterned light beam. The patterned light beam includes a plurality of discrete output light segments where the segments at most partially overlap. The imaging system further includes a light relay assembly that receives and projects the plurality of discrete output light segments onto a transfer plane so as to form a projected light segment by a substantial superposition of the plurality of discrete output light segments. When a donor film that includes a transferable material is placed proximate a substrate that lies in the transfer plane, the projected light segment is capable of inducing a transfer of the transferable material onto the substrate.

Abstract: A lithographic projection apparatus having a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder for holding a substrate the substrate holder provided with a device to provide a holding force for pressing the substrate against the substrate holder; a releasing structure constructed and arranged to eject the substrate from the holder against the holding force; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic projection apparatus may include a controller for controlling the releasing structure so as to release the substrate from the holder with a release force that is reduced prior to final release.

Abstract: An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece table that supports the work piece adjacent to the optical assembly. An environmental system is provided to supply and remove an immersion fluid from the gap between the optical assembly and the work piece on the stage assembly. After exposure of the work piece is complete, an exchange system removes the work piece and replaces it with a second work piece. An immersion fluid containment system maintains the immersion liquid in the gap during removal of the first work piece and replacement with the second work piece.

Abstract: Disclosed is an illumination optical system and an exposure apparatus having the same, and specifically, as an aspect of the invention, an illumination optical system for illuminating a surface to be illuminated, that includes an aperture stop for defining an effective light source distribution upon a predetermined plane which is substantially in a Fourier transform relation with the surface to be illuminated, and a detector disposed adjacent an opening of the aperture stop.

Abstract: An arrangement for adjusting the position on a substrate of a patterned beam generated by a light engine relative to the substrate. The arrangement moves an array of focusing elements, each of which focuses a portion of the patterned beam onto a point on the substrate, relative to an array of individually controllable elements to impart the pattern to the patterned beam.

Abstract: A stage apparatus includes a base, a stage movable on the base in first and second directions, a first member movable relative to the base in the first direction, and a second member movable relative to the base in the second direction. The first member is placed on the second member. With this arrangement, drive reaction-forces generated due to movement of the stage can be canceled by moving the first and second members, resulting in a smaller space needed for accommodating a canceling mechanism.

Abstract: An alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment marker. Detectors detect intensities in a pupil plane where Fourier transforms of the images are caused to interfere. The positional information is derived from the phase difference between diffraction orders of the two images which manifests as intensity variations in the interfered orders. Asymmetry can also be measured by measuring intensities at two positions either side of a diffraction order.

Abstract: A lithographic apparatus comprises an illumination system having optical elements capable of conditioning a radiation beam to comprise in cross-section a first portion of linearly polarized radiation and a second portion of unpolarized or circularly polarized radiation. The apparatus further comprises a support constructed to support a patterning device is provided, the patterning device being capable of imparting the illuminating radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table is provided to hold a substrate, whilst a projection system is provided and configured to project the patterned radiation beam onto a target portion of the substrate.

Abstract: A lithographic apparatus and device manufacturing method makes use of a high refractive index liquid confined in a reservoir 13 at least partly filling the imaging field between the final element of the projection lens and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection can be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal can be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and phase shifting ultrasonic standing-wave node patterns.

Abstract: An exposure apparatus having a projection optical system and configured to expose a substrate to light via a pattern of a mask and the projection optical system. The apparatus includes a chamber to hermetically contain at least part of the projection optical system, and a circulating system to send an inert gas to the chamber. A controller controls a temperature regulator on the basis of a target temperature in the chamber and a detection result of a temperature sensor. The controller changes the target temperature so that a timewise temperature gradient of the inert gas falls within an acceptable range. The acceptable range is determined so that a timewise change in pressure in the chamber caused by a timewise change in temperature of the inert gas is within an acceptable range.

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a support structure constructed to support a patterning structure. The patterning structure is adapted to pattern a beam of radiation according to a desired pattern. The apparatus also includes a substrate holder that is constructed to hold a substrate, a projection system that is constructed and arranged to project the patterned beam onto a target portion of the substrate, and a downstream radical source that is connected to a gas supply and is configured to provide a beam of radicals onto a surface to be cleaned.

Abstract: Exposure equipment useful in the manufacture of semiconductor devices and a related method of operation are disclosed. The exposure equipment directs light through a reticle and an optical system positioned above a wafer onto a target portion of the wafer, and the wafer is rapidly transferred under the directed light to irradiate substantially the entire surface of the wafer. Recursive compensation for undesired movement of the reticle and optical system caused by the rapid transfer of the wafer is provided.

Abstract: A purely refractive projection objective suitable for immersion micro-lithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with a negative refracting power, a second lens group with a positive refracting power, a third lens group with a negative refracting power, a fourth lens group with a positive refracting power and a fifth lens group with a positive refracting power are provided. The system aperture is in the region of maximum beam diameter between the fourth and the fifth lens group. Embodiments of projection objectives according to the invention achieve a very high numerical aperture of NA>1 in conjunction with a large image field, and are distinguished by a good optical correction state and moderate overall size. Pattern widths substantially below 100 nm can be resolved when immersion fluids are used between the projection objective and substrate in the case of operating wavelengths below 200 nm.

Abstract: A lithographic projection apparatus includes an illumination system having a reflective integrator with a rectangular cross-section. An optical element is provided to redistribute an intensity distribution exiting the reflective integrator.

Abstract: The projection system of a lithographic apparatus has a plurality of pupil planes and at least two irises provided in respective pupil planes each optimized to provide a high degree of NA uniformity over a respective NA range so that a high degree of NA uniformity can be provided over a wide range of NA settings.