Abstract: The photosensitive resin composition of the present invention is an excellent photosensitive resin composition: exhibiting significant transmissibility at the use of an exposure light source of 160 nm or less, more specifically F2 excimer laser light, where line edge roughness and development time dependence are small and a problem of footing formation is improved; and comprising a resin which decomposes by an action of acid to increase the solubility in alkali developer, in which the resin contains a specific repeat unit; a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation, in which the compound includes at least two kinds of compounds selected from the group consisting of specific compounds (B1), (B2), (B3) and (B4).

Abstract: An reimageable medium composed of: a substrate; and a photochromic material, wherein the medium is capable of exhibiting a color contrast and an absence of the color contrast, wherein the medium has a characteristic that when the medium exhibits the absence of the color contrast and is then exposed to an imaging light corresponding to a predetermined image to result in an exposed region and a non-exposed region, the color contrast is present between the exposed region and the non-exposed region to form a temporary image corresponding to the predetermined image that is visible for a visible time, wherein the medium has a characteristic that when the temporary image is exposed to an indoor ambient condition for an image erasing time, the color contrast changes to the absence of the color contrast to erase the temporary image in all of the following: (i) when the indoor ambient condition includes darkness at ambient temperature, (ii) when the indoor ambient condition includes indoor ambient light at ambient temp

Abstract: A method for making a photosensitive resin printing plate which comprises at least (1) the exposure step of forming a latent image in an aqueous-developable photosensitive resin layer of a printing plate material by irradiating the printing plate material with a ray of active light, (2) the development step of forming a relief image from the latent image by dissolving or dispersing the photosensitive resin layer that forms the latent image into a developer that contains water as a main component, and (3) the drying step of removing the developer from the printing plate having the relief image, the method being characterized in that a photosensitive resin layer component-dissolved or dispersed developer produced in the development step is subjected to a reduced pressure distillation, and is therefore reused as a developer, and a residue produced by the reduced pressure distillation is solidified.

Abstract: A reimageable medium for receiving an imaging light having a predetermined wavelength scope, the medium composed of: a substrate; a photochromic material capable of reversibly converting among a number of different forms, wherein one form has an absorption spectrum that overlaps with the predetermined wavelength scope; and a light absorbing material exhibiting a light absorption band with an absorption peak, wherein the light absorption band overlaps with the absorption spectrum of the one form.

Abstract: A positive resist composition comprising: (A1) a resin containing at least one type of repeating unit represented by the specific formula and additionally containing at least one type of repeating unit represented by the specific formula, which increases the solubility in an alkali developing solution by the action of an acid, and (B) a compound which is capable of generating an acid by the action of actinic ray or radiation.

Abstract: A positive resist composition comprising (A) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution and includes a specific repeating unit and (B) a compound that generates an acid upon irradiation of an actinic ray or radiation, and a pattern formation method using the positive resist composition.

Abstract: A negative-type photosensitive resin compositions containing an epoxy compound are provided. These compositions use poly(p-vinylphenol) as the base resin and have good development performance when using an aqueous developer, such as tetramethylammonium hydroxide solution.

Abstract: A positive resist composition comprising: (A) a fluorine atom-containing resin, wherein the resin comprises at least one group that increases a solubility of the resin in an alkali developer by the action of an acid; and (B) a sulfonium salt compound having a cation moiety, wherein the cation moiety contains at least one hydroxy group, and the sulfonium salt compound generates an acid upon irradiation with one of an actinic ray and a radiation.

Abstract: Compounds of the formulae I, II and III wherein R1 is for example hydrogen, C3–C8cycloalkyl, C1–C12alkyl, phenyl unsubstituted or substituted; R2 and R2? for example are hydrogen, C1–C20alkyl, C3–C8cycloalkyl or phenyl, unsubstituted or substituted, or are Ar1 is for example phenyl, optionally substituted by e.g. Ar2 is for example phenylene, optionally substituted e.g. by —(CO)R7, (D), (E) or (F); Ar3 is for example phenyl; M1, M2 and M3 are, for example, C1–C20alkylene; M4 is for example direct bond, —O—, —S—, —Y—(C1–C10alkylene)-Y?—, optionally substituted; Y and Y? are for example a direct bond or —O—; R7 is for example hydrogen, C1–C20alkyl or phenyl, optionally substituted; R8, R9, R8? and R9? are for example hydrogen or C1–C12alkyl, exhibit an unexpectedly good performance in photopolymerization reactions.

Abstract: There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for F2 laser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.

Abstract: A radiation-sensitive composition comprising: (A) a compound capable of generating an acid upon irradiation with one of actinic rays and radiation, and (B) a resin containing a repeating unit having a specific group, which increases the solubility in an alkali developing solution by the action of an acid.

Abstract: To provide a positive resist composition having high sensitivity, small defocus latitude depended on line pitch and less surface roughening at the etching, which can be suitably used for micro-photofabrication using far ultraviolet ray, particularly, ArF excimer laser ray. A positive resist composition comprising (A) a resin containing specific two kinds of repeating units, which has an aliphatic cyclic hydrocarbon group on the side chain and increases the dissolution rate in an alkali developer under the action of an acid, and (B) a specific compound capable of generating an acid upon irradiation with actinic rays or radiation, or a positive resist composition comprising (A) two kinds of resins as the resin having an aliphatic cyclic hydrocarbon group on the side chain and capable of increasing the dissolution rate in an alkali developer under the action of an acid, and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation.

Abstract: A resist material and a nanofabrication method provide high-resolution nanofabrication without an expensive irradiation apparatus using, for example, electron beams or ion beams. That is, the resist material and the nanofabrication method provide finer processing using exposure apparatuses currently in use. A resist layer of an incompletely oxidized transition metal such as W and Mo is selectively exposed and developed to be patterned in a predetermined form. The incompletely oxidized transition metal herein is a compound having an oxygen content slightly deviated to a lower content from the stoichiometric oxygen content corresponding to a possible valence of the transition metal. In other words, the compound has an oxygen content lower than the stoichiometric oxygen content corresponding to a possible valence of the transition metal.

Abstract: While the invention has been described in conjunction with the detailed description thereof, the foregoing description is intended to illustrate and not limit the scope of the invention, which is defined by the scope of the appended claims. Other aspects, advantages, and modifications are within the scope of the following claims.

Abstract: There is disclosed a polymer containing at least a repeating unit represented by the following general formula (1), and the resist composition containing the polymer as a base resin, especially a chemically amplified resist composition.

Abstract: A compound having a novel structure and a photo-sensitive composition comprising (i) the novel compound as a sensitizing dye, (ii) an activator compound generating at least one of a radical and an acid by interacting the activator compound with light absorption of the sensitizing dye to cause chemical change, and (iii) a compound changing its physical or chemical property irreversibly by a reaction with at least one of the radical and the acid.

Abstract: A resist exposure system and a method of forming a pattern on a resist are provided and include an exposure source, a photoresist composition, and a mask positioned therebetween. The resist composition comprises a first photoresist X and a second photoresist Y. The first photoresist X absorbs at a higher wavelength than the second photoresist Y. The second photoresist Y has a lower glass transitional temperature than the first photoresist X.

Abstract: A photosensitive material, suitable for image-wise recording, e.g., holographic recording of data or other information, comprises an organic species in an organic-inorganic matrix, the organic species comprising a material having a refractive index which changes upon exposure to actinic radiation. The organic-inorganic matrix may be an organically modified glass. The photo-sensitive material may be made using the sol-gel process.

Abstract: A positive-working resist composition comprising (A1) a resin containing a repeating unit represented by the specific general formula, wherein the resin increases the solubility in an alkali developing solution by the action of an acid.

Abstract: The present invention provides an imageable element including a substrate, a first layer applied to the substrate and a second layer applied to the first layer. The first layer may contain polymeric material and a radiation absorbing compound. The second layer may contain a hydroxyl group-containing polymer that includes a heat-labile moiety.