Patents Examined by Arthur P. Demers
  • Patent number: 4594179
    Abstract: In a radiation or high energy particle responsive system useful as a scintillator, and comprising,a first component which interacts with said radiation or high energy particle to emit photons in a certain first wavelength range; andat least one additional solute component which absorbs the photons in said first wavelength range and thereupon emits photons in another wavelength range higher than said first range;an improvement is provided wherein at least one of said components absorbs substantially no photons in said wavelength range in which it emits photons, due to a large Stokes shift caused by an excited state intramolecular rearrangement.
    Type: Grant
    Filed: August 1, 1984
    Date of Patent: June 10, 1986
    Assignee: The United States of America as represented by the United States Department of Energy
    Inventors: Larry A. Harrah, Clifford L. Renschler
  • Patent number: 4589874
    Abstract: An external male urinary drainage catheter combined with a collar for facilitating proper fitting of the catheter upon a patient, and the method of using such a catheter/collar combination, are disclosed. The catheter includes a cylindrical section rolled to form a torus that is supported by the collar prior to catheter application, a tapered neck section that extends through the open-ended collar, and an inner sleeve portion that is held in a stretched condition by the collar to help insure placement of the sleeve in sealing engagement with the glans of a patient's penis during the initial stage of catheter application.
    Type: Grant
    Filed: March 21, 1985
    Date of Patent: May 20, 1986
    Assignee: Hollister Incorporated
    Inventors: Kenneth E. Riedel, David L. Doerschner
  • Patent number: 4588490
    Abstract: A plasma sputter etching/deposition system comprising an electron-emitting hollow cathode arc-source combined with a conventional plasma sputter etching/deposition system such as a magnetron. The electrons emitted are coupled into the intrinsic high energy, e.g., magnetic field and are accelerated by the plasma potential and cause a significant increase plasma density. The resultant combination allows much greater sputtering/deposition efficiency than was possible with previous devices. According to a further aspect of the invention, switched operation is possible, whereby etching may vary from isotropic to anisotropic. A side discharge hollow cathode structure is also described for enhancing certain sputtering/deposition processes, wherein electrons may be emitted from one or more openings at the side of a hollow cathode chamber to achieve more uniform electron emission in a large process chamber.
    Type: Grant
    Filed: May 22, 1985
    Date of Patent: May 13, 1986
    Assignee: International Business Machines Corporation
    Inventors: Jerome J. Cuomo, Harold R. Kaufman, Stephen M. Rossnagel
  • Patent number: 4587036
    Abstract: An x-ray image storage screen for use in converting x-ray images into video pictures by the use of applied heat, such as a laser beam, has an active substance for the storage layer which is an alkaline earth-mixed halogen system having the formula BaF.sub.2 (Br, Cl):Eu:Sr, with barium fluoride (BaF.sub.2) comprising 0.6 mol, and the barium chloride (BaCl.sub.2) and the barium bromide (BaBr.sub.2) comprising the remaining 0.4 mol, preferably in equal portions, and wherein the activator europium (Eu) does not exceed 10.sup.-4 g-atom and the activator strontium (Sr) does not exceed 10.sup.-2 g-atom.
    Type: Grant
    Filed: November 21, 1984
    Date of Patent: May 6, 1986
    Assignee: Siemens Aktiengesellschaft
    Inventor: Heinz Degenhardt
  • Patent number: 4587002
    Abstract: Improved apparatus (10), including passage (22) for inter-cushion processing and transport of substrates (12) towards and from process modules (14) and (16) for main processing of said substrates (12) at non-atmospheric pressure in a series of successive process chambers (64), located in between successive processors/transporters (66), in which secondary processing and transport of said substrates (12) take place.
    Type: Grant
    Filed: May 21, 1985
    Date of Patent: May 6, 1986
    Inventor: Edward Bok
  • Patent number: 4584079
    Abstract: Disclosed is a method for tailoring the shape of a dielectric layer covering a step in a semiconductor device. The method comprises placing a semiconductor device comprising the step into a low pressure ionization chamber comprising a target electrode and a substrate electrode; connecting a sample of the dielectric to the target electrode; placing the semiconductor device comprising the step onto the substrate electrode; powering the target electrode and the substrate electrode with a radio frequency power having an electrical phase angle between the substrate electrode and the target electrode; and adjusting the electrical phase angle to obtain the desired shape of the dielectric layer covering the step.
    Type: Grant
    Filed: October 11, 1983
    Date of Patent: April 22, 1986
    Assignee: Honeywell Inc.
    Inventors: Eddie C. Lee, William H. Nunne
  • Patent number: 4584078
    Abstract: A method of producing fine particles with a particle size of submicron or finer which comprises the steps of:forming closely fine projections on a substrate surface, preferably by sputter-etching using an ionized gas; and thensputtering metallic or non-metallic materials onto the thus treated substrate in an inert gas or a mixed gas of an inert gas and a reactive gas, such as oxygen, the gas pressure of the inert gas or the mixed gas being in the range of from 1.times.10.sup.-4 torr to 1.times.10.sup.-1 torr, and thereby depositing the purposed fine particles in crystalline or amorphous form. The invention method can successfully provide fine particles with desired properties, for example, in size, shape and structure, by adjusting producing conditions or selection of substrate materials and the thus obtained fine particles are very useful in various applications with or without the substrate.
    Type: Grant
    Filed: August 1, 1984
    Date of Patent: April 22, 1986
    Assignees: Yukio Nakanouchi, Shigehiro Ohnuma, Tsuyoshi Masumoto, Research Development Corporation of Japan
    Inventors: Yukio Nakanouchi, Shigehiro Ohnuma, Tsuyoshi Masumoto
  • Patent number: 4582622
    Abstract: A magnetic particulate comprising gelatin, water-soluble polysaccharide, sodium polymetaphosphate and ferromagnetic substance, which is used as a carrier for immobilization of biological proteins such as antigens, antibodies or enzymes, and a process of producing the magnetic particulate.
    Type: Grant
    Filed: October 12, 1984
    Date of Patent: April 15, 1986
    Assignee: Fujirebio Kabushiki Kaisha
    Inventors: Mikio Ikeda, Shiro Sakamoto, Kazumasa Suzuki
  • Patent number: 4579638
    Abstract: A selective coating for insulating glass, having high color neutrality, high solar transmissivity, a low K-value and great stability, consists of an electrically conductive layer in which very small, transparent, non-conductive particles are embedded.
    Type: Grant
    Filed: October 25, 1983
    Date of Patent: April 1, 1986
    Assignee: Dornier System Gesellshaft mit beschreankter Haftung
    Inventor: Werner Scherber
  • Patent number: 4578213
    Abstract: A plastic scintillator comprises a polymethylpentene thermoplastic material containing a fluorescent additive. This plastic scintillator material functions at high temperatures with excellent optical properties in the detection of neutrons.
    Type: Grant
    Filed: April 27, 1984
    Date of Patent: March 25, 1986
    Assignee: Sangamo Weston, Inc.
    Inventor: John J. Simonetti
  • Patent number: 4576726
    Abstract: A magnetic coating composition comprising a modified polyurethane resin containing hydroxyl groups at a high concentration, a magnetic powder and, when required, a polyfunctional isocyanate compound.
    Type: Grant
    Filed: January 19, 1984
    Date of Patent: March 18, 1986
    Assignee: Toyo Tire & Rubber Company Limited
    Inventors: Masato Watanabe, Yuzo Ozaki
  • Patent number: 4576697
    Abstract: Carbon-containing intercalatable layered or lamellar transition metal chalcogenides having the general formula M.sub.n X.sub.2 C where M is a transition metal selected from the group consisting of Ti, V, Cr, Fe, Zr and Ta; X is sulfur; and n is 1-2; such as TiS.sub.2 C or Ti.sub.2 S.sub.2 C, usable as cathode active materials in alkali metal nonaqueous secondary batteries that can undergo alkali metal intercalation, are synthesized by ion implanting a substrate of the transition metal with sulfur and then carbon at implantation energies in the range of about 150-200 kiloelectron volts and at saturation dosages of 1.times.10.sup.12 to 1.times.10.sup.19 sulfur and carbon atoms/cm.sup.2.
    Type: Grant
    Filed: April 21, 1983
    Date of Patent: March 18, 1986
    Assignee: Combustion Engineering, Inc.
    Inventor: David N. Palmer
  • Patent number: 4576700
    Abstract: A magnetic recording medium conventionally utilizes the in-plane magnetization mode, but recently the perpendicular magnetization mode utilizing the perpendicular anisotropy of an hcp cobalt alloy layer, in which the C axis is oriented perpendicular to the layer surface, has been proposed. The known perpendicular magnetic recording medium is produced by means of RF sputtering and comprises a Permalloy layer, as layer of a low coercive-force material, between the nonmagnetic base and the hcp cobalt alloy layer. The perpendicular anisotropy attained by the present invention in very excellent and is superior to that of a perpendicular recording medium having no Permalloy layer because a Co-Ta alloy is used as the layer of a low coercive-force material.
    Type: Grant
    Filed: February 16, 1983
    Date of Patent: March 18, 1986
    Assignee: Teijin Limited
    Inventors: Sadao Kadokura, Kazuhiko Honjo, Takashi Tomie, Masahiko Naoe
  • Patent number: 4575408
    Abstract: Improved apparatus (10), including passage (22) for inter-cushion processing and transport of substrates (12) towards and from process modules (14) and (16) for main processing of said substrates (12) at non-atmospheric pressure in a series of successive process chambers (64), located in between successive processors/transporters (66), in which secondary processing and transport of said substrates (12) take place.
    Type: Grant
    Filed: March 19, 1984
    Date of Patent: March 11, 1986
    Inventor: Edward Bok
  • Patent number: 4571256
    Abstract: A nitrogen fertilizer manifesting fungicidal property against Pathogenic fungi contains as its effective component a water soluble initial condensation product prepared by causing formaldehyde to react with urea. The fertilizer may be admixed with one or more of other fertilizers of various types.
    Type: Grant
    Filed: May 14, 1985
    Date of Patent: February 18, 1986
    Assignee: Kabushiki Kaisha Kyoritsu Yuki Kogyo Kenkyusho
    Inventors: Shigeki Takagi, Yumiko Urayama
  • Patent number: 4569746
    Abstract: A magnetron sputter device includes separate first and second targets over which first and second discharges are formed by separate ionizing electric fields and separate confining magnetic fields. The separate confining magnetic fields include first and second magnetic circuits through the first and second targets, respectively. The first magnetic circuit includes first and second pole pieces for coupling magnetic flux from a first magnetic field source to the first target. The second magnetic circuit includes the second pole piece and a third pole piece for coupling magnetic flux from a second magnetic field source to the second target. The magnetic circuits and the magnetic field sources are arranged so that magnetic fluxes from the first and second magnetic field sources combine in the second pole piece.
    Type: Grant
    Filed: May 17, 1984
    Date of Patent: February 11, 1986
    Assignee: Varian Associates, Inc.
    Inventor: Martin A. Hutchinson
  • Patent number: 4569745
    Abstract: A sputtering apparatus having a vacuum treatment chamber, a backing plate arranged within the chamber, a sputtering target secured to the backing plate, evacuation means and a voltage source for applying a voltage to the sputtering target. The peripheral portion of the backing plate adjacent to the sputtering target is covered with a material having a high heat resistance temperature and excellent electrical insulating properties or the same material as the material of the sputtering target. The peripheral edge of the sputtering target can also be made larger than the peripheral edge of the backing plate so that the peripheral portion of the backing plate adjacent to the sputtering target is covered with or hidden by the sputtering target. In this sputtering apparatus, at least the peripheral portion of the backing plate adjacent to the sputtering target is not sputtered, and therefore, a metal film formed on a substrate by sputtering is not contaminated and this metal film is, therefore, easily dry-etched.
    Type: Grant
    Filed: October 5, 1983
    Date of Patent: February 11, 1986
    Assignee: Fujitsu Limited
    Inventor: Setsuo Nagashima
  • Patent number: 4569742
    Abstract: Radio frequency sputtering of silicon and chromium alloy targets in a nitrogen and argon atmosphere while applying an electrical bias to the substrate produces an electrically resitive thin film on said substrate.
    Type: Grant
    Filed: May 31, 1984
    Date of Patent: February 11, 1986
    Assignee: Honeywell Inc.
    Inventor: James A. Schuetz
  • Patent number: 4560456
    Abstract: Magnetic recording media comprise a non-magnetic base and one or more magnetic layers consisting of an organic binder matrix containing finely divided magnetic material, the said matrix being obtained by electron beam curing of a mixture of from 70 to 90% by weight of a polyurethane acrylate polymer possessing polymerizable double bonds and from 10 to 30% by weight of one or more copolymerizable compounds.
    Type: Grant
    Filed: September 10, 1984
    Date of Patent: December 24, 1985
    Assignee: BASF Aktiengesellschaft
    Inventors: Guenter Heil, Werner Lenz, Jenoe Kovacs, Werner Grau, Werner Balz
  • Patent number: 4560462
    Abstract: Apparatus for depositing a coating (such as a burnable absorber) on nuclear fuel pellets. Pallets 16 hold a single layer of fuel pellets 22 between lower and upper screened parts 18 and 20. A rotating drum 14 holds the pallets 16 on its circumference. A chamber 12 encloses the drum 14. A sputtering machine 24 has stationary, sputter-frangible, upper and lower targets (such as zirconium diboride) 26 and 28. The stationary upper targets 26 are placed inside the drum's circumference above its longitudinal axis and are pointed facing generally upward and radially outward. The stationary lower targets 28 are placed outside the drum's circumference below its longitudinal axis and are pointed facing generally upward and radially inward. The target material is sputtered onto the fuel pellets 22 as the pallets 16 on the drum 14 rotate past.
    Type: Grant
    Filed: June 22, 1984
    Date of Patent: December 24, 1985
    Assignee: Westinghouse Electric Corp.
    Inventors: Kenneth C. Radford, Herbert W. Keller, Beryl H. Parks, Robert R. Fuller