Abstract: A HVJT structure of HVIC includes P-type substrate. Epitaxial layer is formed on the substrate. N-type doped structure is formed in the epitaxial layer, contacting with the substrate. P-type doped structure is in the N-type doped structure connecting with anode. The substrate, the N-type doped structure and the P-type doped structure form a PNP path along a perpendicular direction to the substrate, wherein NP provide bootstrap diode function and surround the high-side circuit at a horizontal direction. N-type cathode structure is in the epitaxial layer. N-type epitaxial doped region contacts with the substrate, between the PNP path and the N-type cathode structure, also surrounding the high-side circuit. Gate structure is over the N-type epitaxial doped region, between the P-type doped structure and N-type cathode structure. P-type base doped structure is in the epitaxial layer adjacent to the N-type doped structure, to provide a substrate voltage to the substrate.

Abstract: An integrated circuit having a vertical transistor includes first through fourth gate lines extending in a first direction and sequentially arranged in parallel with each other, a first top active region over the first through third gate lines and insulated from the second gate line, and a second top active region. The first top active region forms first and third transistors with the first and third gate lines respectively. The second top active region is over the second through fourth gate lines and insulated from the third gate line. The second top active region forms second and fourth transistors with the second and fourth gate lines respectively.

Abstract: A process for fabricating a circuit substrate is provided. A dielectric layer is formed to cover a surface of a circuit stack and a patterned conductive layer, and has bonding openings exposing bonding segments of traces of the patterned conductive layer, and has plating openings exposing plating segments of the traces. A plating seed layer is formed to cover the surface of the circuit stack, the bonding segments, the plating segments, and the dielectric layer. A mask is formed to cover the plating layer and has mask openings exposing portions of the plating seed layer on the bonding segments. Portions of the plating seed layer on the bonding segments are removed with use of the mask as an etching mask. A thickening conductive layer is plated on each of the bonding segments with use of the mask as a plating mask. The mask and the plating seed layer are removed.

Abstract: A memory device includes gate electrode layers stacked on an upper surface of a substrate and each including a plurality of unit electrodes extending in a first direction, and a plurality of connecting electrodes connecting the unit electrodes to each other. The memory device also includes channel structures extending through the gate electrode layers in a direction perpendicular to the upper surface of the substrate, first common source lines extending in the first direction and interposed between the unit electrodes, and second common source lines extending in the first direction between the first common source lines and each having a first line and a second line separated from each other in the first direction by the connecting electrodes.

Abstract: The disclosure provides a hybrid CMOS device and a manufacturing method thereof. The manufacturing method of the hybrid CMOS device according to the disclosure uses a low-temperature polysilicon to prepare an active layer of a PMOS transistor, and simultaneously uses a metal oxide semiconductor to prepare an active layer of an NMOS transistor. The two types of semiconductor materials are used in combination to form a hybrid CMOS device. Compared with the existing method for producing an active layer of the PMOS transistor by using a two-dimensional carbon nanotransister material or an organic semiconductor material, the hybrid CMOS device obtained according to the disclosure has superior electrical properties.

Abstract: A semiconductor device includes a substrate having a first conductive type. An epitaxial layer having a second conductive type is disposed on the substrate. A first buried layer of the second conductive type is disposed within a high side region of the substrate. A second buried layer of the second conductive type is disposed directly above the first buried layer of the second conductive type. A top surface of the first buried layer of the second conductive type and a top surface of the second buried layer of the second conductive type are apart from a top surface of the epitaxial layer by different distances. A dopant concentration of the first buried layer of the second conductive type is less than that of the second buried layer of the second conductive type.

Abstract: An insulating gate semiconductor device includes an insulating gate semiconductor element, an insulating circuit board, and a main-current path member. A main-current of the insulating gate semiconductor element flows toward a first external terminal in the main-current path member; and a gate-current path member, being patterned so as to have a linearly extending portion arranged in parallel to a linearly extending portion of the main-current path member in a planar pattern on the insulating circuit board, being provided to connect between a second external terminal and a gate electrode of the insulating gate semiconductor element. A current which is induced in the gate-current path member by mutual induction caused by a change in magnetic field implemented by the main-current is used for increasing the gate-current in a turn-on period of the insulating gate semiconductor element.

Abstract: An embodiment is an apparatus. The apparatus includes: a collective wafer platter including a plurality of individual wafer pockets, the individual wafer pockets having respective individual wafer platters, the individual wafer platters configured to rotate around respective first axes, the collective wafer platter configured to rotate around a second axis; a motor coupled to the collective wafer platter; and a control unit configured to control the motor such that the individual wafer platters rotate around the respective first axes, and the collective wafer platter rotates around the second axis.

Abstract: A FinFET device structure and method for forming the same are provided. The FinFET device structure includes a first fin structure extending above a substrate, and the first fin structure includes a portion made of silicon germanium (SiGe). The FinFET device structure includes a second fin structure adjacent to the first fin structure. The FinFET device structure also includes a first liner layer formed on the outer sidewall surface of the first fin structure and a second liner layer formed on the inner sidewall surface of the first fin structure. The FinFET device structure further includes a first isolation structure formed on the substrate, and the first liner layer is between the first isolation structure and the first fin structure, and a top surface of the second liner layer is higher than a top surface of the first liner layer.

Abstract: A smart window controller includes circuitry configured to establish a representative model of one or more building zones based on occupancy, construction, lighting, or cooling properties of a building. A lighting control strategy is implemented for the one or more building zones based on the representative model or one or more user preferences input at a first user interface screen of an external device. Automatic operations of one or more smart windows, cooling systems, or artificial lighting systems are controlled based on trigger points associated with the lighting control strategy, and a performance level of the lighting control strategy for the one or more building zones is determined based on one or more predetermined financial metrics.

Abstract: A smart window controller includes circuitry configured to establish a representative model of one or more building zones based on occupancy, construction, lighting, or cooling properties of a building. A lighting control strategy is implemented for the one or more building zones based on the representative model or one or more user preferences input at a first user interface screen of an external device. Automatic operations of one or more smart windows, cooling systems, or artificial lighting systems are controlled based on trigger points associated with the lighting control strategy, and a performance level of the lighting control strategy for the one or more building zones is determined based on one or more predetermined financial metrics.

Abstract: A semiconductor device includes a gate assembly disposed on a device isolation layer, a gate spacer disposed on a side surface of the gate assembly, a contact assembly disposed on the gate spacer, an air gap disposed between the device isolation layer and the contact assembly, and a first spacer capping layer disposed between the gate spacer and the air gap. The first spacer capping layer has an etch selectivity with respect to the gate spacer.

Abstract: A method and an apparatus for detecting and correcting a spatial position of a workpiece held in a positioning device, wherein a machining head having at least one sensor and position sensor is fed into at least one measuring position. Contactless sensing of an actual position of a measuring point of the workpiece is carried out at the measuring position using the machining head and the sensed actual position is compared with an expected nominal position and deviation values between the actual position and the nominal position are ascertained. The ascertained deviation values are compared with an admissible tolerance value and the machining head is fed to a contour when the ascertained deviation is within the admissible tolerance value, or the machining head and the workpiece are oriented with respect to one another and to the contour such that a deviation of the actual position is within the admissible tolerance values following orientation.

Abstract: A system for surgical planning and assessment of spinal deformity correction is provided that has a spinal imaging system and a control unit. The spinal imaging system is configured to collect at least one digitized position of one or more vertebral bodies of a subject. The control unit is configured to receive the at least one digitized position, and calculate, based on the at least one digitized position, an optimized posture for the subject. The control unit is configured to receive one or more simulated spinal correction inputs, and based on the inputs and optimized posture, predict an optimal simulated postoperative surgical correction.

Abstract: Systems and methods for improved chip device performance are discussed herein. An exemplary chip device for use in an integrated circuit comprises a bottom and a top opposite the bottom. The chip device comprises a through-chip device interconnect and a clearance region. The through-chip device interconnect is configured to provide an electrical connection between a ground plane trace on the bottom and a chip device path on the top of the chip device. The clearance region on the bottom of the chip device comprises an electrically conductive substance. The size and shape of the clearance region assist in impedance matching. The chip device path on the top of the chip device may further comprise at least one tuning stub. The size and shape of the at least one tuning stub also assist in impedance matching.

Abstract: A semiconductor device includes: a plurality of first wires formed in a first layer and indicating fixed potentials; and an inductor formed in a second layer stacked on the first layer, and wiring widths of the first wires located within a range of a formation region of the inductor in a plan view among the plurality of first wires are formed narrower than wiring widths of the first wires located outside the range of the formation region of the inductor.

Abstract: Methods and precursors for depositing silicon nitride films by atomic layer deposition (ALD) are provided. In some embodiments the silicon precursors comprise an iodine ligand. The silicon nitride films may have a relatively uniform etch rate for both vertical and the horizontal portions when deposited onto three-dimensional structures such as FinFETS or other types of multiple gate FETs. In some embodiments, various silicon nitride films of the present disclosure have an etch rate of less than half the thermal oxide removal rate with diluted HF (0.5%).

Abstract: A method for manufacturing a semiconductor device includes forming a stacked configuration of first and second semiconductor layers on a semiconductor substrate, wherein the stacked configuration comprises a repeating arrangement of a second semiconductor layer stacked on a first semiconductor layer, forming a plurality of dummy gates spaced apart from each other on the stacked configuration, wherein the plurality of dummy gates cover a portion of the stacked configuration in a channel region, performing an implantation of a semiconductor material on exposed portions of the stacked configuration in a source/drain region, wherein the implantation increases a concentration of the semiconductor material in the exposed portions of the stacked configuration, and selectively removing first semiconductor layers having an increased concentration of the semiconductor material from the source/drain region, wherein the removed first semiconductor layers correspond in position to the first semiconductor layers in the cha

Abstract: A smart window controller includes circuitry configured to establish a representative model of one or more building zones based on occupancy, construction, lighting, or cooling properties of a building. A lighting control strategy is implemented for the one or more building zones based on the representative model or one or more user preferences input at a first user interface screen of an external device. Automatic operations of one or more smart windows, cooling systems, or artificial lighting systems are controlled based on trigger points associated with the lighting control strategy, and a performance level of the lighting control strategy for the one or more building zones is determined based on one or more predetermined financial metrics.

Abstract: Methods and precursors for depositing silicon nitride films by atomic layer deposition (ALD) are provided. In some embodiments the silicon precursors comprise an iodine ligand. The silicon nitride films may have a relatively uniform etch rate for both vertical and the horizontal portions when deposited onto three-dimensional structures such as FinFETS or other types of multiple gate FETs. In some embodiments, various silicon nitride films of the present disclosure have an etch rate of less than half the thermal oxide removal rate with diluted HF (0.5%).