Abstract: Interconnect structures and methods for forming the interconnect structures generally include forming a dielectric layer over a substrate. The dielectric layer includes a dielectric layer top surface. A metal line is formed in the dielectric layer. The metal line includes a sacrificial upper region and a lower region. The sacrificial upper region is formed separately from the lower region and the lower region includes a lower region top surface positioned below the dielectric layer top surface. The sacrificial upper region is removed, thereby exposing the lower region top surface and forming a trench defined by the lower region top surface and sidewalls of the dielectric layer. An interconnect structure is deposited such that at least a portion of the interconnect structure fills the trench, thereby defining a fully aligned top via.

Abstract: In described examples, an integrated circuit includes a leadframe structure, which includes electrical conductors. A first coil structure is electrically connected to a first pair of the electrical conductors of the leadframe structure. The first coil structure is partially formed on a semiconductor die structure. A second coil structure is electrically connected to a second pair of the electrical conductors of the leadframe structure. The second coil structure is partially formed on the semiconductor die structure. A molded package structure encloses portions of the leadframe structure. The molded package structure exposes portions of the first and second pairs of the electrical conductors to allow external connection to the first and second coil structures. The molded package structure includes a cavity to magnetically couple portions of the first and second coil structures.

Abstract: A semiconductor package including a semiconductor chip, a conductive element disposed aside the semiconductor chip, a conductive via disposed on and electrically connected to the conductive element, an insulating encapsulation, and a first circuit structure disposed on the semiconductor chip and the conductive via is provided. A height of the conductive element is less than a height of the semiconductor chip. The insulating encapsulation encapsulates the semiconductor chip, the conductive element, and the conductive via. The conductive via is located between the first circuit structure and the conductive element, and the semiconductor chip is electrically coupled to the conductive via through the first circuit structure.

Abstract: The method of manufacturing a light emitting device includes: providing a light-transmissive member; providing light emitting elements each having a primary light emission surface and an electrode formation surface; bonding the light emitting elements to a base member such that the electrode formation surfaces face an upper surface of the base member; disposing a generally flat layer of a light-transmissive bonding member on an upper surface of the light-transmissive member; disposing the light emitting elements on the light-transmissive member such that the primary light emission surfaces face the upper surface of the light-transmissive member via the bonding member; disposing a part of the bonding member on a lateral surface of each of the light emitting elements; removing a part of the light-transmissive member to form a groove between the light emitting elements; forming a light-reflective member at least in the groove; and cutting the light-reflective member.

Abstract: A classifier circuit includes an array of dual gate graphene transistors, each of the transistors having a source, a top gate receiving one of an input voltage to be evaluated or a reference voltage, a bottom or embedded gate receiving the other of the input voltage or reference voltage and a drain, the source and drain contacting a graphene channel One of the source and the drain is connected to a voltage source. A common output combines output current of a plurality of the dual gate graphene transistors, which current varies in response to the difference between the input voltage and the reference voltage. A method for forming a classifier transistor with high remanent polarization forms dielectric with ferroelectric capability on a low resistivity substrate. A non-ferroelectric oxide layer is formed on the dielectric. A window is opened, and a graphene channel is formed in the window.

Abstract: The present disclosure provides a semiconductor structure and a method for preparing the semiconductor structure. The semiconductor device structure includes a conductive structure disposed over a semiconductor substrate, and a conductive plug disposed over the conductive structure. The conductive plug is electrically connected to the conductive structure. The semiconductor device structure also includes a first spacer formed on a sidewall surface of the conductive plug, and an etch stop layer disposed over the semiconductor substrate. The etch stop layer adjoins the first spacer. The semiconductor device further includes a first inter-layer dielectric (ILD) layer disposed over the etch stop layer and next to the conductive plug, wherein the first ILD layer is separated from the first spacer by an air gap.

Abstract: A packaged semiconductor device includes a carrier having a die attach surface, a semiconductor die mounted on the die attach surface and comprising first and second conductive terminals disposed on an upper side, a first clip that extends over the semiconductor die and is electrically connected to the first conductive terminal, a second clip that extends over the semiconductor die and is electrically connected to the second conductive terminal, and an electrically insulating encapsulant body that encapsulates the semiconductor die. An outer end of the first clip is exposed from the encapsulant body and provides a point of external electrical contact for the first conductive terminal. An outer end of the second clip is exposed from the same or a different side face of the encapsulant body as the first clip and provides a point of external electrical contact for the second conductive terminal.

Abstract: A micro LED display panel which is transparent to ambient light includes a TFT substrate, a plurality of micro LEDs, a first insulating layer, and a second insulating layer. The TFT substrate includes a first surface and a second surface. The micro LEDs and the first insulating layer are on the first surface. The first insulating layer is transparent. The second insulating layer includes insulating units spaced from each other and made of a light absorbing material. Each insulating unit is on a side of the first insulating layer away from the TFT substrate and each micro LED is embedded in the first insulating layer and in one of insulating units. Regions of the TFT substrate not covered by the insulating layer are regions which allow light to pass through.

Abstract: A method of forming an article, including: inserting a conductive material within a via a wafer, wherein the conductive material comprises a first alloy comprising a first metal and a second metal; and contacting the conductive material with a solution comprising ions of a third metal, wherein the ions of the third metal galvanically displace a portion of the second metal from the first alloy to form a second alloy with the first metal.

Abstract: A display apparatus includes a base substrate, a thin film transistor layer on the base substrate, an insulation layer on the thin film transistor layer, a first electrode on the insulation layer and in a light emitting area, a pixel defining layer having an opening that has a size and a shape substantially same as that of the first electrode, and on the insulation layer, a light emitting layer on the first electrode, and a second electrode on the light emitting layer.

Abstract: A method of fabricating a semiconductor package may include forming a lower redistribution layer, forming a stack on a portion of the lower redistribution layer, and stacking a semiconductor chip on a top surface of the lower redistribution layer. The forming of the stack may include coating a photo imagable dielectric material to form a first insulating layer on the top surface of the lower redistribution layer, forming a first via to penetrate the first insulating layer, coating a photo imagable dielectric material to form a second insulating layer on a top surface of the first insulating layer, and forming a second via to penetrate the second insulating layer.

Abstract: An electronic device, e.g. integrated circuit, has an n-type region and a p-type region located within a semiconductor substrate, the n-type region and the p-type region each intersecting the substrate surface. A dielectric structure is located directly on the substrate surface. The dielectric structure has first and second laterally opposed sides, with the first side located over the n-type region and the second side located over the p-type region.

Abstract: A packaged semiconductor includes an electrically insulating encapsulant body having an upper surface, a first semiconductor die encapsulated within the encapsulant body, the first semiconductor die having a main surface with a first conductive pad that faces the upper surface of the encapsulant body, a second semiconductor die encapsulated within the encapsulant body and disposed laterally side by side with the first semiconductor die, the second semiconductor die having a main surface with a second conductive pad that faces the upper surface of the encapsulant body, and a first conductive track that is formed in the upper surface of the encapsulant body and electrically connects the first conductive pad to the second conductive pad. The encapsulant body includes a laser activatable mold compound.

Abstract: A semiconductor device includes a first substrate having an attaching surface on which first electrodes and a first insulating film are exposed, an insulating thin film that covers the attaching surface of the first substrate, and a second substrate which has an attaching surface on which second electrodes and a second insulating film are exposed and is attached to the first substrate in a state in which the attaching surface of the second substrate and the attaching surface of the first substrate are attached together sandwiching the insulating thin film therebetween, and the first electrodes and the second electrodes deform and break a part of the insulating thin film so as to be directly electrically connected to each other.

Abstract: A memory die including a three-dimensional array of memory elements and a logic die including a peripheral circuitry that support operation of the three-dimensional array of memory elements can be bonded by die-to-die bonding to provide a bonded assembly. External bonding pads for the bonded assembly can be provided by forming recess regions through the memory die or through the logic die to physically expose metal interconnect structures within interconnect-level dielectric layers. The external bonding pads can include, or can be formed upon, a physically exposed subset of the metal interconnect structures. Alternatively or additionally, laterally-insulated external connection via structures can be formed through the bonded assembly to multiple levels of the metal interconnect structures. Further, through-dielectric external connection via structures extending through a stepped dielectric material portion of the memory die can be physically exposed, and external bonding pads can be formed thereupon.

Abstract: A semiconductor package includes a die pad having a die attach surface, a rear surface opposite the die attach surface, and an outer edge side extending between the die attach surface and the rear surface, the outer edge side having a step-shaped profile, wherein an upper section of the die pad laterally overhangs past a lower section of the die pad, a semiconductor die mounted on the die attach surface and having a first electrical terminal on an upper surface of the semiconductor die, and a first conductive clip that directly electrically contacts the first electrical terminal and wraps around the outer edge side of the die pad such that a section of the first conductive clip is at least partially within an area that is directly below the upper section of the die pad and directly laterally adjacent to the lower section.

Abstract: A plurality of high-k metal gate (HKMG) structures is formed over a substrate. The (HKMG) structures are separated by a plurality of gaps. The HKMG structures each include a first dielectric layer at an upper surface of the HKMG structure. The gaps are filled with a first conductive material. A portion of the first conductive material is removed in each of the gaps through an etching-back process. A metal oxide layer is formed using a spin-on deposition process. The metal oxide layer is formed over the (HKMG) structures and over the first conductive material. A second dielectric layer is formed over the metal oxide layer. An opening is etched in the second dielectric layer. The opening is etched through the second dielectric layer and through the metal oxide layer. The opening is filled with a second conductive material.

Abstract: According to one embodiment, a display device includes an insulating substrate, a first insulating film, terminal portions and a pattern. The first insulating film covers the insulating substrate. The terminal portions are disposed on the first insulating film. The pattern is between the insulating substrate and the first insulating film. The pattern is formed by a semiconductor or a light-shielding material, and the pattern is covered with the first insulating film. The pattern is located just under a first terminal and a second terminal of the terminal portions.

Abstract: The present disclosure is directed to a method for the formation of resistive random-access memory (RRAM) structures with a low profile between or within metallization layers. For example, the method includes forming, on a substrate, a first metallization layer with conductive structures and a first dielectric layer abutting sidewall surfaces of the conductive structures; etching a portion of the first dielectric layer to expose a portion of the sidewall surfaces of the conductive structures; depositing a memory stack on the first metallization layer, the exposed portion of the sidewall surfaces, and a top surface of the conductive structures; patterning the memory stack to form a memory structure that covers the exposed portion of the sidewall surfaces and the top surface of the conductive structures; depositing a second dielectric layer to encapsulate the memory stack; and forming a second metallization layer on the second dielectric layer.

Abstract: An electronic device, e.g. an integrated circuit, is formed on a P-type lightly-doped semiconductor substrate having an N-type buried layer. First and second N-wells extend from a surface of the substrate to the buried layer. A first NSD region is located within the first N-well, and a second NSD region is located within the second N-well. A PSD region extends from the substrate surface into the substrate and is located between the first and second NSD regions. A P-type lightly-doped portion of the substrate is located between the N-well and the substrate surface and between the PSD region and the first and second NSD regions.