Patents Examined by David A. Vanore
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Patent number: 11815479Abstract: The invention relates to a method of, and apparatus for, examining a sample using a charged particle beam apparatus. The method as defined herein comprises the step of detecting, using a first detector, emissions of a first type from the sample in response to the charged particle beam illuminating the sample. The method further comprises the step of acquiring spectral information on emissions of a second type from the sample in response to the charged particle beam illuminating the sample. As defined herein, said step of acquiring spectral information comprises the steps of providing a spectral information prediction algorithm and using said algorithm for predicting said spectral information based on detected emissions of the first type as an input parameter of said algorithm. With this it is possible to gather EDS data using only a BSE detector.Type: GrantFiled: August 31, 2021Date of Patent: November 14, 2023Assignee: FEI CompanyInventors: Oleksii Kaplenko, Ond{hacek over (r)}ej Machek, Tomá{hacek over (s)} Vystav{hacek over (e)}l, Jan Klusá{hacek over (c)}ek, Kristýna Bukvi{hacek over (s)}ová, Mykola Kaplenko
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Patent number: 11815706Abstract: Provided are a method of manufacturing an optical element in which an optically-anisotropic layer having a small amount of in-plane unevenness can be prepared, and an optical element.Type: GrantFiled: January 26, 2021Date of Patent: November 14, 2023Assignee: FUJIFILM CorporationInventors: Hiroshi Sato, Yukito Saitoh
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Patent number: 11812834Abstract: Disclosed is an ultraviolet (UV) curing apparatus for nail art, which is configured to focus-irradiate UV light to a curing material coated on fingernails or toenails and to quickly cure the curing material. The disclosed UV curing apparatus comprises: a housing having a receiving space in which user's fingernails or toenails are received; a light source, installed in the housing, for irradiating UV light rays; an optical module provided with a focusing lens for focusing the light rays irradiated from the light source to a target position in the receiving space; and a scanning unit, installed in the housing, for driving the optical module to be capable of reciprocating within the housing in one scanning direction, to allow the target position to move to the entire region of user's fingernails or toenails received in the receiving space.Type: GrantFiled: March 26, 2021Date of Patent: November 14, 2023Inventor: Jae In Seo
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Patent number: 11813482Abstract: The present invention relates to advanced Cherenkov-based imaging systems, tools, and methods of feedback control, temporal control sequence image capture, and quantification in high resolution dose images. In particular, the present invention provides a system and method for simple, accurate, quick, robust, real-time, water-equivalent characterization of beams from LINACs and other systems producing external-therapy radiation for purposes including optimization, commissioning, routine quality auditing, R&D, and manufacture. The present invention also provides a system and method for rapid and economic characterization of complex radiation treatment plans prior to patient exposure. Further, the present invention also provides a system and method of economically detecting Cherenkov radiation emitted by tissue and other media in real-world clinical settings (e.g., settings illuminated by visible light).Type: GrantFiled: January 24, 2022Date of Patent: November 14, 2023Assignee: DoseOptics LLCInventors: Venkataramanan Krishnaswamy, Brian W. Pogue
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Patent number: 11808930Abstract: An objective lens for forming an image of an object. The objective lens includes, sequentially from an image side to an object side, a first lens group having negative refractive power, and a second lens group having positive refractive power.Type: GrantFiled: September 25, 2018Date of Patent: November 7, 2023Assignee: ASML Netherlands B.V.Inventors: Jian Zhang, Zhiwen Kang, Yixiang Wang
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Patent number: 11808784Abstract: The invention relates to the field of localized surface analysis, characterization and modification by electrochemistry. It particularly relates to a portable electrochemical microscopy device, to kits comprising such a portable device, and to uses of the portable device and kits. According to the invention, the portable device comprises: a body having a gripping surface for a user and a bearing surface that can be applied to a surface of a substrate to be analyzed; an electrolytic chamber formed in the body and arranged so as to receive an electrolyte, the electrolytic chamber comprising an opening leading to the bearing surface; and a working probe having a distal end arranged in the electrolytic chamber.Type: GrantFiled: July 5, 2019Date of Patent: November 7, 2023Assignees: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES, CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUEInventors: Gaëlle Charrier, Aurélien Doublet, Guy Deniau, Renaud Cornut
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Patent number: 11810751Abstract: The disclosure relates to a method of imaging a specimen using a transmission charged particle microscope, said method comprising providing a specimen, and providing a charged particle beam and directing said charged particle beam onto said specimen for generating a flux of charged particles transmitted through the specimen. The method comprises the step of generating and recording a first energy filtered flux of charged particles transmitted through the specimen, wherein said first energy filtered flux of charged particles substantially consists of non-scattered and elastically scattered charged particles. The method as disclosed herein comprises the further step of generating and recording a second energy filtered flux of charged particles transmitted through the specimen, wherein said second energy filtered flux of charged particles substantially consists of inelastically scattered charged particles.Type: GrantFiled: June 22, 2021Date of Patent: November 7, 2023Assignee: FEI CompanyInventors: Peter Tiemeijer, Evgeniia Pechnikova, Rudolf Geurink, Abhay Kotecha, Jamie McCormack
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Patent number: 11810753Abstract: A method of determining aberrations of a charged particle beam (11) focused by a focusing lens (120) toward a sample (10) in a charged particle beam system is described. The method includes: (a) taking one or more images of the sample at one or more defocus settings to provide one or more taken images (h1...N); (b) simulating one or more images of the sample taken at the one or more defocus settings based on a set of beam aberration coefficients (iC) and a focus image of the sample to provide one or more simulated images; (c) comparing the one or more taken images and the one or more simulated images for determining a magnitude (Ri) of a difference therebetween; and (d) varying the set of beam aberration coefficients (iC) to provide an updated set of beam aberration coefficients (i+1C) and repeating (b) and (c) using the updated set of beam aberration coefficients (i+1C) in an iterative process for minimizing said magnitude (Ri).Type: GrantFiled: October 13, 2021Date of Patent: November 7, 2023Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventors: Dominik Ehberger, John Breuer, Matthias Firnkes
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Patent number: 11810755Abstract: Aspects of the disclosure relate to apparatus for the fabrication of waveguides. In one example, an angled ion source is utilized to project ions toward a substrate to form a waveguide which includes angled gratings. In another example, an angled electron beam source is utilized to project electrons toward a substrate to form a waveguide which includes angled gratings. Further aspects of the disclosure provide for methods of forming angled gratings on waveguides utilizing an angled ion beam source and an angled electron beam source.Type: GrantFiled: December 17, 2019Date of Patent: November 7, 2023Assignee: Applied Materials, Inc.Inventors: Ludovic Godet, Joseph C. Olson, Rutger Meyer Timmerman Thijssen
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Patent number: 11798776Abstract: Provided is a charged particle beam apparatus capable of stably obtaining a spherical aberration correction effect. The charged particle beam apparatus includes: a charged particle beam aperture stop 121 and an electrode 122 that are arranged on an optical axis between the charged particle beam source 101 and the objective lens 105; and a power supply 108 that applies a voltage between the charged particle beam aperture stop 121 and the electrode 122, in which the voltage that is applied from the electrode to the charged particle beam aperture stop by the power supply is a voltage having a polarity opposite to a charge of the charged particle beam, the electrode 122 includes an annular aperture 205, and the charged particle beam aperture stop 121 includes a plurality of apertures 201 that are arranged at positions overlapping the annular aperture 205 of the electrode 122 when viewed in a direction Z along the optical axis.Type: GrantFiled: May 15, 2019Date of Patent: October 24, 2023Assignee: Hitachi High-Tech CorporationInventors: Shunichi Motomura, Tsunenori Nomaguchi
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Patent number: 11800626Abstract: A method for monitoring a shock wave in an extreme ultraviolet light source includes irradiating a target droplet in the extreme ultraviolet light source apparatus of an extreme ultraviolet lithography tool with ionizing radiation to generate a plasma and to detect a shock wave generated by the plasma. One or more operating parameters of the extreme ultraviolet light source is adjusted based on the detected shock wave.Type: GrantFiled: July 26, 2022Date of Patent: October 24, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Yen-Shuo Su, Jen-Hao Yeh, Jhan-Hong Yeh, Ting-Ya Cheng, Henry Yee Shian Tong, Chun-Lin Chang, Han-Lung Chang, Li-Jui Chen, Po-Chung Cheng
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Patent number: 11798790Abstract: Embodiments of the present disclosure generally relate to apparatus and methods for controlling an ion energy distribution during plasma processing. In an embodiment, the apparatus includes a substrate support that has a body having a substrate electrode for applying a substrate voltage to a substrate, and an edge ring electrode embedded for applying an edge ring voltage to an edge ring. The apparatus further includes a substrate voltage control circuit coupled to the substrate electrode, and an edge ring voltage control circuit coupled to the edge ring electrode. The substrate electrode, edge ring electrode, or both are coupled to a power module configured to actively control an energy distribution function width of ions reaching the substrate, edge ring, or both. Methods for controlling an energy distribution function width of ions during substrate processing are also described.Type: GrantFiled: November 16, 2020Date of Patent: October 24, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Linying Cui, James Rogers
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Patent number: 11798796Abstract: The present disclosure relates to a method and system of preconcentrating analytes in a solution within an emitter for ionization mass spectrometry and analysis.Type: GrantFiled: June 14, 2019Date of Patent: October 24, 2023Assignee: University of New HampshireInventors: Anyin Li, Taoqing Wang
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Patent number: 11796563Abstract: The present application relates to an apparatus for a scanning probe microscope, said apparatus having: (a) at least one first measuring probe having at least one first cantilever, the free end of which has a first measuring tip; (b) at least one first reflective area arranged in the region of the free end of the at least one first cantilever and embodied to reflect at least two light beams in different directions; and (c) at least two first interferometers embodied to use the at least two light beams reflected by the at least one first reflective area to determine the position of the first measuring tip.Type: GrantFiled: January 25, 2022Date of Patent: October 24, 2023Assignee: Carl Zeiss SMT GmbHInventors: Ulrich Matejka, Christof Baur
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Patent number: 11798774Abstract: A system for preventing collisions between components in a particle beam instrument is disclosed. The system is particularly beneficial in use with instruments wherein moveable components are used within a chamber that obscures them from being viewed from outside the chamber. The system comprises: a capacitance sensor configured to monitor the capacitance between a first component and a second component of the instrument, and a proximity module configured to: derive a capacitance parameter from the monitored capacitance between the first component and the second component; and output a proximity alert signal in accordance with a comparison between the derived capacitance parameter and a predetermined capacitance parameter threshold value.Type: GrantFiled: July 16, 2021Date of Patent: October 24, 2023Assignee: OXFORD INSTRUMENTS NANOTECHNOLOGY TOOLS LIMITEDInventors: Stuart Andrew Swan, Grigore Moldovan, Angus Bewick
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Patent number: 11788996Abstract: To reduce an arithmetic processing load or an influence of noise at the time of virtual curve calculation processing, provided is a data processing device for a chromatograph, which is configured to execute data processing based on plot data measured by using a chromatograph, the data processing device including a virtual curve calculation data generator configured to obtain a smaller number of pieces of virtual curve calculation data than a number of pieces of the measured plot data; and an arithmetic processor (163) functioning as a virtual curve calculator configured to obtain a virtual curve based on the virtual curve calculation data.Type: GrantFiled: January 9, 2020Date of Patent: October 17, 2023Assignee: HITACHI HIGH-TECH SCIENCE CORPORATIONInventors: Masahito Ito, Masato Fukuda
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Patent number: 11787707Abstract: In one aspect, a sterilization apparatus is provided to include a flow channel body comprising an inflow unit configured to provide an inflow channel through which water flows in one direction, a discharge unit configured to provide a discharge channel through which water is discharged, and a bypass channel unit configured to provide a bypass channel through which water bypasses in a different direction from the direction of the water flowing in the inflow unit; a mounting unit formed on the flow channel body and configured to provide an installation space connected to the bypass channel, a UV light emitting unit disposed in the installation space and configured to emit UV light towards the bypass channel; and a holder coupled to the mounting unit and securing the UV light emitting unit inside the mounting unit.Type: GrantFiled: January 13, 2022Date of Patent: October 17, 2023Assignee: SEOUL VIOSYS CO., LTD.Inventors: Woong Ki Jung, Sang Hyun Chang
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Patent number: 11791131Abstract: A charged particle beam apparatus includes a movement mechanism, a particle source, an optical element, a detector, and a control mechanism configured to control, based on an observation condition, the movement mechanism, the particle source, the optical element, and the detector. The control mechanism is configured to acquire a diffraction pattern image including a plurality of Kikuchi lines as a comparison image after inclining the movement mechanism by a first angle, evaluate an error between an inclination angle of the sample and a target inclination angle using a reference image of a reference diffraction pattern and the comparison image, and control inclination of the movement mechanism based on an evaluation result.Type: GrantFiled: May 23, 2019Date of Patent: October 17, 2023Assignee: Hitachi High-Tech CorporationInventors: Takashi Dobashi, Hirokazu Tamaki, Hiromi Mise, Shuntaro Ito
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Patent number: 11789372Abstract: In one embodiment, a writing data generating method is for generating writing data used in a multi charged particle beam writing apparatus. The method includes calculating, for a figure containing a curve and a straight line included in design data, a plurality of control points representing the curve and a plurality of vertices of the curve and straight line, and expressing a position of each of the control points and vertices as a displacement from an adjacent control point or vertex to generate the writing data.Type: GrantFiled: March 30, 2022Date of Patent: October 17, 2023Assignee: NuFlare Technology, Inc.Inventors: Kenichi Yasui, Noriaki Nakayamada
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Patent number: 11781952Abstract: The invention proposes preparing biological samples for spectrometry which contain cell structures and/or whole cells of human or animal origin (e.g. thin human and animal tissue sections) or prokaryotes (e.g. microorganisms), and which require constant relative humidity, in a temperature-controlled gas volume whose humidity is determined by a saturated substance solution, for example a suitable salt solution. The invention exploits a physico-chemical phenomenon called “deliquescence”, which manifests itself by keeping the relative humidity above the saturated substance solution constant with a high degree of precision when a specified temperature is maintained. Pure succinic acid exhibits deliquescence at approx. 99% relative humidity, for example. Since an enormous variety of deliquescent salts and other suitable substances are available, it is possible to find the suitable substance for almost any desired relative humidity, with adjustment of the temperature, where necessary.Type: GrantFiled: November 28, 2022Date of Patent: October 10, 2023Inventors: Martin Schürenberg, Sören-Oliver Deininger, Alice Ly