Abstract: The present invention relates to aqueous compositions of associative polyelectrolyte complexes (PECs), optionally containing surfactants, biocidal agents and/or oxidants, which can provide surface protection to treated articles including reduced soiling tendency, reduced cleaning effort and improved soil repellancy, as well as providing bacteriostatic properties to treated surfaces that thereby gain resistance to water, environmental exposure and microbial challenge. Treatment means and compositions are provided that employ associative polyelectrolyte complexes formed by combining a water soluble cationic first polyelectrolyte with a water soluble second polyelectrolyte bearing groups of opposite charge to the first polyelectrolyte under suitable mixing conditions where the one polyelectrolyte present in molar excess is added in the form of a first aqueous solution during a mixing step to a second aqueous solution comprising the oppositely charged polyelectrolyte present in molar deficiency.

Abstract: A substrate treating method, liquid and apparatus are provided which can reduce the amount of sublimable substance used for the drying of a substrate while reducing the collapse of pattern. The substrate treating method includes a step of supplying a liquid to the pattern-formed surface of the substrate, a step of solidifying the liquid on the pattern-formed surface to form a solidified body and a step of subliming the solidified body so as to remove it from the pattern-formed surface. The substrate treating liquid includes a molten sublimable substance and a solvent, the freezing point of the sublimable substance being higher than the freezing point of the solvent. When the sublimable substance and the solvent are separated, the sublimable substance is settled and in the solidification step, the settled sublimable substance is solidified to have a height equal to or higher than the height of a pattern.

Abstract: A method for producing a quaternary alkylammonium hypochlorite solution includes a preparation step of preparing a quaternary alkylammonium hydroxide solution, and a reaction step of bringing the quaternary alkylammonium hydroxide solution into contact with chlorine, wherein a carbon dioxide concentration in a gas phase portion in the reaction step is 100 ppm by volume or less, and pH of a liquid phase portion in the reaction step is 10.5 or more.

Abstract: A semiconductor cleaning agent containing a sulfonic acid group-containing polymer, wherein a content of at least one metal selected from the group consisting of Na, Al, K, Ca and Fe is 0.7 ppm or less.

Abstract: Ozone-based methods and systems for treatment of solid waste that contains pathogens, and requires apparent volume reduction, include using dual treatment chambers, lift transporters that cascade the preliminarily treated solid waste, and agitation within the second (high ozone concentration) treatment chamber. The steps include feeding solid waste into a shredder chamber to reduce its apparent volume; and then to a first treatment chamber for preliminary ozone molecular interaction with the solid waste, and to a second treatment chamber with an agitator, via at least one lift transporter, to both cascade and agitate to enhance efficacy.

Abstract: An air decontamination device (100) comprising: an input unit (102); an output unit (103); and a decontamination unit (104) coupled at a first end (122) to the input unit (102) and coupled at a second end (124) to the output unit (103). The decontamination unit (104) comprises: pairs of conducting plates (108), where one conducting plate of each pair is for being positively charged and the other conducting plate of each pair is for being negatively charged. The positively charged plate and negatively charged plate are separated to form an airflow path (212) and a 3D material (110) that is capable of being potentiated by static electric field is coupled to each side of conducting plate (108). When the static electric filed is applied, the surface moieties of the 3D material (110) are realigned to a direction of the static electric field to potentiate the antimicrobial activity of the 3D material (110) for destroying the microbes present in the received air.

Abstract: A method for washing a car/vehicle/transportation device and a method for washing a braking device of a car/vehicle/transportation device are disclosed. The methods include spraying a detergent composition for washing automobiles, two-wheeled vehicles, bicycles, construction equipment, farm equipment, aircraft, railroad cars, ships, and/or various other types of car/vehicle/transportation devices, thereby washing the car/vehicle/transportation device or the braking device, wherein the detergent composition includes (Z)-1-chloro-3,3,3-trifluoropropene and HFE-type nonflammable fluorinated-type solvent, mass % ratio thereof ((Z)-1-chloro-3,3,3-trifluoropropene/HFE-type nonflammable fluorinated-type solvent) being within a range that is 30/70 to 99/1.

Abstract: Provided are a cleaning agent and a preparation method and the use thereof. The cleaning agent is prepared from the following raw materials comprising the following mass fraction of components: 0.5%-20% of an oxidant containing iodine, 0.5%-20% of an etchant containing boron, 1%-50% of a pyrrolidinone solvent, 1%-20% of a corrosion inhibitor, 0.01%-5% of a metal ion-free surfactant, and water, with the sum of the mass fraction of each component being 100%, the pH of the cleaning agent is 7.5-13.5, and the corrosion inhibitor is one or more of a benzotriazole corrosion inhibitor, a hydrazone corrosion inhibitor, a carbazone corrosion inhibitor and a thiocarbohydrazone corrosion inhibitor. The cleaning agent can efficiently remove nitrides from hard mask residues with little effects on metals and low-? dielectric materials, and has a good selectivity.

Abstract: An azeotropic composition a formulated with 1,1,1,3,3,3,-hexafluoro-2-methoxypropane and a second component selected from the group consisting of isopropyl alcohol, ethanol, methanol, and trans-1,2-dichloroethylene. The azeotropic composition exhibits a substantially constant boiling point at a constant pressure and is useful for various cleaning and degreasing applications.

Abstract: The object of the present invention is to provide a cleaning agent that is superior in the initial cleaning effect and allows residues to be easily distributed evenly in the next fabricated molded article. The object is achieved by a cleaning agent used for a molding machine and including a thermoplastic resin and a glass wool.

Abstract: A gel which is based on polysaccharide and which includes glass protection additives selected from zinc salts, polyvinyl amide, polyvinyl amine, or combinations thereof. The invention additionally relates to the use of the gel for the corrosion protection of glassware during cleaning and/or rinsing processes, in particular in a dishwasher, and to a method for preventing the corrosion of glassware during cleaning and/or rinsing processes, in particular in a dishwasher.

Abstract: The present invention relates to compositions such as cleaning compositions comprising a mix of enzymes. The invention further relates, use of compositions comprising such enzymes in cleaning processes.

Abstract: The present invention is to provide a method for producing a laminate having excellent adhesion properties. An embodiment of the present invention is a method for producing a laminate, the method including: a step 1 of dry-treating a surface A of a plastic to obtain a dry-treated plastic having a surface B that has been dry-treated; a step 2 of wiping the surface B with a cleaning tool containing a composition for wiping, the composition containing at least one solvent selected from the group consisting of water and polar solvents, and a silane coupling agent, to obtain a cleaned plastic having a surface C that has been wiped with the cleaning tool; and a step 3 of applying at least one selected from the group consisting of adhesives and primers on the surface C to obtain a laminated body.

Abstract: The present invention pertains to: a composition capable of removing dry etching residue present on the surface of a semiconductor integrated circuit, while suppressing alumina damage in a production process for the semiconductor integrated circuit; a cleaning method for semiconductor substrates that use alumina; and a production method for a semiconductor substrate having an alumina layer. This composition is characterized by containing 0.00005%-1% by mass of a barium compound (A) and 0.01%-20% by mass of a fluorine compound (B) and having a pH of 2.5-8.0.

Abstract: To provide a means capable of sufficiently removing organic residues present on the surface of a polishing object after polishing containing silicon oxide or polysilicon. A surface treatment composition contains a polymer having a constituent unit represented by Formula (1) below and water and is used for treating the surface of a polishing object after polishing, in which, in Formula (1) above, R1 is a hydrocarbon group having 1 to 5 carbon atoms and R2 is a hydrogen atom or a hydrocarbon group having 1 to 3 carbon atoms.

Abstract: A microwave plasma gasification and recycle integrated system for domestic garbage. The system is fixed in a garbage truck compartment with a garbage inlet, and includes a closed chain-plate type feeder, a shredding machine, and a closed magnetic separator which are connected in sequence. The magnetic separator is further separately connected to a microwave plasma gasification furnace and a metal recycle tank. The microwave plasma gasification furnace is further separately connected to a stink processor, a plastic residue recycle tank, an integrated sewage treatment device, and a residue smashing machine. The stink processor is connected to a gas recycle tank. Both the residue smashing machine and the integrated sewage treatment device are connected to an aerobic fermentation tank. The aerobic fermentation tank is connected to a decomposed material recycle tank by means of a decomposed material forming and screening machine.

Abstract: This invention relates to odor control molecules comprised of polyethyleneimine compounds containing N-halamine and derivatives thereof.

Abstract: A method of cleaning a contaminated surface, such as cleaning the elongate interior lumen of an endoscope contaminated with flesh, bone, blood, mucous, faeces or biofilm, said method comprising the steps of: providing a suspension of solid particles in a liquid to said contaminated surface, and flowing said suspension along said surface thereby to remove contaminant from the surface. The suspension is preferably a paste, where the solid material may be e.g. crystals of a salt, silicon oxide or organic material. The paste preferably has a solid fraction between 5 and 55%. A rheology modifier may be present.

Abstract: The present invention discloses a photoresist-removing solution comprising of an N-containing compound and an organic substance in a mass ratio of 1:(0.5-150). The N-containing compound includes at least one of the followings: tetraalkylammonium hydroxide, ammonia, liquid ammonia, and a mixture of ammonia and water; wherein the tetraalkylammonium hydroxide has the general formula (I): wherein R1, R2, R3, R4 is an alkyl with 1 to 4 carbons, respectively. The organic substance is an organic substance having at least one electron-withdrawing functional group. The present invention mixes a specific kind of N-containing compound and a specific kind of organic substance in a certain ratio, and preferably adds a certain amount of water, so that the removal liquid in the present application has an extremely excellent photoresist-removing effect.

Abstract: A cleaning composition which can remove a layer of interest using a conventional apparatus, such as a coater, a baking furnace and a cleaning chamber, installed in semiconductor manufacturing equipment while preventing the damage or deformation of layers other than the layer of interest, such as a substrate and an interlayer insulation film; a cleaning method using the cleaning composition; and a method for producing a semiconductor employing the cleaning method. A layer of interest formed on a substrate is cleaned with a cleaning composition containing a component capable of decomposing the layer of interest and a film-forming polymer. An example of the layer of interest is a hard mask film. An example of the component is at least one of a basic compound and an acidic compound.