Abstract: A system for an extreme ultraviolet light source includes a capillary tube, the capillary tube including a sidewall extending from a first end to a second end, the sidewall including an exterior wall and an interior wall, the interior wall defining a passage that extends from the first end to the second end; an actuator configured to be positioned at the exterior wall of the capillary tube; and an adhesive between the exterior wall and the actuator, the adhesive being configured to mechanically couple the actuator and the capillary tube, wherein the adhesive occupies a volume that remains substantially the same or expands as a result of curing.

Abstract: A method for relative quantitative analysis of a polymer using MALDI mass spectrometry, the method comprising the steps of preparing a plurality of polymer specimens having a thickness variation of 30% or less by electrospraying a solution including a polymer sample, a monomeric internal standard material, and a matrix through a mask for each different concentration of the polymer sample; obtaining MALDI mass spectra by irradiating laser beams to each of the plurality of polymer specimens, and calculating a signal intensity ratio of the polymer sample to the small molecule internal standard from peak results of the spectra; and depicting the calculated signal intensity ratio according to the concentration of the polymer sample to prepare a quantitative calibration curve, and the method capable of providing MALDI mass spectra with reduced overlapping peaks and thereby providing the relative quantitative analysis of a polymer with improved accuracy.

Abstract: A method of reducing variability of an error associated with a structure on a substrate in a lithography process is disclosed. The method includes determining, based on one or more images obtained based on a scan of the substrate by a scanning electron microscope (SEM), a first error due to a SEM distortion in the image. The method also includes determining, based on the image, a second error associated with a real error of the structure, where the error associated with the structure includes the first error and the second error. A command is generated by a data processor that enables a modification of the lithography process and an associated reduction of the variability of the error based on reducing any of the first error or the second error.

Abstract: A quadrupole mass spectrometer includes: a quadrupole mass filter including a pre-rod; an ionization chamber; and an ion optical system that guides ions generated in the ionization chamber to the pre-rod of the quadrupole mass filter, wherein: a potential of an exit side electrode of the ion optical system is lower than a potential of the ionization chamber and a potential of the pre-rod of the quadrupole mass filter; and there is no structure that has a higher potential than the exit side electrode and decelerates the ions between the exit side electrode and the pre-rod.

Abstract: This disclosure is directed to solutions of detecting and classifying wafer defects using machine learning techniques. The solutions take only one coarse resolution digital microscope image of a target wafer, and use machine learning techniques to process the coarse SEM image to review and classify a defect on the target wafer. Because only one coarse SEM image of the wafer is needed, the defect review and classification throughput and efficiency are improved. Further, the techniques are not distractive and may be integrated with other defect detecting and classification techniques.

Abstract: An extreme ultraviolet light source system includes a chamber configured to maintain a pressure of an inner space thereof at a first pressure, a droplet supply unit disposed in the chamber and configured to discharge a droplet on a first path, a light source configured to emit a light for generating plasma by irradiating a laser light to the droplet at a focal point on the first path, and a suction unit disposed on the first path so as to face the droplet supply unit in the chamber and configured to suction debris of the droplet irradiated with the laser light at a second pressure, lower than the first pressure, wherein the suction unit includes a nozzle protruding from a side wall of the chamber toward the focal point, and an end of the nozzle is closer to the focal point than it is to the side wall of the chamber.

Abstract: The present disclosure relates to a medical radiation protection device, which comprises a barrel-shaped protecting frame and a protecting cover. The barrel-shaped protecting frame comprises an upper protecting frame and a lower protecting frame. The upper protecting frame is connected to the lower protecting frame, and the upper protecting frame may move up or down along the lower protecting frame. The protecting cover is arranged on the side wall of the barrel-shaped protecting frame. The medical radiation protection device of the present disclosure can realize non-wearable X-ray protection, reduce load of the surgeon doctor and improve effectiveness of protection therefor. The protection device is operable via a universal caster, does not get in the way of operation of the surgeon doctor, and is thus convenient for maneuvering of the surgeon doctor.

Abstract: A method for preparing a measurement sample for MALDI mass spectrometry, the method including applying a laser beam to a base including a matrix used for preparing the measurement sample for MALDI mass spectrometry, the matrix being disposed on a surface of the base, in a manner that the laser beam is applied to a surface of the base opposite to the surface including the matrix, to make the matrix fly from the base to be disposed at a predetermined position of an analyte of MALDI mass spectrometry, wherein the base includes a laser energy absorbable material, and wherein laser energy of the laser beam has a wavelength of 400 nm or longer.

Abstract: In order to display an image which enables easy observation of the state of adhesion of a sample regardless of the kind of matrix, its distribution and other factors in a MALDI mass spectrometer configured to irradiate a sample on a sample plate (15) with laser light to ionize a component in the sample and perform a mass spectrometric analysis, the MALDI mass spectrometer includes: a plurality of light source units (30a, 30b), each configured to emit a beam of light with a different wavelength distribution; an illumination light switching section (42, 31) configured to selectively cast one of the beams of light emitted from the light source units, onto the sample plate as illumination light; and an imaging section (32) configured to acquire an optical image of the sample plate formed by the illumination light, the imaging section being common to the light source units.

Abstract: An ion generator includes: an arc chamber which defines a plasma generation space; a cathode which emits thermoelectrons toward the plasma generation space; and a repeller which faces the cathode with the plasma generation space interposed therebetween. The arc chamber includes a box-shaped main body on which a front side is open, and a slit member which is mounted to the front side of the main body and provided with a front slit for extracting ions. An inner surface of the main body which is exposed to the plasma generation space is made of a refractory metal material, and an inner surface of the slit member which is exposed to the plasma generation space is made of graphite.

Abstract: In one embodiment, a method includes receiving measured linescan information describing a pattern structure of a feature, applying the received measured linescan information to an inverse linescan model that relates measured linescan information to feature geometry information, and identifying, based at least in part on the applying the received measured linescan model to the inverse linescan model, feature geometry information that describes a feature that would produce a linescan corresponding to the received measured linescan information. The method also includes determining, at least in part using the inverse linescan model, feature edge positions of the identified feature, analyzing the feature edge positions to determine errors in the manufacture of the pattern structure, and controlling a lithography tool based on the analysis of the feature edge positions.

Abstract: An inspection system serves to qualify semiconductor structures. The inspection system has an ion beam source for space-resolved exposition of the structures to be qualified with an ion beam. The inspection system also includes a secondary ion detection device with a mass spectrometer. The mass spectrometer is configured to measure an ion mass to charge ratio in a given bandwidth.

Abstract: Systems and methods for generating extreme ultraviolet radiation from plasma are described herein. In an embodiment, gas is provided to a gas target within a vacuum chamber. A pulse laser or a pulse laser-driven wavelength conversion system provides a beam which is focused through a lens or microscope object onto the gas target to produce plasma. A collection mirror is then used to guide an extreme ultraviolet radiation beam from the plasma to a target location.

Abstract: Systems are disclosed for providing ultraviolet (UV) energy to items on a processing surface. The system includes a lamp positioned over the processing surface to provide UV energy to the processing surface and a reflector cell positioned to cause UV energy emitted from the lamp in a direction away from the processing surface to be reflected toward the processing surface. The system includes the reflector cell having a reflector cap positioned above the lamp and a shroud extending downwardly from the reflector cap toward the conveyor wherein the shroud has a vertical dimension, a longitudinal dimension, and a horizontal dimension along the direction of the conveyor such that the horizontal dimension and the longitudinal dimension define a treatment area on the conveyor. The lamp is configured to deliver energy to the treatment area such that the delivered energy to the processing surface is substantially uniform over the treatment area.

Abstract: Disclosed herein include systems, devices, and methods for droplet deposition for mass spectrometry. In some embodiments, a microfluidic device comprising wells is reversibly sealed to a mass spectrometry surface and used to deposit contents of droplets (e.g., enzymes and substrates), or products thereof, onto the mass spectrometry surface. The contents of droplets can be analyzed by laser desorption/ionization to, for example, identify a substrate of an enzyme or an enzyme capable of catalyzing a substrate to a product.

Abstract: A method is disclosed. The method includes receiving measured linescan information describing a pattern structure of a feature, applying the received measured linescan information to an inverse linescan model that relates measured linescan information to feature geometry information, identifying, based at least in part on the applying the received measured linescan model to the inverse linescan model, feature geometry information that describes a feature that would produce a linescan corresponding to the received measured linescan information, determining, at least in part using the inverse linescan model, feature edge positions of the identified feature, and analyzing the feature edge positions to detect the presence or absence of defects in the pattern structure.

Abstract: An extraction plate for an ion beam system. The extraction plate may include an insulator body that includes a peripheral portion, to connect to a first side of a plasma chamber, and further includes a central portion, defining a concave shape. As such, an extraction aperture may be arranged along a first surface of the central portion, where the first surface is oriented at a high angle with respect to the first side. The extraction plate may further include a patterned electrode, comprising a first portion and a second portion, affixed to an outer side of the insulator body, facing away from the plasma chamber, wherein the first portion is separated from the second portion by an insulating gap.

Abstract: An extreme ultraviolet light generation apparatus may include a chamber device, a concentrating mirror, a central gas supply port configured to supply gas along a focal line passing through a first focal point and a second focal point from the center side of the reflection surface, and a first peripheral gas supply port disposed at a peripheral portion of the reflection surface and configured to supply gas in a direction from the outer side of the reflection surface toward the inner side of the reflection surface. The first peripheral gas supply port may supply gas, when viewed along the focal line, in an inclined direction inclined to a tangential direction side of the peripheral portion at the peripheral portion where the first peripheral gas supply port is located with respect to a first straight line passing through the first peripheral gas supply port and the focal line.

Abstract: An edge detection system is disclosed. The edge detection system includes an imaging device configured for imaging a pattern structure to form a first image, wherein the pattern structure includes a predetermined feature, and the imaging device images the pattern structure to generate measured linescan information that includes image noise.

Abstract: A mass spectrometer is disclosed comprising a system control module (1715) for controlling the operation of the mass spectrometer. The system control module (1715) comprises one or more functional modules, each functional module being operable to perform a predetermined function of the mass spectrometer. The system control module (1715) and/or one or more functional modules are operable to communicate non-time information with each other using a time code of a communications protocol.