Abstract: A transactional currency sanitizer which includes an enclosure, a deposit device on the enclosure for depositing the currency into said enclosure, an ultraviolet radiation-producing (UV) device with at least two spaced-apart UV light emitters, and a retrieval device on the enclosure for retrieving the currency from said enclosure. The deposit device is configured to receive the currency and pass the currency between the at least two spaced-apart UV light emitters to sanitize both sides of the currency and the retrieval device is configured to accept the sanitized currency from between said device at least two spaced-apart UV light emitters and to provide the sanitized currency for retrieval from said enclosure.

Abstract: A method of controlling an extreme ultraviolet (EUV) lithography system is disclosed. The method includes irradiating a target droplet with EUV radiation, detecting EUV radiation reflected by the target droplet, determining aberration of the detected EUV radiation, determining a Zernike polynomial corresponding to the aberration, and performing a corrective action to reduce a shift in Zernike coefficients of the Zernike polynomial.

Abstract: The invention relates to a light source comprising a photonic wire having a single-mode core and adapted to support an optical mode which is degenerate in polarization, comprising an emitter of a pair of photons which are intended to be entangled in polarization. The photonic wire comprises a cladding which is asymmetrical in rotation and extends along a principal transverse axis. Furthermore, the light source comprises a correction device adapted to induce by electrostatic effect a mechanical deformation of the photonic wire in a plane parallel to the substrate, along a deformation axis forming an angle of inclination of between 0° and 90°, these values being exclusive, with respect to the principal transverse axis, the mechanical deformation leading to mechanical strains experienced by the emitter, thus improving the degree of entanglement of the photon pair.

Abstract: A target delivery system for an extreme ultraviolet (EUV) light source is disclosed. The system includes: a conduit including an orifice configured to fluidly couple to a reservoir; an actuator configured to mechanically couple to the conduit such that motion of the actuator is transferred to the conduit; and a control system coupled to the actuator, the control system being configured to: determine an indication of pressure applied to target material in the reservoir, and control the motion of the actuator based on the determined indication of applied pressure. Moreover, techniques for operating a supply system are disclosed. For example, one or more characteristics of the supply system are determined, and an actuator that is mechanically coupled to the supply system is controlled based on the one or more determined characteristics such that an orifice of the supply system remains substantially free of material damage during operational use.

Abstract: An ion guide (20) provided in a first intermediate vacuum chamber includes six rod electrodes (211 to 216) and a voltage generation unit. The six rod electrodes (211 to 216) are in a hexapole arrangement on the ion incident side, and the two rod electrodes (211 and 214) are tilted with respect to the Z-axis in a manner approaching a central axis (201) as they progress in the ion transport direction, so that the four rod electrodes (211, 214, 215, and 216) are in a quadrupole arrangement. The voltage generation unit applies radio-frequency voltages ±V cos ?t whose phases are inverted to each other between adjacent rod electrodes of the six rod electrodes (211 to 216) around the central axis (201), applies a DC voltage U1 to the four electrodes (211, 214, 215, and 216) by which ions pass through them in an excellent manner, and applies a DC voltage U2 different from U1 to the other two rod electrodes (212 and 213).

Abstract: An ion generator includes an arc chamber defining a plasma generation space, and a cathode which emits thermoelectrons toward the plasma generation space. The arc chamber includes a box-shaped main body having an opening, and a slit member mounted to cover the opening and provided with a front slit. An inner surface of the main body is exposed to the plasma generation space made of a refractory metal material. The slit member includes an inner member made of graphite and an outer member made of another refractory metal material. The outer member includes an outer surface exposed to an outside of the arc chamber. The inner member includes an inner surface exposed to the plasma generation space, and an opening portion which forms the front slit extending from the inner surface of the inner member to the outer surface of the outer member.

Abstract: A method includes irradiating debris deposited in an extreme ultraviolet (EUV) lithography system with laser, controlling one or more of a wavelength of the laser or power of the laser to selectively vaporize the debris and limit damage to the EUV) lithography system, and removing the vaporized debris.

Abstract: A disinfecting system includes a housing. An ultraviolet light (UV) source is secured to the housing and configured to emit UV light for disinfection of a target. A processor is secured to the housing in communication with the UV light source. The processor is configured to activate the UV light source for a selected amount of time suitable for disinfection of the target.

Abstract: The current disclosure is directed to methods and assemblies configured to deliver a mixture of germanium tetrafluoride (GeF4) and hydrogen (H2) gases to an ion implantation apparatus, so H2 is present in an amount in the range of 25%-67% (volume) of the gas mixture, or the GeF4 and H2 are present in a volume ratio (GeF4:H2) in the range of 3:1 to 33:67. The use of the H2 gas in an amount in mixture or relative to the GeF4 gas prevents the volatilization of cathode material, thereby improving performance and lifetime of the ion implantation apparatus. Gas mixtures according to the disclosure also result in a significant Ge+ current gain and W+ peak reduction during au ion implantation procedure.

Abstract: The current disclosure is directed to a repellent electrode used in a source arc chamber of an ion implanter. The repellent electrode includes a shaft and a repellent body having a repellent surface. The repellent surface has a surface shape that substantially fits the shape of the inner chamber space of the source arc chamber where the repellent body is positioned. A gap between the edge of the repellent body and the inner sidewall of the source arc chamber is minimized to a threshold level that is maintained to avoid a short between the conductive repellent body and the conductive inner sidewall of the source arc chamber.

Abstract: A foil trap that captures debris released from a plasma includes a hub structure, a plurality of foils, and a shield member. The hub structure has a circumferential surface portion and a front surface portion facing the plasma. The foils are arranged radially around the hub structure and are supported by brazing on the circumferential surface portion. The shield member is disposed on the front surface portion, has a circumferential edge portion that shields the circumferential surface portion from the plasma, and forms a thermal resistance section between the shield member and the hub structure.

Abstract: As a device for correcting positive spherical aberration of an electromagnetic lens for a charged particle beam, a spherical aberration correction device combining a hole electrode and a ring electrode is known. In this spherical aberration correction device, when a voltage is applied between the hole electrode and the ring electrode, the focus of the charged particle beam device changes due to the convex lens effect generated in the hole electrode. Therefore, in a charged particle beam device including a charged particle beam source which generates a charged particle beam, a charged particle beam aperture having a ring shape, and a charged particle beam aperture power supply which applies a voltage to the charged particle beam aperture, the charged particle beam aperture power supply is configured to apply, to the charged particle beam aperture, a voltage having a polarity opposite to a polarity of charges of the charged particle beam.

Abstract: An infusion system (10) including a radioisotope generator (52) that generates a radioactive eluate via an elution, an activity detector (58) configured to measure an activity of a first radioisotope in the radioactive eluate generated by the radioisotope generator, and a controller (80). The controller can track a cumulative volume of radioactive eluate generated by the radioisotope generator and also track the activity of the first radioisotope in the radioactive eluate generated by the radioisotope generator. The controller can determine a predicted volume of the radioactive eluate generated by the radioisotope generator at which the activity of the first radioisotope in the radioactive eluate will reach a threshold based on the tracked cumulative volume of the radioactive eluate and the tracked activity of the first radioisotope. This information can be useful for proactively removing the radioisotope generator from service and/or replacing the radioisotope generator with a fresh generator.

Abstract: The object of the invention relates to a neutron absorbing concrete wall (10), which concrete wall (10) has an internal delimiting surface (11a), and an external delimiting surface (11b) on an opposite side to the internal delimiting surface (11a), the essence of which is that it contains a first concrete layer (13a) on the side of the internal delimiting surface (11a), and a second concrete layer (13b) on the side of the external delimiting surface (11b), which first concrete layer (13a) contains at least 0.05 mass % boron-10 isotope (10B), and the second concrete layer (13b) is formed as heavyweight concrete. The object of the invention also relates to a method for creating a neutron radiation absorbing concrete wall (10) that has an internal delimiting surface (11a), and an external delimiting surface (11b) on an opposite side to the internal delimiting surface (11a), the essence of which is a first concrete layer (13a) containing at least 0.

Abstract: Impurities in a liquefied solid fuel utilized in a droplet generator of an extreme ultraviolet photolithography system are removed from vessels containing the liquefied solid fuel. Removal of the impurities increases the stability and predictability of droplet formation which positively impacts wafer yield and droplet generator lifetime.

Abstract: Disclosed is radiation-retarding radiation shield which is more flexible than non-toxic lead and lead alloy structures and does not disturb the user.

Abstract: The invention is to provide a defect detection device capable of using a compact optical system to detect a plurality of types of defects with high sensitivity and high speed. The defect detection device includes an irradiation system that irradiates light onto an object to be inspected; an optical system that forms scattered light produced by a light irradiation into an image; a microlens array disposed at an image plane of the optical system; an imaging element that is disposed at a position offset from the imaging plane of the optical system and that images light that passes through the microlens array; a mask image storage unit that stores a plurality of mask images generated for each type of defect or each defect direction; and a calculation unit that carries out mask processing on an image obtained from the imaging element using the plurality of mask images and carries out defect detection processing.

Abstract: Disclosed herein is an apparatus comprising: a first electrically conductive layer; a second electrically conductive layer; a plurality of optics element s between the first electrically conductive layer and the second electrically conductive layer, wherein the plurality of optics elements are configured to influence a plurality of beams of charged particles; a third electrically conductive layer between the first electrically conductive layer and the second electrically conductive layer; and an electrically insulating layer physically connected to the optics elements, wherein the electrically insulating layer is configured to electrically insulate the optics elements from the first electrically conductive layer, and the second electrically conductive layer.

Abstract: The invention relates to a Cryo-Charged Particle (CCP) sample handling and storage system. The system is used for storing and handling cryo-samples for use in charged particle microscopy, such as cryo-electron microscope samples for use in cryo-transmission electron microscopy. The system comprises a storage apparatus for storing a plurality of CCP samples, and a Charged Particle Apparatus (CPA), such as a cryo-TEM, at a location remote from said storage apparatus. The system further comprises a transfer device that is releasably connectable to said storage apparatus, and that is releasably connectable to said CPA as well. As defined herein, said transfer device is arranged for acquiring a CCP sample from said plurality of CCP samples when connected to said storage apparatus, and arranged for transferring said CCP sample from said transfer device to said CPA when connected to said CPA.

Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.