Abstract: A lithographic apparatus includes a first movable element (such as an immersion liquid supply system), which is in operation in contact with a surface of a second movable element (such as a substrate table). Further, the lithographic apparatus includes a second element controller (such as a substrate table controller) to control a position quantity of the second movable element. Disturbance forces caused by, e.g., movements of the first and second movable elements with respect to each other, due to capillary forces disturb a position of the first and second movable elements. To at least partly correct a position of the second movable element due to such disturbance forces, the lithographic apparatus includes a feedforward control path to provide a disturbance force feedforward signal to the second element controller, the feedforward control path including a disturbance force estimator to estimate a disturbance force from a position quantity of the first movable element.

Abstract: In an exposure apparatus, in which exposure data necessary for direct exposure is sequentially supplied to an exposure engine having a plurality of exposure devices and, based on the supplied exposure data, the exposure engine forms an exposure pattern on an exposure target substrate which moves relative to the exposure engine, lights respectively produced from the exposure device groups based on the identical exposure data supplied to each of the plurality of exposure device groups, are projected via optics so as to be superimposed one on top of another on the same area on the exposure target substrate.

Abstract: A coating and developing apparatus includes a process block which includes a unit block for coating-film formation which applies a resist, and a unit block for development which performs a developing process, and is separately provided with a coating-film-formation-unit-block transfer mechanism and a developing-process-unit-block transfer mechanism. After a substrate after exposure is transferred to a transfer stage from the interface-block transfer mechanism, the timing for the developing-process-unit-block transfer mechanism to receive the substrate is adjusted in such a way that the time from exposure of the substrate to transfer of the substrate to a heating unit becomes a preset time.

Abstract: A reticle-processing system includes a reticle-carrying container, a transfer rail for transferring the reticle-carrying container, a light exposure apparatus for printing a circuit pattern, and a reticle stocker for keeping a plurality of reticles. Orientation changer detects the orientation of the reticle-carrying container and changes it appropriately and is located in a path from the reticle stocker to a printing position in the light exposure apparatus. The orientation changer includes a rotary drive for rotating the reticle-carrying container, an orientation detector 83 for detecting the orientation of the reticle-carrying container, which is provided in the path from the reticle stocker to the printing position in the light exposure apparatus, and a controller for, when the orientation detected by the orientation detector is shifted by 180 degrees, controlling the rotary drive so as to correct the orientation.

Abstract: An image exposure device includes an exposure head for forming a desired pattern on a photosensitive material. The exposure head is equipped with a light source for emitting a great number of light beams, a spatial light modulator in which a great number of pixel portions are arranged for independently modulating the light beams emitted from the light source, a micro lens array in which a great number of micro lenses are arranged for individually converging the great number of light beams modulated by the pixel portions, and a total of two or more aperture arrays arranged in the stage before the micro lens array and/or the stage after the micro lens array. Each of the aperture arrays has a great number of apertures for individually restricting the light beams.

Abstract: A sealing assembly for sealing a slit between two regions in a lithographic apparatus is disclosed. The assembly includes a vacuum pumping device that extends substantially in a longitudinal slit direction for at least partially preventing particle transmission in a transversal slit direction.

Abstract: A method and apparatus are described for removing an initial gas from a gas-filled enclosure between the mask-protective device, such as a pellicle, and the patterned mask, such as a reticle, and adding a purge gas with a different composition. The gas-filled enclosure includes a vent for adding the purge gas to the chamber and removing the initial gas from the chamber. Adding and removing may be accomplished by using pressure, diffusion, vacuum, or other means.

Abstract: Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. 3 or more of the at least 3 optical encoders being connected to the substrate table at different locations in the 3 dimensional coordinate system.

Abstract: A scanning exposure apparatus includes a projection system, a stage system, a first detector and a control system. The stage system has first and second stages, each of which is movable independently in a plane while holding a substrate. The first detector detects focusing information of a vicinity of an outer circumference of the substrate during a detecting operation. The control system controls the stage system to perform the detecting operation with the first stage, while performing a first exposure operation on the substrate held by the second stage. After the first exposure operation, a second exposure operation for the substrate held on the first stage is performed, in which a shot area in the vicinity of the outer circumference of the substrate is exposed by moving the first stage while adjusting a position of the substrate surface held by the first stage using the detected focusing information.

Abstract: A liquid immersion lithography system includes projection optics and a showerhead. The projection optics are configured to expose a substrate with a patterned beam. The showerhead includes a first nozzle and a second nozzle that are configured to be at different distances from a surface of the substrate during an exposure operation.

Abstract: A projection exposure apparatus which has a projection optical system and projects a pattern onto a substrate through the projection optical system. The apparatus includes a sensor unit which includes a light-receiving element for detecting light incident through the projection optical system, a vessel in which the light receiving element is arranged, a sealing window which transmits the incident light and seals the vessel, and a driving mechanism which aligns the substrate. A space between the sealing window and the light-receiving element is filled with a liquid having a refractive index which is greater than one, and the liquid also serves as a coolant for cooling the driving mechanism.

Abstract: A lithographic apparatus includes an illumination system configured to provide a beam of radiation and projection system configured to project the radiation beam onto a target portion of a substrate. At least one of the illumination system and the projection system includes a focusing element for reflecting or refracting the beam. A plurality of stop discs is provided, each having an aperture therethrough, together with a disc positioner configured to place one of the stop discs adjacent the focusing element to control the numerical aperture (NA) of the projection system or illumination system. The apparatus further includes a disc changer configured to select one of the stop discs and provide the selected stop disc to the disc positioner, the disc changer being external to the projection system or illumination system.

Abstract: Improved gray scaling imaging methods and systems include a group of elements within an array of individually controllable elements that project a part of a radiation beam onto a lens in an array of microlenses, and are individually controllable so that any number of the individually controllable elements may be switched on or off to generate a gray scale.

Abstract: The invention relates to an exposure machine for printed circuit panels. The machine comprises: a support (26) for said panel (24); a moving artwork support (10) comprising a substantially rectangular frame (12) and a transparent plate (14) suitable for receiving said artwork; means (22) for establishing peripheral sealing; means for establishing suction in the volume; at least one deformable leaktight balloon (30, 32) disposed between said support and said transparent plate around at least a portion of said panel; and a source of gas under pressure at a pressure greater than the pressure of said suction for the purpose of feeding said balloon, thus that when suction is established in said volume, the periphery of said transparent plate presses against said balloon.

Abstract: A liquid immersion lithography system including a projection optical system for directing electromagnetic radiation onto a substrate, and a showerhead for delivering liquid flow between the projection optical system and the substrate. The showerhead includes an injection nozzle and a retrieval nozzle located at different heights. The liquid flow is tilted relative to the substrate. A direction from the injection nozzle to the retrieval nozzle is tilted at approximately 1 to 2 degrees relative to the substrate.

Abstract: A lithographic apparatus includes a measurement system to measure the position and/or movement of a substrate support relative to a reference frame. The measurement system includes a target mounted to one of the substrate support and the reference frame, a radiation source mounted to the other one of the substrate support and the reference frame and a sensor configured to detect a pattern of radiation propagating from the target, indicating the position or movement of the substrate support. The substrate support includes one or more gas outlets configured to provide a flow of gas that encapsulates the volume of space through which the beam of radiation propagates to the target.

Abstract: A substrate transfer apparatus has pluralities of pairs of substrate support mechanisms. The substrate support mechanism includes a first roller provided on a first rotary shaft and a second roller provided on a second rotary shaft, the substrate support mechanism transfers a substrate in a transfer direction while supporting the substrate between the first and second rollers in a thickness direction of the substrate. The pair of the substrate support mechanisms are disposed so as to oppose to each other in a width direction of the substrate and the pairs of the substrate support mechanisms are arranged along with the transfer direction. Further, a substrate position regulating member that regulates a position of the substrate by contacting with a side surface which is parallel to the transfer direction is provided on either of the first and second rotary shafts.

Abstract: A method for correcting structure-size-dependent positioning errors during the photolithographic projection by an exposure apparatus and the use thereof includes providing an exposure apparatus for exposing a plurality of exposure fields and a simulation model of the exposure apparatus for specifying correction values for intra-field errors, providing a first pattern with first structure elements and first measurement marks, which, in the case of a projection, are beset by a first positioning error and a second positioning error dependent on the dimensions and the position in the exposure field, providing a correction function suitable for specifying the first and the second positioning error, determining an average relative positioning error including the first and the second positioning error, calculating correction values for the control of the exposure apparatus, and transmitting the correction values to the exposure apparatus so that subsequent exposures are performed with an improved overlay.

Abstract: A continuous source of radiation, for example a lamp, is used in conjunction with pixel grid imaging. In one example, the individually controllable elements operate at a frequency of at least about 50 kHz. To compensate for any distortion of an exposed spot a point spread function is adjusted to be shorter in a scanning direction.

Abstract: A photolithography mask critical dimension metrology system is provided. The system includes a radiation source, a holder operable to securely hold at least one mask oriented to receive radiation emitted from the radiation source, a projection system operable to direct radiation passing through the at least one mask, and an image capture system operable to receive radiation directed by the projection system and capture a projected image of the at least one mask.