Abstract: A device for disinfecting publicly-used equipment includes a plurality of reflective units disposed along the interior of each wall of the device. Each of the reflective units can include a reflective back section and at least three reflective sections disposed about the reflective back section. UV lamps can be disposed to extend along the walls, and at partially disposed adjacent to a one or more reflective back sections of the reflective units. The UV lamps together with the reflective units collectively direct sufficient UV light on the equipment such that the equipment can be disinfected. The walls and ceiling of the device define a tunnel into which the equipment to be disinfected is inserted. Optionally, the device can include a door to prevent children and others from entering the tunnel while the UV lamps are illuminated.

Abstract: An electron microscope stage mechanism capable of performing high-accuracy positioning while limiting vibration and drift. An ultrasonic motor is used in a stage drive mechanism, and a fixing mechanism capable of increasing stop stiffness is combined integrally with the motor. That is, a structure in which a piezoelectric actuator of the fixing mechanism is mounted in a pre-load mechanism together with the ultrasonic motor is used. When the stage is fixed by the fixing mechanism after acceleration, deceleration and positioning of the stage performed by the drive mechanism, the piezoelectric actuators positioned on opposite sides of the stage are extended to press the stage.

Abstract: The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by calculating, and displaying on the screen, the dislocation vector that represents the relationship in position between the detected patterns on the surface and at the bottom of the photoresist. Furthermore, dislocation vectors between the microstructured patterns at multiple positions in a single-chip or single-shot area or on one wafer are likewise calculated, then the sizes and distribution status of the dislocation vectors at each such position are categorized as characteristic quantities, and the corresponding tendencies are analyzed. Thus, stepper or wafer abnormality is detected.

Abstract: A scanning electron microscope with a length measurement function includes an electron gun for emitting an electron beam, a measurement target region setting unit for setting a measurement region for a pattern formed on a sample, a storing unit for storing the designated measurement region, a beam blanker unit for controlling an irradiation of the electron beam depending on the measurement region, and a control unit for extracting the designated measurement region from the storing unit, interrupting the electron beam with the beam blanker unit in a region other than the measurement region, irradiating the electron beam onto the sample in the measurement region, capturing an image of the measurement region, and measuring the pattern. The measurement region may be a pair of regions having the same areas as each other.

Abstract: In an ion implanting apparatus and a method for implanting ions are provided. The ion implanting apparatus includes an ion source part, a substrate holding part, a beam current adjusting part, a doping quantity measuring part, and an ion beam control part. The ion source part generates an ion beam. The ion beam is irradiated onto the substrate and the ions are implanted into the substrate. The beam current adjusting part is disposed between the ion source part and the substrate holding part, to adjust a beam current. The doping quantity measuring part is disposed on substantially the same surface as the substrate, to measure ion doping quantity. The ion beam control part is connected to the doping quantity measuring part, to control the ion source part and the beam current adjusting part.

Abstract: Methods and systems for measuring charges deposited on resistive and/or pixilated electrodes are described. The system includes a Time-of-Flight (TOF) detector with precise timing information provided by a discriminator implemented as a combination of a leading edge discriminator and a constant fraction discriminator. The discriminator initiates acquisition of the peak amplitude for accurate TOF measurements substantially independent of the signal amplitude at the input of the discriminator. The disclosed charge detection electronics has applications for space-based experiments.

Abstract: An ion source includes structure having separate first and second ion volumes therein, and electron source structure having first and second portions that selectively supply electrons to the first and second ion volumes, respectively. The electron source structure has a first operational mode in which the second portion substantially prevents a supply of electrons to the second ion volume and in which electrons are supplied to the first ion volume under control of the first portion, and has a second operational mode in which the first portion substantially prevents a supply of electrons to the first ion volume and in which electrons are supplied to the second ion volume under control of the second portion.

Abstract: Aimed at providing an ion implantation apparatus elongated in period over which failure of a target work, due to deposition and release of ion species typically to and from the inner surface of a through-hole shaping a beam shape of ion beam, may be avoidable, reduced in frequency of exchange of an aperture component, and consequently improved in productivity, an aperture component shaping a beam shape has a taper opposed to the ion beam, in at least a part of inner surface of at least the through-hole, and has a thick thermal-sprayed film formed so as to cover the inner surface and therearound of the through-hole.

Abstract: A method of generating a single photon, includes preparing an optical resonator including a resonator mode of a resonance angular frequency ?c, preparing a material contained in the optical resonator, including a low energy state |g> and a high energy state |e>, and including a transition angular frequency ?a between |g>?|e> that is varied by an external field, applying, to the material, light of an angular frequency ?l different from the resonance angular frequency ?c, and applying a first external field to the material to vary the transition angular frequency ?a to resonate with the angular frequency ?l, such that a state of the material is changed to |e>, and then applying a second external field to the material to vary the transition angular frequency ?a to resonate with the resonance angular frequency ?c, such that the state of the material is restored to |g>.

Abstract: Thermal control is provided for an extraction electrode of an ion-beam producing system that prevents formation of deposits and unstable operation and enables use with ions produced from condensable vapors and with ion sources capable of cold and hot operation. Electrical heating of the extraction electrode is employed for extracting decaborane or octadecaborane ions. Active cooling during use with a hot ion source prevents electrode destruction, permitting the extraction electrode to be of heat-conductive and fluorine-resistant aluminum composition. The service lifetime of the system is enhanced by provisions for in-situ etch cleaning of the ion source and extraction electrode, using reactive halogen gases, and by having features that extend the service duration between cleanings, including accurate vapor flow control and accurate focusing of the ion beam optics.

Abstract: In electron holography observation using a transmission electron microscope, searching of conditions of an electron optical condition which are necessary for realizing a requested spatial resolution is sophisticated and for persons unaccustomed to operation of the electron microscope, the observation is time consuming work. In addition to the fundamental electron microscope proper, an input unit for inputting a spatial resolution requested in the holography observation, a calculation unit for calculating positions of electron biprism and specimen necessary for realizing the requested spatial resolution from the inputted value and parameters characteristic of the device and mechanisms for moving the two positions for realizing the obtained calculation results are provided.

Abstract: A compact, low power ambient pressure pyroelectric ionization source. The source can be constructed using a z-cut lithium niobate or lithium tantalate crystal with an attached resistive heater mounted in front of the atmospheric pressure inlet of an ion trap mass spectrometer. Positive and negative ion formation alternately results from thermally cycling the crystal over a narrow temperature range. Ionization of molecules such as 1,1,1,3,3,3-hexafluoroisopropanol or benzoic acid results in the observation of the singly deprotonated species and their clusters in the negative ion mass spectrum. Ionization of molecules such as triethylamine or triphenylamine with the source results in observation of the corresponding singly protonated species of each in the positive ion mass spectrum. The pyroelectric crystals are thermally cycled by as little as 30 K from ambient temperature. Ion formation is largely unaffected by contamination of the crystal faces. This ion source is robust.

Abstract: A charged-particle beam writing apparatus includes first and second storage devices, a transfer processor for sequentially sending to the first storage several design data files per pattern layout-defined region, a first data processor which sequentially reads design data files from the first storage and converts each data file's design data into draw data for storage in the second storage while being pipelined with the transfer processing, second to n-th data processors which sequentially read data files from the second storage and apply mutually different ones of second to n-th data processings to each draw data in a way that the first to n-th data processings are pipelined and store the processed draw data in the second storage, and a pattern-writing unit for writing a pattern on a workpiece by using a beam that is controlled based on each n-th data processing-completed data being stored in the second storage.

Abstract: A system, method and apparatus for providing additional radiation shielding to a container holding radioactive materials. The invention utilizes a sleeve-like structure that is slid over a container holding high level radioactive materials to add radiation shielding protection. Because the sleeve-like structure and container are non-unitary and slidably separable from one another, crane lifting capacity is not affected.

Abstract: A direct-write electron beam lithography system employing a patterned beam-defining aperture to enable the generation of high current-density shaped beams without the need for multiple beam-shaping apertures, lenses and deflectors is disclosed. Beam blanking is accomplished without the need for an intermediate crossover between the electron source and the wafer being patterned by means of a double-deflection blanker, which also facilitates proximity effect correction. A simple type of “moving lens” is utilized to eliminate off-axis aberrations in the shaped beam. A method for designing the patterned beam-defining aperture is also disclosed.

Abstract: An apparatus and a method for changing optical tweezers are provided. The apparatus includes a diffractive optical element (DOE), a mask unit and an objective lens. The DOE includes a plurality of phase delay patterns. The mask unit includes a plurality of mask patterns that correspond to the phase delay patterns, respectively, wherein at least a portion of the mask patterns are complementary. A laser beam passing through each phase diffractive pattern correspondingly passes through each mask pattern to generate a compound diffractive pattern. The objective lens receives the compound diffractive pattern and focuses it on an examining object to form an optical tweezers.

Abstract: The invention provides a planar component for interfacing an atmospheric pressure ionizer to a vacuum system. The component combines electrostatic optics and skimmers with an internal chamber that can be filled with a gas at a prescribed pressure and is fabricated by lithography, etching and bonding of silicon.

Abstract: A procedure for the preparation of radioisotopes consisting of a first step of electrodepositing a metallic isotope target to be irradiated on a target-holder element, a second step of irradiating the target, a third step of dissolving the target and a fourth set of purifying the radioisotope from the initial metallic isotope and from other possible radioactive and metallic impurities; the electrodeposition step in turn consisting of a dissolution operation in which the isotope to be irradiated is dissolved in a solution of HNO3 with concentration from 0.5 to 2.5 M, a pH buffering operation, and a recirculation operation, in which the solution obtained above is circulated at a rate from 0.5 to 3 within an electrolytic cell during the current output within the cell itself; the electrodeposition of the target to be irradiated occurs within the electrolytic cell during the recirculation operation.

Abstract: A method for analyzing data from a mass spectrometer comprising obtaining calibrated continuum spectral data by processing raw spectral data; obtaining library spectral data which has been processed to form calibrated library data; and performing a least squares fit, preferably using matrix operations (equation 1), between the calibrated continuum spectral data and the calibrated library data to determine concentrations of components in a sample which generated the raw spectral data. A mass spectrometer system (FIG. 1) that operates in accordance with the method, a data library of transformed mass spectra, and a method for producing the data library.

Abstract: The invention concerns a corrector (10) for chromatic and aperture aberration correction in a scanning electron microscope or a scanning transmission electron microscope, comprising four multipole elements (1, 2, 3, 4) which are consecutively disposed in the optical path (9), the first (1) and fourth (4) of which are used to generate quadrupole fields (5, 6) and the second (2) and third (3) of which are used to generate octupole fields (11, 12) and quadrupole fields (7, 7?, 8, 8?), wherein the latter are superposed magnetic (7, 8) and electric (7?, 8?) fields, and wherein the quadrupole fields (5, 6, 7, 8) of all four multipole elements (1, 2, 3, 4) are successively rotated with respect to one another through 90°.