Abstract: The present invention therefore provides a method of treating the surface of an item for a radiotherapy apparatus, comprising the steps of machining into a planar reflective surface of the item a stepped profile, each step having a first surface angled to the planar reflective surface such that, in use, the first surface reflects light incident on the planar reflective surface away from the isocenter of the radiotherapy apparatus and a second surface angled with respect to the planar reflective surface and the first surface such that, in use, the second surface is shadowed from light incident on the planar reflective surface by the first surface, the steps having a depth which does not exceed 2.15% of the total depth of the item.

Abstract: A UV light irradiating apparatus for irradiating a semiconductor substrate with UV light includes: a reactor in which a substrate-supporting table is provided; a UV light irradiation unit connected to the reactor for irradiating a semiconductor substrate placed on the substrate-supporting table with UV light through a light transmission window; and a liquid layer forming channel disposed between the light transmission window and at least one UV lamp for forming a liquid layer through which the UV light is transmitted. The liquid layer is formed by a liquid flowing through the liquid layer forming channel.

Abstract: A system for providing extreme ultraviolet (EUV) radiation comprises a laser source arranged to produce a laser beam having a focus; and a carrier movable relative to the laser source for carrying a surface material, the surface material when carried by the carrier providing a renewable target edge. The focussed beam is arranged to impinge on the target edge to produce an EUV radiation emitting plasma. The system is cooperable with a mirror for harnessing the EUV radiation by reflecting EUV radiation impinging thereon. The mirror comprises a substantially aspheric surface and means for supplying a reflecting liquid to at least partially coat the aspheric surface, the mirror being rotatable to centrifugally confine the liquid to the aspheric surface.

Abstract: A method and device for accurately and reproducibly positioning a woman's breast to receive radiation while the woman is positioned in a prone, face-down position upon a radiation treatment table are disclosed. The treatment table is useable with radiation accelerator tables of existing linear accelerator machines. The treatment table includes a generally flat patient support surface having an opening that allows the patient's breast to fall dependently below the support surface through the opening yet remain above the radiation accelerator table such that the breast can be irradiated for therapy or treatment. The platform further includes a head positioning device connected to the support surface such that a woman's head can be placed in the positioning device while she lies in the prone position and such that one or both of her breasts can be accurately and reproducibly positioned for treatment through the opening.

Abstract: In a Fourier transform mass spectrometer, an ion cyclotron resonance cell includes trapping and reflecting electrodes. Ions are initially trapped via an electrostatic trapping field. After ions have been excited into a coherent cyclotron motion, the trapping field is turned off and the ions are contained using a reflecting field. The reflecting electrostatic field has substantially no radial field components and therefore introduces essentially no magnetron motion into the ion orbits.

Abstract: In a mass spectrometer for carrying out mass analysis while microscopically observing a two-dimensional area of a sample 15, the observation position for selecting a target portion while observing an image of the sample 15 captured with a CCD camera 23 is separated from the analysis position for carrying out the mass analysis of the sample 15 by delivering laser light from the laser-delivering unit 20 onto the sample 15. The sample 15 is placed on a stage 13, which can be precisely moved between the observation position and the analysis position by a stage-driving mechanism 30. An observation optical system 24 can be set close to the sample 15 at the observation position, without impeding the flight of the ions generated from the sample 15 during the analysis or interfering with a laser-condensing optical system 22. Thus, the spatial resolution for observation is improved without deteriorating the ion-detecting efficiency.

Abstract: In an electron emission method, a voltage is applied to a field electron emission element that has a boron nitride material containing crystal, formed on an element substrate to show a conical projection of the boron nitride material and shows a stable electron emitting property in an atmosphere when a voltage is applied thereto to emit electrons. An electron emission threshold of the field electron emission element falls due to formation of a surface electric dipolar layer by bringing it into contact with an operating atmosphere containing polar solvent gas when applying a voltage to the field electron emission element so as to emit electrons.

Abstract: Methods to reduce the write time for forming mask patterns having angled and non-angled features using electron beam lithography are disclosed. In one exemplary embodiment, non-angled features of the mask pattern are formed by exposure to an electron beam. The orientation of the substrate and a path of the generally rectangular-shaped shot from the electron beam may be relatively altered such that the substrate is exposed to the electron beam to form the angled features as if they were non-angled features. In another exemplary embodiment, the electron beam lithography system determines whether it is necessary to relatively alter the orientation of the substrate and a path of the generally rectangular-shaped shot from the electron beam to form the angled features based on the number of angled features and the time required for relatively altering the orientation. Electron beam lithography systems employing a rotatable stage, rotatable apertures, or both, are also disclosed.

Abstract: The invention relates to an apparatus for generating corona discharges, comprising a first assembly, which first assembly is built up of at least one corona discharge space and at least one discharge electrode disposed in the corona discharge space, as well as a high voltage source, an output of which is connected to the at least one discharge electrode. The object of the present invention is to provide an apparatus for generating corona discharges as referred to in the introduction, which apparatus is capable of controlling more corona discharge spaces, using the standard parts and components, and which is also suitable for high power levels, therefore.

Abstract: An assembly for holding a microscopy sample for storage, observation, manipulation, characterization and/or study of the sample using a microscopy instrument is provided. The assembly includes mating first and second parts having faces between which a microscopy sample, including a TEM grid mounted sample, is secured. A spring is used to provide compression between the faces. A rotatable member such as a threaded screw is operable to draw the parts apart from one another. An annular wall functions to protect microscopy samples held in the assembly from damage.

Abstract: The present invention provides a compact electron lens causing little aberration, and a charged particle beam apparatus such as a scanning electron microscope that is super compact and offers a high resolution. An upper magnetic pole and a sample-side magnetic pole are magnetically coupled to the respective poles of a permanent magnet that is made of a highly strong magnetic material such as a rare-earth cobalt system or a neodymium-iron-boron system, that is axially symmetrical, and that has a hole in the center thereof. An inner gap is created on the side of a center axis. Thus, a magnetic lens is formed axially. Moreover, a semi-stationary magnetic path that shields an outside magnetic field and has the magnetic reluctance thereof regulated is disposed outside. The sample-side magnetic pole and magnetic path defines a region where magnetic reluctance is the highest outside the permanent magnet.

Abstract: A method for focusing a scanning microscope, including scanning a primary charged particle beam across first sites of a reference die of a wafer, detecting a secondary beam emitted from the sites, and computing first focus scores for the sites based on the secondary beam. The method includes scanning the primary beam across second sites of a given die of the wafer while modulating a focal depth of the primary beam, the reference die and the given die having congruent layouts, the second sites corresponding vectorially in location with the first sites, and detecting the secondary beam emitted from the second sites in response to the primary beam. The method also includes computing second focus scores for the second sites based on the detected secondary beam emitted therefrom, and determining an exact focus of the primary beam for the second sites using the first and the second focus scores.

Abstract: An embodiment of the present method may comprise: heating up at least one structural element beyond a change state temperature thereof; changing the configuration of the structural element from an extended configuration to a reduced size configuration; cooling the structural element to below the change state temperature thereof; covering the structural element with a thermal protection device; removing the thermal protection device to expose the structural element to heat radiation; and heating, via the heat radiation, at least a portion of the structural element to thereby cause the structural element to change from the reduced size configuration to the extended configuration. In one embodiment each of the structural elements is formed from a thin elastic memory composite material.

Abstract: In a mass spectrometer in which a high ion dissociation efficiency is possible, inserted electrodes are arranged with a form divided into two or more in the axial direction of the ion trap, an electric static harmonic potential is formed from a DC voltage applied to the inserted electrodes, and with an Supplemental AC voltage applied, ions in the ion trap are oscillated between the divided inserted electrodes in the axial direction of the ion trap by resonance excitation, and the ion with a mass/charge ratio within a specific range is mass-selectively dissociated. Thus, a high ion dissociation efficiency is realized by the use of ion trap of the present invention.

Abstract: Apparatus for forming a single or a plurality of threedimensional optical traps, the apparatus comprising: a. A collimated light source that is directed onto an array of focalizing refractive or diffractive elements providing a single or a plurality of focal areas, and b. An array of reflective elements, placed opposite to the said focalizing elements described in a), which reflect back the light into the said focal area. The invention also relates to a method for using this apparatus.

Abstract: Methods for implanting an ionized polyhedral borane cluster or a selected ionized lower mass byproduct into a workpiece generally includes vaporizing and ionizing a polyhedral borane cluster molecule in an ion source to create a plasma and produce ionized polyhedral borane cluster molecules and its ionized lower mass byproducts. The ionized polyhedral borane cluster molecules and lower mass byproducts within the plasma are then extracted to form an ion beam. The ion beam is mass analyzed with a mass analyzer magnet to permit selected ionized polyhedral borane cluster molecules or selected ionized lower mass byproducts to pass therethrough and implant into a workpiece.

Abstract: In a scanning electron microscope, a reflection plate at ground potential is provided in a specimen chamber and backscattering electrons given off from a specimen impinge on the reflection plate to generate subsidiary electrons. An electric field supply electrode applied with a positive voltage of +100 to +500V is arranged in a gap defined by the reflection plate and a specimen stage. A first detection electrode is arranged to detect ion current attributable to backscattering electrons and a second detection electrode is arranged to detect current representative of coexistence of ion currents attributable to secondary electron and backscattering electron. The scanning electron microscope constructed as above can achieve simultaneous separation/detection of secondary electron and backscattering electron.

Abstract: A novel instrument and method for TOF/TOF mass spectrometry is offered. A spiral trajectory time-of-flight mass spectrometer satisfies the spatial focusing conditions for the direction of flight and a direction orthogonal to the direction of flight whenever ions make a turn in the spiral trajectory. An ion gate for selecting precursor ions is placed in the spiral trajectory of the spiral trajectory time-of-flight mass spectrometer. Electric sectors are placed downstream of the ion gate.

Abstract: The invention is directed to an arrangement for the suppression of unwanted spectral components (‘out-of-band’ radiation, as it is called) in a plasma-based radiation source. The object of the invention is to find a novel possibility for the suppression of unwanted spectral components in radiation exiting from a plasma-based EUV radiation source which permits a simple suppression of out-of-band radiation outside the desired EUV range without requiring costly manufacturing and adjustment of diffraction gratings. This object is met according to the invention in that a filter unit is provided between the plasma and an application location of the EUV radiation, which filter unit has at least one gas curtain comprising at least one rapidly flowing gas whose molecules have no absorption maxima for the desired EUV radiation and intensive absorption maxima for other, unwanted wavelengths that are emitted, at least in the IR region.

Abstract: The present invention generally discloses the use of a nanostructured non-silicon thin film (such as an alumina or aluminum thin film) on a supporting substrate which is subsequently coated with an active layer of a material such as silicon or tungsten. The base, underlying non-silicon material generates enhanced surface area while the active layer assists in incorporating and transferring energy to one or more analytes adsorbed on the active layer when irradiated with a laser during laser desorption of the analyte(s). The present invention provides substrate surfaces that can be produced by relatively straightforward and inexpensive manufacturing processes and which can be used for a variety of applications such as mass spectrometry, hydrophobic or hydrophilic coatings, medical device applications, electronics, catalysis, protection, data storage, optics, and sensors.