Patents Examined by Jack I. Berman
  • Patent number: 7755035
    Abstract: An ion trap time-of-flight mass spectrometer capable of obtaining highly-sensitive mass spectra even on the lower mass number side is realized. The ion trap time-of-flight mass spectrometer includes an ion source that operates at atmospheric pressure, an ion optical system for introducing the ions generated by the ion source into a vacuum chamber and converging the ions introduced into the vacuum chamber, an ion trap part for trapping ions in the vacuum chamber, a multipole part for converging the kinetic energy of the ions discharged from the ion trap, and a time-of-flight mass spectrometry part for measuring the ions discharged from the multipole part. The period of high-voltage pulses generated by an electrode provided in the time-of-flight mass spectrometry part can be changed depending on an ion content introduced into the multipole part.
    Type: Grant
    Filed: August 10, 2007
    Date of Patent: July 13, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroshi Nakamura, Tsukasa Shishika, Yasushi Terui, Takuya Saeki
  • Patent number: 7755040
    Abstract: An electric field source for a mass spectrometer and a mass spectrometer are described.
    Type: Grant
    Filed: September 24, 2007
    Date of Patent: July 13, 2010
    Assignee: Agilent Technologies, Inc.
    Inventors: Gangqiang Li, Alexander Mordehai
  • Patent number: 7755064
    Abstract: A resist pattern processing apparatus comprises a stage for mounting a substrate having a patterned photoresist arranged on a surface thereof, a UV-emitting part for emitting UV rays to the stage, and an annular member for surrounding the whole periphery of the substrate. This allows the annular member to restrain ozone supplied near a mounting surface for the substrate on the stage from diffusing to the periphery of the stage, whereby the ozone concentration becomes even in the surface of the substrate mounted on the stage.
    Type: Grant
    Filed: March 7, 2007
    Date of Patent: July 13, 2010
    Assignee: TDK Corporation
    Inventors: Hitoshi Hatate, Akifumi Kamijima
  • Patent number: 7755060
    Abstract: There is disclosed a multipole lens that can be machined with improved accuracy. A method of fabricating this lens is also disclosed. The multipole lens has a blank material from which polar elements will be fabricated. The blank material is sandwiched vertically between two layers of film-like insulator. The blank material and the two layers of film-like insulator are sandwiched vertically between an upper ring and a lower ring. These members are provided with injection holes for injecting a curing agent. The injection holes of these members are aligned. The curing agent is injected into the holes and cured. Then, the blank material is machined by electric discharge machining to form the polar elements.
    Type: Grant
    Filed: April 9, 2007
    Date of Patent: July 13, 2010
    Assignee: JEOL Ltd.
    Inventor: Eiji Kawai
  • Patent number: 7755071
    Abstract: A cover for a syringe includes an elongated flexible envelope and an absorbent material. The elongated flexible envelope includes a body portion and a needle-receiving portion. The body portion has a first end that defines an opening and an opposite second end. The needle-receiving portion extends from the second end of the body portion and terminates in a distal end. The body portion and the needle-receiving portion define a cavity of sufficient size to allow the syringe to be placed therein. The cavity is in communication with the opening. The envelope is made of a material that is impervious to liquid. The absorbent material is disposed in the distal end of the needle-receiving portion.
    Type: Grant
    Filed: September 17, 2007
    Date of Patent: July 13, 2010
    Inventor: Perry Polsinelli
  • Patent number: 7755068
    Abstract: Compact particle selection and collimation devices are disclosed for delivering beams of ions with desired energy spectra. These devices are useful with laser-accelerated ion therapy systems, in which the initial ions have broad energy and angular distributions. Superconducting electromagnet systems produce a desired magnetic field configuration to spread the ions with different energies and emitting angles for particle selection. The simulation of ion transport in the presence of the magnetic field shows that the selected ions are successfully refocused on the beam axis after passing through the magnetic field. Dose distributions are also provided using Monte Carlo simulations of the laser-accelerated ion beams for radiation therapy applications.
    Type: Grant
    Filed: December 21, 2005
    Date of Patent: July 13, 2010
    Assignee: Fox Chase Cancer Center
    Inventors: Chang Ming Ma, Eugene S Fourkal, Jinsheng Li, Wei Luo
  • Patent number: 7755066
    Abstract: Techniques for uniformity tuning in an ion implanter system are disclosed. In one particular exemplary embodiment, the techniques may be realized as a method for ion beam uniformity tuning. The method may comprise generating an ion beam in an ion implanter system. The method may also comprise measuring a first ion beam current density profile along an ion beam path. The method may further comprise measuring a second ion beam current density profile along the ion beam path. In addition, the method may comprise determining a third ion beam current density profile along the ion beam path based at least in part on the first ion beam current density profile and the second ion beam current density profile.
    Type: Grant
    Filed: March 28, 2008
    Date of Patent: July 13, 2010
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventor: Morgan D. Evans
  • Patent number: 7750319
    Abstract: A method and system for measuring contamination of a lithographic element is disclosed. In one aspect, the method comprises providing a first lithographical element in a process chamber. The method further comprises providing a second lithographical element in the process chamber. The method further comprises covering part of the first lithographical element providing a reference region. The method further comprises providing a contaminant in the process chamber. The method further comprises redirecting an exposure beam via the test region of the first lithographical element towards the second lithographical element whereby at least one of the lithographical elements gets contaminated by the contaminant. The method further comprises measuring the level of contamination of the at least one contaminated lithographical element in the process chamber.
    Type: Grant
    Filed: August 28, 2007
    Date of Patent: July 6, 2010
    Assignee: IMEC
    Inventors: Gian Francesco Lorusso, Rik Jonckheere, Anne-Marie Goethals, Jan Hermans
  • Patent number: 7750298
    Abstract: An interferometer is disclosed which has upper-stage, intermediate-stage, and lower-stage electron biprisms. The disclosed interferometer operates with an azimuth angle ? among filament electrodes of the three electron biprisms to arbitrarily control an interference area and an azimuth ? of the interference fringes formed therein, eliminates Fresnel fringes generation, and allows independent control of an interference fringe spacing s and the azimuth ? of the interference fringes.
    Type: Grant
    Filed: January 27, 2006
    Date of Patent: July 6, 2010
    Assignee: Riken
    Inventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
  • Patent number: 7750290
    Abstract: The invention relates to an integrated system for microfluidic analysis of a liquid sample comprising a liquid sample preparing means (100) which is provided with a displacement means (101) for introducing the sample and reagents and for transmitting said sample and reagents to a second means (200) for chemically or biochemically treating the liquid sample drops, wherein said treating means comprises also means (201) for displacing sample drops to means (300) for drop analysis. Said invention is particularly suitable for a laser radiation desorption device comprising a system for manipulating the sample and reagents in the form of drops, which is provided with one or several loading posts, one or several transport paths consisting of interdigitated electrodes, one or several chemical or biochemical treatment areas and at least one system for switching to a conductive post on which a laser radiation desorption can be carried out.
    Type: Grant
    Filed: June 6, 2005
    Date of Patent: July 6, 2010
    Assignees: Universite des Sciences et Technologies de Lille, Centre National de la Recherche Scientifique (CNRS)
    Inventors: Jean-Christophe Fourrier, François Caron, Pierre Tabourier, Christian Druon, Denis J-P Loyaux, Jean-Pierre Antoine Lepesant, Christian Rolando
  • Patent number: 7750318
    Abstract: A first working process performs a deposition working or an etching working to a workpiece by face-irradiating a focused ion beam to the workpiece, and a second working process then performs a deposition working or an etching working to the workpiece by edge-irradiating a focused ion beam to an edge of the workpiece. During the first working process, the deposition working or the etching working is performed to add the missing portion or remove the excess portion to a point slightly short of the edge boundary of the workpiece, i.e., to a point that is less than the irradiation width of the focused ion beam. The remaining missing portion or the remaining excess portion is eliminated in the second working process by edge-irradiating the focused ion beam to the edge of the workpiece.
    Type: Grant
    Filed: April 17, 2006
    Date of Patent: July 6, 2010
    Assignee: SII Nanotechnology Inc.
    Inventor: Tomokazu Kozakai
  • Patent number: 7750325
    Abstract: Apparatus for producing and storing positrons may include a trap that defines an interior chamber therein and that contains an electric field and a magnetic field. The trap may further include a source material that includes atoms that, when activated by photon bombardment, become positron emitters to produce positrons. The trap may also include a moderator positioned adjacent the source material. A photon source is positioned adjacent the trap so that photons produced by the photon source bombard the source material to produce the positron emitters. Positrons from the positron emitters and moderated positrons from the moderator are confined within the interior chamber of the trap by the electric and magnetic fields. Apparatus for producing and storing protons are also disclosed.
    Type: Grant
    Filed: November 28, 2007
    Date of Patent: July 6, 2010
    Assignee: The United States of America as represented by the United States Department of Energy
    Inventor: Douglas W. Akers
  • Patent number: 7748052
    Abstract: A scanning probe microscope capable of preventing contact between the probe and a sample and a method of operating this microscope. The scanning probe microscope measures the topography of a surface of the sample by scanning the probe relative to the surface of the sample. A scanning reference position in the heightwise direction is updated in response to a maximum value of the height of the surface of the sample on the scan lines scanned so far. A limit value is set for motion of the probe in the heightwise direction relative to the scanning reference position. After the update, the next scan line is scanned. In this way, scanning is carried out along the successive scan lines.
    Type: Grant
    Filed: July 13, 2006
    Date of Patent: June 29, 2010
    Assignee: JEOL Ltd.
    Inventor: Hideo Kojima
  • Patent number: 7745783
    Abstract: A monochromator (1) for a charged particle optics, in particular, for electron microscopy, comprises at least one first deflection element (2, 3) with an electrostatic deflecting field (2?, 3?) for generating a dispersion (4) in the plane (5) of a selection aperture (6) to select charged particles of a desired energy interval (7) and at least one second deflection element (8, 9) with an electrostatic deflecting field (8?, 9?) which eliminates the dispersion (4) of the at least one first deflecting field (2?, 3?). A radiation source (17) comprises such a monochromator (1).
    Type: Grant
    Filed: May 20, 2008
    Date of Patent: June 29, 2010
    Assignee: CEOS Corrected Electron Optical Systems GmbH
    Inventor: Stephan Uhlemann
  • Patent number: 7745781
    Abstract: In a method controlling an ion detector, one or more ion input signals are received at the ion detector. A data point indicative of an intensity of at least one of the received ion input signals is acquired. Asynchronously with acquiring the data point, a drive voltage applied to the ion detector is regulated to operate the ion detector at a gain optimal for the intensity of at least one of the received ion input signals. An ion detector for implementing the method is also provided.
    Type: Grant
    Filed: May 30, 2008
    Date of Patent: June 29, 2010
    Assignee: Varian, Inc.
    Inventor: Urs Steiner
  • Patent number: 7745785
    Abstract: A sample holder is offered which is used when a sample is inspected by irradiating the sample with a primary beam consisting of a charged-particle beam (such as an electron beam) via a film. Furthermore, method and apparatus for preventing destruction of the film due to a pressure difference by detecting damage to the film during inspection are offered.
    Type: Grant
    Filed: December 6, 2007
    Date of Patent: June 29, 2010
    Assignee: JEOL Ltd.
    Inventor: Hidetoshi Nishiyama
  • Patent number: 7745787
    Abstract: Disclosed here is a high resolution scanning electron microscope having an in-lens type objective lens. The microscope is structured so as to detect transmission electrons scattering at wide angles to observe high contrast STEM images according to each sample and purpose. A dark-field detector is disposed closely to the objective lens magnetic pole. The microscope is provided with means for moving the dark-field detector along a light axis so as to control the scattering angle of each detected dark-field signal.
    Type: Grant
    Filed: February 15, 2008
    Date of Patent: June 29, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Chisato Kamiya, Masahiro Akatsu, Mitsugu Sato
  • Patent number: 7741628
    Abstract: A long-term storage container (1) for storage of radioactive material to inhibit radioactive radiation therefrom to the outside of the container, the top of said container to be closed by a screw-on radioactive radiation inhibiting lid (7), said container having an integral inner container part (2; 34; 62; 62?) of a first material, e.g. plastic material, an integral outer container part (3; 43; 69) of a second material, e.g. plastic material, and radioactive radiation inhibiting material (4; 38; 68) in an inter-space between the walls and bottoms of said inner and outer container parts. To fill the inter-space an inter-space container part (4; 38; 68) is integrally moulded through injection or pressure moulding and then fitted onto the inner container part (2; 34; 62; 62?) to subsequently mould the outer container part (3; 43; 69) onto the outside of the inter-space container part (4; 38; 68). A specially made container lid (7) is provided.
    Type: Grant
    Filed: October 19, 2005
    Date of Patent: June 22, 2010
    Assignee: Nuclear Protection Products AS
    Inventor: Frank Stengrimsen
  • Patent number: 7741616
    Abstract: A liquid in which fine solid Sn particles are dispersed in a resin is accommodated inside the heated tank 4. The resin pressurized by a pressurizing pump is conducted to a nozzle 1, so that a liquid-form resin is caused to jet from the tip end of the nozzle 1 that is disposed inside a vacuum chamber 7. The liquid-form resin which is caused to jet from the nozzle 1 assumes a spherical shape as a result of surface tension, and is solidified by being cooled in a vacuum, so that a solid-form target 2 is formed. A laser introduction window 10 used for the introduction of laser light is formed in the vacuum chamber 7, and laser light generated from a laser light source 8 disposed on the outside of the vacuum chamber 7 is focused by a lens 9 and conducted into the vacuum chamber 7, so that the target is converted into a plasma, thus generating EUV light.
    Type: Grant
    Filed: June 22, 2005
    Date of Patent: June 22, 2010
    Assignee: Nikon Corporation
    Inventor: Katsuhiko Murakami
  • Patent number: 7741623
    Abstract: The invention relates to a patient-positioning device for positioning a patient in an irradiation position in a radiation therapy arrangement, in particular in a particle radiation therapy arrangement comprising a patient supporting module, which is provided with a patient supporting device for holding the patient in a body holder where the irradiation is to be carried out, wherein, said patient supporting device is mounted on a base unit in such a way that it is rotatable about an axis by means of a bearing, said base unit is provided with a coupling element, the inventive device is also provided with a positioning arm, which comprises several joints and a coupling point for coupling the coupling element and for freely positioning the patient in any predefined irradiation position by adjusting the angle of rotation of the patient supporting module.
    Type: Grant
    Filed: August 25, 2006
    Date of Patent: June 22, 2010
    Assignee: Siemens Aktiengesellschaft
    Inventor: Andres Sommer