Patents Examined by Jack I. Berman
  • Patent number: 7804058
    Abstract: An optical tweezers controlling device including a light source, an objective lens and a focus adjusting unit is provided. The focus adjusting unit disposed between the light source and the objective lens includes a mirror set and a zoom lens set. The mirror set has at least a mirror. The mirror is rotatable such that after a light of the light source is projected to the mirror, the reflective direction of the light reflected from the mirror is changeable. The zoom lens set has at least a zoom lens disposed in accordance with the mirror. By rotating the mirror or changing the focal length of the zoom lens, the focusing location of the light changes on the focal plane of the objective lens or in the front or the rear of the focal plane.
    Type: Grant
    Filed: August 6, 2008
    Date of Patent: September 28, 2010
    Assignee: Raydium Semiconductor Corporation
    Inventors: Long Hsu, Cheng-Hsien Liu, Sheng-Yang Tseng, Ai-Tang Chang, Chung-Cheng Chou, William Wang, Fung-Hsu Wu, Chen Peng, Ta-Yuan Lee
  • Patent number: 7804062
    Abstract: A method of obtaining pure component mass spectra or pure peak elution profiles from mass spectra of a mixture of components involves estimating number of components in the mixture, filtering noise, and extracting individual component mass spectra or pure peak elution profiles using blind entropy minimization with direct optimization (e.g. downhill simplex minimization). The method may be applied to deconvolution of pure GC/MS spectra of overlapping or partially overlapping isotopologues or other compounds, separation of overlapping or partially overlapping compounds in proteomics or metabolomics mass spectrometry applications, peptide sequencing using high voltage fragmentation followed by deconvolution of the obtained mixture mass spectra, deconvolution of MALDI mass spectra in the separation of multiple components present in a single solution, and specific compound monitoring in security and/or environmentally sensitive areas.
    Type: Grant
    Filed: April 4, 2007
    Date of Patent: September 28, 2010
    Assignee: National Research Council of Canada
    Inventors: Juris Meija, Zoltan Mester
  • Patent number: 7804057
    Abstract: The invention relates to an optical substance manipulator capable of continuing to apply a continued force of action to moving substances without being limited by the flowing conditions for the substances yet with a wide manipulation margin and with efficiency, thereby continuously carrying out various manipulations such as separation, concentration, mixing, and deflection. Specifically, the invention provides an optical substance manipulator capable of manipulating microscopic particles dispersed in a flowing fluid by means of light pressure, characterized by comprising an optical system that forms multiple linear light-collective areas simultaneously with respect to a fluid that flows on a subject surface (5), and further comprising, in optical paths forming the respective linear light-collective areas, means (CL1), (CL2) adapted to adjust directions of the linear light-collective areas on the subject surface and means (M1), (M2) adapted to adjust positions of the linear light-collective areas.
    Type: Grant
    Filed: May 23, 2007
    Date of Patent: September 28, 2010
    Assignee: Keio University
    Inventors: Yohei Sato, Koichiro Saiki
  • Patent number: 7804074
    Abstract: A lightray treatment device (1) for hardening fingernail modeling compounds has a lightray treatment chamber (3) enclosed in a housing (2) and can be comfortably reached by both the left and right hands of a user of the device (1). The housing (2) has two oppositely located wall openings (6, 7) and a hand support surface (8, 9) with a thumb support (12, 13) assigned to each wall opening (6, 7) in the lightray treatment chamber (3). At least two light sources (10, 11) are arranged in the lightray treatment chamber (3), of which the first light source (10) is used for treating the thumb with light and is arranged in front of the thumb supports (12, 13) of the hand support surfaces (8, 9), and the second light source (11) is arranged in the ceiling of the lightray treatment chamber (3).
    Type: Grant
    Filed: April 7, 2008
    Date of Patent: September 28, 2010
    Assignee: European Nail Factory GmbH
    Inventor: Thomas Bernecker
  • Patent number: 7804066
    Abstract: Provided is a charged-particle beam apparatus capable of preventing a small amount of dust from being attached to an electrostatic lens serving as an objective lens to apply a high voltage to the electrostatic lens. The charged-particle beam apparatus 1 includes a chamber 2 which has an interior 2a evacuated by an intra-chamber evacuating means 4, and a lens-barrel 3 which emits a charged-particle beam B1 onto a sample S put in the interior 2a of the chamber 2.
    Type: Grant
    Filed: July 22, 2008
    Date of Patent: September 28, 2010
    Assignee: SII NanoTechnology Inc.
    Inventors: Takashi Ogawa, Hiroto Muto
  • Patent number: 7800074
    Abstract: An electron-optical corrector for rendering superfluous both the third-order opening error and the anisotropic part of the extra-axial third-order coma, using round lenses and hexapole fields, the corrector includes at least three coaxially arranged hexapole fields with at least one round lens field is arranged between adjacent hexapole fields, so that the hexapole fields are imaged onto each other in pairs. The intensities of the hexapole fields are selected so that the image error coefficient of the three-fold astigmatism is equal to 0, and at least three hexapole fields in the Larmor reference system are rotated in relation to each other at an angle about the optical axis.
    Type: Grant
    Filed: October 11, 2006
    Date of Patent: September 21, 2010
    Inventor: Stephan Uhlemann
  • Patent number: 7800056
    Abstract: A document sampler can be arranged to receive a document in an insertion area of the document sampler. With such arrangements, a document can be directly inserted into a document sampler without an extra step of swabbing a document with a sample collection device. By eliminating the extra step of swabbing a document, the efficiency of sample detection is improved, sample detection is performed more rapidly, and operating costs of sample detection are decreased.
    Type: Grant
    Filed: October 24, 2007
    Date of Patent: September 21, 2010
    Assignee: Smiths Detection Montreal Inc.
    Inventors: Bill Mawer, Geoff Beyer, Mark Elliot, Mark Piniarski, Roland Link, Simon Feldberg
  • Patent number: 7800060
    Abstract: Easily and correctly measuring a dimension of a pattern of a photomask or of an OPC pattern of the photomask. A pattern measurement method of the present invention includes steps of obtaining both a standard pattern corresponding to a predetermined pattern and a measurement point specified in advance; setting a measurement area so that it includes two straight line segments on both sides of the measurement point among outlines of the standard pattern; and measuring a dimension between two contours of the scanned image of the predetermined pattern in the measurement area by superposing the measurement area on the scanned image of the predetermined pattern. The measurement area is set so as not to include portions near corner portions connected to two line segments.
    Type: Grant
    Filed: July 30, 2008
    Date of Patent: September 21, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hidetoshi Sato, Ryoichi Matsuoka, Takumichi Sutani
  • Patent number: 7800077
    Abstract: The present invention provides a specimen holder for use with an electron microscope. The specimen holder has a retainer mounted at the front end of the body of the specimen holder. The retainer has a plate member provided with a hole around its front end. The hole provides a reference in securing the whole specimen for a desired field of view. A circular groove is formed in the plate member and used to place the specimen in position. Any members lying perpendicularly to the tilted axis at the position of the specimen are cut out.
    Type: Grant
    Filed: December 26, 2007
    Date of Patent: September 21, 2010
    Assignee: JEOL Ltd.
    Inventor: Koji Moriya
  • Patent number: 7800083
    Abstract: A plasma electron flood system, comprising a housing configured to contain a gas, and comprising an elongated extraction slit, and a cathode and a plurality of anodes residing therein and wherein the elongated extraction slit is in direct communication with an ion implanter, wherein the cathode emits electrons that are drawn to the plurality of anodes through a potential difference therebetween, wherein the electrons are released through the elongated extraction slit as an electron band for use in neutralizing a ribbon ion beam traveling within the ion implanter.
    Type: Grant
    Filed: November 6, 2007
    Date of Patent: September 21, 2010
    Assignee: Axcelis Technologies, Inc.
    Inventors: Bo H. Vanderberg, William F. DiVergilio
  • Patent number: 7800084
    Abstract: A charged-particle beam lithography system is provided. A region to be patterned is divided into plural frames, a main deflection positions a beam to a subfield within the frame, and an auxiliary deflection draws a pattern in units of subfield. The deflection control portion draws a pattern in units of stripe including a first frame drawing region and a second frame drawing region. The first frame drawing region corresponds to one of the frames, and the second frame drawing region is a region moved by a distance C from the first frame drawing region toward a frame to be drawn next. The deflection control portion controls the driver to alternately pattern a first sub-field drawing region in the first frame drawing region and a second sub-field drawing region in the second frame drawing region. The distance C satisfies 0<C<Ws. Ws is a width of the subfield.
    Type: Grant
    Filed: November 1, 2007
    Date of Patent: September 21, 2010
    Assignee: NuFlare Technology, Inc.
    Inventor: Shuichi Tamamushi
  • Patent number: 7800058
    Abstract: A mass spectrometer that is switchable to operate as a linear trap or as a mass filter, and attaining both high ejection efficiency when operated as a linear trap and high mass resolving power when operated as a mass filter. A mass spectrometer includes an ion source for ionizing a sample, a linear trap quadrupole rod lens supplied with ionized ions, a trap electrode for forming a potential to trap the supplied ions between one end of the quadrupole lens and the other end, a control unit to regulate the trap lens voltage, and a mass analyzer or detector to detect ions ejected from the linear trap, and characterized in switching between an operation where the supplied ions are trapped in a section quadrupole rod lens and ejected by the controller unit regulating the trap electrode voltage; and an operation where ions are selective passed through according to their mass.
    Type: Grant
    Filed: November 8, 2007
    Date of Patent: September 21, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Masuyuki Sugiyama, Yuichiro Hashimoto, Hideki Hasegawa, Izumi Waki
  • Patent number: 7800076
    Abstract: A particle-optical corrector for eliminating both the third-order aperture aberration and the third-order extra-axial coma, using circular lenses and hexapole fields, includes three coaxially arranged hexapole fields, at least one circular lens doublet being arranged between adjacent hexapole fields and adjusted so that the center hexapole field is imaged on the hexapole fields. Between the hexapole fields, an intermediate plane prevails and the intermediate planes are conjugated with one another. The three hexapole fields are identically oriented in the Larmor reference system with the intensities of the three fields being chosen so that the image aberration coefficient of the astigmatism with three-fold symmetry becomes 0. The corrective contains two hexapole fields, in which the fields of the hexapole field pair are excited anti-symmetrically to one another, and the pairs are in each case arranged around the two intermediate planes.
    Type: Grant
    Filed: March 31, 2007
    Date of Patent: September 21, 2010
    Inventors: Stephan Uhlemann, Harald Rose, Heiko Müller
  • Patent number: 7800055
    Abstract: LC/MS data generated by an LC/MS system is analyzed to determine groupings of ions associated with originating molecules. Ions are grouped initially according to retention time, for example, using retention time or chromatographic peaks in mass chromatograms. After initial groupings are determined based on retention time, ion peak shapes are compared to determine whether ions should be excluded. Ions having peak shapes not matching other ions, or alternatively a reference peak shape, are excluded from the group.
    Type: Grant
    Filed: May 20, 2005
    Date of Patent: September 21, 2010
    Assignee: Waters Technologies Corporation
    Inventors: Scott J. Geromanos, Jeffrey Cruz Silva, Guo-Zhong Li, Marc Victor Gorenstein
  • Patent number: 7800075
    Abstract: A multifunction module for an electron beam column comprises upper and lower electrodes, and a central ring electrode. The upper and lower electrodes have multipoles and are capable of deflecting, or correcting an aberration of, an electron beam passing through the electrodes. A voltage can be applied to the central ring electrode independently of the voltages applied to the upper and lower electrodes to focus the electron beam on a substrate.
    Type: Grant
    Filed: August 19, 2008
    Date of Patent: September 21, 2010
    Inventors: Benyamin Buller, William J. DeVore, Juergen Frosien, Xinrong Jiang, Richard L. Lozes, Henry Thomas Pearce-Percy, Dieter Winkler, Steven T. Coyle, Helmut Banzhof
  • Patent number: 7800080
    Abstract: The transmissivity of an f? lens which is used as a means for converging laser light differs in the center and in the edge thereof. As a result, when the f? lens is used as it is with the purpose of crystallizing by laser irradiation, energy distribution of the laser light which is irradiated on the semiconductor film is not uniform so that the whole surface of the semiconductor film could not be irradiated uniformly. Therefore, the present invention provides a laser irradiation apparatus including a galvanometer mirror and an f? lens that can offset the change of the energy due to the change of transmissivity of the f? lens and can scan the laser light while controlling the change of the energy on the object to be irradiated. Moreover, the invention provides a manufacturing method of a semiconductor device including the laser irradiation apparatus described above.
    Type: Grant
    Filed: June 19, 2007
    Date of Patent: September 21, 2010
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventor: Koichiro Tanaka
  • Patent number: 7795602
    Abstract: A utility vehicle (100) with ergonomic, safety, and maintenance features is disclosed. The ergonomic, safety, and maintenance features enhance the utility of the vehicle.
    Type: Grant
    Filed: March 17, 2008
    Date of Patent: September 14, 2010
    Assignee: Polaris Industries Inc.
    Inventors: Joshua J. Leonard, Richard Raymond Maki, Eric Bjerketvedt, Mitchell D. Johnson, Bradley Robert Morisch, Brian D. Krosschell, Louis J. Brady, James Bergman, Larry Holter, Richard Nelson, Lionel Hoff, Doug Moman, Michael D. Schneider
  • Patent number: 7791024
    Abstract: A method of evaluating an element that includes the step of preparing a thin evaluation sample including a first portion in which a first layer containing a first material and a second layer containing a second material are laminated, a second portion containing the first material, and a third portion containing the second material; and calculating the thickness of the first layer in the first portion.
    Type: Grant
    Filed: August 22, 2008
    Date of Patent: September 7, 2010
    Assignee: Fujitsu Limited
    Inventors: Toyoo Miyajima, Yasutoshi Kotaka
  • Patent number: RE41665
    Abstract: This invention relates to an object observation apparatus and observation method.
    Type: Grant
    Filed: June 13, 2007
    Date of Patent: September 14, 2010
    Assignee: Nikon Corporation
    Inventors: Muneki Hamashima, Yoichi Watanabe, Yoshiaki Kohama
  • Patent number: RE41667
    Abstract: There is provided an illumination system for microlithography with wavelengths?193 nm that includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical element and the second optical element are reflective. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed, at least partially, on a field in the image plane. The first optical component includes a collector unit and a second optical element having a plurality of second raster elements.
    Type: Grant
    Filed: September 28, 2001
    Date of Patent: September 14, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: Martin Antoni, Wolfgang Singer, Johannes Wangler