Abstract: A method of modulating an infrared radiation (IR) source that includes applying a time-varying, periodic voltage signal to the IR source, measuring a parameter of the voltage signal, and adjusting the voltage signal to maintain a substantially constant delivered power to the IR source. Adjusting the voltage signal is done based on the measured parameter and a predetermined relationship between the measured parameter of the voltage pulse and a resistance of such an infrared radiation source. Alternatively, the method includes applying a the voltage pulse, measuring a first parameter of the voltage pulse and a second parameter of a current passing through the infrared radiation source resulting from the applying step, and adjusting the voltage pulse to maintain a substantially constant delivered power to the infrared radiation source based on the first parameter and the second parameter.

Abstract: An SEM wherein the entire imaging apparatus of the SEM is supported on air bearings. A multi-stage differentially pumped vacuum seal area provides a localized vacuum zone for wafer examination. A wafer leveling mechanism insures that the top surface of the wafer being examined is placed and maintained in a position level with the surface upon which the air bearing supported SEM rests. The SEM can move on its air bearings such that any portion of the wafer can be examined. A voltage-isolating passageway for providing high voltage isolation between a component maintained at high DC voltage and a component maintained at a substantially lower voltage is described. The voltage-isolating passageway incorporates a transverse magnetic field across its passageway. The voltage-isolating passageway includes at least two magnets that are positioned along opposite and exterior surfaces of the passageway. A semi-conductive coating can be applied to the interior passageway surface.

Abstract: A solid state sub-nanometer-scale electron beam emitter comprising a multi-layered structure having a nano-tip electron emitter and tunnel emission junction formed on substrate, an initial electron beam extraction electrode, a “nano-sandwich Einzel” electrode, and a topmost protective layer.

Abstract: A system for handling a radioactive source includes a container containing a radioactive source and a cap mounted on the container to retain the radioactive source inside the container. The cap has a first locking structure and a second locking structure. The system further includes a handling tool having a support shaft, a first locking tip adapted to form a first lock with the first locking structure, and a second locking tip adapted to form a second lock with the second locking structure. The first and second locking tips are slidably coupled to the support shaft.

Abstract: A particle beam therapy system transports an ion beam emitted from an accelerator to one of a plurality of treatment rooms. For that purpose, the therapy system includes a first beam transport system connected to the accelerator, and a plurality of second beam transport systems provided respectively corresponding to the treatment rooms and connected to the first beam transport system. To transport the ion beam to the selected treatment room, a plurality of electromagnets disposed in the corresponding second beam transport system and in a portion of the first beam transport system extended into the relevant second beam transport system are excited in accordance with respective control commands. Control command information including the respective control commands is formed by using at least treatment room information representing the selected treatment room and treatment plan information specified depending on patient identification information.

Abstract: There is provided a sample observing apparatus for observing the surface of a sample by irradiating an electron beam thereto, having an electron gun for irradiating the electron beam to the surface of the sample, a potential control section for adjusting electric potential of the surface of the sample to potential set in advance by applying voltage determined based on an amount of electric charge on the surface of the sample to the sample, an electron detecting section for detecting electrons produced when the electron beam is irradiated to the surface of the sample and an appearance acquiring section for acquiring the appearance of surface of the sample per each spot on the surface based on the electrons detected by the electron detecting section.

Abstract: The present disclosure provides a device and method for exposing a person to ultraviolet radiation in tanning wavelengths which is emitted from a discharge lamp having a plurality of grooves formed in its outer periphery along a helical path. The discharge lamp includes, inter alia, an elongated vitreous tube, first and second electrode assemblies and a coating on the interior the interior of the tube. The coating is applied on an interior of the tube along the entire length for emitting ultraviolet radiation in tanning wavelengths when a voltage is applied across the first and second electrodes. In a first representative embodiment, the plurality of grooves are interconnected and the helical path is continuous. Alternatively, the plurality of grooves can be axially offset and the helical path can be discontinuous.

Abstract: A lithographic projection apparatus includes reflector assembly, a foil trap, and a housing that is constructed and arranged to contain the reflector assembly and the foil trap. The reflector assembly is connected to the housing via a first wall, and the foil trap is connected to the housing via a second wall. The apparatus also includes a chamber between the foil trap and the reflector assembly. The chamber is defined by the housing, the first wall, and the second wall. The apparatus further includes a pump that is configured to create a vacuum in the chamber.

Abstract: A lithographic projection apparatus includes a grazing incidence collector. The grazing incidence collector is made up of several reflectors. In order to reduce the amount of heat on the collector, the reflectors are coated. The reflector at the exterior of the collector has an infrared radiating layer on the outside. The inner reflectors are coated with an EUV reflective layer on the outside.

Abstract: A method for the protection of an optical element of a lithographic apparatus including the optical element and a source of radiation includes providing a material including one or more elements selected from B, C, Si, Ge and/or Sn, and arranging the material such that the source, in use, causes removal of at least part of the material, thereby providing depositable material, and such that at least part of the depositable material deposits on the optical element.

Abstract: An object of this invention is to provide a charged particle beam apparatus that is capable of handling samples without adhering impurities onto the samples. In a scanning electron microscope in which a lubricant was coated on a sliding portion of a movable member that moves inside a vacuum chamber, a substance from which low molecular components were removed is used as the lubricant. It is thus possible to inhibit sample contamination and suppress the occurrence of defects in a process following measurement of the samples.

Abstract: An auto focusing method and apparatus for determining a focusing evaluation value, comparing the focusing evaluation value with an acceptance level of a preset focusing evaluation value, and iteratively focusing, while widening the depth of focus, when the focusing evaluation value is lower than the acceptance level.

Abstract: A detector that may contain a glow discharge ionizer and a photo-ionizer. The existence of both ionizers may increase the accuracy and number of chemical compounds that can be simultaneously monitored for chemical screening applications. The detector is particularly useful for screening explosives, chemical agents, and other illicit chemicals.

Abstract: The invention relates to the ionization of analyte molecules on a solid surface close to atmospheric pressure as an ion source for mass spectrometers. The invention uses a spray mist from an electrospray apparatus to ionize the analyte molecules, for example a spray mist created by spraying pure water, which generates predominantly multiply charged ions of the analyte molecules which are particularly suitable for fragmentation.

Abstract: Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g.

Abstract: In relation to a chromatographic chip, for protein separation, a polymer surface is provided that has a first polymer layer, attached to a support surface, which can be anionic or cationic. To the first layer is attached a second polymer layer, characterized by an opposite charge.

Abstract: An electron beam apparatus is provided for evaluating a sample at a high throughput and a high S/N ratio. As an electron beam emitted from an electron gun is irradiated to a sample placed on an X-Y-? stage through an electrostatic lens, an objective lens and the like, secondary electrons or reflected electrons are emitted from the sample. The primary electron beam is incident at an incident angle set at approximately 35° or more by controlling a deflector. Electrons emitted from the sample is guided in the vertical direction, and focused on a detector. The detector is made up of an MCP, a fluorescent plate, a relay lens, and a TDI (or CCD). An electric signal from the TDI is supplied to a personal computer for image processing to generate a two-dimensional image of the sample.

Abstract: A radiation treatment system (100) for accurately delivering radiation to a targeted site within a cancer patient (108) that includes a modular patient support system and a patient positioner (114). The modular patient support system includes a modularly expandable patient pod (200) and at least one immobilization device, such as, for example, a rigid moldable foam cradle (350). The patient pod (200) includes a generally hemi-cylindrical support shell (212) that extends longitudinally between proximal edge (214) and distal edge (216), and transversely between two lateral edges (222, 224). In one embodiment, the lateral edges (222, 224) are tapered to minimize edge effects that result when radiation beams traverse the lateral edges (222, 224).

Abstract: Packaging system for radioactive materials having: a vial with closure for accommodating the radioactive material; a first casing to be opened, enclosing the vial, and essentially made from a transparent material, which has a capture cross-section selected for shielding at least a part of the emitted radiation; and a second casing to be opened, made from a material with a high capture cross-section (Z) for essentially shielding the remaining radiation, the second casing enclosing the first casing.

Abstract: A method for measuring leakage through a dielectric layer of a semiconductor device on a wafer, including irradiating the dielectric layer with a charged particle beam having a beam current. The irradiation generates a wafer current having a relation to the beam current in a selected range of the beam current. The method further includes determining a boundary value of the beam current at which the relation is not satisfied, and determining a leakage current through the dielectric layer in response to the boundary value.