Patents Examined by Jason L McCormack
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Patent number: 12133927Abstract: A sanitization apparatus includes an excimer lamp and a power converter. The power converter comprises a wide band gap device and a planar inductor. The wide band gap device is selectively switchable between a first mode wherein the inductor is electrically charged and a second mode wherein the inductor is electrically discharged. The wide band gap may be repeatedly switched between the first and second modes to generate a nano second pulse output voltage waveform.Type: GrantFiled: October 20, 2021Date of Patent: November 5, 2024Assignee: GOODRICH CORPORATIONInventors: Yongduk Lee, Matthew Robert Pearson
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Method and apparatus for usable beam current and brightness in Schottky thermal field emission (TFE)
Patent number: 12131883Abstract: A system for determining Schottky thermal field emission (TFE) usable current and brightness of a Schottky TFE source is provided, the system including: one or more processors, configured to: acquire and store in a memory a Schottky TFE emission image in a digital format; and determine Schottky TFE usable beam current and brightness for the based on experimentally developed algorithms that utilize usable current criteria and usable emission current density, the usable current criteria being generated based on properties of a central beam component and an outer beam component of Schottky TFE beam current.Type: GrantFiled: August 28, 2023Date of Patent: October 29, 2024Assignees: NuFlare Technology, Inc., NuFlare Technology America, Inc.Inventors: Victor Katsap, Chising Lai -
Patent number: 12131881Abstract: A contamination prevention irradiation device includes a generation unit and a mirror unit. The generation unit generates a laser beam. The mirror unit has a mirror surface for reflecting a laser beam. The laser beam reflected on the mirror surface is applied to a specimen disposed inside an objective lens. The laser beam is composed of a pulse train. Once a laser beam is applied to the specimen before observation of the specimen, deposition of contaminants on the specimen can be prevented for a predetermined subsequent period.Type: GrantFiled: April 12, 2022Date of Patent: October 29, 2024Assignee: JEOL Ltd.Inventors: Takeshi Kaneko, Norihiro Okoshi, Yu Jimbo, Sang Tae Park
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Method of creating an optical atom trap and atom trap apparatus, employing an incoherent light field
Patent number: 12131834Abstract: A method of creating an optical atom trap comprises the steps of providing an incoherent light field with a light source apparatus, by creating a pulsed laser light beam of laser pulses with a repetition rate equal to or above 100 kHz and a relative spectral width of 10?4 to 10?2, coupling the pulsed laser light beam to an input end of a multimode waveguide device and guiding the pulsed laser light beam by total internal reflection to an output end of the multimode waveguide device, wherein the incoherent light field is provided at the output end, and creating the optical atom trap for trapping atoms in an atom trap chamber device by coupling the incoherent light field to the atom trap chamber device, wherein the optical atom trap has a trap frequency and the atoms have multiple resonance frequencies, and the laser pulses for providing the incoherent light field are created such that the repetition rate is above the trap frequency and the spectral width is below a spectral range between the resonance frequencType: GrantFiled: September 10, 2020Date of Patent: October 29, 2024Assignee: Max-Planck-Gesellschaft zur Foerderung der Wissenschaften e. V.Inventors: Dawei David Wei, Christian Gross, Immanuel Bloch -
Patent number: 12123879Abstract: The present disclosure provides a method for accurately measuring post-translational modifications in proteins such as antibodies. In particular, the method pertains to the use of heavy isotopic standards to generate a calibration curve to allow for accurate quantitation of a modified peptide. The method may be used to accurately quantify C-terminal truncation in antibodies using mass spectrometry.Type: GrantFiled: June 18, 2021Date of Patent: October 22, 2024Assignee: Regeneron Pharmaceuticals, Inc.Inventors: Tyler Greer, Milos Cejkov, Reid O'Brien Johnson, Xiaojing Zheng, Ning Li
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Patent number: 12125669Abstract: Apparatuses, systems, and methods for providing beams for controlling charges on a sample surface of charged particle beam system. In some embodiments, a module comprising a laser source configured to emit a beam. The beam may illuminate an area adjacent to a pixel on a wafer to indirectly heat the pixel to mitigate a cause of a direct photon-induced effect at the pixel. An electron beam tool configured to detect a defect in the pixel, wherein the defect is induced by the indirect heating of the pixel.Type: GrantFiled: July 31, 2023Date of Patent: October 22, 2024Assignee: ASML Netherlands B.V.Inventors: Ning Ye, Jun Jiang, Jian Zhang, Yixiang Wang
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Patent number: 12109321Abstract: Disclosed is a system and method for reducing microorganisms. The system comprises a light assembly and a processor. The light assembly operable to emit at least two of three different blue lights at different peak wavelengths with a full width half maximum of at most 25 nm, each peak having a time averaged intensity. The peak wavelengths are selected from 400-410 nm, 440-464 nm and 465-490 nm. The processor is communicably coupled to the light assembly to control the time averaged intensities of the blue lights emitted by the light assembly such that if two blue lights are used, the time averaged intensity of one blue light is between 0.67 and 1.33 times the time averaged intensity of another blue light; and if three blue lights are used, the time averaged intensity of any one blue light is between 0.76 and 1.24 times the time averaged intensity of the time averaged intensity of both the other blue lights.Type: GrantFiled: August 27, 2019Date of Patent: October 8, 2024Assignee: LED Tailor OyInventors: Camilla Höglund, Niko Huhtinen
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Patent number: 12106956Abstract: A system for improving an appearance of light from an excimer lamp includes the excimer lamp configured to output excimer light that includes ultraviolet light having an ultraviolet wavelength and visible light having a first visible wavelength or spectra. The system further includes at least one additional light source configured to be packaged with the excimer lamp and to output additional light having a second visible wavelength or spectra. The system further includes a cover that is at least one of transparent or translucent to the ultraviolet wavelength and having a surface pattern that causes the excimer light to blend with the additional light.Type: GrantFiled: May 4, 2022Date of Patent: October 1, 2024Assignee: B/E AEROSPACE, INC.Inventors: John D. Edquist, Jeremy John Fredrich
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Patent number: 12106935Abstract: Embodiments described herein relate to methods and apparatus for forming gratings having a plurality of fins with different slant angles on a substrate and forming fins with different slant angles on successive substrates using angled etch systems and/or an optical device. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle ? relative to a surface normal of the substrates and form gratings in the grating material.Type: GrantFiled: April 25, 2023Date of Patent: October 1, 2024Assignee: Applied Materials, Inc.Inventors: Joseph C. Olson, Morgan Evans, Rutger Meyer Timmerman Thijssen
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Patent number: 12105415Abstract: The present invention relates to a method, an apparatus and a computer program for analyzing and/or processing of a mask for lithography, in particular a mask for EUV lithography. A method for analyzing and/or processing of a mask for lithography, in particular a mask for EUV lithography, is described, which method comprises the following steps: 1a.) generating at least one particle beam vortex; and 1b.) using the particle beam vortex for analyzing and/or processing of the mask.Type: GrantFiled: August 10, 2021Date of Patent: October 1, 2024Assignee: Carl Zeiss SMT GmbHInventor: Oliver Jäckel
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Patent number: 12106933Abstract: An example multi-beam scanning electron microscope (MB-SEM) for correcting both astigmatism and linear distortion at least includes an electron source coupled to provide an electron beam, an aperture plate comprising an array of apertures, the aperture plate arranged to form an array of electron beamlets from the electron beam, and an electron column including a plurality of lenses and first and second stigmators, the electron column coupled to direct the array of electron beamlets toward a sample, wherein the first and second stigmators are arranged and excited to correct both astigmatism and linear distortion.Type: GrantFiled: March 14, 2022Date of Patent: October 1, 2024Assignee: FEI CompanyInventors: Jan Stopka, Bohuslav Sed'a
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Patent number: 12100583Abstract: The invention relates to the generation of desolvated ions by electrospraying to be investigated analytically, e.g. according to the charge-related mass m/z and/or ion mobility. The cloud of highly charged droplets drawn from the spray capillary by a high voltage is usually focused and stabilized by a beam of nebulizing gas surrounding the cloud of tiny droplets. For a fast drying of the droplets, an additional desolvation gas is usually heated to a temperature of up to several hundred degrees centigrade and blown into the cloud of droplets. The invention particularly relates to the heating of the gas which is instrumental in the generation of desolvated ions as part of the electrospraying process without any mechanical or electrical contact between the heating power supply and the heater itself, but rather by heating the heater for the gas using electromagnetic induction.Type: GrantFiled: September 1, 2023Date of Patent: September 24, 2024Inventors: Anil Mavanur, Felician Muntean
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Patent number: 12100938Abstract: The present invention provides methods and systems for a modular ion generator device that includes a bottom portion, two opposed side portions, a front end, a back end, and a top portion. A cavity is formed within the two opposed side portions, front end, back end, and top portion. At least one electrode is positioned within the cavity, and an engagement device is engaged to the front end and/or an engagement device engaged to the back end for allowing one or more modular ion generator devices to be selectively secured to one another.Type: GrantFiled: May 22, 2023Date of Patent: September 24, 2024Assignee: GLOBAL PLASMA SOLUTIONS, INC.Inventor: Charles Houston Waddell
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Patent number: 12087566Abstract: Method and devices are provided for assessing tissue samples from a plurality of tissue sites in a subject using molecular analysis. In certain aspects, devices of the embodiments allow for the collection of liquid tissue samples and delivery of the samples for mass spectrometry analysis.Type: GrantFiled: July 28, 2023Date of Patent: September 10, 2024Assignee: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEMInventors: Livia Schiavinato Eberlin, Thomas Milner, Jialing Zhang, John Lin, John Rector, Nitesh Katta, Aydin Zahedivash
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Patent number: 12087569Abstract: A time-of-flight mass spectrometry device includes an electrode to which a DC high voltage is applied in order to form an ion flight space and a high voltage power supply device that applies the high voltage to the electrode. The high voltage power supply device includes a high voltage generating circuit that generates the high voltage, and a voltage control circuit that is selectively set to a convergence responsiveness priority mode in which the high voltage generating circuit is controlled such that the high voltage has first convergence responsiveness and first stability or a stability priority mode in which the high voltage generating circuit is controlled such that the high voltage has second convergence responsiveness that is lower than the first convergence responsiveness and second stability that is higher than the first stability.Type: GrantFiled: August 17, 2020Date of Patent: September 10, 2024Assignee: SHIMADZU CORPORATIONInventors: Takuro Kishida, Yasushi Aoki, Toshitaka Kawai
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Patent number: 12087558Abstract: The present disclosure relates to a semiconductor device manufacturing system. The semiconductor device manufacturing system can include a chamber and an ion source in the chamber. The ion source can include an outlet. The ion source can be configured to generate a particle beam. The semiconductor device manufacturing system can further include a grid structure proximate to the outlet of the ion source and configured to manipulate the particle beam. A first portion of the grid structure can be electrically insulated from a second portion of the grid structure.Type: GrantFiled: August 13, 2021Date of Patent: September 10, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Jung-Hao Chang, Po-Chin Chang, Pinyen Lin, Li-Te Lin
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Patent number: 12080534Abstract: A method is disclosed comprising: trapping ions in an ion trap (40); applying a first force on the ions within the ion trap in a first direction, said force having a magnitude that is dependent upon the value of a physicochemical property of the ions; applying a second force on these ions in the opposite direction so that the ions separate according to the physicochemical property value as a result of the first and second forces; and then pulsing or driving ions out of one or more regions of the ion trap.Type: GrantFiled: July 20, 2022Date of Patent: September 3, 2024Assignee: Micromass UK LimitedInventors: Jason Lee Wildgoose, Keith Richardson, David J. Langridge, Martin Raymond Green, Steven Derek Pringle
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Patent number: 12080514Abstract: A device may include an electron source, a detector, and a deflector. The electron source may be directed toward a sample area. The detector may receive an electron signal or an electron-induced signal. A deflector may be positioned between the electron source and the sample. The deflector may modulate an intensity of the electron source directed to the sample area according to an electron dose waveform having a continuously variable temporal profile.Type: GrantFiled: May 24, 2023Date of Patent: September 3, 2024Assignee: INTEGRATED DYNAMIC ELECTRON SOLUTIONS, INC.Inventors: Ruth Shewmon Bloom, Bryan Walter Reed, Daniel Joseph Masiel, Sang Tae Park
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Patent number: 12080537Abstract: A sample introduction system for a spectrometer comprises a desolvation region that receives or generates sample ions from a solvent matrix and removes at least some of the solvent matrix from the sample ions. A separation chamber downstream of the desolvation region has a separation chamber inlet communicating with the desolvation region, for receiving the desolvated sample ions along with non-ionised solvent and solvent ion vapours. The separation chamber has electrodes for generating an electric field within the separation chamber, defining a first flow path for sample ions between the separation chamber inlet and a separation chamber outlet. Unwanted solvent ions and non-ionised solvent vapours are directed away from the separation chamber outlet. The sample introduction system has a reaction chamber with an inlet communicating with the separation chamber outlet, for receiving the sample ions from the separation chamber and for decomposing the received ions into smaller products.Type: GrantFiled: September 14, 2021Date of Patent: September 3, 2024Assignee: THERMO FISHER SCIENTIFIC (BREMEN) GMBHInventors: Alexander A. Makarov, Stevan R. Horning
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Patent number: 12072181Abstract: An inspection apparatus for adjusting a working height for a substrate for multiple target heights is disclosed. The inspection apparatus includes a radiation source configured to provide a radiation beam and a beam splitter configured to split the radiation beam into multiple beamlets that each reflect off a substrate. Each beamlet contains light of multiple wavelengths. The inspection apparatus includes multiple light reflecting components, wherein each light reflecting component is associated with one of the beamlets reflecting off the substrate and is configured to support a different target height for the substrate by detecting a height or a levelness of the substrate based on the beamlet reflecting off the substrate.Type: GrantFiled: September 28, 2021Date of Patent: August 27, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Yan Wang, Jian Zhang, Zhiwen Kang, Yixiang Wang