Abstract: A miniature electrode apparatus is disclosed for trapping charged particles, the apparatus includes, along a longitudinal direction, a first end cap electrode, a central electrode having an aperture, and a second end cap electrode. The aperture is elongated in the lateral plane and extends through the central electrode along the longitudinal direction and the central electrode surrounds the aperture in a lateral plane perpendicular to the longitudinal direction to define a transverse cavity for trapping charged particles. Electric fields can be applied in a y-direction of the lateral plane across one or more planes perpendicular to the longitudinal axis to translocate and/or manipulate ion trajectories.

Abstract: A multi-beam electronics scanning system using swathing. The system includes an electron emitter source configured to emit an illumination beam. The illumination beam is split into multiple electron beams by a beam splitter lens array. The system also includes an electronic deflection system configured to deflect each of the electron beams in a plurality of directions, including a first direction, along two different axes. Last, a swathing stage is used to move a sample with a constant velocity in a second direction that is parallel to the first direction.

Abstract: A sterilization case includes a case body having a seating surface configured to seat an object to be sterilized, a case cover that is coupled to the case body, the case cover and the case body defining an accommodation space that is configured to accommodate therein the object to be sterilized, a sterilization module that is provided at the case body and configured to sterilize the object to be sterilized, and a reflective pattern provided at an inner surface of the case cover and configured to reflect ultraviolet light emitted from the sterilization module onto a surface of the object to be sterilized.

Abstract: Method and system for generating a diffraction image comprises acquiring multiple frames from a direct-detection detector responsive to irradiating a sample with an electron beam. Multiple diffraction peaks in the multiple frames are identified. A first dose rate of at least one diffraction peak in the identified diffraction peaks is estimated in the counting mode. If the first dose rate is not greater than a threshold dose rate, a diffraction image including the diffraction peak is generated by counting electron detection events. Values of pixels belonging to the diffraction peak are determined with a first set of counting parameter values corresponding to a first coincidence area. Values of pixels not belonging to any of the multiple diffraction peaks are determined using a second, set of counting parameter values corresponding to a second, different, coincidence area.

Abstract: A sterilization module includes a main body having an opening on the top surface thereof, a transparent member which is arranged on the inside of the main body so as to cover the opening, and through which light passes, an inner sealing member which is made of an elastic material and which covers the side surface of the transparent member, a light emitting module that comprises a substrate and a light emitting element installed on the upper surface of the substrate, and which emits light through the transparent member, and an inner holder which is fastened to the inner side surface of the main body and fixes the light emitting module to the inside of the main body.

Abstract: Apparatus and methods for controlling contamination of components contained within the high-vacuum chambers of mass spectrometer systems are provided. The apparatus and methods employ a beam of neutral gas injected in a contra-flow configuration to incoming particle stream from the ionization chamber. The contra-flow can be in the directly opposite counter-flow direction (e.g., 180 degrees) or at a cross-flow angle to the incoming ion stream (e.g., flowing at an angle between about 10 degrees and 170 degrees). The contra-flow disrupts the axial gas flow and diverts neutral molecules and other undesirable contaminants before they reach the high vacuum stages (e.g., beyond the IQ0 orifice) of the spectrometer. By reducing the transmission of contaminants into the sensitive components housed deep within the mass spectrometer, the present invention can increase throughput, improve robustness, and/or decrease the downtime typically required to vent/disassemble/clean the fouled components.

Abstract: A method includes following steps. A photoresist-coated substrate is received to an extreme ultraviolet (EUV) tool. An EUV radiation is directed from a radiation source onto the photoresist-coated substrate, wherein the EUV radiation is generated by an excitation laser hitting a plurality of target droplets ejected from a first droplet generator. The first droplet generator is replaced with a second droplet generator at a temperature not lower than about 150° C.

Abstract: Disclosed are a sterilization apparatus for sterilizing an object using plasma and ultraviolet light and a sterilization system for an airport including the same. The sterilization apparatus includes a first sterilizer configured to radiate plasma rays toward a sterilization space, a second sterilizer configured to radiate ultraviolet light toward the sterilization space, a sensing unit configured to sense whether an object is placed in the sterilization space, and a controller configured to control an operation of the second sterilizer based on information sensed by the sensing unit.

Abstract: Apparatuses, systems, and methods for transferring fluid to a stage in a charged particle beam system are disclosed. In some embodiments, a stage may be configured to secure a wafer, a chamber may be configured to house the stage; and a tube may be provided within the chamber to transfer fluid between the stage and outside of the chamber. The tube may include a first tubular layer of first material, wherein the first material is a flexible polymer; and a second tubular layer of second material, wherein the second material is configured to reduce permeation of fluid or gas through the tube. In some embodiments, a system may include a degasser system outside of the chamber, where the degasser system may be configured to remove gases from the transfer fluid before the transfer fluid enters the tube.

Abstract: A method for processing scanning electron microscope specimen is provided. The method comprises: providing a specimen to be observed; providing a carbon nanotube array comprising a plurality of carbon nanotubes; and pulling a carbon nanotube film from the carbon nanotube array, and laying the carbon nanotube film on a surface of the specimen, wherein the carbon nanotube film comprising a plurality of through holes.

Abstract: A charged particle beam microscope system is operated in a transmission imaging mode. During the operation, the charged particle beam microsystem directs a charged particle beam to the sample to produce images. A time series of beam tilts is applied in a pattern to the charged particle beam directed to the sample to produce a sequence of images. At least some of the images in the sequence of images are captured while the charged particle beam is transitioning between one beam tilt in the time series of beam tilts and a sequentially adjacent beam tilt in the time series of beam tilts. The pattern is configured to induce image changes between the images in the sequence of images that are indicative of optical aberrations in the charged particle beam microscope system.

Abstract: An ion generation apparatus according to the present invention includes an electron emission device, an opposite electrode, and a controller, the electron emission device includes a lower electrode, a surface electrode, and an intermediate layer provided between the lower electrode and the surface electrode, the opposite electrode is provided to be opposite to the surface electrode, and the controller is provided to apply a voltage to the surface electrode, the lower electrode, or the opposite electrode such that a potential of the surface electrode becomes higher than a potential of the lower electrode and a potential of the opposite electrode in a positive ion mode.

Abstract: Sample preparation system and method which enable electron microscope observation of a sample slice with simple structure and process are provided. The sample preparation system includes at least one of a plasma treatment apparatus and a sputtering apparatus, as well as a slice collecting apparatus. The plasma treatment apparatus is configured to feed a resin tape in a plasma irradiation area to irradiate the resin tape with plasma, thereby continuously hydrophilizing the resin tape. The sputtering apparatus is configured to feed the resin tape in a sputtering area to continuously perform sputtering on the resin tape, thereby imparting conductivity to the resin tape. The slice collecting apparatus is configured to serially collect slices cut out from a sample onto the resin tape having been subjected to plasma treatment or sputtering.

Abstract: A telescopic lead blanket lifting frame and method for shielding workers from a radiation source. The lifting frame includes, first and second hollow vertical tubular members attached orthogonally on first ends thereof to first and second ends of a horizontal base member. Third and fourth vertical tubular members and slidably disposed in the first and second hollow vertical tubular members. A first cross member is attached orthogonally to second ends of the first and second hollow vertical tubular members. A second cross member is attached orthogonally to distal ends of the third and fourth vertical tubular members. A plurality of hooks are attached to the first and second cross members on side portions thereof for engaging lead blankets. A lifting gear is provided for telescopically extending and retracting the third and fourth vertical tubular members and second cross member in a vertical direction.

Abstract: A scanning electron microscope according to the present invention enables a column to be detached from a sample installation unit, thereby addressing issues related to the column, such as simple calibration related to the column, tilt of a beam, replacement of consumables, etc., by replacing the entire column. As such, the scanning electron microscope has the advantage of being simply and easily repaired and maintained.

Abstract: A method for detecting a thickness of bonded rubber of a carbon black in a natural rubber based for reinforcement performance is provided. An ultra-thin frozen microtome to prepare a sample, a tapping mode of the atomic force microscope is used, and when characterizes the carbon black and rubber composite material, the difference of imaging characteristics between morphological and phase diagrams is used, the characteristics of bonded rubber of carbon black reinforced composite material can be observed to obtain the thickness of bonded rubber, and then influence of bonded rubber on rubber performance and the reinforcement performance of the carbon black in the rubber are analyzed. The method has advantages of simple operation, no need for excessive sample processing, high detection efficiency, clear detection images and high detection accuracy, thereby having better applicability and providing a new method and idea for studying reinforcements of fillers.

Abstract: Methods and systems for creating attachments between a sample manipulator and a sample within a charged particle systems are disclosed herein. Methods include translating a sample manipulator so that it is proximate to a sample, and milling portions of the sample manipulator such that portions are removed. The portion of the sample manipulator proximate to the sample is composed of a high sputter yield material, and the high sputter yield material may be the material milled with the charged particle beam such that it is removed from the sample manipulator. According to the present disclosure, the portions of the sample manipulator are milled such that at least some of the removed high sputter yield material redeposits to form an attachment between the sample manipulator and the sample.

Abstract: A method for calibrating a scanning charged particle microscope, such as a scanning electron microscope (SEM), is provided. The method includes dividing a wafer into a plurality of regions; preparing, on each of the plurality of regions, a pattern including a first periodic structure interleaved with a second periodic structure, the first and second periodic structures having an induced offset; determining an actual pitch the first and second periodic structures and thereby determining actual induced offset on each of the plurality of regions; selecting a plurality of regions from among the plurality of regions; measuring, by the SEM, a pitch of first and second periodic structures on each of the plurality of regions; and performing linearity calibration on the SEM based on the determining and the measuring.

Abstract: An arrangement for irradiating a surface includes a radiation source configured to emit ultraviolet radiation, a reflector for directional radiation of the ultraviolet radiation onto the surface, and a control device. A dose of the ultraviolet radiation required for sterilizing the surface and/or a dose already administered is settable and/or determinable by the control device.

Abstract: Deflection of a secondary beam, and astigmatism correction of a primary beam or of the secondary beam are carried out using a multi-pole electromagnetic deflector which deflects the path of the secondary beam toward a detector.