Patents Examined by Jason L McCormack
  • Patent number: 11784036
    Abstract: The invention relates to the generation of desolvated ions by electrospraying to be investigated analytically, e.g. according to the charge-related mass m/z and/or ion mobility. The cloud of highly charged droplets drawn from the spray capillary by a high voltage is usually focused and stabilized by a beam of nebulizing gas surrounding the cloud of tiny droplets. For a fast drying of the droplets, an additional desolvation gas is usually heated to a temperature of up to several hundred degrees centigrade and blown into the cloud of droplets. The invention particularly relates to the heating of the gas which is instrumental in the generation of desolvated ions as part of the electrospraying process without any mechanical or electrical contact between the heating power supply and the heater itself, but rather by heating the heater for the gas using electromagnetic induction.
    Type: Grant
    Filed: May 6, 2021
    Date of Patent: October 10, 2023
    Inventors: Anil Mavanur, Felician Muntean
  • Patent number: 11784022
    Abstract: A scanning electron beam apparatus which two-dimensionally scans a sample by an electron beam to achieve high resolution even with a photoexcited electron source. The electron beam apparatus includes a photocathode including a substrate having a refractive index of more than 1.7 and a photoemissive film, a focusing lens configured to focus an excitation light toward the photocathode, an extractor electrode disposed facing the photocathode and configured to accelerate an electron beam generated from the photoemissive film by focusing the excitation light by the focusing lens and emitting the excitation light through the substrate, and an electron optics including a deflector configured to two-dimensionally scan a sample by the electron beam accelerated by the extractor electrode. For a spherical aberration of the focusing lens, a root mean square of the spherical aberration on the photoemissive film is equal to or less than 1/14 of a wavelength of the excitation light.
    Type: Grant
    Filed: January 28, 2019
    Date of Patent: October 10, 2023
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Takashi Ohshima, Tatsuro Ide, Hideo Morishita, Yoichi Ose, Tsunenori Nomaguchi, Toshihide Agemura
  • Patent number: 11776787
    Abstract: A charged particle beam apparatus includes a tilt mechanism that tilts a specimen, a detector that detects an electromagnetic wave emitted from the specimen, a table storage unit that stores a table in which tilt angle information on a tilt angle of the specimen and detection solid-angle information on the detection solid angle of the detector are associated with each other, a tilt control unit that controls the tilt mechanism, and a detection-solid-angle information acquisition unit that acquires the tilt angle information from the tilt control unit and acquires the detection solid-angle information with reference to the table.
    Type: Grant
    Filed: January 6, 2022
    Date of Patent: October 3, 2023
    Assignee: JEOL Ltd.
    Inventors: Kazuki Yagi, Yusuke Toriumi
  • Patent number: 11769650
    Abstract: Provided are a multistage-connected multipole and a charged particle beam device that can be produced with precision in machining without requiring precision in brazing between a pole and an insulation material. This multi-stage connected multipole 100 comprises: a plurality of poles Q1-Q4 that are arranged along the optical-axis direction of a charged particle beam, and that have cutouts Non surfaces facing each other; and braces P1-P3 that are arranged between the plurality of poles Q1-Q4 and are made of an insulator. The poles Q1-Q4 and the braces P1-P3 are joined by fitting the braces P1-P3 into the cutouts N and applying brazing so as to be interposed by a bonding material.
    Type: Grant
    Filed: December 23, 2019
    Date of Patent: September 26, 2023
    Assignee: Hitachi High-Tech Corporation
    Inventors: Hideto Dohi, Yoshinobu Ootaka, Masashi Inada, Hideyuki Kazumi, Hideo Kashima
  • Patent number: 11764032
    Abstract: Apparatuses for collection of wavelength resolved and angular resolved cathodoluminescence (WRARCL) emitted from a sample exposed to an electron beam (e-beam) or other excitation beams are described. Cathodoluminescence light (CL) may be emitted from a sample at specific angles relative to the excitation beam and analyzed with respect to light-emitting and other optical phenomena. The described embodiments allow collection of WRARCL data more efficiently and with significantly fewer aberrations than existing systems.
    Type: Grant
    Filed: March 5, 2021
    Date of Patent: September 19, 2023
    Assignee: Gatan, Inc.
    Inventors: Michael Bertilson, John Andrew Hunt, David J. Stowe
  • Patent number: 11764045
    Abstract: The disclosure features systems and methods that include: exposing a biological sample to an ion beam that is incident on the sample at a first angle to a plane of the sample by translating a position of the ion beam on the sample in a first direction relative to a projection of a direction of incidence of the ion beam on the sample; after each translation of the ion beam in the first direction, adjusting a focal length of an ion source that generates the ion beam; and measuring and analyzing secondary ions generated from the sample by the ion beam after adjustment of the focal length to determine mass spectral information for the sample, where the sample is labeled with one or more mass tags and the mass spectral information includes populations of the mass tags at locations of the sample.
    Type: Grant
    Filed: February 8, 2021
    Date of Patent: September 19, 2023
    Assignee: IONpath, Inc.
    Inventors: Harris Fienberg, David Stumbo, Michael Angelo, Rachel Finck
  • Patent number: 11764031
    Abstract: The present invention concerns a method and a system for imaging at least a part of a specimen by means of two microscopy imaging methods, where a surface (11) of the specimen (10) is imaged by means of a first microscopy imaging method, where a replica (25) of the surface (11) to be imaged by means of the first microscopy imaging method is produced and this replica (25) is simultaneously imaged by means of a second microscopy imaging method, where the images produced by means of the first and the second microscopy imaging methods are overlaid at the correct scale.
    Type: Grant
    Filed: January 30, 2020
    Date of Patent: September 19, 2023
    Assignee: Leica Mikrosysteme GmbH
    Inventor: Peer Oliver Kellermann
  • Patent number: 11756761
    Abstract: A Wien filter and a charged particle beam imaging apparatus are provided.
    Type: Grant
    Filed: January 27, 2022
    Date of Patent: September 12, 2023
    Assignee: Zhongke Jingyuan Electron Limited, Beijing (CN)
    Inventors: Qinglang Meng, Weiqiang Sun, Yan Zhao
  • Patent number: 11756778
    Abstract: Method and devices are provided for assessing tissue samples from a plurality of tissue sites in a subject using molecular analysis. In certain aspects, devices of the embodiments allow for the collection of liquid tissue samples and delivery of the samples for mass spectrometry analysis.
    Type: Grant
    Filed: December 30, 2021
    Date of Patent: September 12, 2023
    Assignee: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
    Inventors: Livia Schiavinato Eberlin, Thomas Milner, Jialing Zhang, John Lin, John Rector, Nitesh Katta, Aydin Zahedivash
  • Patent number: 11747286
    Abstract: The present disclosure relates to a fluid chip for an electron microscope including a lower chip, an upper chip, and a fluid channel part for supplying a fluid sample, and may attach a transmissive thin film part of a graphene material having excellent bulging resistance to a plurality of holes formed in a fluid channel part to increase the thickness of a support not serving as a transmissive window thicker than the conventional one, thereby minimizing the loss of a spatial resolution and also suppressing the bulging phenomenon of the transmissive window while supplying the fluid sample more stably. Further, the present disclosure may form an electrode which may be connected with an external electrical supply source in the fluid channel part, thereby analyzing electrochemical or thermochemical reaction of the fluid sample in the fluid channel part in real time.
    Type: Grant
    Filed: January 22, 2020
    Date of Patent: September 5, 2023
    Inventors: Jongmin Yuk, Namgyu Noh, Kunmo Koo, Jungjae Park, Sanghyeon Ji
  • Patent number: 11749495
    Abstract: Methods and systems for detecting charged particles from a specimen are provided. One system includes a first repelling mesh configured to repel charged particles from a specimen having an energy lower than a first predetermined energy and a second repelling mesh configured to repel the charged particles that pass through the first repelling mesh and have an energy that is lower than a second predetermined energy. The system also includes a first attracting mesh configured to attract the charged particles that pass through the first repelling mesh, are repelled by the second repelling mesh, and have an energy that is higher than the first predetermined energy and lower than the second predetermined energy. The system further includes a first detector configured to generate output responsive to the charged particles that pass through the first attracting mesh.
    Type: Grant
    Filed: October 5, 2021
    Date of Patent: September 5, 2023
    Assignee: KLA Corp.
    Inventors: Youfei Jiang, Michael Steigerwald
  • Patent number: 11749496
    Abstract: Disclosed herein are techniques directed toward a protective shutter for a charged particle microscope. An example apparatus at least includes a charged particle column and a focused ion beam (FIB) column, a gas injection nozzle coupled to a translation device, the translation device configured to insert the gas injection nozzle in close proximity to a stage, and a shutter coupled to the gas injection nozzle and arranged to be disposed between the sample and the SEM column when the gas injection nozzle is inserted in close proximity to the stage.
    Type: Grant
    Filed: June 21, 2021
    Date of Patent: September 5, 2023
    Assignee: FEI Company
    Inventor: Philip Brundage
  • Patent number: 11740073
    Abstract: A method of measuring a critical dimension (CD) includes forming a plurality of patterns in a substrate, creating first to n-th images, where n is a natural number greater than 1, for first to n-th areas in the substrate, respectively, where the first to n-th areas do not overlap with each other, where each of the first to n-th areas comprising at least some of the plurality of patterns, creating a merged image for the first to n-th images, and measuring a CD for a measurement object from the plurality of patterns using the merged image. The merged image has a higher resolution than each of the first to n-th images.
    Type: Grant
    Filed: August 31, 2021
    Date of Patent: August 29, 2023
    Assignees: SAMSUNG ELECTRONICS CO., LTD., SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
    Inventors: Jooho Kim, Donyun Kim, Yunhyoung Nam, Seungjin Lee, Dawoon Choi
  • Patent number: 11742177
    Abstract: Automated processing is provided. A charged particle beam apparatus includes: an image identity degree determination unit determining whether an identity degree is equal to or greater than a predetermined value, the identity degree indicating a degree of identity between a processing cross-section image that is an SEM image obtained through observation of a cross section of the sample by a scanning electron microscope, and a criterion image that is the processing cross-section image previously registered; and a post-determination processing unit performing a predetermined processing operation according to a result of the determination by the image identity degree determination unit.
    Type: Grant
    Filed: October 13, 2021
    Date of Patent: August 29, 2023
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Ayana Muraki, Tatsuya Asahata, Atsushi Uemoto
  • Patent number: 11738376
    Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the cha
    Type: Grant
    Filed: April 22, 2021
    Date of Patent: August 29, 2023
    Assignee: ASML Netherlands, B.V.
    Inventors: Marc Smits, Johan Joost Koning, Chris Franciscus Jessica Lodewijk, Hindrik Willem Mook, Ludovic Lattard
  • Patent number: 11742176
    Abstract: A transmission electron microscope includes a control unit that: determines an excitation amount of a second illumination system lens based on an excitation amount of first illumination system lens such that the second illumination system lens satisfies a first optical condition; and determines a control amount of a first deflector and a control amount of a second deflector based on the excitation amount of the second illumination system lens such that the first deflector and the second deflector satisfy a second optical condition. The first optical condition is for a convergence angle of the electron beam to be constant even if the excitation amount of the first illumination system lens has changed, and the second optical condition is for an illuminating position of the electron beam and an illuminating angle of the electron beam to be constant even if the excitation amount of the first illumination system lens has changed.
    Type: Grant
    Filed: November 29, 2021
    Date of Patent: August 29, 2023
    Assignee: JEOL Ltd.
    Inventors: Kazuki Yagi, Yoshiki Oyama
  • Patent number: 11728131
    Abstract: Apparatuses, systems, and methods for providing beams for controlling charges on a sample surface of charged particle beam system. In some embodiments, a module comprising a laser source configured to emit a beam. The beam may illuminate an area adjacent to a pixel on a wafer to indirectly heat the pixel to mitigate a cause of a direct photon-induced effect at the pixel. An electron beam tool configured to detect a defect in the pixel, wherein the defect is induced by the indirect heating of the pixel.
    Type: Grant
    Filed: December 16, 2021
    Date of Patent: August 15, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Ning Ye, Jun Jiang, Jian Zhang, Yixiang Wang
  • Patent number: 11728128
    Abstract: A device may include an electron source, a detector, and a deflector. The electron source may be directed toward a sample area. The detector may receive an electron signal or an electron-induced signal. A deflector may be positioned between the electron source and the sample. The deflector may modulate an intensity of the electron source directed to the sample area according to an electron dose waveform having a continuously variable temporal profile.
    Type: Grant
    Filed: May 26, 2022
    Date of Patent: August 15, 2023
    Assignee: INTEGRATED DYNAMIC ELECTRON SOLUTIONS, INC.
    Inventors: Ruth Shewmon Bloom, Bryan Walter Reed, Daniel Joseph Masiel, Sang Tae Park
  • Patent number: 11728130
    Abstract: A method, including: recording plural images of an object by scanning plural particle beams across the object and detecting signals generated by the particle beams, wherein the plural particle beams are generated by a multi-beam particle microscope; determining plural regions of interest; determining plural image regions in each of the recorded images; determining plural displacement vectors; and determining image distortions based on image data of the recorded images and the determined displacement vectors.
    Type: Grant
    Filed: April 1, 2021
    Date of Patent: August 15, 2023
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Dirk Zeidler, Thomas Korb, Philipp Huethwohl, Jens Timo Neumann, Christof Riedesel, Christian Wojek, Joaquin Correa, Wolfgang Hoegele
  • Patent number: 11721519
    Abstract: A method and a system are for sparse sampling utilizing a programmatically randomized signal for modulating a carrier signal. The system includes a compound sparse sampling pattern generator that generates at least one primary carrier signal, and at least one secondary signal. The at least one secondary signal modulates the at least one primary signal in a randomized fashion.
    Type: Grant
    Filed: August 5, 2021
    Date of Patent: August 8, 2023
    Assignee: SYNCHROTRON RESEARCH, INC.
    Inventors: Edward Principe, Andrew Stevens, Conan Weiland, Jeffrey Hagen, Brian Kempshall, Kirk Scammon, Zachery Russell, Shane Didona, Mathieu Therezien, Tomas McIntee