Abstract: An alignment method is provided for determining a mark position by using any of a first method for determining a mark position with one of photodiodes for colors which shows a maximal contrast between a mark area and a non-mark area, a second method for determining a mark position by detecting mark positions with photodiodes for colors and taking an average for these positions and a third method for determining a mark position by determining a ratio for determining that mark position, through the photodiodes for colors, by using different contrast levels between a mark area and a non-mark area and a CCD color area sensor.

Abstract: A method and apparatus is provided that lessens the unwanted effects of noise present at the input of an imaging system. By tapping a small portion of a laser input signal containing wavelengths of light corresponding to red, blue, and green of light used to scan the surface to be imaged, the tapped signal is used to generate three beams that correspond to the red, blue, and green content of the laser input signal. Signals generated at the output of the system that correspond to the color of the scanned surface are normalized with the signals that correspond to the three beams generated by the tapped signal. The normalized output signal indicative of the color of the surface is noise reduced; substantially most of any noise present at the input is eliminated from the output of the device.

Abstract: The invention relates to a device for universal quality inspection of material to be exposed, especially of technical films and x-ray films, using an exposure means designed as a sensitometer, and a densitometer, which are combined into a single device. A densitometer is combined with a light source for individual measurements for determining the behavior of the density curve of a film with a densitometer designed as a measurement arm. A luminescent film which can be excited in two colors and which lies in one plane is used as a light source for the sensitometer.

Abstract: A spectrophotometer apparatus (200) is adapted to provide spectral reflectance measurements of object samples. The apparatus (200) comprises a source light (254) and a reflection optics assembly (264, 268). Signals representative of reflected light are analyzed and data provided to an operator representative of the spectral response characteristics of the object sample (252). The apparatus (200) further comprises a side sensor (276) having a fixed spectral response characteristic for compensating the reflectance measurements in accordance with the light intensity emanating from the lamp. For purposes of calibration, a series of time-sequenced measurements are made of a reference sample. Utilizing these measurements, the apparatus (200) provides computations of compensation coefficients for each spectral segment.

Abstract: A LCD test system is able to adjust the differences in focal point lengths caused by chromatic aberration without increasing the size of the camera system and its manufacturing cost. In addition to the conventional structure, the parallel plates are inserted in the pockets of the rotation plate along with each of the four types of optical filters such as red, green, blue and transparency. Therefore, the differences in the focal point lengths due to the chromatic aberration are adjusted without increasing the size of the camera system and its manufacturing cost drastically.

Abstract: An apparatus (10) for measuring the location of lenticules (24) in lenticular media (14) having an encoded portion (14) located adjacent to the lenticules (24) comprises a light source (18) for illuminating the encoded portion (12). A sensor (20) is provided for receiving light referred and then transmitted by the encoded portion (12) that corresponds to the precise location of the encoded portion (12). Moreover, a processing means connecting the sensor (20) is provided for analyzing the signal so as to enable a precise location of the lenticules (24).

Abstract: A sample placed under a microscope is illuminated by light from a laser beam. Raman scattered light is passed back via a dichroic filter to various optical components which analyse the Raman spectrum, and thence to a CCD detector. The optical components for analysing the Raman spectrum include tunable dielectric filters in a filter wheel; a Fabry-Perot etalon; and a diffraction grating. These various components may be swapped into the optical path as desired, for example using movable mirrors, enabling the apparatus to be used very flexibly for a variety of different analysis procedures. Various novel analysis methods are also described.

Abstract: An apparatus capable of concurrently measuring the depth and angle of a notch in the peripheral edge of a wafer includes: a unit for rotating the wafer; a wafer edge detector, including a light-emitting unit and a photo-detecting unit arranged to read the shape of the peripheral edge of the wafer, for outputting a wafer edge detecting signal corresponding to the shape of the peripheral edge of the wafer; a wafer rotational angular position detector for detecting the rotational angular position of the wafer being rotated and outputting a wafer rotational angular position detecting signal; and an arithmetical unit for computing the dimensions of the notch from the wafer edge detecting signal and the wafer rotational angular position detecting signal.

Abstract: An alignment apparatus for aligning a first object (reticle) with a second object (wafer) when irradiating a projection light on the first object to project a pattern of the first object onto the second object through a projection optical system. The apparatus includes an illumination optical system for illuminating a plurality marks on the second object with an alignment light having a wavelength band different from the projection light, a detection optical system for receiving the alignment light from the illuminated mark through the projection optical system to detect an image of the mark formed by the alignment light, and a compensating optical system arranged within the detection optical system for compensating a chromatic aberration of magnification caused by the projection optical system due to the differences among the wavelengths within the wavelength band of the alignment light.

Abstract: A robust spectrophotometer (also known as a color spectrometer or colorimeter) is self contained in a housing which is adapted to be held-held and has all of the electrical, optical and electro optic elements mounted on a board captured within the housing at one end of which light from a sample is restricted to an object area and projected after being dispersed spectrally, as with a reflection grating, to an image area at a photodetector via a lens which has an optical axis and converges the dispersed light at the image area. The dispersive element is mounted on an arm having a pivot laterally offset from the dispersive element's surface where a diverging beam of light from the object area is incident and is deflected to the image area. The geometry is such that the dispersive element may be rotated to a position where the beam is specularly deflected (zeroth order diffraction), and the spectrometer calibrated when the dispersive element is in the specular reflection/deflection position.

Abstract: A method of aligning a substrate with a predetermined reference position is disclosed. An alignment system for detecting an alignment mark formed on a substrate has a detection center. In advance of actual alignment operations, each of a plurality of different types of reference marks is positioned at the detection center, the reference marks are successively detected by means of the alignment system, and detection offset values associated with each reference mark are obtained based on the results of the detection. In an actual alignment operation, one of the reference marks that is of the type substantially the same as that of the alignment mark is determined. Then the position to which the substrate is to be moved is controlled based on i) the detection offset values corresponding to said one reference mark determined and ii) the results of the detection of the alignment mark by means of the alignment system.

Abstract: A method and apparatus for measuring the alignment of vehicle wheels includes a light source having two beams projecting on opposite directions. The source is mounted on the wheel approximately perpendicular to the wheel axis. Measuring scales are mounted along the paths of the beams in front of and behind the wheels. When taking measurements, the wheel is rotated 180.degree. after a first measurement and a second reading of the scales is made. The difference between the two sets of readings is used to determine the deviation of the light beam from the perpendicular to the wheel axis and this deviation is compensated for in measuring the wheel alignment. Optical sighting means such as a camera can be used in place of the two beam light source.

Abstract: A plurality of principal-component spectral distributions are determined in advance by analyzing spectral distributions of a multiplicity of sample films; light transmitted through a film to be estimated is measured by spectrally diffracting the transmitted light into wavelengths of different bands or into different wavelength bands the number of the wavelengths or wavelength bands being equivalent to that of the plurality of principal-component spectral distributions; coefficients for expressing the spectral distribution of the film to be estimated as a linear sum of the plurality of principal-component spectral distributions are determined on the basis of photometric values of the respective wavelengths wavelength bands and the plurality of, principal-component spectral distributions; and the spectral distribution of the film to be estimated is estimated by determining the linear sum of the plurality of principal-component spectral distributions by using the coefficients obtained.

Abstract: Microwave-induced plasma for continuous, real time trace element monitoring under harsh and variable conditions. The sensor includes a source of high power microwave energy and a shorted waveguide made of a microwave conductive, high temperature capability refractory material communicating with the source of the microwave energy to generate a plasma. The high power waveguide is constructed to be robust in a hot, hostile environment. It includes an aperture for the passage of gases to be analyzed and a spectrometer is connected to receive light from the plasma. Provision is made for real time in situ calibration. The spectrometer disperses the light, which is then analyzed by a computer. The sensor is capable of making continuous, real time quantitative measurements of desired elements, such as the heavy metals lead and mercury. The invention may be incorporated into a high temperature process device and implemented in situ for example, such as with a DC graphite electrode plasma arc furnace.

Abstract: Multiple electroluminescent (EL) emitters are constructed from layers deposited on a substrate and incorporated with a broadband sensor to form a colorimeter. The EL emitters produce light covering spectral segments determined by a filter layer and an active layer wherein the spectral segments sufficiently cover the visible spectrum to enable a wide range of colors to be accurately measured. The colorimeter is mounted in a desktop color printer to measure the color content of printed images and to calibrate the printer.

Abstract: A new method of measuring the soiling of floor surfaces or the like, capable of numerically and objectively measuring and grasping the soiling of floor surfaces and wall surfaces, in particular, the soiling of fiber floors, such as carpet floors, comprising the following steps: a step of illuminating a measurement surface of a floor surface in all directions by using diffused light from a diffusion chamber and a diffusion plate, a step of receiving light reflected by the measurement surface at the opening end of an optical fiber bundle disposed in the direction perpendicular to the measurement surface, a step of obtaining a color difference value between the surface color of the measurement surface obtained by measuring the received light and the surface-color of a standard plate obtained by making measurement in the similar way, and a step of numerically measuring the soiling of the floor surface depending on the change with time in the color difference value.

Abstract: An exposure system and method that enable to realize uniform pattern transfer with high accuracy independent of time-dependent illumination deterioration of an exposing light source and/or replacement thereof. An illumination detector detects an illumination of a ray of the exposing light penetrating through one of lens elements of a fly-eye lens. An aligner aligns a position of the detector with a corresponding one of the lens elements of a fly-eye lens. The repetition of the illumination detection for all the lens elements enables to know and compare the illumination distribution for the entire beam of the light with a wanted one in advance. An exposure process is performed after suitable correction of the known distribution and therefore, pattern transfer can be realized uniformly with high accuracy even for fine patterns on a reticle.

Abstract: A measuring method comprises a first step to expose by the irradiation of a predetermined energy ray onto the resist layer of a photosensitive board a first mask pattern having at least two linear pattern portions arranged substantially in axial symmetry with respect to a straight line in a predetermined first direction and inclined at a predetermined angle to the straight line in the first direction, a second step to overlap with the first mask pattern image exposed on the resist layer a second mask pattern formed by the linear patterns which extend in a second direction substantially perpendicular to the first direction by relatively driving the second mask pattern in a predetermined amount in the first direction for exposure, and a third step to measure an interval in the second direction between at least two wedge-shaped resist images formed by the overlapped portions of the first mask pattern and the second mask pattern.

Abstract: In an exposure apparatus and method, a mask and a substrate are scanned in synchronism with each other so that the pattern of the mask may be transferred onto the substrate through a projection optical system. First beams of light are irradiated to least two locations on the mask spaced apart in a direction intersecting the scanning direction of the mask. The reflected light thereof is received, and the positions of the points on the mask to which the beam of light has been irradiated are detected in the direction of the optical axis of the projection optical system. In addition, second beams of light are irradiated to at least two locations on the substrate spaced apart in the scanning direction, and the reflected light thereof is received. The positions of the points on the substrate to which the second beam of light has been irradiated are also detected in the direction of the optical axis of the projection optical system are detected.

Abstract: Method comprises a process for obtaining a photoelectric signal with a waveform pair of extremal values at respective positions corresponding to a pair of edge portions of an alignment mark by photoelectrically detecting the reflected light from the alignment mark on a substrate; a first determination process for determining the position of the alignment mark on the basis of a pair of slope portions existing inside the pair of extremal values of the photoelectric signal waveform; a second determination process for determining the position of the alignment mark on the basis of the pair of slope portions existing outside a pair of extremal values of the photoelectric signal waveform; a third determination process for determining the position of the alignment mark on the basis of both a pair of slope portions existing inside said pair of extremal values of the photoelectric signal waveform and a pair of slope portions existing outside; and a process for selecting any one of the first determination process, secon