Patents Examined by Khaled Brown
  • Patent number: 7057742
    Abstract: A frequency-scanning interferometer is modified to include a diffuse reference surface. An illuminating system produces an expanding measuring beam, portions of which reflect from a test object surface and the diffuse reference surface on converging paths to an imaging system. Interference patterns between overlapping images of the object and reference surfaces are generated at a plurality of frequencies for measuring the object surface with respect to the reference surface.
    Type: Grant
    Filed: June 30, 2003
    Date of Patent: June 6, 2006
    Assignee: Lightgage, Inc.
    Inventors: Joseph C. Marron, Dean Faklis
  • Patent number: 6954272
    Abstract: A transparent plate with fiducials for aligning and placing of dies on a panel with a high degree of accuracy is disclosed. The locations of the fiducials correspond to desired die locations. The transparent plate is arranged beneath the panel, with the fiducials aligned with cavities formed in the panel. The cavities have transparent bottoms. A die alignment mark on a die residing over the panel is used to establish the position of the die. Imaging a fiducial associated with a cavity is used to center the die with respect to the cavity. Accurate placement of the fiducials is accomplished by electron-beam lithography.
    Type: Grant
    Filed: January 16, 2002
    Date of Patent: October 11, 2005
    Assignee: Intel Corporation
    Inventors: Michelle T. Lam, Nathan C. McDaniel, Gary M. Barnes, Rene Cruz
  • Patent number: 6934027
    Abstract: An interferometric measuring device for measuring the shape of a surface of an object having a radiation source which emits a short-coherent radiation, a beam splitter for forming an object beam which is directed via an object light path to the object, and a reference beam which is directed via a reference light path to a reflective reference plane, and having an image converter which picks up the radiation reflected back by the surface and the reference plane and brought to interference, and sends it to an analyzing device for determining a measuring result pertaining to the surface, the optical length of the object light path being changed relative to the optical length of the reference light path for analyzing the interference peak.
    Type: Grant
    Filed: July 6, 2001
    Date of Patent: August 23, 2005
    Assignee: Robert Bosch GmbH
    Inventors: Friedrich Prinzhausen, Michael Lindner, Vincent Thominet
  • Patent number: 6917411
    Abstract: Optimizing printing of an image from an alternating phase shifting mask having a phase shift error is accomplished using off-axis illumination. By simulating the image using varying off-axis illumination parameters, optimized parameters are selected to compensate for the phase shift error. Once the off-axis illumination parameters are optimized, the image is shot. In addition, the method of varying off-axis illumination parameters to compensate for a phase shift error permits an alternating phase shifting mask to be shot at two different wavelengths.
    Type: Grant
    Filed: February 11, 2000
    Date of Patent: July 12, 2005
    Assignee: Micron Technology, Inc.
    Inventors: Christophe Pierrat, Nanseng Jeng
  • Patent number: 6900900
    Abstract: A high-resolution and high-speed film thickness and thickness uniformity measurement method is disclosed in this invention. The disclosed method includes a step a) of measuring a film thickness at a single point on the top surface of the substrate using an interferometry with a measuring light beam having a range of wavelengths. The method further includes a step b) of selecting an optimal wavelength from the range of wavelengths applied for measuring the film thickness at the single point. The method further includes a step c) of measuring reflection intensities by scanning over a plurality of points with a measuring light beam of the optimal wavelength over the top surface of the substrate. The method further includes a step d) of calculating a film thickness at the plurality of points applying the optimal-wavelength reflection intensities at the plurality of points over the top surface of the substrate.
    Type: Grant
    Filed: November 16, 2001
    Date of Patent: May 31, 2005
    Assignee: Process Diagnostics, Inc.
    Inventors: James A. McMillen, Evan Grund
  • Patent number: 6900895
    Abstract: Phase noise is at least partially cancelled for an interferometric system by using a delay/phase cross-correlation approach for two interferometers within the system. The cross-correlation approach may be used in measuring group delay of a device under test and includes determining the differences between the phase of the output of each interferometer at time t and the phase of the same output at the time t minus the delay of the other interferometer. In one embodiment, the first phase difference is the difference between the phase of a test interferometer output at time t and the phase of the test interferometer output at the time t offset by the known delay of a reference interferometer. The second phase difference is calculated using the same technique, but the time offset is a delay representative of the relative delay of two light propagations within the test interferometer.
    Type: Grant
    Filed: December 6, 2001
    Date of Patent: May 31, 2005
    Assignee: Agilent Technologies, Inc.
    Inventor: Gregory D. Van Wiggeren
  • Patent number: 6900896
    Abstract: A method and system for measuring optical characteristics of a sub-component within a composite optical system is disclosed. In one embodiment, the present invention generates an optical response from a composite optical system. The present embodiment then separates an optical response of a sub-component from the optical response of the composite optical system. The present embodiment then determines the optical characteristics of the sub-component by utilizing at least one portion of the optical response of the sub-component.
    Type: Grant
    Filed: March 15, 2002
    Date of Patent: May 31, 2005
    Assignee: Agilent Technologies, Inc.
    Inventors: Ali Motamedi, Bogdan Szafraniec, Gregory D. VanWiggeren
  • Patent number: 6894789
    Abstract: The invention relates to a method of extending the capture range (CR) of a wavelength monitor for the lasers of a wavelength division multiplex (WDM) transmission system wherein the capture range (CR) comprises one wavelength period (FSR) of a periodic error signal (E) generated with the aid of the wavelength filter (4), the capture range contains a desired wavelength (?0) of a plurality of equidistant wavelengths (?i, ?i+1, ?i+2, . . . ), each of the lasers of the WDM transmission system is set at a desired wavelength (?0) by comparing the error signal (E) with an comparison value (C1 or C2), that is unique in the capture range (CR) for a chosen slope sign, the wavelength period (FSR) of the error signal (E) is set such that it corresponds to double the wavelength spacing (A) of two adjacent wavelengths of the WDM transmission system and the desired wavelength (?0) is set taking into account the slope sign of the error signal (E), and further relates to a wavelength monitor and laser system therefor.
    Type: Grant
    Filed: August 31, 2001
    Date of Patent: May 17, 2005
    Assignee: Avanex Corporation
    Inventors: Franck Le-Gall, Daniel Mousseaux
  • Patent number: 6888618
    Abstract: A scan type exposure apparatus wherein a pattern of an original is lithographically transferred to a substrate sequentially while the original and the substrate are scanningly moved relative to exposure light, the apparatus including a photodetector disposed at a position optically conjugate with the original, and a storing device for storing correction information with respect to an output of the photodetector, in relation to different positions of the original to be illuminated with the exposure light, such that, in the lithographic pattern transfer, the output of the photodetector can be corrected by use of the correction information.
    Type: Grant
    Filed: December 28, 1999
    Date of Patent: May 3, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventor: Mitsuya Sato
  • Patent number: 6888639
    Abstract: A method and system using spectral interference of light from plasma emissions collected at near grazing incidence to in-situ monitor and control the film thickness of a non-opaque film. Embodiments of this invention are particularly useful to all substrate processing chambers equipped to form an in-situ plasma within the chamber and which are used to deposit or etch non-opaque films. One embodiment of the method of the present invention forms a plasma within a substrate processing chamber to deposit a non-opaque film on a wafer substrate within the chamber. During the plasma deposition process, a plurality of wavelengths of radiation including those reflected from the top and bottom layer of the film being deposited upon a wafer surface are collected through an existing viewport, and conveyed to a spectrometer for measurements via an optical fiber attached near this viewport. These measurements are analyzed to determine the film's thickness.
    Type: Grant
    Filed: September 24, 2001
    Date of Patent: May 3, 2005
    Assignee: Applied Materials, Inc.
    Inventors: Andreas Goebel, Moshe Sarfaty, Sebastien Raoux
  • Patent number: 6885454
    Abstract: A measuring apparatus is disclosed which includes a measuring unit equipped with a dielectric block and a thin film layer; an incidence system for making a light beam enter the dielectric block so that a condition for total internal reflection is satisfied at an interface between the dielectric block and the thin film layer; and a photodetector for receiving the light beam totally reflected at the interface. The measuring unit is measured a plurality of times, and a change in the state of attenuated total reflection during the plurality of measurements is detected. The sensor further includes a tilt measurement section for measuring the longitudinal tilt of the interface which changes the incidence angles during the plurality of measurements, and a calculating section for obtaining a measured value in which errors due to the longitudinal tilt have been corrected.
    Type: Grant
    Filed: March 28, 2002
    Date of Patent: April 26, 2005
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masayuki Naya, Nobufumi Mori, Toshihito Kimura, Hitoshi Shimizu, Shu Sato
  • Patent number: 6876453
    Abstract: The instant invention is a method and apparatus for the measurement, with low uncertainty, of the six degrees of freedom of a first structure relative to a second structure. The apparatus is comprised of compact, rigid, thermally stable structures. The invention uses linear displacement transducers which have no active pointing to maintain a desired orientation of the linear displacement transducers with other parts of the measurement system.
    Type: Grant
    Filed: June 4, 2003
    Date of Patent: April 5, 2005
    Assignee: Zygo Corporation
    Inventors: Matthew Van Doren, Michael Kuechel, Christopher James Evans
  • Patent number: 6836335
    Abstract: A multi-axis interferometer includes a mounting block with first and second polarizing beam-splitter cubes contacting first and second faces of the mounting block. A beam-distribution system contacts a third face of the mounting block. The beam-distribution system is thus placed in optical communication with the first polarizing beam-splitter cube and the second polarizing beam-splitter cube.
    Type: Grant
    Filed: July 8, 2002
    Date of Patent: December 28, 2004
    Assignee: Zygo Corporation
    Inventors: Henry A. Hill, Andrew Eric Carlson, Peter J. De Groot
  • Patent number: 6831735
    Abstract: The analytical method having both flow cytometery and cytodiagnosis functions comprises the steps of: preparing a sample containing particulate substances such as cells and viruses; injecting the sample into a plate-like sample container; centrifuging the sample container; and using the sample container in which a distribution of the particulate substances has been formed as a preparation for analysis. The preparation is scanned with a laser beam to obtain analytical data. An analytical device for this method is also provided.
    Type: Grant
    Filed: April 10, 2002
    Date of Patent: December 14, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventor: Mamoru Tsukada
  • Patent number: 6829034
    Abstract: An exposure apparatus to be used with an excimer laser as a light source includes an optical system disposed along a path of excimer laser light, a chamber for accommodating the optical system therein and having an inside space being able to be replaced by a predetermined gas, a gas circulation mechanism having a gas circulation path for connecting a gas discharging port for discharging a gas from the chamber and a gas supplying port for supplying a gas into the chamber, and a switching device for selectively using plural purifiers disposed in the gas circulation path.
    Type: Grant
    Filed: March 29, 2001
    Date of Patent: December 7, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yoshinori Miwa, Eiji Sakamoto
  • Patent number: 6822746
    Abstract: An interferometric measuring device for measuring the shape of a surface of an object has a radiation source which emits a short-coherent radiation, a beam splitter for forming an object beam which is directed via an object light path to the object and a reference beam which is directed via a reference light path to a reflective reference plane. The interferometric measuring device also has an image converter which picks up the radiation that has been brought to interference and reflected back from the surface and the reference plane and sends it to an analyzing device for determining a measurement result pertaining to the surface. To analyze the interference peak by scanning, the optical length of the object light path is altered relative to the optical length of the reference light path, or an intermediate image of the surface produced in the object light path is scanned.
    Type: Grant
    Filed: July 24, 2002
    Date of Patent: November 23, 2004
    Assignee: Robert Bosch GmbH
    Inventors: Friedrich Prinzhausen, Michael Lindner, Vincent Thominet
  • Patent number: 6819415
    Abstract: A method and arrangement are disclosed for increasing the depth contrast in microscope imaging. The method and implementation described can be designated as structured illumination for generating quasi-confocal optical sections. In implementing the method, a grating structure located in the field diaphragm plane of a microscope, the object plane and the TV intermediate image plane of a microscope are arranged confocally. The term “confocally” refers to the fact that the grating, object and the intermediate image plane are positioned on optically conjugate planes. By this arrangement, the grating structure is projected in the object plane of the microscope and the object which is structured in this way is imaged in the TV intermediate image plane of the microscope by the optical system following it. Optical sections are generated by calculating the modulation depth of the structured object.
    Type: Grant
    Filed: August 12, 2002
    Date of Patent: November 16, 2004
    Assignee: Carl Zeiss Jena GmbH
    Inventors: Volker Gerstner, Frank Hecht, Ralph Lange, Helmut Bloos
  • Patent number: 6819425
    Abstract: The X, Y and Rx positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be co-planar with the pattern on the mask itself. Measurements of the table position in the other degrees of freedom can be measured with capacitative or optical height sensors.
    Type: Grant
    Filed: August 22, 2001
    Date of Patent: November 16, 2004
    Assignee: ASML Netherland B.V.
    Inventor: Yim Bun Patrick Kwan
  • Patent number: 6816260
    Abstract: A fiber polarimeter has one or more oblique fiber Bragg gratings disposed one behind the other in a fiber. The fiber Bragg gratings couple out portions of a light wave input to the fiber depending on its polarization. For more than one fiber Bragg grating a wave plate is disposed in the fiber between consecutive fiber Bragg gratings. The portions of the light wave from the fiber Bragg grating(s) are detected to produce measurement data that is used to calculate four Stokes parameters for determining polarization, degree of polarization and/or power of the light wave.
    Type: Grant
    Filed: May 15, 2002
    Date of Patent: November 9, 2004
    Assignee: Thorlabs GmbH
    Inventors: Jens Peupelmann, Egbert Krause, Adalbert Bandemer
  • Patent number: 6813009
    Abstract: Serum emission can be used as the first test to detect metabolic disorders in mammals. When changes in emission of the serum from patients with different pathological conditions were characterized, a difference was seen for patients with diseases such as cancer, thyroid disorder, arthritis, diabetes, coronary artery disease (CAD), hypertension, CFS (chronic fatigue syndrome), and fibromyalgia. The level of emission was enhanced or diminished and correlated with the level of energy metabolism and the level of metabolic rate. The method can also be used for risk assessment, to identify whether a treatment is working or to follow the course of a treatment, and to identify changes in energy levels due to stress, etc.
    Type: Grant
    Filed: September 18, 2001
    Date of Patent: November 2, 2004
    Assignee: The Center for the Improvement of Human Functioning, International, Inc.
    Inventors: Hugh D. Riordan, Paul Rillema, Nina Mikarova