Abstract: An optical interference tomographic image observing apparatus is provided so as to detect the static or dynamic structure at a deep portion of a living body or the like and provide a multidimensional image thereof for observation. The optical interference tomographic image observing apparatus includes a rotary prism apparatus which includes a Littrow reflector prism (1) having a 90-degree vertex and disposed near a circumference of a rotary body (4) in such a manner that a surface facing the vertex extends substantially perpendicular to a tangential line of the circumference, the prism having a characteristics such that when a light beam impinges the surface, the light beam is reflected in a direction parallel to the incidence direction.

Abstract: A digital camera capable of performing accurate document reading, and a document processing system utilizing the digital camera. In the document processing system, a document is divided into blocks and each block is sensed by a CCD 103; perspective correction is performed on the image data of each of the plurality of images obtained by divisionally sensing the document; and OCR process is performed on the corrected image data to convert the corrected image data to text data. The converted text data, corresponding to the image data of each of the plurality of images, is combined into one text data, and the combined text data is outputted for printing.

Abstract: A main controller sets an exposure control target value according to the transmittance of an optical system measured by means of a sensor prior to exposure or estimated by predetermined calculation, and exposure is controlled according to the set exposure control target value while a reticle pattern is being transferred onto a wafer through the optical system. Since the exposure energy provided to the image surface changes in a unit time per unit area in accordance with the transmittance of the optical system, the exposure control target value is set according to the transmittance of the optical system, and exposure is controlled according to the set control target value. Thus, exposure with a high precision is achieved without being influenced by the variation of the transmittance.

Abstract: Apparatus and a method for inspecting a topology of a surface (2) of a structural member (1) are provided. The degree to which a known type of stress has been applied to the member may be ascertained using a Moiré grid (8). The method involves providing a range of calibration samples of structurally equivalent members, the samples each having been subject to the known type of stress to a differing respective degree. Measurements taken using the apparatus and method of the invention are then compared with measurements taken from a calibration sample to determine the amount of stress which has been applied.

Abstract: An optical arrangement of the Michelson interferometer type having a measuring arm for measuring optical properties of at least two mutually spaced regions in an optically transparent and/or diffusive object. A reference arm has a path length variation unit which generates a periodic change in path length for the radiation in the reference arm. Arranged in the measuring arm upstream of the object is a detour unit. The detour unit imparts a detour which is larger than at least one second measuring beam into at least one measuring beam. The detour unit selects a detour to be equal to a distance between regions to be measured in the object. Using the optical arrangement the object is irradiated with the aid of a number of measuring beams corresponding to the number of regions. In each case two measuring beams have an optical path difference which corresponds to a geometrical distance between two regions.

Abstract: The invention comprises methods and apparatus for reducing sub-harmonic cyclic errors by rotating by a small angle an interferometer or elements thereof. The rotation of the interferometer or selective elements thereof introduces a corresponding small angle between a sub-harmonic type spurious beam that subsequently interferes with either the reference or measurement beam so that the fringe contrast of the interference terms between the subharmonic spurious beam and either the reference or measurement beam is reduced by a required factor for a given use application thereby reducing nonlinearities in the phase signal.

Abstract: A universal microplate analyzer capable of carrying out measurements on samples contained in the wells of microplates by fluorescence, absorbance, luminescence employs at least two light sources and optical fiber channels for directing excitation light to the sample wells. Flexibility of operation is provided by arrays of mirrors, apertures, and polarizers which can be positioned as required for the analysis to be carried out.

Abstract: In a projection aligner for illuminating a pattern on a mask with a luminous flux from a light source through an illumination system and projecting the pattern onto a wafer with a projection optical system, a titanium oxide (TiO2) film is provided on the surface of at least one optical unit in the projection aligner. Thus, contamination of the projection aligner can be reduced.

Abstract: Interferometric scanning method(s) and apparatus for measuring rotationally and non-rotationally symmetric test optics either having aspherical surfaces or that produce aspherical wavefronts by comparing known and unknown spherical and aspherical shapes. Preferably, a spherical or partial spherical wavefront or reflecting surface is defined with respect to a known origin along a scanning axis. The test optic is aligned with respect the scanning axis and selectively moved along it relative to the known origin so that the spherical shape intersects the test optic at the apex of the aspherical shape and at radial positions where the spherical shape and the aspheric shape intersect at points of common tangency.

Abstract: A narrow band ellipsometer is used to monitor and control the formation of thin layers in an multilayer, thin film interference filter. Optical interference filters used for DWDM application have a large number of thin layers deposited on a substrate. The thickness of the layers must be precisely controlled. An ellipsometer is used to monitor the deposition process and control the layer formation in situ, on a real time basis.

Abstract: An aberration mark for use in an optical photolithography system, and a method for estimating overlay errors and optical aberrations. The aberration mark includes an inner polygon pattern and an outer polygon pattern, wherein each of the inner and outer polygon patterns include a center, and two sets of lines and spaces having a different feature size and pitch that surround the outer polygon pattern. The aberration mark can be used to estimate overlay errors and optical aberrations. In some embodiments, the mark can also be used with scatterometry or scanning electron microscope devices. In other embodiments, the mark can be used to monitor aberrations of a lens in an optical photolithography system.

Abstract: A scale (10) is illuminated by a light source (18). After interaction with an index grating (12), fringes (F) are formed in a Talbot plane and analyzed by an analyzer grating (14). To decrease the sensitivity to changes in the ride height of the index grating above the scale, the light source is restricted to a small but finite size, and positioned so that it subtends a small angle Ø at the analyzer grating (or, if a collimating lens (24) is used, positioned so that it subtends a small angle Ø at the lens). The size of the light source should preferably be smaller than a predetermined value such that the extent of a geometric fringe visibility envelope exceeds the extent of a Talbot fringe visibility envelope.

Abstract: A portable particle detection and removal system (100) that connects to a house vacuum (200). A particle sensor (106) is connected between two hoses: one (102) connected to the house vacuum (200) and one (104) for vacuuming the wafer equipment chamber. A smaller diameter hose (104) may be used for vacuuming the wafer equipment chamber. The particle sensor detects (106) incoming particles and a particle count is displayed for the operator. A modulated cleaning system (112) modulates the vacuum pressure in the second hose (104) between two vacuum pressure states.

Abstract: Interferometric method(s) and apparatus for accurately measuring aspherical surfaces and transmitted wavefronts, particularly of the type having relatively large diameters and departure employed in lithographic applications used in the fabrication of integrated circuits and the like. An interferometer, preferably of the Fizeau type, is provided with at least one aspherical reference surface that is positioned adjacent the test optic. The test optic can be either rotationally or non-rotationally symmetric, a reflecting aspherical test surface, or a refracting system that is illuminated by an aspherical wavefront or produces a transmitted aspherical wavefront. In any case, the departure of the test optic from its intended performance is ultimately determined. The aspherical reference surface is illuminated by an aspherical wavefront provided by upstream optics structured so that the incident aspherical wavefront propagates normal to the aspherical reference surface across its entire surface.

Abstract: At each measurement time, reflected light from a semiconductor wafer W or the like by measurement light from a measurement light source 11 is coupled to reference light from a reference light generating section 14, and interference light is detected by a photodetector 15. A raw thickness value calculating section 16b selects two light intensity peaks corresponding to the upper and lower surfaces of the wafer W from a light intensity distribution between an interference light intensity and a reference optical path length and calculates a raw thickness value. A statistical thickness value calculating section 16c executes statistical processing including data sorting, determination whether the raw thickness value falls within an allowable numerical value range, and determination of a thickness change line, thereby obtaining a statistical thickness value.

Abstract: The present invention provides a continuous-zoom imaging device of an interferometer. Reflected lights of a reference plane and a test plane interfere with each other to generate an interference pattern. A collimation device converts a parallel light of the interference pattern into a convergent light. An optical path adjustment means guides the light to a polarizing beam splitter. A continuous-zoom device adjusts the magnification ratio of the interference pattern on the imaging passageway and to output an object image, which is then imaged on a charge-coupled device. The present invention can improve the quality of the interference pattern without using any rotating diffuser, and thus has the characteristics of reduced number of components, lowered cost, and shrunk volume. Besides, the present invention can utilize a joint device to connect the continuous-zoom device and an attenuator so as to achieve automatic light adjustment and convenient operation.

Abstract: The present invention relates to a spectrometer module comprising an input, for receiving an incoming optical signal, a variable differential group delay (DGD) element, for applying a variable birefringence retardation to said incoming optical signal, and a detector unit for detecting the power of a signal exiting said variable DGD element, having a defined state of polarization. It also relates to a monitor module, a monitoring unit and a monitoring system, comprising such a spectrometer module for use in monitoring an optical network. Further, the invention relates to a spectrometer device, for spectrometry purposes, comprising a spectrometer module as stated above.

Abstract: An image reader for optically reading an image on an original and an image sensor unit for mounting to the image reader. The image sensor unit is provided with a shaft used for rotatably mounting the image sensor unit to an image sensor unit holding member of the image reader. This reduces the size of the image reader.

Abstract: An exposure method, wherein a defocus quantity on the surface of a substrate to be exposed with respect to an image plane of a projection optical system is detected highly accurately even during exposing without lowering throughput much and focusing is made with an automatic focusing method. A first oblique-incident AF sensor including an illumination slit unit (54a) through an optical member (63a) and a second oblique-incident AF sensor including an illumination slit unit (54b) through an optical member (63b) are used to apply slit images (F1f, F2f) onto common measuring points and focus positions are measured respectively. One half of the difference between the two measured values is regarded as a drift and the drift is corrected for values measured by the AF sensors; the first or second AF sensor is then used to perform a focusing by the automatic focusing method.

Abstract: A projection optical system forms an image of an object in a first plane onto a second plane. The projection optical system has an optical element group including at least one refractive member and plural reflective members, and a plurality of lens-barrel units holding the optical element group divided into a plurality of respective groupings. The reflective members are all held by a single lens-barrel unit of the plurality of lens-barrels units.