Patents Examined by Khaled Brown
-
Patent number: 6392742Abstract: An illumination system includes a light source, an emission angle preserving optical element for emitting light from the light source, at a certain emission angle, a collecting optical system for collecting the light from the emission angle preserving optical element, a pattern forming optical system having at least a diffractive optical element, for producing, on a predetermined plane, a light pattern of a desired shape having a uniform light intensity distribution, by use of light from the light collecting optical system, a multiple-beam producing system for producing a plurality of light beams, a zooming optical system for projecting the light intensity distribution on the predetermined plane, onto a light entrance surface of the multiple-beam producing system at a predetermined magnification, and an illuminating device for superposedly projecting lights from a light exit surface of the multiple-beam producing system, upon a surface to be illuminated.Type: GrantFiled: June 1, 1999Date of Patent: May 21, 2002Assignee: Canon Kabushiki KaishaInventor: Toshihiko Tsuji
-
Patent number: 6388736Abstract: A projection lithography system provides a cross-quadrupole illumination pattern in combination with a translucent substrate having boundary relief features. The features are spaced close together so that they are not imaged in a focal plane, but generate a dark image of the space between the features in the focal plane.Type: GrantFiled: November 15, 2000Date of Patent: May 14, 2002Assignee: ASM Lithography B.V.Inventors: Bruce W. Smith, John S. Petersen
-
Patent number: 6384894Abstract: The present invention is a method for developing a substrate by supplying a developing solution from a developing solution supply nozzle onto a surface of the substrate mounted on a predetermined position, and comprises the steps of moving the developing solution supply nozzle from a standby position of the developing solution supply nozzle outside one end of the substrate to at least the other end of the substrate without supplying the developing solution, and thereafter, moving the developing solution supply nozzle from the other end to at least the one end while supplying the developing solution. Therefore, the developing solution supply nozzle which is used once and has a possibility of a drip of the developing solution does not pass above the substrate, so that the developing solution never drips from the developing solution supply nozzle onto the substrate before and after supplying the developing solution for some reason or other.Type: GrantFiled: January 18, 2001Date of Patent: May 7, 2002Assignee: Tokyo Electron LimitedInventors: Yuji Matsuyama, Shuichi Nagamine
-
Patent number: 6377339Abstract: A method and apparatus for document imaging is disclosed. The apparatus uses a flatbed scanner with a selectively opaque/transparent liquid crystal platen. The platen is divided into controllable segments defined by an electrode pattern formed within the platen itself. These segments can each be selectively made transmissive or opaque by applying appropriate voltages to the segment electrodes. An advantage of the invention is that it can operate without a platen cover, since the area of the platen not covered by the original can be made opaque. The opaque part of the platen directs imaging light back into the system, shielding a user's eyes and helping to create a white background if the platen is imaged.Type: GrantFiled: March 29, 1999Date of Patent: April 23, 2002Assignee: Sharp Laboratories of America, Inc.Inventors: Larry Alan Westerman, Jeffrey Norris Coleman, Gary Alan Feather, James M. Florence
-
Patent number: 6377334Abstract: A method for the control of wafer surface temperatures during post exposure bake on hot plates of wafers which carry integrated circuits. Also disclosed is a method of maximizing image size uniformity for integrated circuits through the zonal control of temperatures of hot plates during post exposure bake processes for effectively modulating the wafer surface temperatures. Images within a semiconductor wafer integrated circuit line pattern are repeated to process a wafer through the photolithographic patterning process, including post exposure baking, to measure the image linewidths and compare these with an experimentally derived correlation chart; for instance, PEB temperature vs. linewidth for a given or specified photomasking process.Type: GrantFiled: January 24, 2001Date of Patent: April 23, 2002Assignee: International Business Machines CorporationInventor: Charles A. Whiting
-
Patent number: 6373551Abstract: A photographic system includes a photographic film having a unique identification code thereon. An identification tag is included with the photographic film; the identification tag bears a uniform resource locator that includes the unique identification code, and an associated password. The film is scanned after processing to generate a digital image and the unique identification code is associated with the digital image and stored in a digital storage device. A web server connected to the digital image storage device includes a resource identified by the uniform resource locator for accessing the digital image. A database accessible by the web server contains the unique identification code and the associated password wherein the resource is password protected and accessible by use of the password.Type: GrantFiled: March 6, 2001Date of Patent: April 16, 2002Assignee: Eastman Kodak CompanyInventors: Joseph A. Manico, Craig S. Willand, Madhav Mehra, Howard E. Bussey
-
Patent number: 6373552Abstract: A plate with substantially constant thickness is used to compensate for the residual distortion in the image projected by a high-quality projection lens for lithography. The two surfaces of the plate have an identical aspherical profile, whose shape has been calculated using the measured distortion map of the lithographic objective. The figuring process applied to the plate uses the principle of polishing in the presence of an elastic deformation, so as to achieve the desired aspherical shape on both sides.Type: GrantFiled: January 18, 2000Date of Patent: April 16, 2002Assignee: ASM Lithography B.V.Inventors: Josephus J. M. Braat, Cornelis J. van der Laan
-
Patent number: 6369873Abstract: A thermal processing kiosk for processing thermal film provides multiple processing options for a user. The kiosk includes a user control in the form of a touchscreen to permit the user to enter processing instructions and/or information. The thermal kiosk is adapted to accept exposed film for processing and printing in accordance with the processing instructions. In one feature of the invention, a user can prepay for processing of the film at the time of purchase of the film. The pre-paid status can be provided on the film by a marker or identifier on the cassette or the film. This helps to simplify the user interaction at the kiosk when the user submits the exposed film to the kiosk for processing. In further features of the invention, the processing flow in the thermal kiosk can be adapted to provide for rapid processing and the kiosk can include a display to permit a user to preview images prior to printing.Type: GrantFiled: June 13, 2000Date of Patent: April 9, 2002Assignee: Eastman Kodak CompanyInventors: David H. Levy, Richard P. Szajewski, Mark E. Irving, Lyn M. Irving
-
Patent number: 6369878Abstract: An imaging forming device using a platen, an upper peel roller, a lower peel roller movably positioned under and parallel to the upper peel roller, a diverter bar rotatably positioned underneath the platen and near the upper and lower peel rollers and adapted to guide a printable medium backing to move between the platen and the upper peel roller to between the upper and lower peel rollers, a peel bar rotatably positioned over the upper peel roller, a pair of lever cams rotatably positioned respectively at opposite ends of the upper and lower peel rollers, the lever cams are adapted to push the lower peel roller to press the printable medium backing against the upper peel roller during operation for moving the printable medium backing through the imaging forming device and to allow the lower peel roller to separate apart from the upper peel roller when the imaging forming device is open for loading the printable medium backing in between the upper and lower rollers.Type: GrantFiled: August 16, 2000Date of Patent: April 9, 2002Assignee: Eltron International, Inc. (ZEBRA)Inventors: Thomas M. Zevin, Douglas L. Harb, Alexander Peter, Philip Bryer
-
Patent number: 6369877Abstract: A system and method is disclosed that provides an automated, flow-through, dual side, laser direct imaging process and apparatus. This provides the capability to simultaneously register and image both sides of a substrate in a continuous flow-through process. The present invention provides efficiency improvements over the prior art on several levels. First, the prior art is batch process in which substrates are imaged one (or a batch) at a time in contrast with the present invention is a continuous, flow through, sequential process whereby a first substrate is followed into the apparatus by a second substrate which is, in turn followed by a third and so forth and the second substrate begins the process through the apparatus before the first substrate completes the process through the apparatus. Second, the process time per substrate is reduced as compared to the prior art.Type: GrantFiled: July 19, 2001Date of Patent: April 9, 2002Assignee: ManiaBarlo, N. V.Inventor: Marc Vernackt
-
Patent number: 6369874Abstract: A windowless system and apparatus are provided that prevent outgases from contaminating the projection optics of an in-vacuum lithography system. The outgassing mitigation apparatus comprises a chimney that is substantially closed at one end, a duct fluidly coupled to the chimney, and a baffle disposed within the chimney. The chimney of the outgassing mitigation apparatus is funnel shaped at the end that is substantially closed. This end of the chimney has an opening that permits a beam or bundle of light to pass through the chimney. A rotating barrier, having at least one aperture for the passage of light, can be positioned near the chimney so that the rotating barrier substantially closes an open end of the chimney except when one of the apertures of the rotating barrier is passing by the chimney. This rotating barrier can be chilled by a refrigerator unit, which is radiantly coupled to a portion of the rotating barrier. A motor is used to rotate the barrier.Type: GrantFiled: April 18, 2000Date of Patent: April 9, 2002Assignee: Silicon Valley Group, Inc.Inventor: Santiago E. del Puerto
-
Patent number: 6366342Abstract: A small, light weight drive apparatus is capable of driving an object in a predetermined direction, as well as being capable of micromotion in a rotation direction and in an orthogonal direction to the predetermined direction. A drive apparatus drives an object within a two dimensional plane including a first axis and a second axis orthogonal to the first axis. The drive apparatus includes a first stage on which the object is placed. A micromotion mechanism slightly drives the first stage in a direction of the second axis and in a rotation direction about a third axis orthogonal to the two-dimensional plane. A second stage holds the first stage without physically contacting the first stage. A non-contact holding mechanism disposed between the first stage and the second stage holds the first stage to the second stage in a non-contact manner allowing for micromotion of the first stage in the second axis direction and in the rotation direction relative to the second stage.Type: GrantFiled: March 5, 2001Date of Patent: April 2, 2002Assignee: Nikon CorporationInventor: Keiichi Tanaka
-
Patent number: 6366341Abstract: At the time of transferring the pattern image of a mask onto a substrate, an exposure apparatus overlays peripheral portions of exposure areas with respect to a pattern image, which has previously been transferred onto the substrate, with each other, and transfers a predetermined pattern onto the substrate. This exposure apparatus comprises a dose adjusting device capable of adjusting the dose of exposure light at the overlying portion, a shape measuring unit for measuring the shape of the pattern image of the overlying portion formed on the substrate, and a control section for controlling the dose adjusting device based on the result of measurement by the shape measuring unit in such a way that the shape of the pattern image of the overlying portion formed on the substrate becomes an intended shape.Type: GrantFiled: August 10, 2000Date of Patent: April 2, 2002Assignee: Nikon CorporationInventors: Akinori Shirato, Kazuhiko Hori, Toshio Matsuura
-
Patent number: 6359678Abstract: When an illumination light beam is radiated by an illumination system at a predetermined angle of incidence &thgr; with respect to a pattern plane of a mask, the illumination light beam is reflected by the pattern plane. The reflected light beam is projected by a projection optical system PO onto a substrate, and a pattern in an area on the mask illuminated with the illumination light beam is transferred onto the substrate. During the transfer, a stage control system is operated to synchronously move a mask stage and a substrate stage in the Y direction, while adjusting a relative position of the mask in the Z direction with respect to the projection optical system, on the basis of predetermined adjusting position information.Type: GrantFiled: May 10, 2000Date of Patent: March 19, 2002Assignee: Nikon CorporationInventor: Kazuya Ota
-
Patent number: 6359677Abstract: A stage apparatus includes a base having a reference plane, a stage mounted on the base, a plurality of static-pressure bearings forming a gap between the reference plane and the stage, a plurality of preloading mechanisms producing a preload between the stage and the reference plane, a guideless motor for driving the stage, and a controller for controlling driving of the stage in (i) at least one of a direction perpendicular to the reference plane and in a tilting direction by controlling at least one of the static-pressure bearings and the preloading mechanism, and (ii) in a direction within the reference plane by the guideless motor. Positioning of the stage in a Z-direction and in tilting directions can be carried out by electromagnets and air pads. Positioning in directions (X, Y, &thgr;) within a plane parallel to the reference plane of the base can be accomplished by guideless motors.Type: GrantFiled: December 15, 1998Date of Patent: March 19, 2002Assignee: Canon Kabushiki KaishaInventors: Hiroshi Itoh, Nobushige Korenaga
-
Patent number: 6353469Abstract: The photoelectric scanning device for original images contained on a photographic film has a film platform for the film, for temporarily holding the original images contained on the film in a respectively defined scanning position; a light source for illuminating the respective original image in the scanning position; a photoelectric converter for receiving light being transmitted through the respective original image in the scanning position, and for converting the received light into electrical scanning signals in a two-dimensional and pixel-by-pixel manner; an optical member for imaging the respective original image in the scanning position onto the photoelectric converter; and an electronic member for controlling the photoelectric converter and for reading out the electrical scanning signals which are generated by said photoelectric converter.Type: GrantFiled: July 25, 2000Date of Patent: March 5, 2002Assignee: Gretag Imaging Trading AGInventors: Heinrich Schaub, Willy Koch
-
Patent number: 6351304Abstract: An exposure method for exposing a substrate through a multiple exposure process including a first exposure using a first pattern having fine line elements of different directions, and a second exposure using a second pattern including a periodic pattern, wherein a periodicity direction of the periodic pattern is registered with a direction along which fine line elements of a predetermined direction, of the different directions, are arrayed, while, at least in a portion of the periodic pattern, a pattern or a boundary between adjacent patterns as well as a portion of or the whole of the fine line elements of the particular direction are adapted to be printed at the same location, and wherein the second pattern is so structured that one or those of the fine line elements of the first pattern extending in a particular direction different from the predetermined direction are not superposed with the periodic pattern.Type: GrantFiled: June 1, 2000Date of Patent: February 26, 2002Assignee: Canon Kabushiki KaishaInventors: Miyoko Kawashima, Yumiko Ohsaki
-
Patent number: 6341867Abstract: In a polarized light illumination apparatus, randomly polarized lights emitted from first and second light sources are respectively separated by a polarized light separating and combining element into two different types of polarized lights. Secondary light source images are formed at locations shifted from each other in an x direction, whereby polarization is aligned in the same single direction. At least two condensing mirror plates of first to third condensing mirror plates are shifted in parallel from the center axis of the polarized light separating and combining optical element so that secondary light source images formed by z-polarized lights (polarized in a z direction) emitted from the first and second light sources are superimposed upon each other, and secondary light source images formed by x-polarized lights (polarized in an x direction) emitted from the first and second light sources are superimposed upon each other.Type: GrantFiled: August 12, 1999Date of Patent: January 29, 2002Assignee: Seiko Epson CorporationInventor: Yoshitaka Itoh
-
Patent number: 6341010Abstract: A film scanner for scanning an image formed on a film, is provided with a line sensor unit that scans the image in a main scanning direction, and a table supporting the film. The table is slidable in an auxiliary scanning direction. A geared transmission is provided to receives the driving force of a driving source and outputs, to a table driving mechanism, one of a first and a second driving force. The first driving force is a force with which the table driving mechanism drives the table in a forward direction at a first speed, and the second driving force is a force with which the table driving mechanism drives the table in a reverse direction at a second speed that is different from the first speed.Type: GrantFiled: August 14, 2000Date of Patent: January 22, 2002Assignee: Asahi Kogaku Kogyo Kabushiki KaishaInventor: Yuichi Kurosawa
-
Patent number: 6337735Abstract: An exposure apparatus for photoengraving stamps includes a light-proof cabinet having a flash light therein and a drawer adapted to be drawn out therefrom. A clamp is carried on the drawer for holding the stamp. The clamp includes a base fixed to the drawer and formed with a pair of parallel rails, a pair of opposed holders movable on the base along the parallel rails, and means for moving the holders along the parallel rails in opposite directions synchronously. Each of the holders is also provided with a lifter for lifting up the middle plank between the bars and a handle for operating the lifter. Therefore the stamp may be held between the planks just under the flash light when the holders are moved closer together and the middle planks are lifted by turning the handles.Type: GrantFiled: January 16, 2001Date of Patent: January 8, 2002Inventor: Shiny Shih