Abstract: Disclosed is a method, system, and lense system for performing lithography on a substrate. The system includes a unique lense system for nonplanar substrates. The lense system includes a first lense section for receiving a pattern and producing a concave image of the pattern. The concave image can the be received by a second lense section for producing a nonplanar image of the pattern. The system also includes two light sources and a digital imaging device for projecting and exposing the pattern through the lense section and onto the substrate. Light from the first light source is used for exposing the pattern while light from second light source is used for receiving an alignment image. An image sensor, using the light from the second light source, detects an alignment image from the substrate. The alignment image is used to accommodate the projection of the pattern onto the substrate so that the pattern is properly aligned to the substrate.

Abstract: An image enhancement apparatus and method are disclosed. The apparatus consists of a spatial frequency filter where zero order mask diffraction information is reduced in an alternative pupil plane of the objective lens, specifically just beyond the mask plane. By introducing an angular specific transmission filter into this Fraunhofer diffraction field of the mask, user accessibility is introduced, allowing for a practical approach to frequency filtering. This frequency filtering is accomplished using a specifically designed interference filter coated over a transparent substrate. Alternatively, filtering can also be accomplished in a complimentary region near the wafer image plane or in both near-mask and near-wafer planes.

Abstract: An image reading apparatus includes a diffusion box unit comprising a plurality of diffusion boxes, which each correspond to different sizes of photographic films, and controls the unit in such a manner that the diffusion box, which corresponds to the size of a film whose image is to be read, is positioned on an optical axis of a light source. Accordingly, the responsibility imposed upon an operator can be reduced and the error of choosing a wrong diffusion box can be prevented.

Abstract: An air shower head of an exposure device of photolithography equipment is free of chemical substances that could otherwise contaminate a photoresist layer on a semiconductor wafer and degrade the profile of the photoresist pattern. The air shower head is interposed between a lens system of the exposure device and a wafer stage, and has a hole in the middle thereof through which exposure light can pass to a wafer supported on the stage. The air shower head includes an upper frame defining a cavity open at the bottom thereof, and a porous bottom member covering the bottom of the upper frame. The porous member is mechanically secured to bottom ends of both the inner and outer side walls of the upper frame, i.e., without the use of chemical binders, to reduce the ability of the air shower head to serve as a source of contamination.

Abstract: In a printing device which prints a color image on a photosensitive material by allowing an exposing head to modulate light from a light source for each pixel in accordance with image information, the exposing head is constituted by superposing three LCS's in the light-axis direction. The respective LCS's control the transmission and interruption of only the respective blue, green and red color components so that color tones in the respective pixels with respect to an image printed on printing paper are controlled based upon the subtractive color process. Therefore, it is possible to eliminate the generation of pixel offsets in an image printed on the photosensitive material by using a simple structure, and consequently to provide a printing device having a superior processability.

Abstract: An exposure apparatus is arranged to project one unit of a circuit pattern onto the surface of a resist on a substrate to be manufactured and to expose it over the surface of this resist. The exposure apparatus includes a processing unit that enables forming a high-resolution circuit pattern image on the substrate by the use of an image display which is able to ensure a wide display region without deteriorating the resolution, and that when dividing the one unit of circuit pattern into a plurality of regions in order to ensure an inexpensive, reliable exposure operation, divides it so that adjacent ones of the divided regions may partly overlap each other. An exposure device includes a plurality of optical systems each of that projects one of a plurality of the divided regions onto the surface of the resist on the substrate.

Abstract: A reticle capturing system includes a reticle that defines a first recess extending into the reticle from a first edge of the reticle and a second recess extending into the reticle from a second edge of the reticle. The reticle capturing system also includes a first finger selectively extending into the first recess and a second finger selectively extending into the second recess. The first and second fingers may be tapered so that the reticle capturing system will be self centering. The reticle capturing system may also include a third recess defined by the reticle and a third finger selectively extending into a recess. A method for capturing a reticle includes providing a reticle that defines a recess at an edge of the reticle and inserting the finger into the recess. The method may further include inserting a second finger into a second recess.

Abstract: The invention is directed to a projection exposure apparatus for the flat panel display manufacture having an objective array and magnifying objectives (O1 to O5).

Abstract: A projection exposure apparatus is provided which prevents a deterioration in alignment accuracy even if a deviation of the optical axis occurs with projection magnification adjustment of a projection optical system. After the projection magnification of a projection optical system is adjusted based on measurement results of marks formed on a substrate mounted on a substrate stage, the substrate is exposed by a predetermined pattern via the projection optical system. Information related to an imaging position of the projection optical system is measured after adjustment of the projection magnification and before exposure of the substrate.

Abstract: A system for performing digital lithography onto a subject is provided. The system utilizes pixel panels to generate pixel patterns. Mirrors are utilized to divert and align the pixel elements forming the patterns onto a subject. A gradient lens system positioned between the panels and the subject simultaneously directs the pixel elements to the subject. The pixel elements may overlapping, adjacent, or spaced as desired. The pixel elements may be directed to multiple surfaces simultaneously. One or more point array units may be utilized in the system to achieve higher resolution.

Abstract: A preexposure apparatus comprises a film supply station ST1 for arranging a film cartridge 14 containing a film 12 accommodated therein, a film-drawing station-ST3 for automatically drawing the film 12 over its entire length, an exposure station ST5 for exposing a predetermined portion of the drawn film 12 with an image by the aid of an exposure section 32, a winding station ST6 for automatically rewinding the film 12 after the exposure into the film cartridge 14, and a withdrawing station ST8 for withdrawing the film cartridge 14. Accordingly, the predetermined portion of the film can be preexposed with a desired image automatically and efficiently.

Abstract: A stage device includes a first stationary member, a second stationary member, a moving member and positioning devices. The first stationary member extends in a first direction. The second stationary member extends in the first direction and is spaced apart from the first stationary member in a second direction perpendicular to the first direction. The moving member can cooperate with the first stationary member and with the second stationary member. The positioning devices selectively position the moving member into cooperation with one of the first and second stationary members without physically contacting the moving member with the first and second stationary members. In addition, a stage device provided with a moving member that can move within a two-dimensional plane having a first direction and a second direction perpendicular to the first direction includes a first stationary member and a second stationary member.

Abstract: A stage apparatus includes a stage, a member fixed to the stage and a weight compensation mechanism having at least three spring members for compensating for a weight of a structure including the stage and the member. A barycentric position of the structure deviates from a centroid of a polygon formed by support points of the at least three spring members. The spring constants of the at least three spring members are based on a relative positional relationship between the barycentric position of the structure and the at least three spring members so as to set at least one spring constant different from the other spring constants.

Abstract: An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. An optical element (1) is therefore acted upon in a rotationally non-symmetrical manner by the radiation of the light source. A compensating light supply device (11, 14 to 19) is optically coupled via the peripheral surface (13) of the optical element (1) to the latter. It supplies compensating light (16, 12) to the optical element (1) in such a way that the temperature distribution in the optical element (1), which arises as a result of cumulative heating of the optical element (1) with projection light (2) and compensating light (12), is at least partially homogenized. In said manner image defects induced by the projection light are corrected.

Abstract: In a step and repeat process with a projection exposure apparatus, a pre-auto focus process is performed so as to compensate for a focus error caused by traveling of an XY stage wherein the pre-auto focus process is performed in a period in which the XY stage is moved from one exposure location to another. The pre-auto focus process minimizes the focus error, which is further corrected in a focus adjustment process using an auto focus sensor. This technique allows a focus adjustment to be made with improved accuracy in a short time. The focus error corrected in the pre-auto focus process is such an error of the position, in a direction along the optical axis, of the exposure surface with respect to the projection image plane that occurs when the XY stage is driven in a plane that is not parallel to the projection image plane and that is proportional to the traveling distance of the XY stage in the XY plane.

Abstract: Optimization apparatus for photographic image data with a data input device for input of first image data which are present in a first color space and represent a photographic image or a set of photographic images, an optimization device for optimizing the first image data and a data output device for output of the optimized first image data which optimally represent the photographic image or the set of photographic images, whereby the optimization device carries out an optimization transformation on the first image data, whereby the optimization transformation corresponds to a combination of at least the following transformations: a first transformation which transforms the first image data from the first color space into another, second color space; a correction transformation, which corrects the transformed first image data in the second color space; and a second transformation which transforms the corrected first image data into a third color space.

Abstract: The present invention is a method of supplying a developing solution to an entire face of a substrate to perform a developing treatment, including the steps of: moving a developing solution supply nozzle at a predetermined speed at least from one end to another end of the substrate while the developing solution is being supplied; measuring an amplitude of a wave on a solution face of the developing solution supplied on the substrate after the supply of the developing solution; and changing the predetermined speed of the developing solution supply nozzle based on a measured value. Accordingly, it is unnecessary to measure a line width or the like which is finally formed on the substrate before correction as in the conventional art, and thus the correction can be made earlier as compared with the conventional case, resulting in a reduced number of defective items and improved yield.

Abstract: An exposure system having an exposure apparatus for transferring a pattern of a first object onto a second object, which includes an exposure apparatus having a detecting system for performing relative alignment of the first object and the second object, a transmitting system for transmitting, to a remote location and through a public data line, a mark detection signal obtained by detection of a mark of the second object made by use of the detecting system and shape information obtained by measurement of a shape of the mark on the second object, and a calculating system for performing calculation of an offset of the exposure apparatus, at the remote location. The calculating system transmits information, including the offset, to the exposure apparatus and through the public data line, and, on the basis of the information including the offset, alignment of the first and second objects is executed by using the detecting system and an exposure process is performed in the exposure apparatus.

Abstract: An image forming device in which a plurality of image frames are exposed onto a photosensitive material at an exposure device, and the photosensitive material is superposed with image receiving materials of same sizes as the image frames on a heat drum, such that a plurality of image frames can be heat transferred all at once onto the image receiving materials. Image receiving materials of different sizes are readied in a plurality of magazines, and an image receiving material (magazine) of an appropriate size is selected in accordance with an exposure pattern and sizes of the image frames. Various types of prints can be formed by merely setting one photosensitive material. Further, because the plurality of image frames are heat transferred onto the image receiving materials all at once, printing processing efficiency can be improved.

Abstract: The present invention overcomes many of the disadvantages of prior lithographic microfabrication processes while providing further improvements that can significantly enhance the ability to make more complicated semiconductor chips at lower cost. A new type of programmable structure for exposing a wafer allows the lithographic pattern to be changed under electronic control. This provides great flexibility, increasing the throughput and decreasing the cost of chip manufacture and providing numerous other advantages. The programmable structure consists of an array of shutters that can be programmed to either transmit light to the wafer (referred to as its “open” state) or not transmit light to the wafer (referred to as its “closed” state). The programmable structure can comprise or include an array of selective amplifiers.