Abstract: A package includes a first package component having a top surface, a second package component bonded to the top surface of the first package component, and a plurality of electrical connectors at the top surface of the first package component. A molding material is over the first package component and molding the second package component therein. The molding material includes a first portion overlapping the second package component, wherein the first portion includes a first top surface, and a second portion encircling the first portion and molding bottom portions of the plurality of electrical connectors therein. The second portion has a second top surface lower than the first top surface.

Abstract: Provided are an OLED device and a method of manufacturing the OLED device that may provide improved luminance uniformity. The disclosed OLED may have a first electrode that has a first sheet resistance Rs, and a second electrode that has a second sheet resistance, wherein the second sheet resistance may be in the range of 0.3 Rs-1.3 Rs. In addition, the disclosed OLED may have a plurality of equal potential difference between points on a first electrode and a second electrode. The equal potential difference may be provided by a gradient resistance formed on at least one of the electrodes.

Abstract: A lattice structure is formed in a non-silicon interposer substrate to create large cells that are multiples of through hole pitches to act as islands for dielectric fields. Each unit cell is then filled with a dielectric material. Thereafter, holes (i.e., through holes or blind holes) are created within the dielectric material in the cells. After hole formation, a conductive metal is formed into each of the holes providing an interposer. This method can enable fine pitch processing in organic-based materials, isolates the thermal coefficient of expansion (TCE) stress from metal vias to low TCE carriers and creates a path to high volume, low costs components in panel form.

Abstract: The inventive concept relates to a liquid crystal display and a manufacturing method thereof. More particularly, the inventive concept relates to a liquid crystal display including one substrate and a manufacturing method thereof. A liquid crystal display according to an exemplary embodiment of the inventive concept includes: a thin film transistor; a passivation layer; a pixel electrode; an opposing electrode disposed on the pixel electrode and spaced apart from the pixel electrode by a microcavity interposed therebetween; a roof layer disposed on the opposing electrode and overlapping the pixel electrode, wherein the roof layer and the opposing electrode form a valley exposing an injection hole of the microcavity, a buffer zone disposed between the light transmitting area and the valley and a light blocking member overlapping the valley. A height of the microcavity in the buffer zone is higher than a height of the microcavity in the light transmitting area.

Abstract: A planar STT-MRAM includes apparatus, made by a method of operating and a method of manufacturing a spin-torque magnetoresistive memory and a plurality of magnetoresistive memory element having a ferromagnetic recording layer forming a flux closure with a self-aligned ferromagnetic soft adjacent layer which has an electric field enhanced perpendicular anisotropy through an interface interaction with a dielectric functional layer. The energy switch barrier of the soft adjacent layer is reduced under an electric field along a perpendicular direction with a proper voltage on a digital line from a control circuitry; accordingly, the in-plane magnetization of the recording layer is readily reversible in a low spin-transfer switching current.

Abstract: First and second fins are formed extending from a substrate. A first layer is formed over the first fin. The first layer comprises a first dopant. A portion of the first layer is removed from a tip portion of the first fin. A second layer is formed over the second fin. The second layer comprises a second dopant. One of the first and second dopants is a p-type dopant, and the other of the first and second dopants is an n-type dopant. A portion of the second layer is removed from a tip portion of the second fin. A solid phase diffusion process is performed to diffuse the first dopant into a non-tip portion of the first fin, and to diffuse the second dopant into a non-tip portion of the second fin.

Abstract: A resonator includes a laminate, an inductive element on the laminate, and a semiconductor die attached to the inductive element and the laminate. The semiconductor die includes a substrate and a device layout area. The device layout area is separated into a number of device layout sub-areas, each of which has an area between about 1.0 ?m2 and 100.0 ?m2. By limiting the area of each one of the device layout sub-areas with the charge carrier trap trenches, the total area of the semiconductor die prone to inducement of eddy currents (i.e., the layer of accumulated charge at the interface of the substrate and the device layout area) is reduced, which in turn reduces interference with the magnetic field of the inductive element and thus improves the performance of the resonator.

Abstract: A first III-V material based buffer layer is deposited on a silicon substrate. A second III-V material based buffer layer is deposited onto the first III-V material based buffer layer. A III-V material based device channel layer is deposited on the second III-V material based buffer layer.

Abstract: A semiconductor substrate includes a doped region. A premetallization dielectric layer extends over the semiconductor substrate. A first metallization layer is disposed on a top surface of the premetallization dielectric layer. A metal contact extends from the first metallization layer to the doped region. The premetallization dielectric layer includes sub-layers, and the first metal contact is formed by sub-contacts, each sub-contact formed in one of the sub-layers. Each first sub-contact has a width and a length, wherein the lengths of the sub-contacts forming the metal contact are all different from each other.

Abstract: One aspect relates to a layered structure with a substrate, a first layer over the substrate, and a second layer over the first layer. The substrate and the second layer are an electrically conductive material and the first layer is an insulating material or the substrate and the second layer are insulating material and the first layer is electrically conductive material. At least one of the first and second layers comprises an electrically conductive polymer.

Abstract: A method of manufacturing a light emitting device package includes forming on a growth substrate a light emitting structure including a first conductivity-type semiconductor layer, an active layer, and a second conductivity-type semiconductor layer. First and second electrodes are formed on the light emitting structure to be connected to the first and second conductivity-type semiconductor layers, respectively. A first bonding layer is formed on the light emitting structure, and is polished A second bonding layer is formed on the polished first bonding layer, and a support substrate is bonded to the light emitting structure using the first and second bonding layers.

Abstract: Some embodiments include an integrated structure having a stack of alternating dielectric levels and conductive levels, vertically-stacked memory cells within the conductive levels, an insulative material over the stack and a select gate material over the insulative material. An opening extends through the select gate material, through the insulative material, and through the stack of alternating dielectric and conductive levels. A first region of the opening within the insulative material is wider along a cross-section than a second region of the opening within the select gate material, and is wider along the cross-section than a third region of the opening within the stack of alternating dielectric levels and conductive levels. Channel material is within the opening and adjacent the insulative material, the select gate material and the memory cells. Some embodiments include methods of forming vertically-stacked memory cells.

Abstract: A semiconductor structure includes an isolation structure, a gate stack, a spacer and a patterned resist protective oxide. The isolation structure is formed in a semiconductor substrate, and electrically isolates device regions of the semiconductor substrate. The gate stack is located on the isolation structure. The spacer is formed along a sidewall of the gate stack on the isolation structure. The patterned resist protective oxide is located on the isolation structure and covers a sidewall of the spacer such that the spacer is interposed between the patterned resist protective oxide and the gate stack.

Abstract: Trench-confined selective epitaxial growth process in which epitaxial growth of a semiconductor device layer proceeds within the confines of a trench. In embodiments, a trench is fabricated to include a pristine, planar semiconductor seeding surface disposed at the bottom of the trench. Semiconductor regions around the seeding surface may be recessed relative to the seeding surface with Isolation dielectric disposed there on to surround the semiconductor seeding layer and form the trench. In embodiments to form the trench, a sacrificial hardmask fin may be covered in dielectric which is then planarized to expose the hardmask fin, which is then removed to expose the seeding surface. A semiconductor device layer is formed from the seeding surface through selective heteroepitaxy. In embodiments, non-planar devices are formed from the semiconductor device layer by recessing a top surface of the isolation dielectric.

Abstract: The disclosure is related to a thin film transistor and a method of manufacturing the thin film transistor. The thin film transistor comprises a substrate, a first semiconductor layer, an etch stop layer and a second semiconductor layer stacked on a surface of the substrate, and a first via and a second via formed on the etch stop layer; a source and a drain formed separating from each other and the source and the drain overlapping two ends of the second semiconductor layer respectively, wherein the source connects the first semiconductor layer through the first via, and the drain connects the first semiconductor layer through the second via, a gate insulation layer formed on the source and the drain; and a gate formed on the gate insulation layer. The thin film transistor of the disclosure have a higher on-state current of the thin film transistor and a faster switching speed.

Abstract: A method of forming a trench isolation (e.g., an STI) for an integrated circuit includes forming a pad oxide layer and then a nitride layer over a semiconductor substrate, performing a trench etch through the structure to form a trench, depositing a trench oxide layer over the structure to form a filled trench, depositing a sacrificial planarizing layer, which is etch-selective to the trench oxide layer, over the deposited oxide, performing a planarizing etch process that removes the sacrificial planarizing layer and decreases surface variations in an upper surface of the trench oxide layer, performing an oxide etch process that is selective to the trench oxide layer to remove remaining portions of the trench oxide layer outside the filled trench, and removing the remaining nitride layer such that the remaining oxide-filled trench defines a trench isolation structure that projects above an exposed upper surface of the semiconductor substrate.

Abstract: Methods and apparatus for forming a semiconductor device package on an interposer using a micro-bump layer are disclosed. The micro-bump layer may comprise micro-bumps and micro-bump lines, where a micro-bump is used as a vertical connection between a die and the interposer, and a micro-bump line is used as a horizontal connection for signal transmission between different dies above the interposer. The micro-bump lines may be formed at the same time as the formation of the micro-bumps with little or no additional cost.

Abstract: A replacement channel and a method for forming the same in a semiconductor device are provided. A channel area is defined in a substrate which is a surface of a semiconductor wafer or a structure such as a fin formed over the wafer. Portions of the channel region are removed and are replaced with a replacement channel material formed by an epitaxial growth/deposition process to include a first dopant concentration level less than a first dopant concentration level. A subsequent doping operation or operations is then used to boost the average dopant concentration to a level greater than the first dopant concentration level. The replacement channel material is formed to include a gradient in which the upper portion of the replacement channel material has a greater dopant concentration than the lower portion of replacement channel material.

Abstract: An apparatus comprises a buried layer over a substrate, an epitaxial layer over the buried layer, a first trench extending through the epitaxial layer and partially through the buried layer, a second trench extending through the epitaxial layer and partially through the buried layer, a dielectric layer in a bottom portion of the first trench, a first gate region in an upper portion of the first trench, a second gate region in the second trench, wherein the second gate region is electrically coupled to the first gate region, a drain region in the epitaxial layer and a source region on an opposite side of the first trench from the drain region.

Abstract: A display panel is disclosed, which comprises: a substrate with a first surface, a first thin film transistor unit and a second thin film transistor unit disposed on the first surface of the substrate; a first conductive line with a first inclined surface, disposed on the first surface of the substrate and electrically connecting to the first thin film transistor unit; a second conductive line with a second inclined surface, disposed on the first surface of the substrate and electrically connecting to the second thin film transistor unit, wherein an angle included between the first surface and the first inclined surface or an extension surface thereof of the first conductive line is defined as a first angle, an angle included between the first surface and the second inclined surface or an extension surface thereof of the second conductive line is defined as a second angle, and the first angle is different from the second angle.