Abstract: A cleaning or care device for the cleaning or care of medical or dental instruments, having a cleaning or care chamber in which at least two connections for the instruments to be cleaned are provided, and a supply device for supplying the at least two connections with a cleaning or care agent. The at least two connections and the supply device can be moved relative to one another in such a way that one of the connections can be connected to the supply device and supplied with a cleaning or care agent, while another of the connections is not connected to the supply device and cannot be supplied with a cleaning or care agent. A corresponding method for the cleaning or care of medical or dental instruments with such a cleaning or care device is also described.

Abstract: The invention relates to a method for the removal of coatings from scrap materials (3), wherein the scrap (3) is brought into contact with a liquid and, while the coating removal process is performed, moves within a conveying trough (2) of a vibrating conveyor (1) in a direction (6) from the inlet end (7) towards the outlet end (8) of said conveying trough (2). The invention is of special importance for the dezincing of steel scrap. The method operates on a continuous basis with the removal of coatings being efficiently accomplished.

Abstract: Debris-collecting apparatus and methods of use are provided. One hood is provided for use with a mobile debris-collecting apparatus that has an input portion, a draft inducer, and a bag. The hood has an inlet for receiving air and debris drawn through the input portion by the draft inducer, and the hood includes a helical passage extending downwardly from the inlet at least two hundred and seventy degrees about an imaginary vertical axis to direct the air and debris from the inlet to the bag in a helical direction. An opening may be formed inside the helical passage, and the hood may include a filter removably positioned to restrict the debris from exiting through the opening. The filter may extend downwardly inside the helical passage and/or the bag, whereby further causing helical movement of the debris by providing an inner boundary around which the debris must pass.

Abstract: Compositions, methods, and systems permit selectively etching metal oxide from reactor metal parts (e.g., titanium and/or titanium alloys). The etching composition comprises an alkali metal hydroxide and gallic acid. The method is useful for cleaning reaction chambers used in the deposition of metal oxide films such as aluminum oxide.

Abstract: A substrate liquid processing apparatus of the present invention includes a process-liquid supply unit selectively supplying a plurality of types of process-liquids to the substrate held by a substrate holding table, first and second guide cups which are disposed in this order from the top and are configured to respectively guide downward the process-liquid scattering from the rotating substrate while being held by the substrate holding table; and a position adjustment mechanism adjusting a positional relationship between the first and second guide cups and the substrate holding table. A first process-liquid recovery tank is provided at a lower area of the first and second guide cups and recovers the process-liquid guided by the first guide cup. A second process-liquid recovery tank is provided at the inner peripheral side of the first process-liquid recovery tank and recovers the process-liquid guided by the second guide cup.

Abstract: The present invention provides a method of cleaning steel sheet, said method of cleaning steel sheet feeding a cleaning solution activated by ultrasonic waves of a frequency of 0.8 MHz to 3 MHz to a surface of steel sheet at an angle inclined by 1 to 80° with respect to a line perpendicular to the surface of the steel sheet in a direction opposite to the running direction, thereby enabling megasonic waves to be applied to cleaning of running steel sheet and improving the cleaning effect and cleaning speed, and a continuous cleaning system of steel sheet.

Abstract: A brush for dislodging impurities on steam relief screen basket within an operating vessel including at least one brush that includes an elongated support column with a brush attached to a first end of the elongated support column extends out of a seal located on a removable vessel cover of the vessel. The steps using the brush to dislodge impurities on steam relief screen basket include locating the brush comprised of a plurality of bristles adjacent to the steam relief screen basket, contacting the brush with the screen basket, extending the elongated support column through the seal, closing the removable vessel cover of the vessel to avoid pressure drop inside the vessel, and moving the brush from a first location on the screen basket to a second location on the screen basket to dislodge impurities attached to the screen basket.

Abstract: A device for cleaning a fixed abrasive polishing pad includes a main body having a surface facing the polishing pad, an inlet coupled to an end of the main body and configured to supply a cleaning liquid, an inject orifice coupled to the inlet for injecting the cleaning liquid and being provided on the surface of the main body, an outlet coupled to the end of the main body, and a recycle orifice coupled to the outlet, and being provided on the surface of the main body.

Abstract: Embodiments of mechanisms for cleaning a wafer are provided. A method for cleaning a wafer includes cleaning a wafer by using a wafer scrubber and cleaning the wafer scrubber in a scrubber cleaning module. An agitated cleaning liquid is applied on the wafer scrubber to clean the wafer scrubber. The method also includes cleaning the wafer or a second wafer by the wafer scrubber after the wafer scrubber is cleaned by the agitated cleaning liquid.

Abstract: A method and apparatus for forming heterojunction stressor layers is described. A germanium precursor and a metal precursor are provided to a chamber, and an epitaxial layer of germanium-metal alloy formed on the substrate. The metal precursor is typically a metal halide, which may be provided by subliming a solid metal halide or by contacting a pure metal with a halogen gas. The precursors may be provided through a showerhead or through a side entry point, and an exhaust system coupled to the chamber may be separately heated to manage condensation of exhaust components.

Abstract: Provided is a washing method of a washing machine including an outer tub for receiving washing water, an inner tub rotatably provided in the outer tub to receive laundry, a pulsator rotatably provided in the inner tub, and a motor providing driving force to rotate at least one of the inner tub and the pulsator. In the washing method, a first centrifugal circulation water stream is formed by rotating the inner tub such that the washing water rises along a space between the outer and inner tubs and falls into the inner tub. An agitating water stream is formed by rotating the pulsator rotating the washing water. Here, the forming of the agitating water stream includes forming a first agitating water stream by controlling the motor with a first net acting ratio, and forming a second agitating water stream by controlling the motor with a second net acting ratio lower than the first net acting ratio.

Abstract: The present invention is concerned with methods and apparatus for cleaning the surface of an ion source in a mass spectrometer, for example an electrode of a MALDI ion source. The method includes directing UV light onto the surface to desorb contaminant material. The UV light source can be a laser and a moving reflecting surface can be used to direct the light on to the surface.

Abstract: Described embodiments include an unmanned aerial vehicle and a method. The unmanned aerial vehicle includes an airframe and a rotary wing system coupled with the airframe and configured to aerodynamically lift the vehicle in the air. The unmanned aerial vehicle includes a flight controller configured to control a movement of the vehicle while airborne. The unmanned aerial vehicle includes a cleansing controller configured to manage a removal of a surface contaminant from a selected portion of a surface of an external object using an airflow generated by the rotary wing system.

Abstract: A spray assembly for a dishwasher appliance is provided. The spray assembly includes a base unit and a mounting bracket rotatably mounted to the base unit. A spray arm is selectively secured to the mounting bracket. The mounting bracket includes features for engaging the spray arm and hindering undesired detachment of the spray arm from the mounting bracket.

Abstract: A cleaning method for an EUV light generation apparatus may include closing a connection portion so that a chamber interior and the interior of an exposure apparatus do not communicate when EUV light is not being generated, supplying an etchant gas for etching debris that has accumulated on a reflective surface of an optical element to the chamber interior in a state where the connection portion is closed, and exhausting the chamber interior using an exhaust apparatus while supplying the etchant gas.

Abstract: A disinfecting mat device cleans and sanitizes surfaces of objects coming into contact with the mat. The device includes a mat comprising a bottom wall, a perimeter wall, and an top wall defining an interior space of the mat. A compressible reservoir is positioned in the interior space and a fluid is positioned in the reservoir. An air chamber is positioned in the interior space. A plurality of ducts extends through a lower interior wall wherein each duct has an upper end in fluid communication with the air chamber and a lower end positioned adjacent to the reservoir. A plurality of tubes is in fluid communication with the reservoir extending through the top wall wherein each tube delivers the fluid in the reservoir to an upper surface of the top wall when the air chamber is compressed.

Abstract: An ultrasonic cleaning method for cleaning an object in a liquid in which a gas is dissolved includes preparing the liquid in which the gas is dissolved. The object is cleaned while applying ultrasonic waves to the liquid so that a ratio determined by dividing a vibration strength of the liquid at a fourth-order frequency of the ultrasonic waves by a vibration strength of the liquid at a fundamental frequency of the ultrasonic waves is larger than 0.8/1000.

Abstract: The present invention relates to a household appliance (1) that can be changed to a mode other than the operating or stand-by modes when desired, but eliminating the possibility of changing to this mode unintentionally by the user.

Abstract: A method including immersing a ceramic coated article into a bath including an HF acid solution having NH4F with a molar concentration of about 0.1M to 1.0M for a time period to remove a deposition, and rinsing the ceramic coated article.

Abstract: A substrate processing apparatus is provided including: a liquid processing unit that processes a substrate with a processing liquid; a carry-in port formed in the liquid processing unit and configured to carry-in the substrate in a dry-state before the substrate is processed with the processing liquid; a carry-out port formed in the liquid processing unit and configured to carry-out the substrate in a wet-state after completing the liquid processing; a supercritical dry processing unit that performs a dry processing for the substrate using a supercritical fluid; a first substrate transport unit that transports the substrate in a dry-state before the substrate is processed with the processing liquid to the carry-out port of the liquid processing unit; and a second substrate transport unit that transports the substrate in a wet-state after completing the liquid processing from the carry-out port of the liquid processing unit to the supercritical dry processing unit.