Abstract: An image display device generates a temperature information image indicating, by a numerical value, a temperature of each pixel contained in a predetermined area including a position on a thermal image specified by a user, and causes a display to display the temperature information image while a temperature of a pixel corresponding to the position specified is displayed at a center of the temperature information image. The image display device sets a temperature range that has a predetermined temperature width and a center which is a temperature of a pixel corresponding to a position the temperature information image specified by the user, updates the temperature-color conversion information based on the set temperature range, regenerates the thermal image and the temperature information image based on the temperature-color conversion information updated, and causes the display to display the regenerated thermal image and the regenerated temperature information image.

Abstract: A chromatic confocal sensor configured for calibrating an orientation of an equipment about the optical axis of the chromatic confocal sensor, wherein the equipment is disposed at a first orientation about the optical axis of the chromatic confocal sensor, the chromatic confocal sensor including a light source, a collimator, a lens and a reticle, wherein the light source, the collimator and the lens are coaxially disposed along the optical axis, the reticle is configured to be interposable between the collimator and the lens along the optical axis, an image is configured to be cast by the light source through the collimator, the reticle and the lens on the equipment, the image is disposed at a second orientation about the optical axis and the equipment is calibratable by aligning the equipment with the image such that the first orientation approaches the second orientation.

Abstract: A device for performing Raman spectroscopy measurements that incorporate Raman Shift calibration and related method for carrying out the Raman Shift calibration are disclosed. The device comprises of one or more Raman shift reference materials with one or more Raman bands, the positions of which are pre-determined to a high degree of accuracy within a useful temperature range. The device further comprises a sensor to measure the temperature of the one or more reference materials to provide accurate reference values for the Raman shift calibration. When used with the measured spectrum of the reference materials, an accurate Raman Shift calibration function of the device can be generated.

Abstract: The invention concerns a device (1) for the chromatic confocal measurement of a local height and/or orientation of a surface (S) of a sample comprising—a light source (2) configured to generate a polychromatic light beam (9)—a projection lens (4) comprising a lens (4) with axial chromatism configured to apply the light beam (9) to the surface (S) of the sample, —an optical sensor, configured to receive a light beam (9) reflected by the surface (S) of the sample and measure a total energy of the reflected light beam (9) received during an integration interval, —a scanning system (10), coupled to the projection lens (4) and configured to move the propagation axis of the light beam (9) relative to the projection lens (4), such that the total energy measured by the optical sensor corresponds to a dynamic spatial average of the total energy of the light beam (9) reflected by the surface (S) of the sample.

Abstract: A detection mechanism includes a light source disposed on a substrate, a condensing lens disposed between the substrate and light emitted from the light source, and a photodetector disposed on the substrate and under the condensing lens.

Abstract: An apparatus and a method for quantitative detection of gases are provided. The apparatus for quantitative detection of gases includes: a cavity ring-down spectroscopy device configured to quantitatively detect any characteristic gas in gases to be detected; a sample processing device disposed in a downstream of the cavity ring-down spectroscopy device and connected to the cavity ring-down spectroscopy device; and a mass spectrometry device disposed in a downstream of the sample processing device and configured to detect all the gases to be detected. Quantitative analysis of any variety of gases may be achieved without using standard gas in the technical solution proposed by the present application. Since no standard gas is required, the technology has significantly increased flexibility, and can be used for routine laboratory testing, for online analysis at industrial sites, as well as detection and analysis in environmental protection, national defense, aviation, aerospace, military and other fields.

Abstract: An interferometer includes a coherent light source and an array of electrically coupled light-sensitive pixel elements. The interferometer is configured to direct an internal optical path of the coherent light source and an external optical path of the coherent light source into a monolithic unit cell. In addition, the monolithic unit cell is configured to direct the internal optical path first through the monolithic unit cell and then onto the array and also configured to direct the external optical path back outside the monolithic unit cell through an external environment and then back into the monolithic unit cell and finally onto the array. In addition, interferometer is further configured to combine the internal optical path and the external optical path at the array and produce a first interferogram on the array, the interferogram characterizing an optical property of the external environment.

Abstract: An imaging apparatus includes a light source configured to generate and output light, a stage having a measurement target thereon, a line-scan spectral imaging (SI) optical system configured to measure the measurement target using a first scale and to slopingly irradiate the light from the light source onto the measurement target in a line beam shape, divide light reflected by the measurement target, and perform imaging of the divided light, and an angle-resolved SI optical system configured to measure the measurement target at a second scale that is smaller than the first scale and configured to divide the light from the light source into monochromatic light, slopingly irradiate the monochromatic light onto the measurement target by using a reflective objective lens, and perform imaging of light reflected by the measurement target.

Abstract: An epitaxial structure of a GaN-based radio frequency device based on a Si substrate and a manufacturing method thereof are provided. The epitaxial structure is composed of a Si substrate (1), an AlN nucleation layer (2), AlGaN buffer layers (3, 4, 5), a GaN:Fe/GaN high-resistance layer (6), a GaN superlattice layer (7), a GaN channel layer (8), an AlGaN barrier layer (9) and a GaN cap layer (10) which are stacked in turn from bottom to top, wherein the GaN:Fe/GaN high-resistance layer (6) is composed of an intentional Fe-doped GaN layer and an unintentional doped GaN layer which are alternately connected; the GaN superlattice layer (7) is composed of a low-pressure/low V/III ratio GaN layer and a high-pressure/high V/III ratio GaN layer which are periodically and alternately connected.

Abstract: A wearable head-up display which allows for convenient and safe stowage when not in use. A hinge component is positioned within the optical path from an image projector to a display component which ensures optical alignment for projection. A detection means is provided to signal when the wearable device is in a folded position in order to deactivate the projector.

Abstract: An object is to provide an optical pulse test method and an optical pulse test device with which it is possible to measure transmission losses of a basic mode and a first higher-order mode at a connection point at which two-mode optical fibers are connected in series, without switching the mode of input test light.

Abstract: A lamination molding apparatus includes a molding room, a chamber, a chamber window, a molding table, a molding table driving device, surrounding walls, an irradiation device, a measuring unit, and a controller. The measuring unit includes a first measuring device acquiring a measured value of a light intensity, and a second measuring device acquiring a value of a beam diameter, and measures laser beams outputted based on set values of light intensity during molding. The controller determines an abnormality has occurred when a slope of a linear function obtained from a relationship between the measured value of the light intensity and the value of the beam diameter at a predetermined height is out of a predetermined range, or when a slope of a linear function obtained from a relationship between the measured value of the light intensity and a value of a focal position is out of a predetermined range.

Abstract: A display has an image projector projecting collimated image illumination along a projection direction, and an optical element having two major surfaces and containing partially reflective surfaces which are internal to the optical element, planar, mutually parallel and overlapping relative to the projection direction. Each ray of the collimated image illumination enters the optical element and is partially reflected by at least two of the partially reflective surfaces so as to be redirected to exit the first major surface along a viewing direction. An alternative implementation, a first reflection from one of the partially reflective surfaces redirects part of the image illumination rays so as to undergo total internal reflection at the major surfaces of the optical element. The rays are then redirected by further reflection from another of the partially reflective surfaces to exit the optical element along the viewing direction.

Abstract: An EUV collector mirror for an extreme ultra violet (EUV) radiation source apparatus includes an EUV collector mirror body on which a reflective layer as a reflective surface is disposed, a heater attached to or embedded in the EUV collector mirror body and a drain structure to drain melted metal from the reflective surface of the EUV collector mirror body to a back side of the EUV collector mirror body.

Abstract: A light-source device includes an excitation light source; a wavelength conversion unit to convert at least some of first color light into second color light; a light mixing element including a rod integrator to mix at least one of the first color light and the second color light from the conversion unit; and an optical element on an optical path of the first color light and having a reflecting surface. A center of the first color light on the reflecting surface intersects with only one of a first light flux of the first color light incident on and a second light flux of the first color light emitted from the conversion unit. An angle formed by a projection straight line of the first color light incident on an incident aperture of the integrator and a predetermined axial line of the incident aperture of the integrator is smaller than 40°.

Abstract: In a method executed in an exposure apparatus, a focus control effective region and a focus control exclusion region are set based on an exposure map and a chip area layout within an exposure area. Focus-leveling data are measured over a wafer. A photo resist layer on the wafer is exposed with an exposure light. When a chip area of a plurality of chip areas of the exposure area is located within an effective region of a wafer, the chip area is included in the focus control effective region, and when a part of or all of a chip area of the plurality of chip areas is located on or outside a periphery of the effective region of the wafer, the chip area is included in the focus control exclusion region In the exposing, a focus-leveling is controlled by using the focus-leveling data measured at the focus control effective region.

Abstract: A system for illuminating a character for a scene includes a computing platform communicatively coupled to a lighting source and a camera, the computing platform including a hardware processor and a system memory storing a software code. The hardware processor executes the software code to identify a background for the scene, generate, using the lighting source, a simulation of the background on a surface illuminated by the lighting source, and utilize the simulation of the background generated on the surface illuminated by the lighting source to illuminate the character for the scene. The hardware processor also executes the software code to track, using the camera, a plurality of parameters of the camera during recording of an image of the illuminated character and the simulation of the background, and to remove the simulation of the background from the image based on the plurality of parameters of the camera.

Abstract: A light source device according to the present disclosure includes a light source section for emitting a first pencil and a second pencil, a first optical element for altering a proceeding direction of a principal ray of the first pencil, a second optical element for altering a proceeding direction of a principal ray of the second pencil, a wavelength conversion layer having a plane of incidence, a reflecting surface, a first side surface, and a second side surface, a first reflecting element having a first reflecting surface, and a second reflecting element having a second reflecting surface.

Abstract: A method for controlling a lithographic apparatus, and associated apparatuses. The method is configured to provide product structures to a substrate in a lithographic process and includes determining optimization data. The optimization data includes measured and/or simulated data of at least one performance parameter associated with the product structures and/or their arrangement which are to be applied to the substrate in the lithographic process. Substrate specific metrology data as measured and/or modeled before the providing of product structures to the substrate is determined, the substrate specific metrology data including metrology data relating to a characteristic of the substrate to which the structures are being applied and/or the state of the lithographic apparatus at the time that the structures are applied to the substrate.

Abstract: A phosphor according to the present disclosure includes a first crystal phase added with an activator agent, a second crystal phase higher in thermal conductivity than the first crystal phase, and a third crystal phase which is disposed between the first crystal phase and the second crystal phase, and is same in crystal structure as the first crystal phase, and is smaller in additive amount of the activator agent than the first crystal phase.