Abstract: The present disclosure describes a lithography apparatus comprising a photoresist coating unit configured to perform one or more coating processes on a substrate. The lithography apparatus further comprises a detection unit configured to determine a contamination level of a contaminant from the one or more coating processes adheres on a sidewall of the lithography apparatus. The lithography apparatus further comprises a controller unit configured to adjust one or more operations of the lithography apparatus based on a comparison between the contamination level and a baseline cleanliness requirement of the lithography apparatus.

Abstract: The invention provides an illumination system, configured to provide an illumination beam. The illumination system includes blue, green, and red laser modules respectively configured to provide blue, green, and red beams and a wavelength conversion component. The wavelength conversion component includes a wavelength conversion region and an optical output region. In a first time interval, the blue, green, and red beams are sequentially transmitted to the optical output region, where the illumination beam includes the blue, green, and red beams. In a second time interval, the blue beam is transmitted to the wavelength conversion region to form a converted beam, where the illumination beam includes the converted beam. A projection device including the illumination system is also provided. The projection device using the illumination system in the invention achieves color performance of a wide color gamut at relatively low costs.

Abstract: A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.

Abstract: Apparatus for processing substrates can include a gas distribution plate that includes an upper plate and a lower plate and a solid disk between the upper plate and the lower plate. Each of the upper plate and the lower plate has a central region and an outer region surrounding the central region, the central region being solid and the outer region having a plurality of through holes. The upper plate and the lower plate are coaxially aligned along a central axis extending through a center of the central region of the upper plate and a center of the central region of the lower plate. The solid disk is coaxially aligned with the upper plate and the lower plate. The solid disk is configured to block transmission of ultraviolet radiation through the solid disk.

Abstract: Display systems, such as near eye display systems or wearable heads up displays, may include a laser projection system having an optical engine and an optical scanner. Light output by the optical engine may be directed into the optical scanner as two angularly separated laser light beams. The angularly separated laser light beams may overlap at an entrance pupil plane along a first dimension at a first scan mirror of the optical scanner, or at a location between the first scan mirror and an optical relay of the optical scanner. The angularly separated laser light beams may overlap at an exit pupil plane along the first dimension at a second scan mirror of the optical scanner or at an incoupler of the laser projection system.

Abstract: A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become energized and emit extreme ultraviolet radiation. A collector reflects the extreme ultraviolet radiation toward a photolithography target. The photolithography system isolates a source of droplets from oxidants to prevent the oxidation of the nozzle or the formation of metal oxides on the nozzle, both of which can adversely affect an ability of the nozzle to generate a sufficient amount of droplets and/or direct the droplets in a desired direction.

Abstract: Provided are a vehicle-mounted display device and a display system. The vehicle-mounted display device includes: an image source, a light reflection module, and an image size adjustment module which are located on a light path; wherein the image source is configured to emit image light to the light reflection module according to an image to be displayed; the light reflection module reflects the image light at least twice, and emits same to the image size adjustment module; and the image size adjustment module is configured to adjust and emit the image light incident thereon.

Abstract: A light source apparatus 1 includes: a light emitter 2 having a plurality of laser diode devices 22 and packages 24 to hold the respective laser diode devices; a collimator 3 disposed on an optical path of a laser beam emitted from each of the laser diode devices; a focusing lens 5 disposed on a downstream side in a direction of an optical axis of each laser diode device relative to the collimator 3 and configured to condense the laser beams; a light guide 6 disposed on the downstream side in the direction of the optical axis relative to the focusing lens 5; and a magnification optical system 4 disposed between the collimator 3 and the focusing lens 5 to bring a beam diameter W?2-1 in a slow axis direction of the laser beam transmitted through the collimator 3 close to a beam diameter W?1-2 in a fast axis direction.

Abstract: An imaging optical unit for EUV microlithography is configured so that, when used in an optical system for EUV microlithography, relatively high EUV throughput and high imaging quality can achieved.

Abstract: A structured beam generation device based on beam shaping and a method adopting the device are provided. Linearly polarized beam emitted by a laser sequentially passes through an electro-optic intensity modulator, a half-wave plate, and a first beam expander, and then enters a first polarization beam-splitting prism to be transmitted and reflected. The transmitted beam sequentially passes through a beam shaper, an optical delay line, and a first reflector to form a parallel ring-shaped beam to be transmitted by a second polarization beam-splitting prism. The reflected beam sequentially passes through an electro-optic phase modulator, a second reflecting mirror, and a second beam expander, and is then reflected by the second polarization beam-splitting prism and combined with the transmitted beam into a beam, which is then adjusted by a polarizing plate have consistent polarization direction, and is finally focused at a focal plane by a focusing lens for interference.

Abstract: A vehicle includes at least one side bay equipped with a window, and a device for displaying at least one item of information on the window. The display device includes an image projector fastened to a ceiling of the vehicle. The display device emits light rays. A system of at least one mirror is arranged to reflect light rays emitted by the image projector in the direction of the window.

Abstract: A method including: obtaining a thin-mask transmission function of a patterning device and a M3D model for a lithographic process, wherein the thin-mask transmission function is a continuous transmission mask (CTM) and the M3D model at least represents a portion of M3D attributable to multiple edges of structures on the patterning device; determining a M3D mask transmission function of the patterning device by using the thin-mask transmission function and the M3D model; and determining an aerial image produced by the patterning device and the lithographic process, by using the M3D mask transmission function.

Abstract: An optical element has a first member having a first refractive index and a second member having a second refractive index different from the first refractive index. The optical element has a first transmissive surface, a reflective surface, and a second transmissive surface arranged from a demagnifying side toward a magnifying side in order. The first transmissive surface and the reflective surface are located in one side with respect to an optical axis of the optical element. The second transmissive surface is located in the other side with respect to the optical axis of the optical element. the reflective surface has a concave shape.

Abstract: An extreme ultraviolet light concentrating mirror may include a substrate, a multilayer reflection film provided on the substrate and configured to reflect extreme ultraviolet light, and a protective film provided on the multilayer reflection film. Here, the protective film may include a mixed film in which a network-forming oxide is mixed with an amorphous titanium oxide, or a mixed film in which two or more amorphous titanium oxide layers and two or more network-forming oxide layers are each alternately laminated.

Abstract: The present disclosure relates to a projector including a light source apparatus that outputs a light ray flux containing fluorescence, a bandpass filter provided at least in part of an optical path of the fluorescence, an integrator unit on which the light ray flux is incident and which divides the light ray flux into a plurality of partial light ray fluxes, a superimposing lens that is provided on the downstream of the integrator unit and causes the plurality of partial light ray fluxes to be incident in different positions, a light modulator including a plurality of pixels, a microlens array including a plurality of microlenses corresponding to the plurality of pixels, and a projection optical apparatus that projects light outputted from the light modulator.

Abstract: A projection device is provided. An excitation light source of the projection device emits a first light beam incident to a light wavelength conversion wheel along a first direction. The light wavelength conversion wheel outputs the first light beam at a first timing, and converts the first light beam into a second light beam to be outputted at a second timing. The second light beam exits the light wavelength conversion wheel along a second direction. The first and second light beams sequentially penetrate a color filter wheel and a light homogenizing element, so that an illumination system outputs an illumination beam. The illumination beam is incident to a light valve along a third direction to be converted into an image beam. The image beam exits the light valve along a fourth direction. The first to fourth directions are different from each other and are located on a same plane.

Abstract: An extreme ultraviolet light generation apparatus may include a chamber; a droplet generator configured to sequentially supply a first droplet of target substance to a plasma generation region in the chamber; and a gas flow generation device having a gas outlet for causing gas to flow along a travel direction of the first droplet around at least a part of a trajectory of the first droplet. Here, the droplet generator includes a vibrating element configured to generate, by applying vibration to a nozzle through which the target substance is output, a plurality of second droplets each having smaller volume than the first droplet and to cause the second droplets to be combined to generate the first droplet, and the gas outlet is located downstream, on a trajectory direction of the first droplet, of a position where the second droplets are combined and the first droplet is generated.

Abstract: A pellicle for extreme ultraviolet lithography has an extreme ultraviolet transmittance of 90% or more and also has thermal stability, mechanical stability, and chemical durability. The pellicle includes a support layer and a pellicle layer. The support layer has an opening formed in a central portion thereof. The pellicle layer is formed on the support layer to cover the opening and includes ZrBx (2<x<16).

Abstract: A light source unit includes a blue laser diode of an excitation light shining device for emitting light in a first wavelength range, a red light source of a red light source device for emitting light in a second wavelength range, a luminescent wheel including a wavelength transforming area for transforming the light in the first wavelength range into light in a third wavelength range differing in wavelength range from the light in the first wavelength range and the light in the second wavelength range and emitting the light in the third wavelength range and a transmitting area for emitting the light in the first wavelength range, the wavelength transforming area and the transmitting area being provided end to end in a circumferential direction, and a dichroic mirror configured to transmit one of the lights in the first and second wavelength ranges and reflect a remaining light.

Abstract: A wavelength converter according to the present disclosure includes a wavelength conversion layer having a first surface on which excitation light that belongs to a first wavelength band is incident and a second surface different from the first surface and converts the excitation light into fluorescence that belongs to a second wavelength band different from the first wavelength band, and a base so provided as to face the second surface. The base includes a first heat dissipation section so provided as to face a light incident area of the first surface that is an area on which the excitation light is incident and a second heat dissipation section the thermal conductivity of which in a first direction that intersects the first surface is lower than the thermal conductivity of the first heat dissipation section.