Abstract: Containing device for a treatment machine for loose products, provided internally with a treatment compartment that has at least an open side for loading the loose products to be treated, and for unloading the loose products that have been treated; the containing device comprises at least a first loading door for the loose products to be treated, positioned on a first portion of said open side and associated with at least a respective opening and closing unit, and at least a second unloading door for the loose products that have been treated, positioned on a second portion of said open side and associated with at least a respective opening and closing unit.

Abstract: In a chemical mechanical polishing system, a platen shield cleaning assembly is installed on a rotatable platen in a gap between the rotatable platen and a platen shield. The assembly includes a sponge holder attached to the platen and a sponge. The sponge is held by the sponge holder such that an outer surface of the sponge is pressed against an inner surface of the platen shield.

Abstract: Certain exemplary embodiments can provide a system that comprises an electric motor, an electric motor housing, a cable and a heat shield. the electric motor housing substantially surrounds the electric motor with the exception of a protruding shaft of the electric motor. The cable is coupled to the electric motor, the cable is constructed to rotate within a stovepipe or chimney.

Abstract: A washing cabinet for cleaning a part.

Abstract: An anti-sedimentation system can implement a method in which a pump pumps seawater to a discharge nozzle positioned under the seawater and facing an under keel clearance of a marine vessel docked at a dock. Sediments are flowed away from the under keel clearance by the discharge nozzle discharging the seawater toward the under keel clearance.

Abstract: A self-contained, compact camera wash system 1000 for a drone 800 or as an automotive aftermarket kit 1101 uses a pressurized container 1002 similar to a common aerosol can to supply washer fluid to a washer nozzle 1020 via actuable valving. The fluid supply container is small for use with drone cameras (e.g., ˜15 ml in volume) and is readily packaged in a compact assembly. For the automotive aftermarket kit 1101 a larger volume container volume is provided and configured to be easily replaced as needed.

Abstract: A cleaning method is provided. In the cleaning method, residues of elements of a group for a common semiconductor material in a chamber are removed with plasma of a halogen-containing gas. Residues of metal elements of groups 12 and 13 and groups 14 and 15 in the chamber are removed with plasma of a hydrocarbon-containing gas. A C-containing material in the chamber is removed with plasma of an O-containing gas. Further, the removing with the plasma of the halogen-containing gas, the removing with the plasma of the hydrocarbon-containing gas, and the removing with the plasma of the O-containing gas are performed in that order or the removing with the plasma of the hydrocarbon-containing gas, the removing with the plasma of the O-containing gas, and the removing with the plasma of the halogen-containing gas are performed in that order X times where X?1.

Abstract: An assembly includes a housing defining a chamber and having an air inlet. The assembly includes a blower in the chamber and in fluid communication with the air inlet. The assembly includes a sensor defining a field of view and supported by the housing. The housing has an outlet vent of variable size. The outlet vent is in communication with the blower and aimed across the field of view of the sensor.

Abstract: The cleaning device (20) for cleaning a cylindrical roller (50), for example an anilox roller of a printing machine, includes a cleaning head (30) with a cleaning chamber (110), in which there is housed a mechanical cleaning member (60), and with which there are associated feeding members (70) for feeding a cleaning liquid into the cleaning chamber (110). The mechanical member (60) and cleaning liquid dispensed by the feeding members work in combination inside said cleaning chamber (110) to clean the lateral surface of the roller (50).

Abstract: There is provided a drying apparatus for covering an upper surface of the substrate with an uneven pattern formed thereon with a liquid film and subsequently drying the substrate, including: a first heat transfer part whose temperature is adjusted to a first temperature, wherein a first heat is transferred between the first heat transfer part and the substrate by a first temperature difference; a second heat transfer part whose temperature is adjusted to a second temperature different from the first temperature, wherein a second heat is transferred between the second heat transfer part and the substrate by a second temperature difference; and a controller configured to control the first temperature and the second temperature and to control a surface tension distribution of the liquid film so as to control an agglomeration of the liquid film.

Abstract: A cleaning robot according to an embodiment of the present invention comprises: a traveling motor configured to generate a driving force for traveling; a cleaning module changing unit configured to selectively activate any one of at least one cleaning module; a sensing unit configured to sense characteristics of a floor surface; and a processor configured to perform a cleaning operation of cleaning the floor surface by controlling the cleaning module changing unit to activate any one of the at least one cleaning module based on the sensed characteristics of the floor surface, wherein the processor is configured to: sense characteristics of a contaminant present on the floor surface by using the sensing unit while performing the cleaning operation; and control the cleaning module changing unit to change or maintain the activated cleaning module based on the sensed characteristics of the contaminant.

Abstract: A cleaning device and a method therefor are provided. The cleaning device includes a vacuum cleaner including a dust collecting container and a docking station to which the dust collecting container is coupled. The docking station includes a suction device configured to move air from the dust collecting container to inside of the docking station, a collector configured to collect a foreign substance that is moved together with the air by driving of the suction device, a suction flow path along which air moves inside the docking station, a flow adjusting device configured to open or close the suction flow path, and at least one processor configured to control the suction device to operate based on the dust collecting container being coupled to the docking station, and control the flow adjusting device to periodically open and close the suction flow path in a state in which the suction device operates.

Abstract: When performing a liquid processing on a substrate W being rotated and removing a processing liquid by a cleaning liquid, a cleaning liquid nozzle 421 configured to discharge a cleaning liquid slantly with respect to a surface of the substrate W toward a downstream side of a rotational direction of the substrate W and a gas nozzle 411 configured to discharge a gas toward a position adjacent to a central portion side of the substrate W when viewed from a liquid arrival position R of the cleaning liquid are moved from the central portion side toward a peripheral portion side. A rotation number of the substrate is varied such that rotation number in a period during which the liquid arrival position R moves in the second region becomes smaller than a maximum rotation number in a period during which the liquid arrival position moves in the first region.

Abstract: A cleaning device and a method therefor are provided. The cleaning device includes a vacuum cleaner including a dust collecting container and a docking station to which the dust collecting container is coupled. The docking station includes a suction device configured to move air from the dust collecting container to inside of the docking station, a collector configured to collect a foreign substance that is moved together with the air by driving of the suction device, a suction flow path along which air moves inside the docking station, a flow adjusting device configured to open or close the suction flow path, and at least one processor configured to control the suction device to operate based on the dust collecting container being coupled to the docking station, and control the flow adjusting device to periodically open and close the suction flow path in a state in which the suction device operates.

Abstract: A back-blush cleaning container may have a spring-biased piston that allows the container to fill with hot water when attached to a group head of the espresso machine. When the hot water of the espresso machine is turned off, the piston due to the spring urges the hot water out and back through a 3-way valve to clean the espresso machine. The backflush cleaning container also may have a steam conduit that allows steam from a steam wand of the espresso machine to clean the group head, 3-way valve and tubes. Moreover, the container may have a window which based on the position of the piston, a particular color is shown. The colors indicate whether the container is safe to remove from the group head of the espresso machine and when the container is full of water.

Abstract: Disclosed is a method for processing a substrate, comprising a liquid processing step of performing liquid processing on the substrate by supplying a processing liquid onto the substrate in a liquid processing chamber, a transfer step of transferring the substrate from the liquid processing chamber to a drying chamber, and a drying step of drying the substrate in the drying chamber. In the drying step, the substrate is dried while an edge region of the substrate other than a central region of the substrate is supported by a support unit, and in the liquid processing step, the liquid processing is performed on the substrate such that a height of the processing liquid remaining on the edge region of the substrate is greater than a height of the processing liquid remaining on the central region of the substrate when the liquid processing is completed in the liquid processing chamber.

Abstract: The invention pertains to a system consisting of a first floor treatment apparatus that is exclusively guided manually within an environment by a user and a second floor treatment apparatus that is exclusively operated automatically, wherein the second floor treatment apparatus is designed for orienting and localizing itself within an environment. The first floor treatment apparatus is designed for detecting a movement path of the first floor treatment apparatus during a movement of the first floor treatment apparatus that is manually guided by a user, as well as for transmitting information on the detected movement path to the second floor treatment apparatus by means of wireless communication. The second floor treatment apparatus is designed for receiving the information and for autonomously traveling along the movement path within the environment based on the received information.

Abstract: A substrate processing method includes supplying a water-soluble polymer solution to a surface of a substrate having, on a surface of the substrate, a resist film on which no pattern is formed, after an immersion exposure process, hydrophilizing a surface of the resist film using the supplied water-soluble polymer solution, supplying, after the hydrophilizing, a cleaning liquid to the surface of the substrate while rotating the substrate to remove the water-soluble polymer solution that has not contributed to the hydrophilizing, and drying the substrate supplied with the cleaning liquid, wherein the water-soluble polymer solution has a pH value that allows an acid concentration in the resist film to fall within a permissible range.

Abstract: Disclosed is a first cleaning apparatus including a first cleaning bath, a cover provided at the upper part of the first cleaning bath, a drainage portion provided at the lower part of the first cleaning bath, a first cleaning unit and a second cleaning unit provided respectively at a first side surface and a second side surface in the first cleaning bath, and first and second moving units configured to move the first and second cleaning units, respectively, wherein each of the first and second cleaning units includes a plurality of cleaning solution supply pipes provided at different heights and a plurality of nozzles provided at each of the cleaning solution supply pipes, the nozzles provided at one cleaning solution supply pipe have identical cleaning solution spray angles, and the nozzles provided at the other cleaning solution supply pipes have different cleaning solution spray angles.

Abstract: A cleaning device and a method therefor are provided. The cleaning device includes a vacuum cleaner including a dust collecting container and a docking station to which the dust collecting container is coupled. The docking station includes a suction device configured to move air from the dust collecting container to inside of the docking station, a collector configured to collect a foreign substance that is moved together with the air by driving of the suction device, a suction flow path along which air moves inside the docking station, a flow adjusting device configured to open or close the suction flow path, and at least one processor configured to control the suction device to operate based on the dust collecting container being coupled to the docking station, and control the flow adjusting device to periodically open and close the suction flow path in a state in which the suction device operates.