Abstract: A machine is cleaned by directing a foam detergent into the machine to remove contaminants from inside the machine. An effluent portion of the foam detergent exits from the machine with some of the contaminants. One or more of a turbidity, a salinity, an amount of total dissolved solids, or a concentration the contaminants in the effluent is measured. A cleaning time period during which the foam detergent is to be directed into the machine is determined based on the turbidity, the salinity, the amount of total dissolved solids, and/or the contaminant concentration that is measured from the effluent. The foam detergent continues to be directed into the machine during the cleaning time period, and the flow of the foam detergent into the machine is terminated on expiration of the time period.

Abstract: A method for cleaning a substrate includes supplying to a substrate on which a resist layer is not formed a film-forming processing liquid which includes a volatile component and forms a film on the substrate, forming a processing film on the substrate by solidifying or curing the film-forming processing liquid supplied on the substrate, and supplying to the substrate having the processing film a strip-processing liquid which strips the processing film from the substrate.

Abstract: A cleaning apparatus for cleaning a cleaning tool that scrub-cleans a substrate includes a cleaning body. The cleaning body includes a contact portion configured to come into contact with the cleaning tool, and the contact portion includes a suction area configured to remove foreign matter from the cleaning tool.

Abstract: A method for maintaining and cleaning air scrubbers. The air scrubbers are maintained and cleaned by applying an aqueous ozone solution thereto.

Abstract: A cleaning device and a method therefor are provided. The cleaning device includes a vacuum cleaner including a dust collecting container and a docking station to which the dust collecting container is coupled. The docking station includes a suction device configured to move air from the dust collecting container to inside of the docking station, a collector configured to collect a foreign substance that is moved together with the air by driving of the suction device, a suction flow path along which air moves inside the docking station, a flow adjusting device configured to open or close the suction flow path, and at least one processor configured to control the suction device to operate based on the dust collecting container being coupled to the docking station, and control the flow adjusting device to periodically open and close the suction flow path in a state in which the suction device operates.

Abstract: In a submersible ultrasonic cleaning system for use in highly radioactive environments (e.g., cleaning radiated nuclear fuel assemblies), a bond between energy producing transducers and an radiating wall is strengthened with a polyurethane adhesive such as Permabond PT326, or 3M DP-190 adhesive. In various diagnostic tests, one or more of the transducers are operated in an energy-transmitting mode while one or more other transducers are operated in an energy-detecting mode to detect a weakened transducer/wall bond and/or acoustic conditions of the working fluid.

Abstract: A cleaning method by which a cleaning apparatus including a first cleaner and a second cleaner cleans a detection element including a detection surface includes cleaning by the first cleaner the detection surface of the detection element by wind pressure, and wiping the detection surface of the detection element with the second cleaner in a contacted manner, wherein the cleaning by the first cleaner and the wiping by the second cleaner are performed in this order.

Abstract: A plant for cleaning rolled metal strips provided with a superficial layer of oxide, the plant comprising unwinding means for unwinding at least one coil of rolled strip and pickling means for pickling said rolled strip; wherein there are provided measuring means for measuring the thickness of the superficial layer of oxide, arranged between said unwinding means and said pickling means. A relating cleaning method is also claimed.

Abstract: A substrate cleaning apparatus includes a support inside a chamber to hold a substrate, a first supply source inside the chamber that includes a first nozzle along a first direction and facing an upper surface of the support, the first nozzle to spray polymer and solvent onto the substrate to form a coating, and a second nozzle at an oblique angle to the first direction and facing an edge of the support to inject a hot gas toward the coating to volatilize the solvent, a second supply source inside the chamber and having a third nozzle facing the upper surface of the support to inject a peeling treatment to the coating to peel the coating from the substrate, and a third supply source inside the chamber and facing a lower surface of the support to inject the hot gas to heat a second surface of the substrate.

Abstract: A cleaning station for an optical element is providing, including: an optical element holder configured to hold the optical element; a first drive configured to rotate the optical element holder around a rotation axis coinciding with an optical axis of the optical element when held by the optical element holder; a cleaning nozzle configured to project a cleaning jet of a cleaning liquid towards the optical element; and a separate drying nozzle configured to project a drying jet towards the optical element, the cleaning nozzle and the drying nozzle being configured to move in order to direct the cleaning jet and the drying jet, respectively, successively to different locations on the optical element.

Abstract: The present disclosure relates to a level adjustable washing machine and a method for adjusting a level of the washing machine.

Abstract: The present invention is a washing apparatus for induction suitable cookware and also involves the method of washing. The apparatus can be incorporated in restaurants, operated manually or incorporated in automatic cooking systems. The apparatus comprises of an induction heating unit, a replaceable water nozzle, a sink, an induction element, a ceramic glass, a pump, an electric motor, a controller, a manual HMI and a vision system.

Abstract: A substrate processing apparatus includes a liquid film forming unit 16A configured to form a liquid film of a liquid for anti-drying on a substrate; a drying processing unit 16B configured to dry the substrate; and a transfer mechanism 17 configured to transfer the substrate from the liquid film forming unit into the drying processing unit. By a transfer time adjusting operation of adjusting a volatilization amount of the liquid during a transfer of the substrate by adjusting a transfer time during which the substrate is transferred from the liquid film forming unit into the drying processing unit or by an initial liquid film thickness adjusting operation of adjusting a thickness of the liquid film formed in the liquid film forming unit, the thickness of the liquid film when a drying processing is begun in the drying processing unit is controlled to fall within a target range.

Abstract: A portable spray cleaning system with a device for sanitizing the interior surface of residential trash cans. The device includes adjustable arms, a plurality of spray nozzles, and rubber clamps. On one end, the device may also include a port for connecting to a water supply via a hose. Once the hose is connected, water can then be sprayed out through the spray nozzles. The pressure created by the water flow enables the device to rotate while water is being sprayed. There may also be a compartment for inserting a disinfectant that mixes in with the water. The device is collapsible for easy storage and packaging. It is known that trash receptacles often become very dirty and contaminated after repeated use.

Abstract: An assembly for frothing a fluid having an air channel with a controllable air valve and having a fluid channel with an air inlet emanation point in which the air channel emanates, a pump, a fluid restriction, a heater, and a valve assembly having a first state in which fluid is channeled to a fluid outlet of the fluid channel and a second state in which the fluid is diverted from the fluid channel to a second fluid outlet. A water supply channel is connected to the fluid channel. The assembly also includes a cleaning reservoir and a return channel that is connected to the second fluid outlet of the valve assembly and that emanates in the cleaning reservoir. An electronic controller assembly is configured to control at least the pump, the heater, and the valve assembly, and to operate the assembly in a production mode and a cleaning mode.

Abstract: A device for cleaning the inside of a monocrystalline pulling apparatus includes a main tube unit to be inserted into a pull chamber and an inner surface cleaning mechanism that is provided at an upper part of the main tube unit and cleans the inner surface of the pull chamber. The main tube unit includes a retreat/housing section into which a seed chuck provided at the lower end of a wire retreats and which houses the seed chuck therein, and a continuous extension mechanism that is provided at the lower part of the main tube unit and to which a plurality of extension rods are capable of being added and joined. Accordingly, the inner surface of the pull chamber is efficiently cleaned.

Abstract: A supercritical drying apparatus and a method of drying a substrate, the apparatus including a drying chamber configured to receive a supercritical fluid and to dry a substrate; a chuck in the drying chamber, the chuck being configured to receive the substrate; and a particle remover in the drying chamber, the particle remover being configured to remove dry particles from the substrate by heating the substrate with radiant heat.

Abstract: A substrate processing method includes a processing liquid film forming step of supplying a processing liquid, containing a sublimable substance, to a pattern forming surface of a substrate, to form a processing liquid film on the pattern forming surface, a temperature maintaining step of maintaining a temperature of the processing liquid film, formed on the pattern forming surface, in a temperature range not lower than a melting point of the sublimable substance and lower than a boiling point of the sublimable substance, a film thinning step of thinning the processing liquid film while the temperature of the processing liquid film is in the temperature range, a freezing step of making the processing liquid film, thinned by the film thinning step, freeze on the pattern forming surface after the temperature maintaining step to form a frozen body of the sublimable substance, and a sublimating step of sublimating the frozen body to remove the frozen body from the pattern forming surface.

Abstract: A method includes forming a film of a compound on an inner wall of a gas supply line by polymerization of a first compound and a second compound by controlling a temperature of the gas supply line to a first temperature at which the first compound and the second compound are polymerized in a state where a first gas containing the first compound and a second gas containing the second compound are supplied to the gas supply line, and removing the film by controlling the temperature of the gas supply line to a second temperature at which the film is depolymerized after predetermined processing is performed on a target object in a processing chamber by a processing gas supplied into the processing chamber through the gas supply line having the film. The first compound is isocyanate. The second compound is amine or a compound having a hydroxyl group.

Abstract: An apparatus comprising a cleaning rod driven in reciprocating, axial extension (y) and retraction (x) movements upon cleaning a smelt discharge opening of a chemicals recovery boiler, wherein a linear actuator is controllable for driving the cleaning rod in the axial movements. A pivot actuation means is controllable for pivoting the cleaning rod about an axis (S) upon cleaning a smelt spout associated with the smelt discharge opening, wherein one or more sensors are arranged to provide control basis for correlation of the axial movements (x; y) with the change in pivot angle (?) during pivoting of the cleaning rod. A method to be performed in use of the apparatus is likewise disclosed.