Patents Examined by Mikhail Kornakov
  • Infinite ultraviolet shielding devices, systems, and methods
    Patent number: 11478560
    Abstract: A UV shielding device including a sanitizing interface having a top surface arranged to support device positioned above the sanitizing interface where the sanitizing interface includes a translucent material arranged to allow UV light to pass through. The device also includes at least one shape sensor arranged to detect a shape of a surface of the device facing the sanitizing interface. The device further includes an adjustable UV emission interface that is positioned adjacent to the sanitizing interface and arranged to adjustably conform to the shape of the surface of the device facing the sanitizing interface, while also being arranged to emit the UV light toward sanitizing interface and device.
    Type: Grant
    Filed: October 4, 2021
    Date of Patent: October 25, 2022
    Assignee: Nittany Solutions Group, LLC
    Inventors: Robert F. McKeon, Scott A. Treser
  • Adhesive removing device and method
    Patent number: 11478828
    Abstract: Provided is an adhesive removing device for removing an adhesive for adhering a mask and a pellicle from the mask. The adhesive removing device includes: a laser irradiating unit configured to irradiate a laser beam to an adhesive layer formed between the mask and the pellicle; a controller configured to control a wavelength, a waveform, and an energy density of the laser beam, so as to remove the adhesive layer through emission of the laser beam; and an imaging unit configured to monitor a region to which the laser beam is irradiated.
    Type: Grant
    Filed: August 17, 2016
    Date of Patent: October 25, 2022
    Assignee: EO TECHNICS CO., LTD.
    Inventors: Ill Hyun Park, Dae Yub Cho, Young Jung Kim
  • Methods and apparatus for washing objects produced by stereolithography
    Patent number: 11478987
    Abstract: Method of making a three-dimensional object, comprising the steps of: (a) providing a carrier platform on which the three-dimensional object can be formed; (b) producing the three-dimensional object, (c) immersing the object in a wash liquid with the object remaining adhered to the carrier platform; (d) agitating (i) the object in said wash liquid, (ii) the wash liquid with the object immersed therein, or (iii) both the object and the wash liquid, to at least partially remove residual resin from the surface of the object; (e) separating the object from the wash liquid, with the object remaining adhered to the carrier platform, (f) agitating the object to at least partially remove residual wash liquid from the surface thereof; and (g) repeating steps (c) through (f) to remove additional polymerizable resin from the surface thereof, wherein steps (c) through (f) are carried out in the same vessel.
    Type: Grant
    Filed: November 29, 2017
    Date of Patent: October 25, 2022
    Assignee: Carbon, Inc.
    Inventors: Courtney F. Converse, W. Ryan Powell, Sherwood Forlee, David Eliot Scheinman, Scott Heines, Edwin James Sabathia, Jr.
  • Household dishwasher
    Patent number: 11464388
    Abstract: A household dishwasher includes: a washing water spray nozzle module disposed on an area of inner surfaces of a washing chamber and spraying washing water, which is supplied from a water supply tube, into the washing chamber; a steam generation module disposed in the washing chamber and supplying steam into the washing chamber using the washing water supplied from the washing water spray nozzle module; an induction module disposed on an outer surface of the washing chamber and heating the washing water supplied in the washing chamber; an ultrasonic vibration module disposed on an outer surface of the washing chamber and applying ultrasonic vibration to the washing water in the washing chamber to perform ultrasonic washing; and a controller disposed in a body and controlling operational relationships of internal components in response to washing order signals from a user.
    Type: Grant
    Filed: October 4, 2020
    Date of Patent: October 11, 2022
    Assignee: PRIME.CO., LTD
    Inventors: Sung Hyun Kim, Sung Woo Kim
  • Automated cleaning system for internal cavities of pressure instruments
    Patent number: 11446716
    Abstract: Various automated cleaning systems for internal cavities of pressure instruments are disclosed. The systems comprise a computer controlled fluid flow system that enables the use of various cleaning fluids for cleaning internal cavities of pressure instruments to high cleanliness levels. Various pressure instruments, including complex shapes such as Bourdon tube gauges, are accommodated. The system can include a computerized cleaning cycle selection and a multi-fluid combination of cleaners for efficient and low cost cleaning solution. A servo controlled agitation system can allow for filling, evacuation, and drying of aqueous solutions as well as high performance solvents for Oxygen Clean service.
    Type: Grant
    Filed: May 11, 2020
    Date of Patent: September 20, 2022
    Assignee: King Nutronics Corporation
    Inventors: Amir Gnessin, Nathan J. Ransom, Robert T. Welther
  • Dishwashing machine and method
    Patent number: 11445883
    Abstract: The invention relates to a method of automatic dishwashing, comprising: placing soiled wares inside a cleaning volume; providing a first cleaning composition comprising a bleach and a second cleaning composition different from the first composition; and delivering the first composition and the second composition separately to the cleaning volume to contact the soiled wares, wherein: the first composition is delivered to the cleaning volume as a mist and the second composition is delivered to the cleaning volume as a jet; and the first and second compositions are delivered to the cleaning volume at a temperature below 100° C. The invention also relates to a dishwasher and a kit for use in the inventive method.
    Type: Grant
    Filed: April 20, 2017
    Date of Patent: September 20, 2022
    Assignee: Reckitt Benckiser Finish B.V.
    Inventors: Alberto Buogo, Callum Couser, Frank Dierkes, Jorg Pflug, Karl-Heinz Mohrhard, Caroline Rigobert
  • Substrate processing apparatus and substrate processing method
    Patent number: 11443938
    Abstract: A substrate processing apparatus and a substrate processing method are provided. The substrate processing apparatus includes a chamber having a first housing and a second housing that are combined with each other to form a processing space inside, and a housing actuator that moves the first housing to open or close the processing space. The housing actuator includes a plurality of cylinder units coupled to the first housing, a fluid supplier that supplies a fluid for operating the plurality of cylinder units, and a deviation corrector that corrects an operation deviation between the plurality of cylinder units. The deviation corrector corrects the operation deviation between the plurality of cylinder units coupled to the chamber, thereby minimizing particles that are generated when the chamber is opened/closed.
    Type: Grant
    Filed: October 15, 2018
    Date of Patent: September 13, 2022
    Assignee: SEMES CO., LTD.
    Inventors: Boong Kim, Joo Jib Park, Woo Young Kim
  • Washing machine for longitudinal profiled sections with a film cover, and method for washing longitudinal profiled sections
    Patent number: 11440059
    Abstract: The invention relates to a washing machine for longitudinal profiled sections (5), comprising a drum (1, 2) that can be rotated about a horizontal rotational axis (10, 11) and comprises a plurality of receiving areas (101, 102, 103, 104, 105, 106, 107, 108, 109 or 200, 201, 202, 203, 204, 205, 206, 207, 208, 209, 210) which are arranged along the circumference of the drum, which are laterally delimited by lamellas (3, 4), which are open in the radial direction, and into which the longitudinal profiled sections (5) can be inserted along the longitudinal direction (L).
    Type: Grant
    Filed: July 12, 2016
    Date of Patent: September 13, 2022
    Assignee: Rattunde AG
    Inventor: Ulrich Rattunde
  • Cleaning method, method for producing silicon single crystal, and cleaning device
    Patent number: 11426775
    Abstract: A cleaning method includes a first removal step of causing an inert gas to which a pulsation is applied to flow into an exhaust pipe after a silicon single crystal doped with an n-type dopant is produced, to peel and remove a deposit; and a second removal step of causing an atmospheric air to which no pulsation is applied to flow into the exhaust pipe through a chamber to burn a part of the deposit with the atmospheric air, the part being not removable in the first removal step, and peel and remove a burned substance of the deposit.
    Type: Grant
    Filed: November 16, 2018
    Date of Patent: August 30, 2022
    Assignee: SUMCO CORPORATION
    Inventors: Koichi Maegawa, Takuya Yotsui, Satoru Hamakawa
  • Cooling package cleaning system
    Patent number: 11428481
    Abstract: A machine that includes a cooling package and a method for cleaning debris from the cooling package is disclosed. The cooling package may include a housing, a cooler, a heat exchanger, a conduit, and plurality of nozzles mounted on the conduit. The cooler may be configured to receive heated machine fluid generated by the machine. The heat exchanger may be configured to convey heat away from the cooler and may include a plurality of fins coupled to and extending outward from the cooler. The plurality of fins may define a plurality of channels. The conduit may be disposed between the housing and the plurality of fins. The plurality of nozzles are configured to discharge a fluid on the fins. The fluid may be air or a release agent. In some embodiments, a release agent may be discharged on the fins prior to the discharge of air on the fins.
    Type: Grant
    Filed: December 5, 2019
    Date of Patent: August 30, 2022
    Assignee: Caterpillar Paving Products Inc.
    Inventors: Brent Robert Kleinvachter, Conwell K. Rife, Jr.
  • Method for cleaning semiconductor wafer backside surface by hybrid brush assembly
    Patent number: 11417512
    Abstract: In accordance with some embodiments, a wafer processing method is provided. The wafer processing method includes placing a semiconductor wafer on a wafer stage with a backside surface of the semiconductor wafer facing downwardly. The wafer processing method further includes positioning a first brush assembly below the backside surface of the semiconductor wafer. The wafer processing method also includes moving a first brush assembly toward the backside surface of the semiconductor wafer to a first position. At the first position, an inner brush member and an outer brush member of the first brush assembly, made of different materials, are in contact with the backside surface of the semiconductor wafer. In addition, the wafer processing method includes rotating the first brush assembly relative to the semiconductor wafer while the first brush assembly is in the first position.
    Type: Grant
    Filed: February 10, 2020
    Date of Patent: August 16, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Hsuan-Ying Mai, Hui-Chun Lee
  • Smoking pipe cleaning assembly
    Patent number: 11412779
    Abstract: A smoking pipe cleaning assembly for cleaning a smoking pipe includes a cylinder that is hollow to contain a fluid cleaning solution. A smoking pipe is insertable into the cylinder to submerge the smoking pipe in the fluid cleaning solution for cleaning the smoking pipe. A first cap is removably attachable to the cylinder and the first cap engages the smoking pipe to inhibit the smoking pipe from striking the cylinder. A second cap is removably attachable to the cylinder and the second cap receives the smoking pipe to inhibit the smoking pipe from striking the second cap. A base for is provided that insertably receives the cylinder when the smoking pipe is positioned in the cylinder.
    Type: Grant
    Filed: June 30, 2020
    Date of Patent: August 16, 2022
    Inventor: David Bryner
  • Wafer holding pins and methods of using the same
    Patent number: 11410857
    Abstract: An apparatus includes a substrate stage configured to secure a substrate thereon and a motion mechanism configured to rotate the substrate stage. The substrate stage includes a plurality of holding pins for holding an edge of the substrate. Rotating the substrate stage causes a chemical solution dispensed on an upper surface of the substrate to spread outwardly toward the edge of the substrate. At least one of the plurality of holding pins includes at least one opening or at least one tapered side surface, or both, for guiding the chemical solution to flow off the substrate.
    Type: Grant
    Filed: February 28, 2018
    Date of Patent: August 9, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chia-Lun Chen, Ming-Sung Hung, Po-Jen Shih, Wen-Hung Hsu
  • Method of using pipeline flow for pipeline cleaning
    Patent number: 11407015
    Abstract: The method of using the flow within a pipeline to clean the inner wall of the pipeline including placing the cleaning pig into the pipeline to be cleaned at a first location, using a restraining rope or cable to cause the cleaning pig to move along the pipeline at a speed slower than the speed of the flow within the pipeline and thereby causing a pressure differential between the upstream side and the downstream side of the cleaning pig, providing one or more jetting nozzles and using the pressure differential to jet a portion of the flow within the pipeline through the one or more jetting nozzles onto the inner wall of the pipeline while providing a flow area through the cleaning pig to bypass the portion of the flow which does not pass through the one or more jetting nozzles.
    Type: Grant
    Filed: May 8, 2021
    Date of Patent: August 9, 2022
    Inventor: Benton Frederick Baugh
  • Cleaning method for solar panels
    Patent number: 11411531
    Abstract: A method for cleaning solar panels when snow, ice, or dust accumulates on the solar panels to reduce or eliminate the electrical power output from the solar panels. The method of cleaning includes selecting specific cleaning locations, on the array of solar panels, based primarily upon obstruction location and obstruction size differences. The method of cleaning also includes the incremental and sequential selection of the cleaning locations, and the incremental and sequential activation of cleaning devices within the selected cleaning locations. Additional groups of incrementally and sequentially activated cleaning devices may be powered, in whole or in part, by the prior solar panels that have been cleaned.
    Type: Grant
    Filed: September 8, 2020
    Date of Patent: August 9, 2022
    Assignee: PASCO Ventures LLC
    Inventor: Paul A. Stewart
  • Substrate processing method and substrate processing apparatus
    Patent number: 11404292
    Abstract: A substrate processing method includes a first processing liquid supplying step of supplying a first processing liquid to an upper surface of a substrate, a holding-layer forming step of solidifying or curing the first processing liquid to form a particle holding layer on the upper surface of the substrate, a holding-layer removing step of peeling and removing the particle holding layer from the upper surface of the substrate, a liquid film forming step of forming, after removal of the particle holding layer from the substrate, a liquid film of a second processing liquid, a gas phase layer forming step of forming a gas phase layer for holding the liquid film between the upper surface of the substrate and the liquid film, and a liquid film removing step of removing the second processing liquid from the upper surface of the substrate by moving the liquid film on the gas phase layer.
    Type: Grant
    Filed: November 29, 2018
    Date of Patent: August 2, 2022
    Inventors: Yukifumi Yoshida, Manabu Okutani, Hiroshi Abe, Shuichi Yasuda, Yasunori Kanematsu, Hitoshi Nakai
  • Automated particle removal system having angular adjustability
    Patent number: 11400495
    Abstract: A foreign particle removal system for removing a foreign particle from a surface of an object has a tool gripper which grips a particle removal tool. A tip of the particle removal tool has a sticky tip portion. The sticky tip portion has an apex region at a remote end of the sticky tip portion and a flank region adjoining the apex region. The tool gripper holds the particle removal tool at an oblique angle with respect to the surface so that the flank region of the sticky tip portion faces towards the surface. The tilted particle removal tool is conveyed with the tool gripper to contact the foreign particle on the surface with the flank region of the sticky tip portion and a force is exerted onto the surface to attract the foreign particle onto the flank region. The particle removal tool may then be lifted away from the surface together with the foreign particle.
    Type: Grant
    Filed: September 9, 2020
    Date of Patent: August 2, 2022
    Assignee: ASM TECHNOLOGY SINGAPORE PTE LTD
    Inventors: Keng Yew Song, Chin Tiong Ong, Soo Kin (Kenny) Tan, Qing Le Tan, Gang Shu
  • Plasma-based process for production of F and HF from benign precursors and use of the same in room-temperature plasma processing
    Patent number: 11404280
    Abstract: Methods and apparatuses for the production of HF in an electron-beam generated plasma. A gas containing fluorine, hydrogen, and an inert gas such as argon, e.g., Ar/SF6/H2O or Ar/SF6/NH3 flows into a plasma treatment chamber to produce a low pressure gas in the chamber. An electron beam directed into the gas forms a plasma from the gas, with energy from the electron beam dissociating the F-containing molecules, which react with H-containing gas to produce HF in the plasma. Although the concentration of the gas phase HF in the plasma is a very small fraction of the total gas in the chamber, due to its highly reactive nature, the low concentration of HF produced by the method of the present invention is enough to modify the surfaces of materials, performing the same function as aqueous HF solutions to remove oxygen from an exposed material.
    Type: Grant
    Filed: October 26, 2020
    Date of Patent: August 2, 2022
    Assignee: The Government of the United States of America, as represented by the Secretary of the Navy
    Inventors: David R. Boris, Scott G. Walton
  • Method and apparatus for cleaning PVA brush
    Patent number: 11382412
    Abstract: A PVA brush cleaning method includes immersing a PVA brush in a cleaning solution containing an organic matter, thereby removing a siloxane compound in the PVA brush; and applying vibration to the PVA brush, thereby removing impurities in the PVA brush.
    Type: Grant
    Filed: September 20, 2018
    Date of Patent: July 12, 2022
    Assignees: EBARA CORPORATION, INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG
    Inventors: Jin-Goo Park, Jung Hwan Lee, Satomi Hamada
  • Cleaning system
    Patent number: 11370002
    Abstract: A cleaning system and process for cleaning a medical system comprising at least one air source at least one cleaning solution source at least one rinsing solution source and at least one switch for switching between the at least one air source, the at least one cleaning solution source, and said at least one rinsing solution source. The process is configured to selectively provide the cleaning solution from the cleaning solution source, selectively provide the rinsing solution source, and selectively providing the air pressure to purge the lines of a medical/dental system.
    Type: Grant
    Filed: June 22, 2020
    Date of Patent: June 28, 2022
    Assignee: Emack Industries, LLC
    Inventor: Kevin M. Guckenberger