Abstract: An apparatus for supporting and maneuvering a wafer comprises a handle having a gas inlet adapted to couple to a gas supply, a supporting surface coupled to the handle section including a frame structure having edge segments connecting at vertices and spoke elements extending from a center of the frame structure to the vertices, a gas supply channel coupled to the gas inlet that extends from the handle and branches into channels that run through the spoke elements, and a plurality of nozzles positioned at the vertices on the supporting surface and coupled to the channels in the spoke elements. Gas provided to the plurality of nozzles exits the nozzles in a stream directed parallel to the supporting surface and the stream of gas generates forces that enable wafers to be securely supported in a floating manner over the supporting surface without coming into direct contact with the supporting surface.

Abstract: The present invention relates to systems and methods for cleaning of devices, such as heat exchangers. According to the invention, controlled cavitation is created at predetermined positions within a device. The cavitation is done by mechanical waves, such as ultrasound waves, generated by transducers, wherein the waves are based on output of time-reversal wave form analysis of the device structures.

Abstract: A method for evaluating a silicon wafer, including: a pre surface defect measuring step for performing a surface defect measurement on the silicon wafer in advance, a cleaning step of alternately repeating on the silicon wafer an oxidation treatment by ozone water and an oxide film removal treatment by hydrofluoric acid under a condition of not completely removing an oxide film formed on a surface of the silicon wafer, and an incremental defect measuring step of performing a surface defect measurement on the silicon wafer after the cleaning step and measuring incremental defects that increased relative to defects measured in the pre surface defect measuring step, wherein the cleaning step and the incremental defect measuring step are alternately performed repeatedly multiple times and the silicon wafer is evaluated based on a measurement result of the incremental defects after each cleaning step.

Abstract: An appliance having: a control unit managing the operation of the appliance; at least one hydraulic component actionable for distributing water/treating liquids within the appliance; a plurality of sensors arranged for acquiring information regarding physical parameters associated with the operation of the appliance, and a module managing at least part of the water/treating liquids distribution within the appliance. The module includes the at least one hydraulic component; at least two sensors of the plurality of sensors, and a local control unit managing the operation of the at least one hydraulic component and/or receiving the information acquired by the at least two sensors.

Abstract: The invention relates to a cleaning apparatus (10) for functionally regenerating a brush (20) which can be used for washing a flexographic plate; in particular, the apparatus is configured to regenerate a brush (20) comprising a cylindrical core (5) about which a channel (4) supporting filaments (3) is fixed according to a spiral shape. The apparatus comprises a frame defining a rotation axis (100) for the brush and a motorized assembly, which can be operatively connected to an end of said cylindrical core (5) of the brush (20) to rotate it about the rotation axis (100). The apparatus (10) further comprises a cleaning unit (30) comprising a carriage (31), movable along a rectilinear guide (32) and a tool (33) provided with an end (33A) adapted to penetrate into the spaces defined between the turns of the spiral to detach the polymer and monomer residues hardened in said spaces as a result of the use of said brush for said washing.

Abstract: An apparatus for cleaning false lashes for includes a body having upper and lower supports, each including a plurality of apertures, that are movable relative to one another between open and closed positions, the open position providing access to an inner surface of the lower support, and the closed position substantially abuts the upper and lower supports against one other, and an arcuate locator on an inner surface of the lower support that positions a strip of a false lash such that strands of the false lash extend across at least one aperture. The false lash is secured between the upper and lower supports in the closed position. Running fluid through the apertures of the upper and lower supports allows the fluid to run through the strands of the false lash. A system and methods of cleaning false lashes is also disclosed.

Abstract: Techniques herein pertain to apparatus embodiments and methods for treating the surface of a microelectronic substrate, and in particular for removing objects from the microelectronic substrate using fluid treatment sprays such as cryogenic fluid sprays. The apparatus embodiments and methods described herein further include techniques for monitoring and/or controlling treatment processes for removing particles from surfaces of a microelectronic substrate. The techniques allow using image analysis techniques to monitor characteristics of spray nozzle(s) (e.g., frost formation on the nozzle surface) and using the resultant image information of the nozzle to take corrective action if frost or another nozzle condition is detected.

Abstract: The invention relates to a method for cleaning dissolution vessels and for the subsequent dosing of a dissolution media, and to mobile modular cleaning and dosing equipment for the implementation of said method. According to said method, injected water steam is used for the cleaning and is subsequently aspirated, together with the residues of the dissolution, and the vessel is then refilled with the desired quantity of a new dissolution media. The mobile modular cleaning and dosing equipment allows the cleaning and dosing to be carried out in situ without having to remove the dissolution vessels from the equipment or site where the dissolution tests are carried out, using self-sufficient modular equipment, and a novel steam supply line is used for the cleaning, which sprays the steam against the bottom of the vessel and the inner side walls.

Abstract: A detoxifying device 100 having an inner wall 104 that forms a flow passage 103 through which treatment gas flows includes a first piping 130 that forms a part of the flow passage 103, a replaceable piping section 170 that forms a part of the flow passage 103 at the position downstream of the first piping 130, and is connected thereto for sprinkling the cleaning water to remove the solid product adhering to the inner wall 104, and a second piping 150 that forms a part of the flow passage 103 at the position downstream of the piping section 170, and is connected thereto.

Abstract: A back-blush cleaning container may have a spring-biased piston that allows the container to fill with hot water when attached to a group head of the espresso machine. When the hot water of the espresso machine is turned off, the piston due to the spring urges the hot water out and back through a 3-way valve to clean the espresso machine. The backflush cleaning container also may have a steam conduit that allows steam from a steam wand of the espresso machine to clean the group head, 3-way valve and tubes. Moreover, the container may have a window which based on the position of the piston, a particular color is shown. The colors indicate whether the container is safe to remove from the group head of the espresso machine and when the container is full of water.

Abstract: A system for controlling dust during hydraulic fracturing operations includes a manifold having a plurality of ports for capturing dust when negative air pressure is applied to the manifold. A support frame positions the manifold above a piece of hydraulic fracturing equipment receiving sand from a sand source.

Abstract: A method for cleaning components of a gas turbine engine is presented. The method includes introducing a working fluid into a gas flow path or a cooling circuit defined by the one or more components of the gas turbine engine such that the working fluid impinges upon a surface of the one or more components of the gas turbine engine, wherein the working fluid includes a plurality of detergent droplets entrained in a flow of steam. A system for cleaning components of a gas turbine engine are also presented.

Abstract: A mechanism that conveys a substrate is cleaned in a cleaning unit. A substrate processing apparatus that includes a substrate polishing device and a substrate cleaning unit is disclosed. The substrate cleaning unit includes a cleaning module and a cleaning unit conveyance mechanism. The cleaning unit conveyance mechanism includes a hand and a hand open/close mechanism. The substrate processing apparatus further includes a hand cleaning unit. The hand cleaning unit includes a hand cleaning tank and a cleaning liquid injection mechanism.

Abstract: Vessels can be become fouled due to normal operation thereof, for example, during lignocellulosic biomass hydrolysis, and the vessel will become inoperable unless the fouling is removed from the vessel. Accordingly, methods are disclosed herein for removing fouling substances from the interior surfaces of fouled pressurized vessels. The methods utilize a brief rapid change of pressure in the vessel. In some embodiments, the rapid pressure change is a decrease, and the rapid pressure change causes, for example, increased velocity of the fluid flowing in the vessel, flashing of a portion of the fluid to vapor, and removal of the fouling substance adhered to the interior surface of the vessel.

Abstract: Provided are methods and systems for cleaning various semiconductor substrate storage articles, in particular, FOUP doors. The FOUP doors and other similar articles often have openings that may get contaminated with cleaning liquids if not covered. The described cleaning system includes contact points for engaging the article and covering these openings. The contact points may be also used for supporting the article and for pressurizing the openings in the article with a gas. The gas may be supplied through one or more contact points. It prevents liquids from getting into the openings if even the openings are not completely sealed. The pressurization may be maintained through the entire wet portion of the cleaning process. The article may be rotated within the cleaning system while cleaning and/or other liquids or gases are dispensed through a set of spraying nozzles. Spraying nozzles may move to enhance cleaning of the article.

Abstract: Disclosed are an apparatus and a method for treating a substrate. The substrate treating apparatus includes a flow rate measuring unit includes a container located outside the housing and having an accommodation space an upper side of which is opened and in which the treatment liquid discharged from the treatment liquid nozzle is accommodated, in the interior thereof, a measurement member configured to measure an amount of the treatment liquid accommodated in the accommodation space, and a drain line through which the treatment liquid in the container is discharged.

Abstract: A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.

Abstract: Methods, systems, and apparatus for generating hydrogen radicals for processing a workpiece, such as a semiconductor workpiece, are provided. In one example implementation, a method can include generating one or more species in a plasma chamber from an inert gas by inducing a plasma in the inert gas using a plasma source; mixing hydrogen gas with the one or more species to generate one or more hydrogen radicals; and exposing the workpiece in a processing chamber to the one or more hydrogen radicals.

Abstract: Novel materials and devices can remove small defects from long rolls of flexible electronics material while they are in continuous motion. The cleaning materials are designed to remove small particles without transferring defects or damaging the flexible electronics. The device generally consists of variable speed, motor-driven cylinders mounted on moveable brackets. The cylinders are capable of matching the speed of the cleaning material such that the cleaning material is always in contact with the web roll to be cleaned. The brackets are capable of rotating so the same material can be used more than once. Another material is used to remove debris from the cleaning material. A similar device consisting of motor-driven cylinders and moveable is used to apply the debris removal film to the cleaning film, allowing the cleaning film to be used multiple times.

Abstract: A heatable element is configured to apply sufficient energy density to contaminants in an internal ambient atmosphere with in a sealable housing to drive a reaction that inactivates the contaminants.