Abstract: The present invention is concerned with methods and apparatus for cleaning the surface of an ion source in a mass spectrometer, for example an electrode of a MALDI ion source. The method includes directing UV light onto the surface to desorb contaminant material. The UV light source can be a laser and a moving reflecting surface can be used to direct the light on to the surface.

Abstract: An ultrasonic cleaning method for cleaning an object in a liquid in which a gas is dissolved includes preparing the liquid in which the gas is dissolved. The object is cleaned while applying ultrasonic waves to the liquid so that a ratio determined by dividing a vibration strength of the liquid at a fourth-order frequency of the ultrasonic waves by a vibration strength of the liquid at a fundamental frequency of the ultrasonic waves is larger than 0.8/1000.

Abstract: A method for cleaning a substrate includes supplying a treatment solution which includes a volatile component onto the front surface of a substrate, solidifying or curing the treatment solution through vaporization of the volatile component of the treatment solution such that a treatment film is formed on the entire portion of the front surface of the substrate, treating a different surface of the substrate while the entire portion of the front surface of the substrate is covered with the treatment film, and supplying to the substrate a removal solution which removes the treatment film in the amount sufficient such that the treatment film covering the entire portion of the front surface of the substrate is removed substantially in entirety after the treating of the different surface of the substrate is finished.

Abstract: A substrate processing apparatus includes a substrate holding unit that horizontally holds a substrate in non-contact with a major surface of the substrate, a processing liquid supply unit that supplies a processing liquid to the major surface of the substrate held by the substrate holding unit, and a hydrophilic surface placing unit that places an annular hydrophilic surface along a peripheral portion of the major surface of the substrate held by the substrate holding unit such that the hydrophilic surface comes into contact with a liquid film of the processing liquid held on the major surface of the substrate.

Abstract: A cleaning apparatus is provided that includes a first nozzle configured to direct a cleaning jet towards a contaminated surface at a pressure sufficient to remove contaminants from the surface. At least one second nozzle is configured to direct a rinsing jet towards the contaminated surface to remove cleaning fluid therefrom, wherein the rinsing jet is directed at a pressure sufficient to isolate the cleaning jet from an ambient environment.

Abstract: A method of wet cleaning an aluminum part having bare aluminum surfaces and anodized aluminum surfaces. The method includes CO2 dry ice blasting the surfaces of the aluminum part at approximately 35 to approximately 45 psi, masking the aluminum part to conceal the bare aluminum surfaces, soaking the dry ice blasted and masked aluminum part in deionized water at or above approximately 60° C., scrubbing the aluminum part with an abrasive pad and deionized water after completion of the soaking in deionized water, and repeating the soaking and scrubbing in the recited order at least three additional times.

Abstract: This description relates to a wafer debonding and cleaning apparatus including an automatic wafer handling module. The automatic wafer handling module loads a semiconductor wafer into a wafer debonding module for a debonding process. The automatic wafer handling module removes the semiconductor wafer from the debonding module and loads the semiconductor wafer into a wafer cleaning module for a cleaning process.

Abstract: A cleaning apparatus for cleaning an associated object includes a motor and an output drive shaft powered by the motor. A cleaning attachment is coupled for rotational movement with the output drive shaft and has an axis of rotation. The cleaning attachment includes a housing having an outer surface and an inner surface. A plurality of elongated cleaning members is mounted to the inner surface of the housing. The apparatus can be employed as a cleaning implement for fire hydrants or other stationary objects. A mechanized method for cleaning stationary objects is also disclosed.

Abstract: A cosmetic brush cleaner apparatus is provided for automatically washing, cleaning, rinsing, and sanitizing a plurality of cosmetic brushes quickly, efficiently, and effectively. In particular, the cosmetic brush cleaner includes a removable lid, a base having a liquid inlet port, a removable brush holder coupled to the base, wherein the brush holder secures one or more cosmetic brushes. The cleaner further comprises a bristle plate coupled to the base, a liquid dispensing port for dispensing the liquid on to the bristle plate, a liquid drainage port for draining the liquid from the bristle plate, wherein the bristle plate is configured to engage the cosmetic brushes, and a controller for operating a motor of the brush cleaner.

Abstract: The inventive substrate treatment apparatus includes a spin chuck which horizontally holds and rotates a wafer; a heater which is disposed in opposed relation to a lower surface of the wafer held by the spin chuck and heats the wafer from a lower side; a phosphoric acid nozzle which spouts a phosphoric acid aqueous solution to a front surface (upper surface) of the wafer held by the spin chuck; and a suspension liquid nozzle which spouts a silicon suspension liquid to the front surface of the wafer held by the spin chuck. The wafer is maintained at a higher temperature on the order of 300° C. and, in this state, a liquid mixture of the phosphoric acid aqueous solution and the silicon suspension liquid is supplied to the front surface of the wafer.

Abstract: The present disclosure relates to a dishmachine that includes at least two tanks and methods of using the tanks to isolate, substantially isolate, or incrementally isolate different chemistries from each other during a cycle. The disclosed dishmachine design and method allows for the use of two different, and potentially incompatible, reactive, or offsetting chemistries to be used in the same dishmachine cycle.

Abstract: A method for removing organic materials includes providing a target object having the organic materials adsorbed thereon, and an adsorbent, into a space including a non-liquid medium therein; and separating the organic materials from the target object by applying ultrasound waves to the target object having the organic materials adsorbed thereon and the adsorbent in the space, and disposing the organic materials to the adsorbent.

Abstract: An apparatus for application to a broom that includes a broom head provides enhanced cleaning. A skirt of polar fleece fabric has a yoke long enough so that one end of the polar fleece fabric laps the other end when wrapped around the broom head. Hook and loop fasteners on the yoke where one end laps the other end enable the skirt to remain wrapped around the broom head. A plurality of strips that are at least one to three inches longer than the height of the broom head and bristles depend from the yoke. The skirt of polar fleece fabric yoke and strips are conveniently made of a single piece of fabric. A fabric with a stretchable direction transverse to a non-stretchable direction works best if the yoke is substantially parallel to the non-stretchable direction.

Abstract: A portable resonance induction cleaning method for cleaning a process tubular, heat exchanger, or both can include providing a liquid and air to a portable resonance induction cleaning apparatus, and regulating flow of the liquid therein using the air; thereby providing pressurized pulses of the liquid having a resonance. The method can include engaging a hose assembly or hydraulic ram with the portable resonance induction cleaning apparatus, and engaging the hose assembly with the process tubular or sealing the hydraulic ram to the heat exchanger. The method can include continually expelling the pressurized pulses of the liquid into the process tubular or heat exchanger until a standing column of the liquid is formed. The standing column of the liquid can receive the resonance and transmit the resonance through the process tubular or heat exchanger for removing fouling.

Abstract: A cleaning apparatus for the on-site cleaning of a stationary object includes a housing having a side wall with an interior surface. A holder including an outer face and an inner face is detachably mounted to the housing side wall interior surface so that the holder inner face is oriented inwardly in relation to the housing. An elongated cleaning member includes a first end mounted to the holder and a second end extending away from the holder inner face. The elongated cleaning member extends inwardly in the housing. The elongated cleaning member is adapted to contact a surface of the stationary object.

Abstract: The present invention relates to a product and method for cleaning outdoor surfaces. The product may include a support member and a cleaning element. The support member may include top and bottom portions, the top portion may include a connector configured and dimensioned for receiving and attaching a pole to the support member. The bottom portion may include a structural support for providing rigidity to the support member. The cleaning element associated with the structural support. The cleaning element may include a cleaning face operatively associated with the bottom portion of the support member. The structural support may transfer cleaning forces to the cleaning element. Examples of the type of cleaning element may be a mitt or an alignment plate. The cleaning element may be made of a material that is washable, durable and absorbent and the structural support may be removable from the cleaning element when not in use.

Abstract: A method is provided for cleaning at least a part of a water-steam circuit of a power plant. The method includes introducing a cleaning solution into the part requiring to be cleaned and subsequently draining off the cleaning solution. While the cleaning solution is being drained off or immediately thereafter, steam for flushing is injected via a steam injection device into the part requiring to be cleaned at at least one high point of the part requiring to be cleaned and low-point drains are opened or remain open in the part requiring to be cleaned and steam continues to be injected until steam emerges from the low-point drains and those low-point drains from which steam emerges are closed, and steam continues to be injected until steam has emerged from all low-point drains, upon which the steam injection device is closed and all low-point drains are reopened.

Abstract: The present invention relates to a process for washing a polysaccharide-based material which has been subjected to oxidation by at least one oxidizing agent, the said process comprising a first stage of washing with a first densified fluid which is inert with regard to the said oxidizing agent, characterized in that the first stage is followed by a second stage of washing with a washing composition comprising at least one second inert densified fluid and at least one alcohol. The said process according to the invention can additionally comprise a third stage of washing with a third inert densified fluid in order to remove the said alcohol deposited on the said polysaccharide-based material during the said second washing stage. Preferably, the said inert densified fluids are supercritical carbon dioxide.

Abstract: Equipment for washing a carpet includes a conveyor for transferring the carpet between washing and drying units, a control unit, at least one washing unit and at least one drying unit located in the transport direction after the washing unit, and elements for receiving production goods to the equipment. The conveyor is able to transfer the carpet through the washing and drying units with the same speed. The washing unit includes a wet or dry cleaning unit, with at least one brush and elements for transferring the carpet. Each drying unit has a blowing device for blowing compressed air at a pressure of 2-15 bars onto the pile side of the carpet, the blowing pressure depending on the carpet type and/or transfer speed of the carpet at a drying station of the drying unit, it being possible to blow such an amount of compressed air through the drying apparatus so that the carpet exits the drying station tack free.

Abstract: The base plate of a robotic or manually propelled tank or pool cleaning apparatus includes a transverse conduit positioned on the interior surface of the base plate and is in fluid communication with a source of pressurized water that is also located within the pool cleaner's housing, which pressurized water is discharged from the bottom or lower portion of the transverse conduit through a plurality of openings that extend along a line that is transverse to the longitudinal axis of the pool cleaner's direction of travel, to produce downwardly-directed water jets that are discharged through and below the base plate towards the surface of the pool or tank over which the pool cleaning apparatus is moving to dislodge and suspend dirt and debris that is then drawn into and retained by the pool cleaner's filter.