Abstract: A flowback tank cleaning system and method is described. A flowback tank includes a self-cleaning system. A flowback tank cleaning method may include moving solid debris collected at a bottom of a collection section of a flowback tank towards a lift auger using a cleaning auger or a conveyer belt extending along a length of the collection section, the bottom of the collection section including an angled trough, funneling solid debris towards the cleaning auger or conveyor belt by placing the cleaning auger or conveyor belt at a base of the angled trough, spraying fluid downward through a series of fluid outlets, removing the sand so moved by the cleaning auger or conveyer belt from the flowback tank using the lift auger, and removing the fluid from the flowback tank using a drain manifold below the cleaning auger or conveyer belt.

Abstract: A wash equipment assembly for a car wash and method of operating the equipment are described. For example, the assembly includes a cleaning element configured to clean a vehicle, an arm assembly operably attached to the cleaning element and configured to move the cleaning element to a vehicle cleaning position, the arm movably fixed to a support at a first end and the cleaning element mounted on the arm at a second end, a controlled locator for positioning the arm relative to the support such that the cleaning equipment is moved to the vehicle cleaning position, and a sensor for evaluating an actual orientation of the cleaning element relative to a default orientation of the cleaning element. In certain implementations, the controlled locator can modify the position of the arm in response to a signal from the sensor, thereby providing a closed loop control system.

Abstract: The invention provides a body care device (1) for treating a skin, the body care device (1) comprising a housing (100) and a skin treatment head (200) associated with the housing (100), wherein the housing (100) further comprises an actuator (110) configured to rotate the skin treatment head (200) about an axis (A), wherein the skin treatment head (200) comprises a first region (210) comprising a plurality of bristles (211) and a second region (220) comprising a porous flexible material (221).

Abstract: The present invention relates to a method and apparatus for cleaning an oil and gas well riser section or assembly on location offshore that includes a larger diameter central pipe and a plurality of smaller diameter pipes that are spaced radially away from the central larger diameter pipe. Even more particularly, the present invention relates to an improved method and apparatus for cleaning oil and gas well riser sections wherein a specially configured cap or pair of caps are fitted to the ends of the riser which enable pressure washing cleaning tools (or a camera) to be inserted into and through a selected one of the pipes including either a smaller diameter of the pipes or the central larger diameter pipe and wherein the cap continuously collects spent cleaning fluid and debris, allowing the cleaning process to be done on location without transporting the riser section back onshore.

Abstract: A substrate processing apparatus includes a substrate holder, a first cleaning body, a first moving mechanism, a second cleaning body, a second moving mechanism, and a controller. The first cleaning body cleans one of the upper surface and the lower surface of the substrate held by the substrate holder by ejecting fluid thereto or by coming into contact therewith. The second cleaning body cleans the other one of the upper surface and the lower surface of the substrate held by the substrate holder by coming into contact therewith. The controller controls the first moving mechanism and the second moving mechanism to perform a both-surface cleaning processing in which the first cleaning body which ejects the fluid to one surface or is in contact with the upper surface and the second cleaning body which is in contact with the lower surface are horizontally moved in synchronization with each other.

Abstract: The invention relates to a wiping device for a motor vehicle window, comprising a windscreen wiper frame and a piezoelectric film, said piezoelectric film being mounted on the windscreen wiper frame such as to produce an electric current. The invention also relates to a warning method and a spray control method for such a wiping device.

Abstract: A detergent composition, a method of making the detergent composition, and a method of use thereof are provided. The detergent composition comprises at least 0.001% by weight of an antimicrobial agent, based on the total weight of the composition; an enzyme; and at least 0.01% by weight of a hydrotrope, based on the total weight of the composition.

Abstract: A cleaning tool with a reservoir comprises an elongated handle attached to one end of a cleaning-head hub and an open cell liquid absorptive material, referred to as a squeeze sponge located within the cleaning-head hub. The cleaning tool has a reservoir for holding fluid within the cleaning-head hub and handle removable interchangeable scrubbing components for cleaning grills and griddles. The sponge holds the fluid and dispenses the cleaning liquid drawn from the reservoir to the heat tolerant liquid permeable material used for scrubbing. A mounting plate liquid barrier layer is disposed at a bottom of the reservoir. A plunger plate is disposed above the squeeze sponge and comprises a perimeter seal fitted to mesh against interior sides of the reservoir. A knob is coupled plunger plate above it. A vertical stabilizer rod is disposed within the interior of the reservoir and fitted to the plunger plate.

Abstract: A system 1 comprises a self-cleaning rotisserie oven 2 with a casing 4, a door 6, and an oven cavity 8, for cooking a food product. The system 1 further comprises a cleaning unit 10, which is a separate unit from the self-cleaning oven 2. The cleaning unit 10 comprises a frame 12, supporting a water tank 14, and a waste water tank 16. The frame 12 of the cleaning unit 10 is movably supported by wheels 18. The cleaning unit 10 comprises a push bar 20. The self-cleaning rotisserie oven 2 comprises a discharge hose connector 22, and a water hose connector 24, for connecting a discharge hose 26, and a water hose 28 respectively, to the cleaning unit 10. The self-cleaning rotisserie oven 2 further comprises a control 30 with a user interface, and a timer. The system 1 also comprises a second self-cleaning rotisserie oven 32.

Abstract: A method of transferring semiconductor chips includes providing a transfer tool having a plurality of segments, each segment having a liquid receiving area; providing a plurality of semiconductor chips in a regular array on a source carrier; providing a target carrier; selectively arranging liquid drops on the liquid receiving areas of some of the segments; causing the transfer tool to approach the source carrier, each liquid drop contacting and wetting a semiconductor chip; lifting the transfer tool from the source carrier, wherein semiconductor chips wetted by liquid drops are lifted from the source carrier by the transfer tool; causing the target carrier by the transfer tool, to approach the semiconductor chips arranged on the transfer tool contacting the target carrier; and lifting the transfer tool from the target carrier, the semiconductor chips contacting the target carrier remaining on the target carrier

Abstract: A paint recovery and cleaning trolley is provided for an apparatus for applying paint provided with a belt for conveying pieces to be painted. The conveyor belt has an upper outward section and a lower return section. The trolley includes a paint recovery subunit and a cleaning subunit. Each subunit includes a reverse roller in contact with the lower return section of the conveyor belt, a doctor blade tangentially placed with respect to the reverse roller for all its length, and a doctor blade scraping the lower return section of the conveyor belt. In each subunit the respective reverse roller, doctor blades and return section of the conveyor belt form a closed chamber having the shape of a triangular prism, of which the components represent the rectangular faces and that contains a solvent which drips from the triangular faces into a respective collecting hopper.

Abstract: A device for drying and polishing a plurality of items including glasses and cutlery is provided. The device includes a plurality of movable cleaning elements configured to at least one of dry and polish the items and an enclosure defining a chamber, the movable cleaning elements being within the chamber. The enclosure includes a first aperture at a first enclosure location, a second aperture at a second enclosure location, a third aperture at a third enclosure location, and a channel assembly located in the chamber. The first aperture is adapted to receive a first item, the second aperture is adapted to receive a second item, and the third aperture is adapted to enable the second item to exit the chamber. The channel assembly defines a channel path between the second aperture and the third aperture.

Abstract: Embodiments of the present disclosure generally provide an apparatus and methods for processing a substrate. More particularly, embodiments of the present disclosure provide a processing chamber having an enhanced processing efficiency at an edge of a substrate disposed in the processing chamber. In one embodiment, a processing chamber comprises a chamber body defining an interior processing region in a processing chamber, a showerhead assembly disposed in the processing chamber, wherein the showerhead assembly has multiple zones with an aperture density higher at an edge zone than at a center zone of the showerhead assembly, a substrate support assembly disposed in the interior processing region of the processing chamber, and a focus ring disposed on an edge of the substrate support assembly and circumscribing the substrate support assembly, wherein the focus ring has a step having a sidewall height substantially similar to a bottom width.

Abstract: An apparatus for cleaning a substrate has a holding unit 60 that holds a substrate W; a rotated unit 30 connected to the holding unit 60; a rotating unit 35 that is provided on a peripheral outer side of the rotated unit 30 and rotates the rotated unit 30; and a cleaning unit 10, 20 that physically cleans the substrate W held by the holding unit 60.

Abstract: A method for implementing a wet clean process includes cleaning one or more trenches formed in an interlevel dielectric by applying a two-phase cleaning solution. Applying the two-phase cleaning solution includes applying a first component of the two-phase cleaning solution including a diluted acid solution, and reducing capillary force during drying by applying a second component of the two-phase cleaning solution including a chemistry that is less dense than the first component.

Abstract: A method for cleaning fruit and vegetable ingredients is provided, in which the washing basket assembly agitates the water in the washing barrel to rotate upward to achieve the cleaning of fruit and vegetable. During the process of “cyclic cleaning in the barrel”, the drainage outlet in the center of the bottom of the washing barrel is closed to prevent the water from flowing out of the barrel cavity; when the drainage outlet in the center of the bottom of the washing barrel is opened and drained, the water body rotates to form eddy current drainage; fruits and vegetables in the washing basket alternately move centripetally and centrifugally. The number of exercises is proportional to the number of washes.

Abstract: A processing apparatus includes a chamber configured to accommodate a substrate to be processed, a nozzle provided in the chamber and configured to supply a processing solution to the substrate, a flow rate measuring part configured to measure a flow rate of the processing solution supplied to the nozzle, a flow path opening/closing part configured to open and close a supply flow path of the processing solution to the nozzle, and a controller configured to output a close signal causing the flow path opening/closing part to perform a closing operation that closes the supply flow path. The controller is configured to detect an operation abnormality of the flow path opening/closing part based on an accumulated amount of the flow rate measured by the flow rate measuring part after outputting the close signal.

Abstract: A microelectronic device (semiconductor substrate) cleaning composition is provided that comprises water; oxalic acid, and two or more corrosion inhibitors and methods of using the same.

Abstract: Method for increasing the ability of at least one droplet to slide over a medium. An ultrasonic surface wave is generated in the medium with a sufficient amplitude to cause the droplet to deform in an inertio-capillary eigen-vibration mode, thus decreasing the attachment of the droplet to the medium, so as to make it easier for the droplet to move under the effect of an external force, the amplitude of the ultrasonic surface wave being insufficient to cause the droplet to deform asymmetrically to the point that it moves in the absence of the external force in the direction of propagation of the ultrasonic surface wave.

Abstract: To provide a composition for removing photoresist residue and/or polymer residue formed in a process for producing a semiconductor circuit element, and a removal method employing same. A composition for removing photoresist residue and/or polymer residue, the composition containing saccharin and water, and the pH being no greater than 9.7.