Abstract: Apparatuses and methods of cleaning and drying applicator tools, such as brushes, cosmetic applicators, or cosmetic tools, are disclosed. An applicator tool cleaning apparatus according to various embodiments includes an applicator tool holder configured to hold multiple applicators of various sizes with the applicator heads facing down. The applicator tool cleaning apparatus further comprises a cleaning chamber that can dispense liquid to saturate the applicator heads and contact the applicator heads with a textured surface to dislodge collected materials on the applicator heads. Additionally, the applicator tool cleaning apparatus may comprise a drying chamber where drying mechanisms blow air or dissipate heat at the applicator heads until dried. The applicator tool holder may be moved vertically between the cleaning chamber and the drying chamber via a motor and drive mechanism of the applicator tool cleaning apparatus.

Abstract: A dishwasher can be included in a home network and can be utilized to complete a cycle of operation. The dishwasher includes a controller capable of automatically determining treating at least one cycle parameter based on the communication of at least one aspect of a recipe. The at least one aspect of a recipe can be wirelessly provided to a computer system that is in communication with the dishwasher. The computer system can be the controller or any known computer system in communication with the dishwasher.

Abstract: Contaminant cleaning systems and related methods are provided. Exemplary embodiments include a reactive substance generator to produce or transfer reactive substance(s) that react with contaminant(s) on an item into a cleaning chamber. An analysis section can be attached to the cleaning chamber to perform gas analysis on gas samples brought into the analysis chamber that measure reaction byproducts from the reactive substance(s) interaction with the contaminants. An exemplary valve system can selectively couple the reactive substance generator, the analysis section, and the cleaning chamber. An exemplary pumping system, in combination with the valve system, can selectively generate differential pressure/vacuum levels between the reactive substance generator vs cleaning chamber as well as between the cleaning chamber and analysis section. For example, the analysis chamber can be configured to have a higher vacuum than the cleaning chamber to facilitate passage of gas test samples into the analysis chamber.

Abstract: The inventive in basin cleaning apparatus comprises a body with an outer cleaning surface and a cleaning slot, a base, and bristles attached to the body which is particularly useful for cleaning dishes.

Abstract: A system for cleaning a media transport device includes a cleaning substrate sized and configured to fit within at least a portion of a media travel pathway of the transport device. The cleaning substrate includes scarifying holes that scrape debris from media conveyors (belts and/or rollers) of the transport device. Cleaning the transport device may include positioning the cleaning substrate in the section while operating the transport device, or moving the substrate so that the scarifying holes contact the cleaning substrate and clean the belts and/or rollers.

Abstract: A substrate processing method includes a rinse liquid supplying step of supplying a rinse liquid containing water to a major surface of a substrate, a rotating step of rotating the substrate around a rotation axis passing through a central portion of the major surface of the substrate, and a hydrophobizing agent supplying step of supplying a hydrophobizing agent containing a first dissolving agent to the major surface of the substrate to replace a liquid held on the major surface of the substrate with the hydrophobizing agent in parallel with the rotating step after the rinse liquid supplying step is performed, and the hydrophobizing agent supplying step includes a hydrophobizing agent discharging step of discharging a continuous flow of the hydrophobizing agent from a discharge port of a nozzle toward the major surface of the substrate held by a substrate holding unit with a Reynolds number at the discharge port being not more than 1500.

Abstract: Systems and methods for rinsing one or more pellicles during fabrication, including immersing and soaking the one or more pellicles in a rinse bath solution for a particular time period, forming a top layer above the rinse bath solution, the top layer having a lower surface tension than the rinse bath, and withdrawing the one or more pellicles through the top layer for drying.

Abstract: Disclosed are a standby port and a substrate processing apparatus having the same. The standby port exhausts fumes generated when a processing liquid is discharged into the standby port before the supply of the processing liquid onto a substrate, thereby preventing pollution of a chamber atmosphere.

Abstract: The invention relates to a cleaning system (14) for a windscreen (34) of a motor vehicle (32), comprising at least one drive arm (2) and at least one wiper blade (1, 1a, 1b), the wiper blade (1, 1a, 1b) being connected to the drive arm (2), the cleaning system (14) having at least one projection device (13) able to project a liquid onto the windscreen (34), characterized in that the cleaning system (14) comprises a determination element (16) for a zone (23) of the windscreen (34) and an activation means (15) of the determination element (16), an activation of the drive arm (2) and of the projection device (13) being subject to image information (18) as to a position of the zone (23) on the windscreen (34) transmitted by the determination element (16).

Abstract: A system includes a dome, a wiper assembly, a position sensor and a control device. The wiper assembly includes a wiper blade configured to rotate around the dome. The position sensor may be configured to send a signal to a control device when a wiper blade passes the position sensor. The control device may include one or more processors configured to receive the signal from the position sensor and determine a location of the wiper blade relative to the dome based on the received signal.

Abstract: An apparatus and method for cleaning containers using water within the container and a submersible pump exhibiting a nozzle. Air may be injected into the pumped water to increase its pressure as it exists the nozzle.

Abstract: A method is provided for cleaning an optical entry window (1) of a fire detector (2), wherein an intermittent gas stream is discharged from at least one gas exit opening (7) onto the surface of the optical entry window (1) of the fire detector (2), wherein the intermittent gas stream having a number of pressure pulses (14) is discharged onto the optical entry window (1), and to an apparatus for cleaning an optical entry window. The method has the advantage that the optical entry window of a fire detector can be cleaned from contamination intermittently and corresponding to the intensity of contamination with a matched and low consumption of gas.

Abstract: A system and method for treating a substrate is described. In particular, the system and method for treating a substrate include techniques for removing particles from the surface of a microelectronic substrate. The system includes: a vacuum process chamber; a substrate stage for supporting a microelectronic substrate within the vacuum process chamber; a cryogenic fluid supply system that can provide a fluid or fluid mixture through one or more nozzles arranged within the vacuum process chamber to inject a fluid spray into the process chamber in a direction towards an upper surface of the microelectronic substrate; and a process monitoring system coupled to the vacuum process chamber, and arranged to collect fluid spray data corresponding to at least one measured attribute of the injected fluid spray downstream of an exit of the one or more nozzles.

Abstract: A process for cleaning a reactor, the reactor comprising a shell including catalyst for selectively converting hydrocarbons. The process includes removing catalyst from the reactor and deploying a robot into the reactor. A cleaner from the robot is applied onto a surface within the shell of the reactor that includes a foulant. The cleaner is adapted to remove the foulant from the surface within the shell of the reactor. The cleaner may be one of light radiation, heat radiation, ultra-high pressure fluid, and liquid nitrogen.

Abstract: A substrate cleaning method includes supplying, onto a substrate, a film-forming processing liquid including a volatile component and a polar organic material that forms a processing film on the substrate, volatilizing the volatile component such that the film-forming processing liquid solidifies or cures and forms the processing film on the substrate, supplying, to the processing film formed on the substrate, a peeling processing liquid that peels off the processing film from the substrate and includes a non-polar solvent, and supplying, to the processing film, a dissolution processing liquid that dissolves the processing film and includes a polar solvent after the supplying of the peeling processing liquid. The non-polar solvent does not contain water, and the polar solvent does not contain water.

Abstract: A hole is formed on a liquid film of a low surface tension liquid which covers an entire region of an upper surface of a substrate, and a central portion of the upper surface of the substrate is exposed. The hole in the liquid film of the low surface tension liquid is expanded up to an outer circumference of the substrate. Discharge of hot water is stopped before formation of the hole in the liquid film of the low surface tension liquid. After the liquid film of the low surface tension liquid has been expelled from the upper surface of the substrate, hot water is supplied again to a lower surface of the substrate. A liquid adhering to the substrate is shaken off after stoppage of discharge of the hot water.

Abstract: Systems, methods, and a hole-cleaning apparatus for cleaning machined holes before measurement. The apparatus includes a probe that is inserted into a hole, and a spool support configured to support a spool of a cleaning material. During operation, cleaning material is drawn from the spool downward along the outer surface of the probe, and cleans the machined hole. The cleaning material then passes through an opening at the lower end of the probe, moves upward through an internal passage to an opening in the upper end of the probe, and is collected on a powered take-up reel.

Abstract: A substrate processing method including a center portion discharging step of discharging a low-surface-tension liquid from a first low-surface-tension liquid nozzle disposed above a substrate toward the center portion of an upper surface, an inert gas supplying step of supplying inert gas to above the substrate in parallel with the center portion discharging step in order to form a gas flow flowing along the upper surface, and a peripheral edge portion discharging and supplying step of discharging the low-surface-tension liquid from a second low-surface-tension liquid nozzle disposed above the substrate toward a peripheral edge portion of the upper surface in parallel with the center portion discharging step and the inert gas supplying step.

Abstract: An apparatus and a method for cleaning a lens with which the lens can selectively be fed by means of a common handling device to several cleaning devices and can be moved in a lens-specific manner during cleaning.

Abstract: According to one embodiment, a method for cleaning a substrate includes first cleaning process and second cleaning process. The first cleaning process subjects a substrate to a first cleaning method. The second cleaning process subjects the substrate to a second cleaning method that is different from the first cleaning method and is subsequent to the first cleaning process. The first cleaning method includes at least one of acidic cleaning or alkaline cleaning. The second cleaning method includes freeze cleaning.