Abstract: A method of cleaning a process chamber includes following steps. A plurality of process films and a plurality of non-process films are alternately formed on an interior surface of the process chamber. A cleaning operation is performed to remove the plurality of process films and the plurality of non-process films from the interior surface of the process chamber.

Abstract: A system for automatically deploying a windshield wiper blade to a deployed position includes one or more processors, an actuator coupled to the windshield wiper blade and communicatively coupled to the one or more processors, one or more optical sensors communicatively coupled to the one or more processors that output an optical signal, and one or more memory modules communicatively coupled to the one or more processors. The one or more memory modules store logic that when executed by the one or more processors cause the one or more processors to receive the optical signal output by the one or more optical sensors, detect whether an accumulation of a substance has formed on the vehicle based on the optical signal output by the one or more optical sensors, and deploy, with the actuator, the windshield wiper blade to the deployed position in response to detecting the accumulation of the substance.

Abstract: Cleaning fixtures for a component(s) are disclosed. The cleaning fixtures may include a first and second component recess configured to receive a first and second component, respectively. Each component recess may be defined between a first and second member of the cleaning fixture. The cleaning fixture may also include a first solvent conduit in fluid communication with the first component recess, and a second solvent conduit in fluid communication with the second component recess. The first and second solvent conduit may include physical characteristic(s) configured to control delivery of solvent into the respective component recess at desired fluid parameter(s). The cleaning fixture may also include a first gas conduit in fluid communication with the first component recess, and a second gas conduit in fluid communication with the second component recess. Each of the first and second gas conduit may deliver a pressurized gas to the respective component recess.

Abstract: Disclosed herein are various embodiments of a system and method for operating a surface pressure washer with a wand component. The method may include the steps of cleaning a first surface through a first fluid path, where the first fluid path includes a pump, a pressure regulating valve, a diversion block, and a spray gun, while spray nozzles are not discharging fluid to a second surface, actuating a valve connected to the diversion block, thereby reducing the pressure available to the first fluid path and creating a second fluid path, where the second fluid path includes the pump, the pressure regulating valve, the diversion block and the spray nozzles, where the spray nozzles are configured to rotate above the second surface when the second fluid path is open, and cleaning a second surface underneath the pressure washer system through the second fluid path.

Abstract: A recover piping cleaning method is a method of cleaning a recovery piping into which a chemical liquid used for processing of a substrate is led via a processing cup, the recovery piping being arranged to lead the led chemical liquid into a predetermined chemical liquid recovery piping, the method including a piping cleaning step of cleaning the interior of the recovery piping by using a cleaning liquid by, while supplying the cleaning liquid to the recovery piping, leading the liquid led into the recovery piping into a drain piping which is different from the chemical liquid recovery piping, and a cleaning chemical liquid supplying step of, supplying the cleaning chemical liquid from a cleaning chemical liquid supply piping connected to the recovery piping to the recovery piping while leading the liquid led into the recovery piping into the drain piping.

Abstract: Provided is a substrate processing apparatus that removes a film by supplying a processing liquid to the peripheral edge of a substrate. An ejection unit ejects the processing liquid to the peripheral edge of the substrate held and rotated by a substrate holding unit. An ejection position setting unit sets the ejection position of the processing liquid of the ejection unit to correspond to the removal width of the film included in a recipe, and a property information acquisition unit acquires property information of the film to be removed. A correction amount acquisition unit acquires the correction amount for correcting the ejection position of the processing liquid based on the property information of the film, and an ejection position correction unit corrects the ejection position of the processing liquid by the ejection unit based on the correction amount acquired by the correction amount acquisition unit.

Abstract: A cleaning assembly for leading edges of airfoils, in particular airfoil profiles of aircraft or spacecraft, has a cleaning device that is provided with at least one cleaning member and is intended for applying mechanical pressure to a planar region of an airfoil, and has a drive having at least one drive element, which drive moves the cleaning device along the surface to be cleaned. It is proposed to adhesively hold the cleaning device on the airfoil by the at least one cleaning member and/or for the at least one cleaning member to have a sticky surface and for the at least one cleaning member to be dimensionally stable and have flexible contours.

Abstract: The invention relates to a method for cleaning of indoor or outdoor areas by operating a dirt stop surface, comprising the steps of dividing the dirt stop surface (1) into surface units (4), dispensing a fluid flow on the surface to be cleaned, while the proximity of the surface to be cleaned is sensed separately for each surface unit (4), and the fluid is dispensed from the surface units (4) of the dirt stop surface in a selective manner such that only the surface units (4) in the proximity of which the presence of the surface to be cleaned has been sensed are applied for dispensing the fluid. The invention relates further to a dirt stop surface unit and a dirt stop surface assembled therefrom that is capable of carrying out the method.

Abstract: Disclosed is a washer idler roller and a wafer cleaner using the same in which the wafer cleaner prevents wafer slip and wafer hunting so that the wafer rotates stably, and it is possible to efficiently determine whether the wafer is clean or not by precise detection of a rotation state of the wafer. The wafer cleaner of semiconductor manufacturing equipment according to the present invention includes a wafer roller for rotating the wafer, an idler detecting a rotation speed of the wafer, and brushes respectively disposed at opposite sides of the wafer, wherein the idler includes a first body configured to rotate, a pair of first guide portions disposed at the first body, and a washer idler roller disposed between the first guide portions and being in contact with an outer circumferential surface of the wafer.

Abstract: A system for cleaning an additive manufacturing machine recoater includes a position module for sensing and/or determining a position of a recoater of the additive manufacturing machine and a gas manifold disposed in the additive manufacturing machine and configured to spray a pressurized gas on the recoater when the recoater is in at least one cleaning position. The system includes a valve configured to allow the pressurized gas to flow from a gas source to the gas manifold, and a valve control module configured to control the valve as a function of the position sensed and/or determined by the position module.

Abstract: A substrate processing apparatus includes a heater having an infrared lamp and a housing for heating an upper surface of a substrate held by a substrate holding mechanism with the heater in opposed relation to the upper surface. A heater cleaning method includes locating the heater at a position above a lower nozzle in opposed relation to a first spout of the lower nozzle, the lower nozzle being in opposed relation to a lower surface of the substrate held by the substrate holding mechanism, and a lower cleaning liquid spouting step of supplying a cleaning liquid to the lower nozzle to spout the cleaning liquid upward from the first spout with no substrate being held by the substrate holding mechanism to thereby supply the cleaning liquid to an outer surface of the housing of the heater located at the heater cleaning position.

Abstract: The present invention relates to a method and apparatus for cleaning an oil and gas well riser section or assembly on location offshore that includes a larger diameter central pipe and a plurality of smaller diameter pipes that are spaced radially away from the central larger diameter pipe. Even more particularly, the present invention relates to an improved method and apparatus for cleaning oil and gas well riser sections wherein a specially configured cap or pair of caps are fitted to the ends of the riser which enable pressure washing cleaning tools (or a camera) to be inserted into and through a selected one of the pipes including either a smaller diameter of the pipes or the central larger diameter pipe and wherein the cap continuously collects spent cleaning fluid and debris, allowing the cleaning process to be done on location without transporting the riser section back onshore.

Abstract: A surgical cleaning tool and method of cleaning a surgical tool. The surgical cleaning tool includes a shaft, a handle and an end portion. The shaft has a distal end and a proximal end. The handle is attached to the distal end of the shaft The end portion is connected to the proximal end of the shaft, wherein the end portion has an outer surface, an inner cavity, an inner surface, at least one cleaning element connected to at least a portion of the inner surface, and an opening in a wall portion of the end portion, wherein the opening allows access to the cleaning element in the inner cavity of the end portion.

Abstract: An apparatus for cleaning HVAC cooling coils comprises a supply and collection assembly having a housing defining an interior space for containing a quantity of cleaning solution. A pump has a pump inlet positioned to be in fluid communication with the cleaning solution and is operative to deliver the cleaning solution to a supply outlet of the supply and collection assembly. A vacuum source has a vacuum inlet positioned to be in fluid communication with an ullage space above the quantity of cleaning solution such that the vacuum source creates negative pressure in the ullage space during operation. A collection inlet is in fluid communication with the ullage space such that the cleaning solution is returned to the interior space through the collection inlet during operation of the vacuum source. A nozzle device is in fluid communication with the supply outlet via outlet piping so as to deliver the cleaning solution to a surface of an HVAC coil unit.

Abstract: Fuel nozzle assemblies are flushed after ultrasonic cleaning. In one embodiment, a method includes: cleaning a fuel nozzle assembly by ultrasonic cleaning; and after the ultrasonic cleaning, flushing the fuel nozzle assembly using a solution, the fuel nozzle assembly comprising a valve located in an interior of the fuel nozzle assembly, the solution flowing through the interior of the fuel nozzle assembly, and the flowing of the solution controlled by the valve.

Abstract: A method for cleaning a wall body with a UAV includes obtaining a path to be cleaned; flying to a region to be cleaned according to the path to be cleaned; recognizing a wall surface in the region to be cleaned; and using a cleaning device carried by the UAV to clean the wall surface.

Abstract: A method for processing a substrate is provided. The method includes supplying a first flow of a chemical solution into a processing chamber, configured to process the substrate, via a first dispensing nozzle. The method further includes producing a first thermal image of the first flow of the chemical solution. The method also includes performing an image analysis on the first thermal image. In addition, the method includes moving the substrate into the processing chamber when the result of the analysis of the first thermal image is within the allowable deviation from the baseline.

Abstract: In one embodiment, after a new filter unit (3) is installed in a treatment liquid supply apparatus, there is performed, before a solvent-containing treatment liquid is passed through the filter unit, a step of soaking the filter unit with a solvent for pretreatment and then discharging therefrom the solvent. The solubility of a material, constituting a filter part (31) of the filter unit, to the solvent is greater than the solubility of the material to the treatment liquid. This step makes it possible to remove a component, which may elute from the filter part into the treatment liquid to produce foreign matters (particles), before treatment liquid is passed through the filter unit.

Abstract: A cleaning apparatus is provided that includes a first nozzle configured to direct a cleaning jet towards a contaminated surface at a pressure sufficient to remove contaminants from the surface. At least one second nozzle is configured to direct a rinsing jet towards the contaminated surface to remove cleaning fluid therefrom, wherein the rinsing jet is directed at a pressure sufficient to isolate the cleaning jet from an ambient environment.

Abstract: The invention provides a cleaning formulation comprising a multiplicity of solid cleaning particles, wherein the solid cleaning particles comprise polymeric particles and at least one cleaning agent, wherein the at least one cleaning agent is immobilised on the surface of the polymeric particles. Typically the at least one cleaning agent is immobilised on the surface of the polymeric particles by means of chemical bonds, typically ionic bonds, hydrogen bonds, covalent bonds, polar bonds, or bonds formed by virtue of unequal charge distributions between polymeric particles and immobilised materials. The invention also provides a method for the cleaning of a substrate, the method comprising the treatment of the substrate with a formulation according to the invention, and a method for the preparation of the cleaning formulation of the invention which comprises treating a multiplicity of polymeric particles with at least one cleaning agent.